ILLUMINATION SYSTEM, ILLUMINATION LIGHT OBSERVATION SYSTEM, ILLUMINATION LIGHT IMAGING SYSTEM, ILLUMINATION DEVICE, AND DESIGN METHOD FOR ILLUMINATION SYSTEM

WIPO Patent Application WO/2024/090492

A1

An illumination system (30) comprises a projection surface (40) and an illumination device (50). The projection surface (40) is parallel to a first direction (D1) and a second direction (D2) perpendicular to the first direction (D1). The illumination device (50) projects a projection pattern (41), which extends in the first direction (D1), onto the projection surface (40). The illumination device (50) has a light source (51), and a diffraction optical element (55) that forms the projection pattern (41) by diffracting light from the light source (51). The diffraction optical element (55) includes a plurality of element diffractive optical elements (56), each of which diffracts light from the light source (51). The shortest length (Lb1) among the lengths in the second direction (D2) of the projection pattern (41) is shorter than the greatest length (Lc) among the lengths at which light incident on the diffraction optical element (55) intersects with a plane parallel to the projection surface (40), and is greater than the greatest length (La) among the lengths at which the component diffraction optical elements (56) intersect with the plane parallel to the projection surface (40).

KURASHIGE MAKIO (JP)
NISHIO SHUMPEI (JP)

PCT/JP2023/038603

May 02, 2024

October 25, 2023

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DAINIPPON PRINTING CO LTD (JP)

F21S2/00; F21V9/00; G02B5/18; F21Y113/10; F21Y115/30

WO2019009260A1

2019-01-10

JP2021192110A	2021-12-16
JP2022160853A	2022-10-20
JP2022090539A	2022-06-17

MIYAJIMA Manabu et al. (JP)

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