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WO/2011/006753 |
In a method for machining a piston (10) for an internal combustion engine, a ring groove (12) is first at least partially hard anodized (14), and the hard anodized coating (14) is subsequently partially polished by a rotating grinding to...
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WO/2011/006650 |
The invention discloses a method for microstructuring for improving known polishing methods and polishing devices for correcting geometric deviation defects on precision surfaces. In order to determine the microstructure for the purpose ...
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WO/2011/007342 |
The present invention relates to a security element (1), comprising: an optical system, comprising: a transparent or translucent substrate (2); on the side of a first surface (2a, 2b) of the substrate (2) is a combined image (I) comprisi...
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WO/2011/008077 |
The invention relates to a grinding head for a grinding machine. The grinding head comprises a tool holder, which in use is moved in a plane, in particular rotated or translated back and forth, by the grinding machine. The grinding head ...
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WO/2011/008499 |
In one aspect, a polishing pad includes a homogeneous unitary polishing layer having a polishing surface, an opposed bottom surface, a recess in the polishing surface extending partially but not entirely through the polishing layer, and ...
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WO/2011/008804 |
A ruler has a body with a forward surface and a side surface defining a straight line. An elongate member having an abrasive outer edge is positioned along the side surface. The abrasive edge assists in sharpening a cutting tool moved al...
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WO/2011/009046 |
An abrasive tool with flat and consistent surface topography for conditioning a CMP pad and method for making are disclosed. The abrasive tool includes abrasive grains coupled to a low coefficient of thermal expansion (CTE) substrate thr...
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WO/2011/007590 |
Provided is a water-soluble working fluid for a fixed-abrasive wire saw, which comprises glycol (A) and water, has a viscosity at 25°C that is between 3 mPa·s and 50 mPa·s, and has excellent silicon workability.
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WO/2011/007476 |
Disclosed are a device for processing a substrate and a method for processing a substrate employing said processing device, which are simple and make it possible to provide a processed substrate which has a smooth surface. Also provided ...
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WO/2011/007217 |
The present invention relates to a device for sharpening one or more cutting edges (51) of a dental curette (50). It has a base support (2), on which there is articulated a frame (3), and at least one sharpening guide (4, 40). Said frame...
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WO/2011/009046 |
An abrasive tool with flat and consistent surface topography for conditioning a CMP pad and method for making are disclosed. The abrasive tool includes abrasive grains coupled to a low coefficient of thermal expansion (CTE) substrate thr...
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WO/2011/004352 |
The invention relates to a suspension including a set of abrasive grains and a binder, said suspension being characterized in that: the particle size fraction D40-D60 of said set of abrasive grains comprises more than 15 vol % and less t...
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WO/2011/004793 |
Disclosed is a polishing liquid composition for silicon wafers, which comprises an abrasive material, an aqueous medium, and a polymer compound. The polymer compound has structural unit (a1) represented by general formula (1), structural...
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WO/2011/004085 |
The invention relates to a method for cutting a material, in which said material is cut using a cutting jet at a pressure of at least 100 bars, characterised in that the cutting jet consists of a mixture of at least one first compound in...
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WO/2011/004701 |
In the case of a desktop cutting machine, it is so arranged that when the area where a rotary cutting tool is mounted on a spindle is to be guarded by a guard member installed in a body case, then a fixing device which fixes this guard m...
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WO/2011/004189 |
An apparatus and method for aligning a gemstone such as diamond (106) with a predetermined vertical axis (108) is described. The apparatus includes an upwardly extending nozzle (105) aligned with the vertical axis (108) and sized to allo...
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WO/2011/004473 |
An optical disc polishing apparatus (10) is provided with: an optical disc turntable (15), which is rotary-driven by being horizontally disposed and has an optical disc (14) placed on an upper section thereof; and polishing material turn...
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WO/2011/004259 |
A bevelling apparatus, for manufacturing screws and the like, includes a fixed supporting structure, which includes a first motor unit (3) and a second motor unit (4) which actuate a pliers unit adapted to lock an item to be machined and...
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WO/2011/003621 |
The present invention relates to a knee joint prosthesis (1) having: a tibial component (2) and a femoral component (3). The tibial component (2) includes a fixation portion (10) adapted to be fixed to an upper end of a prepared tibia (T...
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WO/2011/003937 |
An attachment arrangement is intended for attaching a grindstone (1) on a shaft (3) therefore. An inner washer (4), against which the grindstone is supported, is in supporting engagement against a shaft shoulder. A washer nut (7) in dire...
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WO/2011/003782 |
The invention relates to a method for preparing a suspension from a separation process, wherein the suspension is made of a particulate abrasive and a liquid slurrying agent. The method comprises the steps: a) thinning the suspension in ...
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WO/2011/003621 |
The present invention relates to a knee joint prosthesis (1) having: a tibial component (2) and a femoral component (3). The tibial component (2) includes a fixation portion (10) adapted to be fixed to an upper end of a prepared tibia (T...
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WO/2011/004764 |
A grinding device for plate-like bodies is provided with back pads which are configured in such a way as to adsorb and hold first surfaces of the principal surfaces of the plate-like bodies and with grinding pads which are configured in ...
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WO/2011/002149 |
The present invention relates to a CMP polishing pad with pores formed therein, wherein the pores are formed in the CMP polishing pad using a laser by setting the focal point of the laser beam inside the CMP polishing pad. When pores are...
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WO/2011/001710 |
Provided is a polishing apparatus that can efficiently correct protruding defects on the surface of a workpiece. A tape polishing apparatus (1) that corrects protruding defects on the surface of a workpiece with a running polishing tape ...
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WO/2011/002149 |
The present invention relates to a CMP polishing pad with pores formed therein, wherein the pores are formed in the CMP polishing pad using a laser by setting the focal point of the laser beam inside the CMP polishing pad. When pores are...
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WO/2011/001755 |
Provided is a two-pack urethane resin composite for use in an abrasive pad, said composite comprising: a base containing an isocyanate-terminated urethane prepolymer (A); and a hardener containing an isocyanate-reactive compound (B). The...
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WO/2011/002881 |
An abrasive article with an array of independently gimballed abrasive members that are capable of selectively engaging with nanometer-scale and/or micrometer-scale asperities on the surfaces of substrates. Each abrasive member maintains ...
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WO/2011/002149 |
The present invention relates to a CMP polishing pad with pores formed therein, wherein the pores are formed in the CMP polishing pad using a laser by setting the focal point of the laser beam inside the CMP polishing pad. When pores are...
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WO/2011/002069 |
Honing stone bases (12) which are equipped with honing stones (15) provided on the outer side thereof are mounted to the holder (11) of a honing head (10) so as to be expandable in the radial direction. Each honing stone base (12) is div...
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WO/2010/149462 |
The invention relates to a method for producing a turbine rotor for a turbocharger, especially in or for a motor vehicle, including the following steps: providing a turbine wheel (3) comprising a welded pin (4) to be integrally joined to...
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WO/2010/150757 |
A glass disc polishing device comprises a base, a lower surface lapping plate to polish lower surfaces of glass discs held by a carrier, an upper lapping plate to polish upper surfaces of the glass discs, an upward and downward movement ...
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WO/2010/149434 |
Aqueous dispersion comprising cerium oxide and silicon dioxide, obtainable by first mixing a cerium oxide starting dispersion and a silicon dioxide starting dispersion while stirring, and then dispersing at a shear rate of 10000 to 30000...
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WO/2010/151039 |
A machining wheel is disclosed. The machining wheel comprises a metallic disk and diamond abrasive particles attached to the edge surface of the disk. A plurality of through-holes are formed in an edge portion of the disk so as to penetr...
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WO/2010/148430 |
The invention relates to a blade sharpening and storing device. The device includes a hollow housing for receiving and storing a blade and an access opening at an end of the housing through which the blade can be moved longitudinally to ...
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WO/2010/149718 |
Segment cut-off wheel for machining workpieces made of metal, and particularly cast metal, comprising a metal steel blade 1 and segments disposed on the circumference of the steel blade 1, wherein the outside edge of the segments 2 is pr...
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WO/2010/149720 |
The present invention relates to a method for manufacturing a part (10) by forging, including producing a semifinished part (10) by precision forging and polishing the part (10) by means of an abrasive strip, the compliant geometric char...
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WO/2010/151039 |
A machining wheel is disclosed. The machining wheel comprises a metallic disk and diamond abrasive particles attached to the edge surface of the disk. A plurality of through-holes are formed in an edge portion of the disk so as to penetr...
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WO/2010/150460 |
Provided are a silicon ingot cutting method and a cutting system. The method comprises: performing a primary and secondary centrifugal separations on waste slurry produced when a silicon ingot is cut by a wire saw and separating the wast...
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WO/2010/150560 |
A shot-blasting machine that can process a desired part of shaped steel by shot blasting comprises: a means (1) for shooting shot materials against a predetermined location; a cabinet (2), to which the means for shooting is attached and ...
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WO/2010/150766 |
Provided is a polishing pad which is capable of improving the affinity to a polishing liquid and achieving the stabilization of the polishing performance. The polishing pad (10) is provided with a urethane sheet (2). The urethane sheet (...
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WO/2010/150326 |
Provided is a holding pad the whole area of which can be applied to a holding panel while ensuring flatness even in the case of having an enlarged size. A holding pad (10) is provided with a buffed urethane sheet (2) on the rear side of...
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WO/2010/147135 |
Provided is a wheel bearing that prevents balls from becoming scratched and has improved acoustic properties and an improved lifespan. In the provided wheel bearing, which is configured as a double-row angular ball bearing, a counter are...
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WO/2010/145912 |
Method for determining movement data representing the movement of a machining tool of an optical lens 3D machining device for machining a surface of an optical lens, wherein the method comprises: ▪ a machining tool data providing stage...
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WO/2010/145852 |
An apparatus (1) for polishing cavities in mechanical components (4), characterized in that said apparatus (1) comprises a supporting framework (2) supporting a working plane (3) thereon are housed the mechanical workpieces (4) to be sub...
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WO/2010/148265 |
The evacuation properties of an abrasive disk are improved by forming its apertures to exhibit a configuration that will direct process fluids onto or away from a workpiece (or contact) interface through capillary action, surface tension...
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WO/2010/146982 |
A polyurethane prepared by reacting a mixture which contains at least (A) a diisocyanate, (B) a polyol, and (C) a chain extender, characterized in that: the polyol (B) has a number-average molecular weight of 400 to 5,000; the chain exte...
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WO/2010/147086 |
Provided is a grinding device with a simple configuration such that it is possible to easily dress a grind stone and which has a dressing mechanism that can be manufactured inexpensively. A dressing head (7) that attaches to a dressing t...
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WO/2010/146898 |
A spring wire (20) having a hardness of 50 to 56 HRC is subjected to a first shot-peening step (S6) and a second shot-peening step (S7) in a temperature range from 150 to 350°C. At the first shot-peening step (S6), a first shot having a...
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WO/2010/148265 |
The evacuation properties of an abrasive disk are improved by forming its apertures to exhibit a configuration that will direct process fluids onto or away from a workpiece (or contact) interface through capillary action, surface tension...
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