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Matches 651 - 700 out of 145,028

Document Document Title
WO/2019/194732A1
A transmission arrangement (113) comprising a first axle (24) that is rotatable about a first axis (33) and is connected to a first pulley (25) that is arranged to drive an endless power transferring means (26) that further is adapted to...  
WO/2019/195427A1
A system for blast-cleaning a barge bottom providing for safety and avoidance of damage to the barge and to persons, where a barge is blast-cleaned with a blasting tractor having a transverse track beam along which positioning units move...  
WO/2019/195087A1
Data received from an in-situ monitoring system includes, for each scan of a sensor, a plurality of measured signal values for a plurality of different locations on a layer. A thickness of a polishing pad is determined based on the data ...  
WO/2019/119523A8
Disclosed is a deburring machine, comprising a machine base (1), and a conveying device (2) for conveying a workpiece, a universal rolling brush grinding machine head (3) for deburring edges and holes of the workpiece, and an abrasive be...  
WO/2019/193908A1
Provided is a high-porosity CBN vitrified grindstone which is filled with an appropriate quantity of a hollow filler having a suitable grain diameter, and whereby the grindstone can be endowed with high strength without changing the cont...  
WO/2019/194967A1
A glass grinding apparatus includes a base unit assembly having a work-piece support assembly and a motor housing assembly. The work-piece support assembly includes a work-piece support grating and a water basin. The motor housing assemb...  
WO/2019/191848A1
An apparatus may include: a first at least one piezoelectric actuator operable to vibrate a tool in a first lateral direction; and a second at least one piezoelectric actuator operable to vibrate the tool in a second lateral direction. A...  
WO/2019/188359A1
The present invention provides a means whereby a work can be polished at a high rate and have a further improved surface quality. The present invention is a polishing composition for use in polishing works which comprises abrasive alumin...  
WO/2019/188747A1
The present invention provides a polishing composition that is for polishing gallium compound semiconductor substrates. The polishing composition includes silica abrasive grains, a compound Cpho that has a phosphoric acid group or a phos...  
WO/2019/184195A1
An eccentric translational polishing head, comprising an eccentric wheel (8), a dial (9), and swinging rod mechanisms (10). The eccentric wheel (8) is connected to the dial (9). The geometric center of the eccentric wheel (8) overlaps th...  
WO/2019/185544A1
An abrasive product comprising an impregnated woven fabric comprising: a) A first layer of first uncrimped weft multifilaments (301-308) b) a second layer of second uncrimped weft multifilaments (309-316); wherein for each of the first u...  
WO/2019/188120A1
The present disclosure relates to a shot which is used for blast processing, and which is formed from an iron-based alloy that contains, as additional elements, 0.20-0.50% by mass of C, 0.50-1.10% by mass of Si and 0.50-1.15% by mass of ...  
WO/2019/188610A1
Provided is a shot treatment device in which a projector projects a projection material onto an article to be treated. The shot treatment device comprises: a plurality of suspensory conveyance devices; and a control device. The suspensor...  
WO/2019/190735A1
Provided is a process for blast cleaning comprising subjecting a work surface to a blast stream, wherein the work surface is metal that is contaminated with one or more radioactive moiety, wherein the blast stream comprises water and one...  
WO/2019/187814A1
The present invention relates to a substrate holding device for use in polishing a surface of a substrate by pressing the substrate against a polishing tool, such as a polishing pad. The present invention also relates to a method of manu...  
WO/2019/188901A1
Provided is a production method for a semiconductor substrate. The production method makes it possible to control the post-production shape of the substrate to a high degree. This production method for a semiconductor substrate includes ...  
WO/2019/188577A1
The present invention provides: a polishing pad that exhibits high stability in terms of polishing rate over time; and a method for producing same. This polishing pad is equipped with a polishing layer having a polyurethane sheet, wherei...  
WO/2019/189610A1
Provided is a polishing composition with which a high polish rate is achieved, surface smoothness (surface quality) of a polishing substrate is improved, and defects can be reduced. Specifically, this polishing composition contains silic...  
WO/2019/187878A1
This sheet glass production method comprises an end-face grinding step for grinding an end face (Ga) of the sheet glass (G) and an end-face polishing step for polishing the end face (Ga) of the sheet glass (G) that has been ground, where...  
WO/2019/185279A1
The invention relates to a coating removal method for the edge deletion of sheets of glass (3), wherein the sheets of glass (3) have at least on one of their two glass surfaces (3a;b) a protective coating (9) in the form of a peel-off pr...  
WO/2019/189124A1
Provided is a polishing composition that has excellent ability to eliminate bulging around an HLM. This polishing composition is for pre-polishing a silicon substrate. The polishing composition includes abrasive grains, a basic compound,...  
WO/2019/187837A1
The present invention provides a polishing composition, wherein there is a means with which it is possible to stably maintain a fixed polishing rate even when the polishing composition is stored for a long period of time in a concentrate...  
WO/2019/191711A1
Articles and methods regarding the making and use of low-shedding nonwoven abrasive articles, such as abrasive wheels and hand pads, that have a low shed rate and achieve a high grind ratio. The abrasive articles comprise a blend of a pl...  
WO/2019/191443A1
A tool is provided and includes a tool frame. The tool frame includes a spindle and an abrasive article is mounted to the spindle. Further, a spark-invariant sensor is coupled to the frame and is configured to measure the rotation rate o...  
WO/2019/191673A1
An abrasive article can include a substrate, abrasive particles coupled by a bond material to the substrate, and a coating overlying at least partially the exterior surface of the bond material. The coating can be a poly(p-xylylene) poly...  
WO/2019/188609A1
This shot treatment device comprises: a workpiece setting jig; a suspensory conveyance device; a projector; a projection positioning mechanism; and a clamp mechanism. The workpiece setting jig comprises a base member including a pair of ...  
WO/2019/188476A1
The purpose of the present invention is to provide a polishing pad that minimizes defects in a polished object, is capable of achieving a flat topography, and exhibits excellent defect performance and topography performance. Provided is ...  
WO/2019/187873A1
The end-face processing step of this method comprises a position control step for controlling, by means of a control device 5, the position of a processing tool 2. The position control step includes: a preparation step S1 for placing the...  
WO/2019/185397A2
The invention relates to an angle grinder having a spindle for fastening a disk-shaped tool, wherein the spindle is mounted in a gear housing of the angle grinder so as to be drivable about a spindle axis, and the spindle is surrounded b...  
WO/2019/187977A1
Provided is a polishing solution which does not easily generate defects on a polishing surface and is capable of more selectively polishing silicon oxide relative to silicon nitride when applied to CMP, or does not easily generate defect...  
WO/2019/187875A1
This sheet glass production method comprises an end-face grinding step for grinding an end face (Ga) of the sheet glass (G) and an end-face polishing step for polishing the end face (Ga) of the sheet glass (G) that has been ground, where...  
WO/2019/187969A1
Provided is a polishing composition that, although including a polyvinyl alcohol-based polymer, has suppressed aggregation of the polyvinyl alcohol-based polymer in the composition and can effectively reduce surface defects. This polishi...  
WO/2019/180621A2
A charge -modified particle comprising the inorganic core and a shell surrounding the inorganic core, wherein the shell comprises a copolymer comprising monomeric units corresponding to free- radically polymerizable monomers, and wherein...  
WO/2019/179847A1
The invention relates to a holding apparatus (1) for a rotating, circular tool (2), such as a grinding or cut-off wheel, containing a circular holding element (3) for removably connecting the tool (2) to the holding apparatus (1) and a c...  
WO/2019/181498A1
The present invention addresses the problem of providing a polishing agent recycle processing system and a polishing agent recovery/regeneration method for efficiently recovering a polishing agent from a used polishing agent slurry and r...  
WO/2019/181811A1
According to one aspect, provided is a washing device for washing a barrel tank of a horizontal-type centrifugal barrel polishing device. This washing device is provided with: a casing, a rotation mechanism, a washing nozzle, and a nozzl...  
WO/2019/181561A1
This rolling component (21) has a surface (21A). The rolling component (21) includes a fiber flow (FF) and a non-metal inclusion. In a region of a first depth from the surface (21A) of the rolling component (21), a gap between the non-me...  
WO/2019/181437A1
The purpose of the present invention is to provide a polishing liquid which, when applied to CMP, has a high selectivity of polishing silicon nitride over silicon oxide and which does not tend to cause defects in the polished surface; an...  
WO/2019/179751A1
The invention relates to a truing device (1) for truing a grinding tool (2) having a specified grinding profile (14), wherein the truing device (1) comprises at least one first truing region (3) and a second truing region (4) connected t...  
WO/2019/179003A1
Disclosed is a bearing hole polishing and impurity removal device for a rolling bearing, comprising a storing seat and a pressing disc. An upper clamping seat is mounted above the storing seat of the pressing disc; four first rotary join...  
WO/2019/181487A1
The purpose of the present invention is to provide a polishing liquid which, when applied to CMP, has a high selectivity of polishing silicon oxide over silicon nitride and which does not tend to cause defects in the polished surface; an...  
WO/2019/180134A1
The invention relates to a transport container (100) for spectacle lenses or spectacle lens blanks in spectacle lens production having a receptacle (106, 107) for receiving a spectacle lens or spectacle lens blank. According to the inven...  
WO/2019/182149A1
This grain-oriented electrical steel sheet comprises: a base material steel sheet having a chemical composition containing, in mass%, 0.010% or less of C, 2.50-4.00% of Si, 0.050-1.000% of Mn, a total of 0.005% or less of S and Se, 0.005...  
WO/2019/181419A1
The present invention provides a means capable of, when grinding an object to be ground containing (a) a material having a silicon-nitrogen bond and (b) another material, improving the ratio of the grinding rate of the material (a) with ...  
WO/2019/181269A1
[Problem] The purpose of the present invention is to solve the contradictory problems of suppressing etching while maintaining the grinding speed during germanium grinding. [Solution] This germanium dissolution inhibitor comprises a comp...  
WO/2019/179964A1
The invention relates to a connecting device comprising a positive connecting element and a negative connecting element, wherein the positive connecting element has an elevation arranged on a base surface and the negative connecting elem...  
WO/2019/179660A1
The invention relates to a method for manufacturing spectacle lenses (1) according to a prescription, comprising the steps of: - blocking (504) or fixing a semi-finished spectacle lens blank (SFB) having a first face (cx) possessing a fi...  
WO/2019/181652A1
This porous pad (20) is provided with: a porous ceramic portion (25) having formed a plurality of pores providing permeability to allow for passage of a fluid; and an antislip portion (27) which is formed on the porous ceramic portion (2...  
WO/2019/181693A1
[Problem] To provide a polishing composition capable of polishing a silicon oxide carbide (SiOC) at a faster rate than the rate of polishing the silicon nitride (that is, having a high SiOC/silicon nitride selectivity). [Solution] This p...  
WO/2019/180873A1
This end mill has a shank and a cutting edge section. The shank has a coolant supply path. The cutting edge section covers an outlet of the coolant supply path and is provided on the shank. The cutting edge section is configured by a por...  

Matches 651 - 700 out of 145,028