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WO/2024/025797A1 |
A composition includes at least one pH adjuster, at least one chelating agent, at least one anionic surfactant, at least one nitrogen containing heterocycle, at least one alkylamine compound, and an aqueous solvent, wherein the compositi...
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WO/2024/022756A1 |
2.1. The invention relates to a honing method for processing an inner surface of a borehole in a workpiece using at least one honing operation. A honing tool which can be widened and which is coupled to a spindle shaft of a spindle unit ...
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WO/2024/025792A1 |
Exemplary polishing methods for chemical mechanical polishing may include engaging a substrate with a membrane of a substrate carrier. The methods may include chucking the substrate against a substantially planar surface defined by the s...
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WO/2024/023876A1 |
A polishing tool (1) stores and holds, in a storage unit (52) of a polishing tool holder (4), a reference dimension (M) which is the initial dimension of a linear abrasive material (2), the number of polishing operations, and a wear patt...
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WO/2024/024178A1 |
This management device 20 comprises a control unit 22 that manages a plurality of wafer processing devices 1. The control unit 22 selects a wafer processing device 1 to be assigned to processing of a prescribed type of wafer from among t...
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WO/2024/026289A1 |
A method of forming a cutting element includes providing a supporting substrate including a homogenized binder including Co, Al, C, and one or more of Ni and Re, depositing discrete diamond particles directly on the supporting substrate,...
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WO/2024/024413A1 |
The present invention provides means for preventing sedimentation of abrasive grains and improving redispersibility of abrasive grains, while improving polishing performance. The present invention relates to a polishing composition com...
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WO/2024/025429A1 |
The present invention is an accessory for installation on grinding machines. The accessory is the support body, or skate holder in industrial language, for receiving the skate, over which the grinding belt will slide. It is comprised of ...
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WO/2024/023333A1 |
A system (100) for producing a powder-gas jet for performing a dental treatment, wherein the system (100) is configured for being connected to a dentist chair by a connection, wherein the connection of the system (100) to the dentist cha...
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WO/2024/023847A1 |
CNC Machine for Spectacle Glass Edging provides 3-axis/dimensional scanning, cutting and edging process with use of novel Multi-functional tool (114) in single machine with computer implemented program, in which Scanning Sensor-S1-Periph...
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WO/2024/025330A1 |
An aluminum alloy surface treatment method is provided. The aluminum alloy surface treatment method comprises the steps of: processing an aluminum alloy into a predetermined shape; physically forming unevenness on the surface of the alum...
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WO/2024/025839A1 |
Carriers for polishing workpieces with flats or voids are provided. In one aspect, a substrate carrier head for a chemical mechanical planarization (CMP) system include a carrier body comprising an aperture configured to receive a wafer ...
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WO/2024/022976A1 |
In a method for mounting or for determining the position of a semi-finished optical product (3) on a manufacturing mandrel (2) during the manufacture of a spheric or aspheric lens, the position of the semi-finished product (3) on the man...
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WO/2024/022445A1 |
A mechanism having a bidirectional rotation function, comprising a driver (1), and an inner shaft (3) and an outer shaft (4) which are in driven connection to the driver (1), the outer shaft (4) being sleeved on the inner shaft (3). A sp...
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WO/2024/025816A1 |
Low-friction sanding assemblies and machines for sanding and/or grinding one or more portions of a part are provided. The low-friction sanding assemblies comprise a sanding pad, an abrasive device, and a constant-force assembly that main...
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WO/2024/023618A1 |
Polyurethanes and polishing articles made therefrom including a reaction product of a reactive mixture including a polyol, a diol chain extender, a diisocyanate, a mono-alcohol, and a multifunctional amine are described. The mole ratio o...
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WO/2024/025002A1 |
The present invention relates to a method for polishing the surface of a 3D-printed orthopedic Ti alloy plate, the method enabling the surface of a 3D-printed orthopedic Ti alloy plate to be polished to a roughness level suitable for bio...
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WO/2024/026380A1 |
In one embodiment, a polishing composition can comprise abrasive particles including zirconia, an oxidizing agent including hydroxylamine and water. The polishing composition can have a high copper removal rate of at least 3500 Å/min, a...
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WO/2024/018854A1 |
A substrate processing method comprising: preparing a substrate having a first main surface and a second main surface opposite to the first main surface and having waviness in each of the first main surface and the second main surface; i...
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WO/2024/018735A1 |
A method for dressing a polishing pad is proposed by which the polishing pad can be more evenly dressed even on a rotating platen having a curved surface. The method for dressing a polishing pad 100 comprises pressing the grindstone 12 o...
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WO/2024/017033A1 |
A polishing machine, comprising a closed horizontally-arranged long channel (1), a power vibration mechanism (2) and a hot air production device (3), the long channel (1) being arranged on the power vibration mechanism (2), hot air comin...
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WO/2024/019240A1 |
A pad conditioner for dressing the surface of a CMP pad according to an embodiment of the present invention comprises: a substrate; and a plurality of protrusion members provided on the substrate. Each of the protrusion members may inclu...
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WO/2024/019256A1 |
An exterior material for home appliances, according to an embodiment, may include a base material having a hierarchical circular structure pattern on the upper surface thereof. The hierarchical circular structure pattern may include a pl...
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WO/2024/018495A1 |
Method for holding and performing work on a sheet (200) which has a first lateral surface (210), an opposing second lateral surface (211) and a perimeter edge (212), comprising: a step of holding said sheet (200), a step of working said ...
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WO/2024/016558A1 |
A brick-pushing device, comprising a first brick-pushing component (1), which is equipped with an adjusting electric motor (31) and an adjusting seat (32), wherein a limiting block (33) is provided on the adjusting seat (32), the adjusti...
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WO/2024/018562A1 |
The purpose of the present invention is to provide a system and a program for enabling workpiece processing precision to be maintained even if a grinding material is worn down. A system comprising at least one computer device, the syst...
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WO/2024/014608A1 |
The present invention relates to a polishing device for polishing a tooth surface, the device comprising: an air pump for generating compressed air; a filter for removing moisture in air introduced through the air pump; and a powder cont...
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WO/2024/015530A1 |
A chemical mechanical polishing system includes a support configured to hold a substrate face-up, a polishing article having a polishing surface smaller than an exposed surface of the substrate, a port for dispensing a polishing liquid, ...
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WO/2024/011283A1 |
An aerofoil combining the advantages of both lift and pressure type fluid dynamic devices in which the lower surface is in the form of a convex hyperbola towards the leading edge and a symmetrical concave hyperbola towards the trailing e...
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WO/2024/012048A1 |
A TFT-LCD float glass substrate processing line, sequentially comprising: a fine-cutting and edge-grinding working area, a surface grinding working area, and an inspection and packaging working area. A cold cutting device, a fine-cutting...
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WO/2024/011292A1 |
A guard for a motor of a portable power tool, comprising an assembly of panels that interconnect to form a cover that is couplable to the motor. The cover is configured to conform to an external geometry of the motor and to extend substa...
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WO/2024/010132A1 |
Disclosed are a polishing pad equipped with a window and a method for manufacturing same, wherein, in the process of inserting and attaching a window into a polishing pad, no thermal melting/bonding scheme and no vibration melting/bondin...
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WO/2024/009588A1 |
Provided is a machining tolerance evaluating system capable of reducing, at least, reworking costs, by obtaining and displaying an appropriate tolerance range with which a metal machined product can be manufactured. The machining toler...
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WO/2024/009580A1 |
Provided is a method for determining conditions for polishing one surface of a wafer with a polisher. The polisher comprises at least a platen, a polishing pad disposed on the platen, and a polishing chuck disposed over the polishing pad...
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WO/2024/009938A1 |
A material for a ceramic ball according to the present embodiment is characterized in that a deviation from spherical form is 2% or less, and an arithmetic mean roughness Ra is 0.2 μm to 2 μm inclusive. Moreover, in the material for a ...
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WO/2024/007231A1 |
The present application relates to the technical field of turret machining, and discloses end face tooth polishing equipment for a turret. The equipment comprises a frame; the frame is provided with a workbench; a mounting base for mount...
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WO/2024/007725A1 |
A sharpening machine for a linear probe, comprising a sharpening positioning module (400), a clamping module (200) and a grinding machine (900); the sharpening positioning module (400) comprises two semicircular pipes (480), and the two ...
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WO/2024/010778A1 |
A system and method for excising mechanical property samples from a part using a water jet is provided. The method includes generating programs, software, and/or profile data associated with the part; placing the part in a fixture bracke...
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WO/2024/007519A1 |
A brick pushing device, comprising two independent brick pushing mechanisms arranged oppositely. Each brick pushing mechanism comprises a support base (1), a brick pushing support (2) slidably arranged on the support base (1), a brick pu...
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WO/2024/010509A1 |
A pre-filter (200) for a heavy-duty dust extractor (100), the pre-filter (200) comprising a filter aperture (210) and a filter side wall (220), where the side wall is arranged to permit a flow of air to pass the side wall and to prevent ...
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WO/2024/009775A1 |
This substrate processing device comprises: a substrate clamping unit that clamps a substrate; a supply unit the supplies a fluid to the inside of the substrate clamping unit; a suction unit that suctions the fluid from the inside of the...
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WO/2024/009887A1 |
Provided is a top panel which is for a tactile sense presentation device and which can sufficiently increase the variation width of frictional force and efficiently increase tactile sense expressiveness. A top panel 1 for a tactile sen...
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WO/2024/007647A1 |
A water jet strengthening and polishing integrated system for blades of a bladed disk, comprising a vibration polishing unit and a water jet strengthening unit. The vibration polishing unit comprises a vibration polishing tank (3), a cla...
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WO/2024/008338A1 |
The present invention relates to a grinding and/or polishing machine (1) with a rotatable specimen holder (20) and a rotatable disc (8) for supporting a preparation surface (6), the specimen holder (20) comprising a housing (25) having a...
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WO/2024/001048A1 |
A polishing head driving device and a polishing machine. The polishing head driving device comprises: a main shaft (6), which is used for connecting to a polishing head (1); a bearing seat (5), which is sleeved outside the main shaft (6)...
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WO/2024/000974A1 |
Disclosed is a grinding mechanism for a formwork of a tunnel lining trolley, the mechanism comprising a mounting frame (100), a driving member (200), a rotary disc (210), a link rod (300), a rocker arm (400) and a cleaning assembly. The ...
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WO/2024/004224A1 |
Provided is a surface treatment member 1 for use by being attached to a rotary member in a surface treatment system comprising the rotary member. The surface treatment member 1 comprises a base 10, a striking member 40 having an annular ...
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WO/2024/001121A1 |
The present invention relates to the technical field of ultra-precision polishing, and particularly relates to a semiconductor wafer magnetically-controlled grinding and polishing integrated disc and a use method therefor. The semiconduc...
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WO/2024/002312A1 |
Disclosed in the present invention is a chemical mechanical planarization apparatus, comprising: a polishing module, a cleaning module, and a cleaning input module, which is arranged respectively adjacent to the polishing module and the ...
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WO/2024/005507A1 |
The present invention relates to a coupler for fastening a polishing disk, which is capable of constantly maintaining the fastening force with the polishing disk even when being used for a long period of time and preventing the arbitrary...
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