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WO/2011/082704 |
The invention relates to a processing machine (1) or a processing device (1) for dry ice (2), said machine or device lying in a housing (26) and being constructed as a modular tower. The arrangement and design solution is achieved by: a ...
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WO/2011/083953 |
A wafer polishing apparatus is provided. The wafer polishing apparatus includes a first polishing roller disposed on a wafer, the first polishing roller extending in a direction in which the wafer extends and a second polishing roller di...
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WO/2011/083010 |
The invention relates to a grinding wheel (10) having a disc-shaped or plate-shaped carrier (12) having a central bore (18) and having grinding lamellae (20, 22) which are arranged overlapping in a shingle-like manner on a ring-shaped ou...
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WO/2011/082156 |
Polishing pads including organic particulates in a continuous polymer phase, and methods of making and using such pads in a polishing process. In one exemplary embodiment, the polishing pads include a multiplicity of polishing elements i...
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WO/2011/080569 |
An abrasive article includes a fabric comprising a front face and a back face. The front face is formed of first knitted yarns. Each yarn of the first knitted yarns includes a plurality of filaments. A plurality of threads intertwines wi...
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WO/2011/080328 |
The invention relates to a roughing and/or cut-off wheel for machining workpieces and/or separating workpieces, wherein the roughing and/or cut-off wheel (1) has a hardened body (2), wherein the hardened body (2) has at least a granular ...
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WO/2011/081306 |
The present invention relates to a machine for sharpening a skate blade, comprising: leg units facing each other below left and right ends of the machine for sharpening a skate blade, so as to fix a skate blade; a transfer unit which is ...
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WO/2011/082155 |
Polishing pads containing a phase-separated polymer blend, and methods of making and using such pads in a polishing process. In one exemplary embodiment, the polishing pads include a multiplicity of polishing elements integrally formed i...
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WO/2011/082261 |
An article includes a packaging material comprising a self-supporting wall having a water vapor transfer rate of not greater than 0.001 g/m2-day. The packaging material defines an enclosed volume. The article further includes a bonded ab...
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WO/2011/080569 |
An abrasive article includes a fabric comprising a front face and a back face. The front face is formed of first knitted yarns. Each yarn of the first knitted yarns includes a plurality of filaments. A plurality of threads intertwines wi...
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WO/2011/082155 |
Polishing pads containing a phase-separated polymer blend, and methods of making and using such pads in a polishing process. In one exemplary embodiment, the polishing pads include a multiplicity of polishing elements integrally formed i...
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WO/2011/080463 |
The invention relates to an automated machine for grinding track welds on a rail head (13), which comprises a portable main chassis (9) arranged so as to be placed on the track and provided with mountings (10) that describe an arc of cir...
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WO/2011/081541 |
The subject of the invention is a method for modification of top layers of working surfaces of machine parts, which is used for the treatment of top layers of working surfaces of machine parts, and especially for placement of coatings of...
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WO/2011/079347 |
An optically variable device (50, 250, 260) including a plurality of relief elements (60, 251, 261, 262) applied to a surface (22). The relief elements (60, 251, 261, 262) collectively generate, by diffraction and/or refraction and/or re...
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WO/2011/080328 |
The invention relates to a roughing and/or cut-off wheel for machining workpieces and/or separating workpieces, wherein the roughing and/or cut-off wheel (1) has a hardened body (2), wherein the hardened body (2) has at least a granular ...
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WO/2011/082377 |
An abrasive article includes a base, an abrasive member comprising three distinct phases bonded to each other including abrasive particles, a metal matrix, and an infiltrant. The abrasive article further includes a backing region between...
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WO/2011/081109 |
Provided is a polishing liquid for CMP, with which, during CMP of an ILD film, it is possible to obtain a sufficiently high polishing speed while polishing wear is reduced, aggregation of abrasive grains is suppressed, and a high degree ...
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WO/2011/082377 |
An abrasive article includes a base, an abrasive member comprising three distinct phases bonded to each other including abrasive particles, a metal matrix, and an infiltrant. The abrasive article further includes a backing region between...
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WO/2011/080569 |
An abrasive article includes a fabric comprising a front face and a back face. The front face is formed of first knitted yarns. Each yarn of the first knitted yarns includes a plurality of filaments. A plurality of threads intertwines wi...
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WO/2011/081306 |
The present invention relates to a machine for sharpening a skate blade, comprising: leg units facing each other below left and right ends of the machine for sharpening a skate blade, so as to fix a skate blade; a transfer unit which is ...
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WO/2011/082156 |
Polishing pads including organic particulates in a continuous polymer phase, and methods of making and using such pads in a polishing process. In one exemplary embodiment, the polishing pads include a multiplicity of polishing elements i...
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WO/2011/081540 |
The subject of the invention is a unit for surface treatment of top layers, especially of metal, which is used for the treatment of top layers of working surfaces of machine parts, and especially for placement of coatings of micro- and n...
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WO/2011/082261 |
An article includes a packaging material comprising a self-supporting wall having a water vapor transfer rate of not greater than 0.001 g/m2-day. The packaging material defines an enclosed volume. The article further includes a bonded ab...
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WO/2011/077631 |
Disclosed is a dual-surface polishing device which has at least: upper and lower setting plates which have polishing cloths attached thereto; a carrier which has a holding-hole formed therein to hold a wafer between the upper and lower s...
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WO/2011/077127 |
A machine tool is provided which comprises a machine base (10); a first support (200) provided on a first rotational machine axis, the first rotational axis being mounted on the base in a fixed position relative to the base; a second sup...
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WO/2011/076904 |
A method for mounting an optical lens to be polished Method for mounting an optical lens (10) to be polished on a spindle(20)of a polishing device, the optical lens (10) comprising a first and a second main surface (101, 102), the method...
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WO/2011/078110 |
Provided is a remotely-operated actuator that has a compact overall structure and makes it possible to accurately and precisely change the orientation, via remote operation, of a tool provided on the tip of a long, thin pipe section. The...
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WO/2011/077650 |
Disclosed are: a base tube for cold-drawing which can be used in the manufacturing of small diameter, elongated tubes such as heat transfer tubes for use in steam generators in nuclear power facilities, and which does not cause sticking ...
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WO/2011/077985 |
A leaf spring device (10) is provided with a leaf spring (11) comprising an eye (12) at each end thereof, and a bushing (20) press-fitted into the eye (12). The inner surface (30) of the eye (12) is cut with a tool such as a reamer and i...
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WO/2011/079059 |
The invention relates to a method of making a grinding disk, comprising the steps of: providing a cap; providing an abrasive part; placing the cap on the abrasive part to form an assembly; holding the assembly and injecting a molding mat...
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WO/2011/076851 |
A method of drilling into an object, comprising providing a drill string (1) in a borehole (2) in the object, the drill string comprising an abrasive jet drill head (16) including a jet nozzle (18), and providing a passageway (20) for fl...
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WO/2011/077127 |
A machine tool is provided which comprises a machine base (10); a first support (200) provided on a first rotational machine axis, the first rotational axis being mounted on the base in a fixed position relative to the base; a second sup...
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WO/2011/077922 |
Conventionally, it was difficult to sufficiently affix an adherend when polishing, and to easily peel off the adherend. Disclosed is a non-reactive temporarily fixing composition for plane polishing, wherein the shear strength is 0.05MPa...
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WO/2011/076845 |
Method of drilling, comprising providing a drill string (1) in a borehole (2), the drill string comprising an abrasive jet drill head (16) including a jet nozzle (18), the drill string providing a passageway (20) for fluid to the jet noz...
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WO/2011/077403 |
The present invention relates to a method for manufacturing a sheet (5) including a substrate (6) made of at least one polymer material, comprising the following consecutive steps: a) compregnating at least one area of the substrate (6) ...
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WO/2011/077999 |
Disclosed is a pad for chemical mechanical polishing, characterized by comprising a polishing layer formed from a composition containing a thermoplastic polyurethane, the polishing layer having a specific gravity of 1.15-1.30 and a Shore...
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WO/2011/078139 |
Disclosed is a low-cost rotary grinding tool with an excellent low-noise characteristic capable of suppressing noise during grinding. Specifically disclosed is a rotary grinding tool with an excellent low-noise characteristic, which comp...
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WO/2011/077973 |
Provided is a polishing agent for copper polishing that includes: at least one leveling agent selected from the group consisting of tetrazole, tetrazole derivatives, triazole, and triazole derivatives (with the exception of benzotriazole...
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WO/2011/076846 |
A method of drilling into an object, the method comprising providing a drill string (1) in a borehole (2) in the object, the borehole having at its bottom a borehole axis (48), the drill string comprising a borehole- centralized jet dril...
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WO/2011/079059 |
The invention relates to a method of making a grinding disk, comprising the steps of: providing a cap; providing an abrasive part; placing the cap on the abrasive part to form an assembly; holding the assembly and injecting a molding mat...
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WO/2011/077887 |
The disclosed CMP polishing fluid for polishing palladium contains 1,2,4-triazole, phosphoric acids, an oxidizing agent, and abrasive particles having a degree of association of at least 1.5 to less than 2.5. The disclosed polishing meth...
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WO/2011/076928 |
Method for determining the edge contour of an uncut spectacle lens comprises: - a spectacle frame data providing step, - a minimum edge thickness providing step, - an initial contour providing step, - a thickness determining step, - an o...
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WO/2011/074340 |
Disclosed is a shot peening apparatus which prevents shot from scattering around a shot peening area according to the shape of the portion to be shot peened. For this purpose, the shot peening apparatus, which sends shot (B) so as to imp...
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WO/2011/072926 |
The invention relates to a method for producing a honed segment bore (5-8) in work pieces (1-4), which each have a segment bore (5-8). The work pieces (1-4) are arranged relative to each other such that the segment bores (5-8) of the wor...
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WO/2011/074773 |
The present invention relates to a grinding wheel assembly comprising a polishing machine for finishing concrete, asphalt, and a surface or floor of a structure, and more particularly, to a grinding wheel assembly for facilitating the at...
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WO/2011/074944 |
System and method for blasting, via a blasting head (2), objects with a blasting medium that includes a blasting liquid comprising a mixture of water and a not soluble abrasive material, which blasting liquid is supplied to the blasting ...
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WO/2011/075438 |
A target cylinder and a method for testing a superhard component thereon. The target cylinder includes a first end, a second end, and a sidewall extending from the first end to the second end. At least one of the second end and the sidew...
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WO/2011/074615 |
Disclosed is a polishing method having improved operation efficiency in a polishing step without being affected by generation state of surface defects (17) on a glass plate (G) surface to be polished. The distribution state of the surfac...
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WO/2011/072405 |
A security document comprises a substrate (1) and an optical waveguide (7). Couplers (10a, 10b) are provided in the waveguide (7) for coupling light into and out of the waveguide. The couplers (10a, 10b) can e.g. by gratings, scattering ...
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WO/2011/073547 |
The invention relates to a manual polishing device (1), provided with a handle (2) including an air supply coupling and provided with an air exhaust member, and provided with a head (3) including a polishing median (6), said device inclu...
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