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WO/2009/084101A1 |
A polishing device which reduces a failure rate in generating a substrate by minimizing the depth of micro cracks. The polishing device (M) has a carrying line (1) composed of a carry-in line (2) for carrying an unpolished prismatic memb...
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WO/2009/033315A1 |
An automatic adjusting device for brush washing for copper strip, which can efficiently enhance washing quality, is disclosed wherein an elastic member is mounted within a sliding cylinder, the elastic member within the sliding cylinder ...
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WO/2009/014384A2 |
Disclosed herein is a method for restoring a lamp cover of a vehicle headlight, the method including: applying a cleaner to the surface of the lamp cover, rubbing the lamp cover surface either with abrasive sand paper having a particle o...
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WO/2009/009870A1 |
An apparatus and method for micro-machining a surface of a workpiece having a complex surface profile including desired profile features and finer undesired profile features to be removed, including shaping a formable polishing tool usin...
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WO/2008/156002A1 |
Provided is a polishing sheet which requires only a short time before start-up. A method for manufacturing such polishing sheet is also provided. The polishing sheet is composed of a sheet-like foam. The polishing sheet is characterized ...
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WO/2008/135847A1 |
An abrading device features a flexible abrading membrane supported by two supports. The device may be used in either linear or rotary configurations. The device can be used in conjunction with devices that impart continuous or vibratory ...
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WO/2008/093785A1 |
A simply constructed surface treatment brush that can apply uniform surface treatment to an object having irregularities and in which a material is saved. A large number of brush bodies (58) are intermittently arranged on the surface of ...
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WO/2008/058200A2 |
The present invention relates to an apparatus and a method of electrochemical mechanical polishing (ECMP) for microelectronics applications. The apparatus and method of electrochemical mechanical polishing can be used planarize NiP subst...
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WO/2008/057626A2 |
A bladder for use on a CMP carrier head having a carrier head housing with a passage extending therethrough is provided. The bladder comprises a flexible diaphragm and first and second annular ribs. Each of the ribs comprises a first end...
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WO/2008/024721A2 |
Embodiments of a retaining ring for use with a chemical mechanical polishing process with a body including a polyethylene terephthalate polymer or polymer including ethylene terephthalate monomers are disclosed.
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WO/2008/014807A1 |
The invention relates to a polishing tool (1) for a portable, motor-operated angle polisher (2). The polishing tool (1) has a polishing plate (3), provided for the rotational drive, and a polishing body (5) fastened to an outer flat side...
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WO/2007/140111A1 |
One embodiment of the disclosure is a method for changing a cutting ability of an abrasive device. The method includes abrading a portion of an abrasive device, thereby reducing a cutting ability of the abrasive device. Moreover, the met...
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WO/2007/078914A1 |
Composite articles (e.g., abrasive articles (e.g., abrasive wheels and honing sticks), cutting tools, and cutting tool inserts) comprising a glass-ceramic distributed in a ceramic matrix.
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WO2006127780B1 |
A chemical mechanical polishing retaining ring comprising a base portion made from a wear-resistant plastic material, and an upper portion, or backbone portion, made from a stiffer and more wear resistant material. One of the base or bac...
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WO/2007/055901A1 |
A method of manufacturing a chemical-mechanical polishing (CMP) pad comprising: forming a layer of a polymer resin liquid solution; inducing a phase separation in the layer of polymer solution to produce an interpenetrating polymeric net...
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WO/2007/047996A2 |
An apparatus for conditioning the polishing pad of a chemical mechanical planaπzation (CMP) system including an apertured conditioning disk formed to support a plurality of brush bristles in any desired configuration The bnstles are uti...
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WO/2007/037302A1 |
A polishing brush adapted for a method for polishing a disk-like glass substrate having a circular hole at its center, where the polishing is made by rotating the brush while it is made to be in contact with an end surface on the inner c...
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WO/2007/030348A2 |
A polish pad (40, 42) and platen (50) assembly for use in chemical mechanical polishing of semiconductor devices includes a platen (50) having a vented endpoint window (62, 72, 82) with one or more venting passageways (e.g., 64, 66) and/...
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WO/2007/030779A2 |
An apparatus and method for polishing objects, such as semiconductor wafers, uses at least one object cleaner, which may be a movable object cleaner. The movable object cleaner allows access to different parts of the apparatus for mainte...
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WO/2007/030347A2 |
A polish pad (120) and platen (130) assembly for use in chemical mechanical polishing of semiconductor devices includes a platen (130) having a grooved or channeled surface (136) which is sealed from the processing environment by an ungr...
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WO/2007/019342A2 |
A chemical mechanical polishing process including a single Step I CMP slurry formulation for planarization of a microelectronic device structure preferably having copper deposited thereon. The process includes the bulk removal of a coppe...
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WO/2007/008822A2 |
A CMP conditioning apparatus enhanced end effector arm for improving the reliability of the apparatus and the quality of the conditioning and polishing operations includes a conditioner head with features that provide for simplified alig...
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WO/2007/001699A1 |
The invention is directed to a chemical-mechanical polishing pad substrate comprising a microporous closed-cell foam characterized by a narrow pore size distribution in the range of 0.01 microns to 10 microns. The polishing pad is produc...
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WO/2006/126455A1 |
A polishing apparatus exhibiting extremely excellent practicality in which good polishing can be ensured even if a pattern or a tin film composed of a soft material or a material of low hardness is formed on the surface of a substrate. T...
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WO/2006/120790A1 |
A form rolling tool for spline machining enabling an increase in durability by securing the strength of machining teeth and manufacturable at low cost and a method of manufacturing the form rolling tool. In the method, a bristle brush is...
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WO/2006/098119A1 |
A grinding device and a grinding system having excellent grinding performance and capable of efficiently grinding by preventing a belt from falling in grinding the end face of the belt. Segment brushes (4, 4 ...) are installed circumfere...
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WO/2006/084845A2 |
The invention relates to a method of simulating a complex system including a scheduler hierarchy and to the corresponding storage means and computer program product. More specifically, the invention relates to a method of simulating a co...
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WO/2006/030091A1 |
The invention relates to a polishing tool (1) for finishing an ophthalmic lens. The inventive tool comprises: a drive plate (4) which is equipped with means (2) for mounting same to the spindle of a polishing machine; a removable polishi...
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WO/2006/025508A1 |
The object of the invention is to provide a method of polishing the end surfaces of a substrate for a recording medium, which is capable of efficiently polishing the inner peripheral end surface and/or the outer peripheral end surface of...
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WO/2006/022413A1 |
A polishing method without dispersion in the amount of working at the time of polishing the inner peripheral end surfaces of a plurality of disk-like substrates for a recording medium is provided. There is provided a method of polishing ...
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WO/2006/022414A1 |
The object of the invention is to provide a method of polishing the inner peripheral end surfaces of substrates while maintaining a sufficiently high working precision at the time of polishing the inner peripheral end surfaces of a plura...
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WO/2006/019170A1 |
A manufacturing method for silicon substrates for a magnetic recording medium has the steps of forming a stack body of a number of silicon substrates which are stacked via spacers therebetween, wherein each silicon substrate has a circul...
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WO/2005/112549A2 |
Provided is a multifunctional cleaner for vehicles, which includes a housing member that forms a main body; a loading portion that is embedded in the housing member and stores a cleanser for washing a vehicle with water or a brightener f...
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WO/2005/065888A1 |
A tool for grinding and polishing of glass and surfaces of hard and brittle non-glass materials comprises abrasive which is for example ceric oxide, and bond, for example phenol-formaldehyde resin. The tool further comprises hollow or ...
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WO/2005/056235A1 |
A buffing and polishing ball made of a compressible polymeric foam material is formed by slitting a body of foam material in a substantially uncompressed state (1) from an outside surface of the body in a direction generally perpendicula...
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WO/2005/056709A2 |
This invention provides for provides for abrasive compositions and methods of use of these compositions for the preparation of surfaces for the application of various coatings such as paints, lacquers and varnishes. The abrasive composit...
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WO/2005/056233A1 |
According to the invention, adjusting shafts (1;2) comprising a noise-insulating outer sleeve (1.3; 2.3) and shaft ends (1.1; 1.2; 2.1) that are free therefrom are produced in a brushing device by moving rotating brushes (4; 5) to an ins...
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WO/2005/053904A1 |
A method of abrading a surface of a workpiece with a structured abrasive article in the presence of a liquid comprising water and at least one of a sulfonate or sulfate anionic surfactant.
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WO/2005/038790A1 |
In order to achieve substantially uniform pressing pressure in an optical disk-restoring apparatus, a surface of a turntable (41) and/or a sheet (45) is provided with at least either of an inclined or stepped form and a curved form. The ...
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WO/2005/028130A1 |
A can treatment method, wherein at least one of various types of treatments including polishing, roughing, cutting, removal of print, removal of adhered matter, removal of refuse, removal of contamination, and washing is performed for th...
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WO/2005/009681A1 |
A method for providing a mirror-finish on the edge of a recording-media-disk raw plate is disclosed, by which a pit of the edge of the recording-media-disk raw plate is removed in a short time with simple procedure and low cost. Also dis...
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WO/2004/076125A1 |
Disclosed is a grinding tool (20) for a grinding apparatus (10) comprising a rotary oscillating drive unit (12), the output shaft of which (14) is driven so as to oscillate about the longitudinal axis (16) thereof and is provided with a ...
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WO/2004/073924A1 |
A plate-like work polishing apparatus for polishing a thin plate-like work such as a printed circuit board material by buff rollers, comprising a guide member guiding the plate-like work passed through a clearance between the buff roller...
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WO/2004/071750A2 |
The invention relates to a method for retreading worn-down tires (12), especially tires that have become out of true during use, especially aircraft tires. According to this method, the remaining tire tread material is equidistantly buff...
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WO/2004/069473A1 |
A metal ring polishing method and device capable of polishing the lateral end edge of a metal ring without performing barrel polishing or polishing by a grindstone. Subsequent to loading process for loading a metal ring (W) by a loading ...
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WO/2004/049886A2 |
A motorized cleaning/polishing device includes a housing and a carrier with a detachable cleaning/polishing attachment. The housing contains a rechargeable battery, motor and flex mount having flexible pillars to which the carrier is mou...
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WO/2004/050306A1 |
A polishing grindstone for polishing a gravure platemaking copper-plated roll, wherein eliminating the occurrence of a streaky spiral pattern (feed mark) due to feeding the grindstone to the platemaking roll surface lightens the burden o...
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WO/2004/048033A1 |
A grinding method for grinding the peripheral surface of a rotating work (10) by a grinding wheel (22) rotated by a grinding wheel spindle (21), comprising the steps of mounting a rotating brush (40) rotated together with the rotating gr...
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WO/2004/048035A1 |
In grinding the outer peripheral surface of work (10) in the form of a non-circular rotary body, while being rotated around its axis, by a rotary grindstone (22) adapted to be advanced and retracted by NC control according to the profile...
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WO/2004/039507A1 |
Disclosed is a method for creating a highly lustrous surface on a workpiece which is made of aluminum or aluminum alloy and has a peak-to-valley height of less than 5 µm. Said method comprises the following successive steps: a) the surf...
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