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JP2011195828 |
To provide a polymer compound useful for manufacturing of a light-emitting element being excellent in maximum luminous efficiency.The polymer compound includes a constitution unit represented by formula (1): wherein Ar1 is an aromatic hy...
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JP2011184304 |
To provide a silane coupling agent that strongly binds to a substrate and has excellent heat resistance, mold releasability and antifouling property such that a surface modified by the compound does not show any decrease in contact angle...
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JP2011184434 |
To provide a resist composition having good resolution of a pattern obtained therefrom, and to provide a salt and an acid generator for obtaining the composition.There is provided a salt represented by formula (I) (wherein Q1 and Q2 are ...
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JP2011187893 |
To provide a new charge transport material, and a thin film and an organic electronic device such as an organic electroluminescent element, an organic field effect transistor and an organic solar cell using the charge transport material,...
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JP2011184359 |
To provide an industrially advantageous producing method which can produce a high-purity 3,5-di-tert-butyl halogenobenzene at a high yield.The invention relates to the method for producing a 3,5-di-tert-butyl halogenobenzene compound rep...
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JP2011173829 |
To provide a method for producing a corresponding alkene by deoxygenating an epoxy compound and capable of producing the objective compound under a moderate condition in an excellent yield.This method for producing the alkene includes de...
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JP2011173894 |
To provide a liquid crystal compound having an excellent balance of physical properties such as exhibiting negative dielectric anisotropy together with having relatively high clear point, relatively small viscosity, a proper optical anis...
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JP2011173972 |
To provide a compound that easily forms a stable thin film because of less crystallizability of the molecule, exhibits excellent properties such as low-voltage driving, prolongation of the life and the like when used as a blue light-emit...
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JP2011174058 |
To provide a polymer compound effective for production of a light-emitting element excellent in light-emitting efficiency.This polymer compound is represented by general formula (1-1) and/or general formula (2-1), wherein in formulae (1-...
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JP2011168624 |
To provide a production method of a tetrahalobiphenyl derivative which is a precursor compound of a 2,3-dihalobiphenylene derivative which can be utilized as a synthetic raw material of electronic materials, such as an organic semiconduc...
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JP2011168530 |
To provide a safe and simple production method, by a recrystallization operation, of a liquid crystal compound having high specific resistivity, to provide a liquid crystal composition and a liquid crystal display element each using the ...
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JP2011162468 |
To provide a new fullerene derivative that efficiently adsorbs in a short time allergen to cause pollinosis, does not re-release allergen, does not contain a metal, etc., having bad effects on the human body, is easily applied to, impreg...
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JP2011161214 |
To provide an apparatus for removing aromatic phosphate in waste oil and a system for treating waste oil containing PCB (Polychlorinated Biphenyl).The apparatus includes: a storage tank 11 for storing waste oil 13 containing aromatic pho...
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JP2011144300 |
To provide an organic electroluminescent element that has high external quantum efficiency, a low drive voltage, excellent durability and low dependence of voltage rise after drive on a used ambient temperature.The luminescent organic th...
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JP2011140472 |
To provide a liquid crystalline compound that shows liquid crystallinity, particularly the one exhibiting only a nematic phase in a wide temperature range.The asymmetric diamantane compound is represented by formula (I) (wherein R1 is 1-...
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JP2011137004 |
To provide an image recording material which forms a developed image with good visibility by laser exposure, and to provide a compound useful for a lithographic printing plate precursor and a lithographic printing method.There is provide...
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JP2011126871 |
To provide a salt for an acid generator of a resist composition which can form patterns having excellent resolution and CD uniformity.There is provided the salt represented by formula (I). In formula (I), Q1 and Q2 are each F or a 1 to 6...
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JP2011125795 |
To provide an apparatus for continuous detoxification treatment and a system for continuous detoxification treatment of an organic chlorine compound in which a catalyst used for decomposing an organic chlorine compound and therefore havi...
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JP2011126872 |
To provide a salt for an acid generator of a resist composition which can form patterns having excellent resolution and focus margin.There is provided the salt represented by formula (I). In formula (I), Q1 and Q2 are each F or a 1 to 6C...
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JP2011121909 |
To provide a simple method for producing a liquid crystal compound exhibiting a high specific resistance by recrystallization operation, to provide a liquid crystal composition using the liquid crystal compound obtained by the production...
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JP2011121938 |
To form a resist pattern of excellent resolution and an excellent shape.There is disclosed a salt represented by formula (I). In formula (I), Q1 and Q2 each independently represent a fluorine atom, or a 1C-6C perfluoroalkyl group; L1 rep...
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JP2011121937 |
To form a resist pattern having few defects, an excellent shape, and excellent line edge roughness.There is disclosed a salt represented by formula (I). In the formula, Q1 and Q2 each represent F or a perfluoroalkyl group; L1 represents ...
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JP2011116742 |
To provide a salt of an acid generator for a resist composition capable of obtaining patterns having excellent line edge roughness.The salt is represented by formula (I) [wherein, Q1 and Q2 are each fluorine atom or 1-6C perfluoroalkyl; ...
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JP2011105657 |
To provide a method for easily producing an aromatic compound having a difluoromethyl group in high yield while using a reagent having low toxicity.The method for producing the aromatic difluoromethyl compound includes reacting an aromat...
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JP2011105691 |
To provide a method for producing a trifluoromethylcyclopropane compound by using a readily handleable raw material without using trifluoromethyldiazomethane which is hard to handle as a raw material.There is provided the method for prod...
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JP2011105687 |
To provide a simple method for producing a liquid crystal compound having a high resistivity value by recrystallizing operation, to provide a liquid crystal composition using the liquid crystal compound obtained by the method for product...
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JP2011079739 |
To provide a new dehydrohalogenation coupling reaction of an aromatic compound with a halogenated unsaturated compound.The method for producing the coupling compound includes reacting an aromatic compound with a halogenated unsaturated c...
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JP2011079822 |
To provide a fused-ring compound capable of attaining the efficiency heightening and life prolongation of an organic luminescent element.There are provided a 1H-indeno[3,2-a]pyrene derivative having a substituent or substituents such as ...
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JP2011074074 |
To provide compounds for liquid crystal media, and high-frequency components containing the same.The invention relates to bistolans of formula I (wherein one or more of the groups L1 to L3 are Rx, where Rx is cyclopropyl, cyclobutyl, cyc...
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JP2011075827 |
To provide an actinic ray-sensitive or radiation-sensitive resin composition excellent in sensitivity, resolution, roughness property, pattern configuration, temporal stability and outgassing property, and to provide a pattern forming me...
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JP2011046696 |
To provide a salt achieving even better line edge roughness (LER) in a formed pattern, a resist composition comprising the salt, and a method for forming a pattern.The salt is constituted of an anion of 1,3-diketone and an organic cation...
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JP2011046952 |
To provide a medium having no drawbacks inherent in relevant conventional technologies, or, if any, only of slight extent, and having, preferably, an extremely high resistivity and a low threshold value voltage simultaneously, particular...
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JP2011037834 |
To provide a compound capable of forming patterns having excellent pattern resolution and line edge roughness, and to provide a resist composition using the same.There is provided a compound represented by formula (I-Pb), [wherein, XPb i...
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JP2011028201 |
To provide a resist composition containing, as a base material, a molecular material capable of reducing LER and LWR in EUV lithography capable of forming an ultrafine pattern, and giving a resist film which ensures low outgassing in EUV...
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JP2011005205 |
To provide a wet dehalogenation treatment method by spraying a natural mineral ion-containing vegetable skin fruit juice composition containing active hydrogen and combusted seashell fine-powder simultaneously with the use of a nozzle fo...
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JP2010285365 |
To provide a complete route of synthesizing an intermediate derivative of isoindoline and a final derivative of isoindoline, which route enables industrial, economical and large scale production of the final derivative of isoindoline.The...
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JP2010280656 |
To provide a diaryl iodonium salt mixture which is a precursor of a BF4 salt or the like of a diaryl iodonium compound, can be produced in the form of crystals at ambient temperature, can be purified in a simple manner, can be produced w...
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JP2010282189 |
To provide a radiation-sensitive resin composition that has small LWR (Line Width Roughness) and MEEF (Mask Error Enhancement Factor), has an excellent crude/dense bias, and has high storage stability.The radiation-sensitive resin compos...
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JP2010274170 |
To provide a detoxifying treatment method and an apparatus for an instrument with a remaining organic halogen compound, by which the organic halogen compound remaining in the container and the inner member of the instrument such as a tra...
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JP2010259681 |
To provide a method for detoxification treatment of PCB-containing oil which detoxifies PCB on mild operating conditions and obtains a high detoxification ratio of the PCB using a small amount of chemical.The PCB-containing oil, ethanol,...
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JP2010259496 |
To provide a decomposition treatment method for organic halogen compounds and a decomposition treatment device for easily detoxifying an oil in which an organic halogen compound such as an insulating oil used in a pole-mounted transforme...
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JP2010254582 |
To provide a method for producing para-dichlorobenzene, by which the objective compound can be obtained in a high yield in stable operation on work as a real apparatus.This method for producing the para-dichlorobenzene, comprising chlori...
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JP2010247083 |
To provide a selective sticking agent which is stuck selectively to a minute amount of a halogenated aromatic compound contained in an organic medium to remove the halogenated aromatic compound from the organic medium or concentrate the ...
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JP2010240326 |
To provide a detoxification method for intermingled organic chlorine compounds by which waste oils such as insulating oils containing a plurality of kinds of intermingled organic chlorine compounds such as a polychlorinated biphenyl (PCB...
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JP2010233873 |
To provide a system to make highly harmless organic halogen compounds included in insulating oils or the like used in the transformers installed on column tops.A hydrogen donor such as isopropyl alcohol, and an alkaline compound are adde...
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JP2010229059 |
To provide a method for producing a para-dichlorobenzene, by which a reactor can be operated as a full scale facility to give the para-dichlorobenzene in high reaction selectivity.This method for producing the para-dichlorobenzene, compr...
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JP2010229058 |
To provide a method for producing para-dichlorobenzene, by which a reactor can stably be operated as a full size facility to give the objective material in a high yield.This method for producing the para-dichlorobenzene, comprising chlor...
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JP2010227390 |
To provide a detoxifying treatment method for an apparatus incorporating an organic halogen compound, which performs the detoxifying treatment in the organic halogen compound left in the apparatus without neither generating dioxin, etc.,...
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JP2010229061 |
To provide a method for producing a para-dichlorobenzene, by which heat is efficiently removed in the heavily heat-generating reaction of chlorination to suitably inhibit rise in temperature, thereby selectively producing the para-dichlo...
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JP2010229060 |
To provide a method for producing para-dichlorobenzene, by which a reactor can be operated as a full scale facility to give the para-dichlorobenzene in high reaction selectivity.This method for producing the para-dichlorobenzene, compris...
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