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Matches 601 - 650 out of 5,245

Document Document Title
JP5500565B2  
JP5499685B2  
JP2014511399A  
JP2014511339A  
JP5491421B2  
JP5493700B2  
JP5488514B2  
JP5485583B2  
JP5484880B2  
JP2014510710A  
JP2014074803A
To provide a coloring composition that has high coloring power and is suitable for forming a colored layer having high heat resistance and excellent chromaticity characteristics.A coloring composition contains (A) an acidic coloring agen...  
JP5481815B2  
JP5476421B2  
JP5481850B2  
JP5474389B2  
JP2014058501A
To provide a method of producing a picene and a derivative thereof suitable for uses of organic semiconductors, thin film transistors, field effect transistors or solar batteries or the like, in a short reaction process with high yield.A...  
JP5461751B2  
JP5457785B2  
JP5458577B2  
JP5446436B2  
JP5439711B2  
JP5439647B2  
JP5425503B2  
JP5428147B2  
JP5417708B2  
JP5419444B2  
JP2014028784A
To provide a novel heterocyclic compound which can be used as a host material which disperses light-emitting materials of a light-emitting layer, in a light-emitting element.A heterocyclic compound is denoted by general formula G1. In ge...  
JP5411319B2  
JP5411494B2  
JP2014025025A
To inhibit the photoisomerization of a compound expressed by the formula (a), which is a difluorostilbene derivative, to provide a composition including the compound expressed by the formula (a) and a triplet quencher, to provide, among ...  
JP2014026102A
To provide a pattern forming method excellent in roughness performance such as line width roughness and excellent in exposure latitude, and an actinic ray-sensitive or radiation-sensitive resin composition to be used for the method.The p...  
JP2014026260A
To provide a resist composition from which a resist pattern with superior pattern collapse resistance can be produced.The resist composition contains an acid generator expressed by formula (I) and a resin having an acid-labile group. In ...  
JP2014019646A
To provide a liquid crystalline compound exhibiting high stability against heat, light or the like, high clearing point, low lower limit temperature of a liquid crystal phase, low viscosity, appropriate optical anisotropy, large dielectr...  
JP2014021286A
To provide a compound useful for a resist composition, a resist composition containing the compound, and a method for forming a resist pattern by using the resist composition.The resist composition comprises a base component (A) showing ...  
JP5404430B2  
JP5398955B2  
JP5397710B2  
JP2014005213A
To provide a method for industrially producing an α,α-difluoroaromatic compound (where a CF2 group links directly to an aromatic ring) with good yield and at a low cost using a simple reactor and easy operation without a highly toxic c...  
JP2014500239A  
JP5375024B2  
JP5379873B2  
JP5371239B2  
JP5368270B2  
JP2013544233A  
JP5366610B2  
JP5366101B2  
JP5362671B2  
JP2013241401A
To provide a highly versatile production method with which a compound being useful as a functional material like a liquid crystal material or the like and having a linking group -CF2O-, is conveniently and efficiently obtainable.In a pro...  
JP5357182B2  
JP5357872B2  

Matches 601 - 650 out of 5,245