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JP7438716B2 |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator containing the salt, and a resist composition containing the acid generator.The salt is represented by formula (I) [where Qand Qea...
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JP2024023301A |
The present invention provides novel compounds effective for controlling pests. The molecule of formula 1, as well as its N-oxides, agriculturally acceptable acid addition salts, salt derivatives, solvates, ester derivatives, crystalline...
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JP7433394B1 |
The present invention provides a resist composition, a method for forming a resist pattern, a novel polymer compound, and a compound suitable for the synthesis thereof, which can achieve higher sensitivity and have improved lithography p...
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JP2024022556A |
The present invention provides a resist composition and the like that can produce a resist pattern having good pattern collapse resistance. The present invention provides a carboxylic acid generator and a resist composition using a carbo...
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JP2024020170A |
An object of the present invention is to provide a salt, a resist composition, etc. that can produce a resist pattern having good line edge roughness. A salt represented by formula (I), an acid generator, and a resist composition. [In th...
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JP2024017219A |
The present invention provides a resist composition, a method for forming a resist pattern, and a compound capable of forming a resist pattern that has excellent stability over time and has both high exposure latitude and high sensitivit...
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JP7425593B2 |
To provide a salt capable of producing a resist pattern having good line edge roughness (LER), an acid generator, and a resist composition containing the acid generator.The salt represented by formula (I), the acid generator, and the res...
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JP7421901B2 |
To provide a salt, an acid generator, and a resist composition capable of producing a resist pattern having good CD uniformity (CDU).The salt represented by formula (I), the acid generator, and the resist composition are provided. [In th...
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JP2024010543A |
[Problem] In lithography, whether positive or negative type, a resist composition has high sensitivity and excellent resolution, improves LWR and CDU, and can suppress collapse of resist patterns. Provides a novel onium salt for use in [...
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JP2024010326A |
[assignment] In the synthesis reaction of a sulfonium salt compound, in which a sulfonium salt compound is obtained by reacting a silyl enol ether compound or a ketene silylacetal compound with a sulfoxide compound, the desired sulfonium...
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JP2024009780A |
An object of the present invention is to provide a salt, etc., which can produce a resist pattern having good CD uniformity, and a resist composition containing the same. A salt represented by formula (I), an acid generator, and a resist...
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JP2024009782A |
An object of the present invention is to provide a carboxylic acid salt, etc., which can produce a resist pattern having good line edge roughness, and a resist composition containing the same. A carboxylic acid salt represented by formul...
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JP2024009781A |
An object of the present invention is to provide a salt, etc. and a resist composition that can produce a resist pattern having good line edge roughness. A sulfonium salt or iodonium salt having a specific structure and a resist composit...
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JP2024009779A |
An object of the present invention is to provide a salt, etc., which can produce a resist pattern having good CD uniformity, and a resist composition containing the same. A salt represented by formula (I), an acid generator, and a resist...
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JP7419049B2 |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator, and a resist composition containing the acid generator.The salt represented by formula (I), the acid generator, and the resist co...
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JP2024008955A |
The present invention provides a radiation-sensitive resin composition, a resist pattern forming method, and a compound that have excellent sensitivity and a wide process window. [Solution] A compound represented by the following formula...
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JP7418488B2 |
The present invention employs a resist composition which generates an acid upon exposure to light and changes the solubility with respect to a developer solution by the action of the acid, and which contains a compound that is represente...
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JP2024007482A |
The present invention provides a carboxylic acid salt, etc. and a resist composition that can produce a resist pattern having a good mask error factor. The present invention provides a carboxylic acid generator and a resist composition u...
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JP2024007481A |
The present invention provides a resist composition and the like that can produce a resist pattern with good resolution. The present invention provides an acid generator, etc., and a resist composition using a salt having a specific stru...
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JP7414926B2 |
A resist composition containing a base material component of which solubility in a developing solution is changed due to an action of an acid and a compound represented by Formula (bd1); in the formula, Rbd1 to Rbd3 each independently re...
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JP7414500B2 |
To provide a salt capable of producing a resist pattern with a good mask error factor (MEF), and a resist composition containing the salt.The salt represented by formula (I), an acid generator, and the resist composition containing the s...
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JP2024501780A |
The present disclosure relates, in part, to compounds for modulating the activity of aldehyde dehydrogenases, such as ALDH2, or pharmaceutically acceptable salts or solvates thereof, and/or alcohol use disorders, alcohol-induced disorder...
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JP7412328B2 |
In one aspect, compounds of Formula AA, or a pharmaceutically acceptable salt thereof, are featured:or a pharmaceutically acceptable salt thereof, wherein the variables shown in Formula A can be as defined anywhere herein.
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JP7412186B2 |
Disclosed is a resin including a structural unit represented by formula (a1-5) and a structural unit represented by formula (I), and a resist composition:wherein Ra8 represents an alkyl group which may have a halogen atom, a hydrogen ato...
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JP2024003079A |
An object of the present invention is to provide a compound useful as a base component for a resist composition, which has enhanced roughness characteristics and an effect of suppressing the occurrence of defects. The present invention e...
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JP2024001871A |
An object of the present invention is to provide a salt, an acid generator, a resist composition, etc. that can produce a resist pattern with good CD uniformity. A salt represented by formula (I), an acid generator, and a resist composit...
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JP2024001870A |
An object of the present invention is to provide a carboxylic acid salt, a resist composition, etc., which can produce a resist pattern having good resistance to pattern collapse. A carboxylic acid salt represented by formula (I), a carb...
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JP7409844B2 |
To provide a carboxylate capable of producing a resist pattern having good CD uniformity (CDU), and a carboxylic acid generator and a resist composition containing the carboxylate.The carboxylate is represented by formula (I). [Rrepresen...
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JP2023184542A |
To provide an actinic ray-sensitive or radiation-sensitive resin composition that is capable of giving a pattern having excellent LWR performance even if the composition has been stored for a long period of time, and to provide a resist ...
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JP7406319B2 |
To provide a salt, an acid generator and a resist composition from which a resist pattern having good CD uniformity (CDU) can be produced.The salt is represented by formula (I), and the acid generator and the resist composition contain t...
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JP7406320B2 |
To provide a salt, an acid generator and a resist composition from which a resist pattern having good CD uniformity (CDU) can be produced.A sulfonium salt is provided, which has a phenyl group having an ether as a substituent, the ether ...
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JP2023182038A |
To provide a resist composition that exhibits improved LWR and resolution and prevents a resist pattern from collapsing in deep-UV, EB or EUV lithography, an onium salt for use in the resist composition, and a patterning method using the...
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JP2023552793A |
The present invention provides RXFP1 modulators for the treatment of heart failure, heart failure with preserved ejection fraction, heart failure with mildly reduced ejection fraction, heart failure with reduced ejection fraction, chroni...
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JP2023179389A |
To provide a compound for treating and preventing diseases and conditions including heart failure, heart failure with a maintained ejection fraction, heart failure with a mildly reduced ejection fraction, heart failure with a reduced eje...
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JP7398551B2 |
According to the present invention, it is possible to provide an actinic ray-sensitive or radiation-sensitive resin composition containing a resin of which a solubility in a developer changes by the action of an acid, a photoacid generat...
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JP6991214B6 |
The present invention pertains generally to the field of chemical synthesis, and more particularly to methods for the chemical synthesis of a thiosulfonic acid of Formula (1) by a step of periodate mediated oxidative coupling of a thiosu...
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JP7397256B2 |
To provide a novel sulfonium compound that can be used for an acid generator to generate an acid in response to heating or irradiation with an energy ray.There is provided a sulfonium compound represented by the general formula (I) in th...
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JP2023177294A |
To provide a salt, a resist composition and the like which allow a resist pattern having good line edge roughness to be produced.There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the f...
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JP2023177295A |
To provide a carboxylate, a resist composition and the like which allow a resist pattern having a good focus margin to be produced.There are provided a carboxylate represented by formula (I), a carboxylic acid generator, and a resist com...
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JP2023177048A |
To obtain a resist pattern with improved resolution and good LER and fidelity.A chemically amplified negative resist composition contains: (A) an acid generator containing at least one selected from a sulfonium salt represented by the fo...
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JP7396360B2 |
Provided are a radiation-sensitive resin composition with which it is possible to form a resist pattern having excellent sensitivity to exposure light and having exceptional LWR performance and resolution, a resist pattern formation meth...
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JP2023550612A |
The invention particularly relates to methods and intermediates for the synthesis of Compound 1, which inhibits MCL1 and is useful in the treatment of cancer.
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JP7391163B2 |
Provided is a resist composition including a base material component (A) whose solubility in a developing solution is changed due to the action of an acid, and a compound (D0) formed of an anion moiety and a cation moiety which is repres...
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JP2023171386A |
To provide a salt, a resist composition, and the like which allow a resist pattern having good line edge roughness to be produced.The salt is represented by formula (I) [where Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl ...
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JP7389562B2 |
Described are a salt and a resist composition capable of producing a resist pattern with satisfactory line edge roughness (LER). The salt is represented by formula (I):In formula (I), R1, R2, R3, R4 and R5 each independently represent a ...
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JP2023169814A |
To provide a resist composition that has excellent solvent solubility, high sensitivity and high contrast, and excellent lithographic performance such as LWR, as well as exhibits resistance to pattern collapse even in fine pattern format...
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JP2023169812A |
To provide a sulfonium salt used for a resist composition having excellent solvent solubility, high sensitivity and high contrast, and excellent lithographic performance such as exposure latitude and LWR; a resist composition containing ...
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JP7389786B2 |
Provided herein are compounds, compositions, and methods useful for modulating the integrated stress response (ISR) and for treating related diseases; disorders and conditions.
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JP2023168942A |
To provide a resist composition capable of forming a resist pattern with good CDU, a resist pattern formation method using the resist composition, and a compound useful as an acid diffusion control agent used for the resist composition.T...
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JP7387818B2 |
This disclosure relates to the field of molecules having pesticidal utility against pests in Phyla Arthropoda, Mollusca, and Nematoda, processes to produce such molecules, intermediates used in such processes, pesticidal compositions con...
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