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Matches 1 - 50 out of 3,113

Document Document Title
WO/2018/116916A1
Provided are: an active light sensitive or radiation sensitive resin composition which contains (A) a photoacid generator that generates an acid having a pKa of -1.40 or more when irradiated with active light or radiation, and (B) a resi...  
WO/2018/102433A1
Thionyl tetrafluoride gas reacts efficiently with primary amines to form reactive iminosulfur oxydifluoride compounds. These dual SVI-F loaded iminosulfur oxydifluoride compounds, in turn, readily react with secondary amines or aryloxy s...  
WO/2018/101339A1
Provided are a radiation-sensitive resin composition including an acid generating agent that gives an acid having sufficient acid strength even when no fluorine atoms are present at the proximal carbon of a sulfonic acid group, an onium ...  
WO/2018/087064A1
The invention relates to a method for producing triarylorganoborates from organoboronic acid esters in the presence of an n-valent cation 1/n Kn+, comprising the anhydrous treatment of the reaction mixture, and to the use of the obtained...  
WO/2018/084050A1
Provided are: a metal-containing onium salt compound suitable for use as a photodisintegrable base for resist compositions which have satisfactory sensitivity to ionizing radiation such as extreme ultraviolet (EUV), are excellent in term...  
WO/2018/074382A1
Provided are an onium salt and a composition which are appropriately usable in a resist composition for a lithography process, wherein two kinds of active energy rays including first active energy rays such as electron beams or extreme u...  
WO/2018/071327A1
This disclosure relates to the field of molecules having pesticidal utility against pests in Phyla Arthropoda, Mollusca, and Nematoda, processes to produce such molecules, intermediates used in such processes, pesticidal compositions con...  
WO/2018/028461A1
Disclosed are a novel cationic photoinitiator, and a preparation method therefor and applications thereof. The cationic photoinitiator has a structure represented by formula (I), can match a longer absorption wavelength in the applicatio...  
WO/2018/028050A1
Disclosed is an asymmetric aryl-alkyl persulfate compound as represented by formula (3) and a synthesis method therefor, in which an arylboronic acid of formula (1) and R2SSCOR3 of formula (2) serve as reaction raw materials and, under t...  
WO/2018/020974A1
Provided are the following: a sulfonium salt which does not contain a toxic metal and which exhibits higher cationic polymerization performance and crosslinking performance than a tetrakis(pentafluorophenyl)borate salt; a heat- or photo-...  
WO/2018/003470A1
Because a sulfonium salt that does not contain a toxic metal and that exhibits polymerization performance and crosslinking reaction performance equal to or greater than those of a tetrakis (pentafluorophenyl) borate salt, a photoacid gen...  
WO/2017/219935A1
The present invention discloses a biaryl urea RORγt inhibitor, and specifically relates to a biaryl urea derivative, as represented by formula I, with an RORγt inhibiting activity, and a manufacturing method thereof, and a pharmaceutic...  
WO/2017/212963A1
The purpose of the present invention is to provide a novel sulfonium salt having high photosensitivity to the i-line. The sulfonium salt according to the present invention is represented by formula (1). [In the formula, R1-R8 each indepe...  
WO/2017/179727A1
The present invention is a radiation sensitive resin composition which contains a polymer having a first structural unit that contains an acid-cleavable group, a first radiation sensitive acid generator and a solvent, and wherein the fir...  
WO/2017/172802A1
The invention provides compounds having the general formula I: (i) and pharmaceutically acceptable salts thereof, wherein the variables RA, RAA, subscript n, ring A, X2, L, subscript m, X1, ring B, R1, and RN have the meaning as describe...  
WO/2017/154345A1
The present invention provides: an active light sensitive or radiation sensitive resin composition which is capable of forming a pattern that has low LWR and is suppressed in collapsing; a resist film; a pattern forming method; and a met...  
WO/2017/091279A1
Methods for preparing isotopically modified 1,4-diene systems from non- isotopically modified 1,4-dienes involve selective oxidation of one or more bis-allylic position(s), or the preparation of isotopically modified 1,4-diene systems vi...  
WO/2017/059222A1
Described herein are thermoset compositions suitable for hybrid polymerization when processed via additive fabrication equipment utilizing sources of actinic radiation with peak spectral intensities in the UV and/or visible region contai...  
WO/2017/038870A1
The purpose of the present invention is to provide a compound having an inhibition activity against discoidin domain receptor 1. The present invention provides a urea derivative represented by the formula and a pharmacologically acceptab...  
WO/2016/180804A1
The invention relates to a monomer for copolymerization with alkenes, dienes, vinyl compounds and/or vinylidene compounds, a method for synthesizing a copolymer, a copolymer synthesized using said method, a sulfur cross-linkable rubber m...  
WO/2016/168059A1
This disclosure relates to the field of moiecuies having pesticida i utility against pests in Phyla Arthropoda, Moliusca, and hJematoda, processes to produce such moiecuies, intermediates used In such processes, pesticidai compositions c...  
WO/2016/168058A1
This disclosure relates to the field of molecules having pesticidal utility against pests in Phyla Arthropoda, Mollusca, and Nematoda, processes to produce such molecules, intermediates used in such processes, pesticidal compositions con...  
WO/2016/161445A1
The present invention provides methods of forming hydrogen sulfide. The methods include contacting a precursor compound with an unmasking agent; wherein the precursor compound comprises a hydrogen sulfide releasing moiety and a masked nu...  
WO/2016/146597A1
The invention relates to a compound of the general formula (I) N3O2S-Ar-L-Ar'-SO2N3, wherein: - Ar and Ar' are aromatic building blocks; and - L is a linking group comprising at least one heteroatom as well as an organic chain denoted as...  
WO/2016/146151A1
The invention relates to a compound of the general formula (I) N3O2S-Ar-L-Ar'-SO2N3, wherein: Ar and Ar' are aromatic building blocks; and L is a linking group comprising at least one heteroatom as well as an organic chain denoted as Sp"...  
WO/2016/132413A1
Provided is a sulfonium borate salt that is free from highly toxic elements such as Sb, has a high sensitivity to active energy rays such as heat or light, and shows an excellent storage stability when blended with a cationic polymerizab...  
WO/2016/102877A1
The invention relates to novel chemokine CXCR1 and CXCR2 receptor antagonist compounds of general formula (I), to pharmaceutical compositions containing said compounds, and to the use of said compounds and said compositions for the treat...  
WO/2016/104677A1
A method for producing a nitrogen-containing pentafluorosulfanylbenzene compound including causing a nitrogen-based nucleophile to react with a halogeno-pentafluorosulfanylbenzene compound represented by formula (1) (where X is a halogen...  
WO/2016/088648A1
A sulfonic acid derivative represented by general formula (1). General formula (1): R1COOCH2CH2CFHCF2SO3 -M+ (in said formula (1), R1 is a C1-200 monovalent organic group having at least one hydroxyl group, and may have a substituent oth...  
WO/2016/072169A1
The present invention relates to: an active light sensitive or radiation sensitive resin composition; an active light sensitive or radiation sensitive film using the active light sensitive or radiation sensitive resin composition; a mask...  
WO/2016/047784A1
Provided are a novel sulfonium salt having high sensitivity with respect to active energy rays, a photoacid generator comprising the sulfonium salt, and a photosensitive composition containing the photoacid generator. The sulfonium salt ...  
WO/2016/044433A3
The present invention relates to novel biguanide derivatives including their pharmaceutically acceptable salts. The invention also relates processes for the preparation of, intermediates used in the preparation of, pharmaceutical composi...  
WO/2015/195071A1
Therapeutically-effective amounts of novel analogs or derivatives of alkyl fatty acids, such as but not limited to lipoic acid, and pharmaceutical formulations comprising such analogs or derivatives and pharmaceutically-acceptable carrie...  
WO/2015/174471A1
An onium salt represented by formula (a). Z-A-W-Y+(R)nX- (a) (In formula (a), Z, A, W, Y, (R)n, and X have the following meanings: Z represents a monovalent organic group having a ring structure provided with a conjugated π electron sys...  
WO/2015/174215A1
An actinic ray-sensitive or radiation-sensitive resin composition comprising a photoacid generator and resin (B), said resin composition comprising, as the photoacid generator, at least photoacid generator (A) represented by general form...  
WO/2015/128516A1
The invention relates to a method for using a product of propyl propane thiosulfonate (PTSO) for modulating immunological responses in healthy or sick individuals. The method includes the selection of a compound based on PTSO in order to...  
WO/2015/092789A1
The present invention provides water soluble onium salts other than ammonium salts (e.g. phosphonium salt, sulfonium salt) of lipophilic diesters of 1,2-bis(2 aminophenoxy)ethane- N,N,N',N'-tetraacetic acid denoted herein as BAPTA-DE whi...  
WO/2015/078774A1
The invention relates to the production of an ionic liquid comprising a chalcogenide anion from an ionic liquid comprising a carbonate anion using anion exchange as well as to the use of the obtained chalcogenide compond comprising an or...  
WO/2015/064764A1
Provided is an aryloyl(oxy or amino)pentafluorosulfanylbenzene compound having pharmacological action. The present invention relates to an aryloyl(oxy or amino)pentafluorosulfanylbenzene compound represented by general formula (A-I), a p...  
WO/2015/050236A1
 The purpose of the present invention is to make possible synthesis of various fluorine-containing compounds having organic groups at both terminals of a tetrafluoroethylene structure (-CF2-CF2-). The present invention provides fluorin...  
WO/2015/046277A1
An onium salt according to the present invention comprises a compound (A) represented by given general formula (1). A composition according to the present invention comprises the onium salt according to the present invention and an onium...  
WO/2015/045977A1
 The present invention provides: an active light-sensitive or radiation-sensitive resin composition allowing pattern formation, in which pattern collapse is suppressed when used for negative development, and an excellent pattern profil...  
WO/2015/025859A1
A radiation-sensitive resin composition that comprises a polymer having an acid-dissociable group-containing structural unit, a compound comprising a radiolytic onium cation and a counter anion, and a solvent, wherein the counter anion h...  
WO/2015/019983A1
The present invention addresses the problem of providing a method for producing a sulfonium salt compound, with which a sulfonium salt compound having a variety of counter anions, particularly a sulfonium salt compound having weak acid-d...  
WO/2015/014735A1
A process for the preparation of fluorinated compounds having at least one -OSF5 group, said method comprising the step of reacting SOF4 with a fluorinated 3- or 4-membered cyclic ether in the presence of a fluoride catalyst.  
WO/2015/005051A1
Provided are a compound and an active light sensitive or radiation sensitive resin composition, which are capable of forming an ultrafine pattern (for example, one having a line width of 50 nm or less), while satisfying high sensitivity,...  
WO/2015/000929A1
The invention relates to compounds characterized by a general formula (1), wherein T is S, SO or SO2, and R is hydrogen or CO-R' wherein R' is unsubstituted or substituted alkyl, alkenyl, alkynyl, aryl, heteroaryl, use in a method for tr...  
WO/2014/188762A1
The present invention is a radiation-sensitive resin composition which contains a polymer having a structural unit that contains an acid-cleavable group and a compound represented by formula (1). In formula (1), R1 represents a monovalen...  
WO/2014/183415A1
The present invention relates to a double-amide derivative with optical activity and geometrical isomerism, and preparation and application. The double-amide derivative has structures shown in general formulas (I-1) and (I-2), and defini...  
WO/2014/178284A1
A thermoelectric conversion element which has a first electrode, a thermoelectric conversion layer and a second electrode on a base, and wherein the thermoelectric conversion layer contains a conductive nano-material and at least one com...  

Matches 1 - 50 out of 3,113