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WO/2012/056201 |
The invention provides a compound of formula A, B, C or D, methods for making them, intermediates therefor, and their use in making organic biologically active compounds: (Formula (A)). Wherein: • X = F, CI, Br, I, sulfonate esters, ph...
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WO/2012/056901 |
This resist composition comprises at least a base resin, a photo-acid generator and a solvent, wherein the photo-acid generator is a fluorinated sulfonic acid salt represented by general formula (4). (In the formula, X represents a hydro...
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WO/2012/050015 |
According to the invention, a sulfonate resin having a repeating unit represented by general formula (3) is provided. In formula (3), X represents a hydrogen atom or a fluorine atom; n represents an integer of 1 to 10; R1 represents a hy...
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WO/2012/049345 |
The invention relates to a method for capturing isocyanides. These systems can be used in the synthesis of organic compounds, in the chemical and pharmaceutical industry and in environmentally friendly chemical processes characteristic o...
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WO/2012/050041 |
The present invention provides a pest control agent, an acaricide, or a bactericide that contains, as the active ingredient thereof, at least one type of compound selected from aryloxyurea compounds represented by formula (V) (wherein R1...
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WO/2012/045290 |
Process for the preparation of substituted 3- and 4-(pentafluorosulfanyI)benzenes of general formula 3 and 4 by nucleophilic aromatic substitution, where nitrobenzene having pentafiuorosulfanyl group connected in position 3 or 4 is allow...
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WO/2012/046771 |
The inventors have intensively studied on compounds that have Aβ42 production inhibitory activity and have found that a compound (I) of the present invention, wherein a carboxylic acid or a tetrazole group is bonded to a cycloalkane moi...
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WO/2012/023374 |
The purpose of the present invention is to provide a radiation-sensitive composition capable of forming a chemically amplified positive resist film which effectively responds to (extreme) far UV light such as a KrF excimer laser, an ArF ...
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WO/2012/020627 |
The purpose of the present invention is to provide a radiation sensitive composition, or similar, capable of depositing a chemically amplified positive resist film which is effectively sensitive to KrF excimer lasers, ArF excimer lasers,...
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WO/2012/016907 |
The invention relates to an aqueous composition containing a) at least one compound containing a carbamoyl sulfonate group and b) at least one non-ionic alkoxylated polyol containing ester groups and having a HLB value of at least 13 (b1...
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WO/2012/015019 |
Disclosed is a manufacturing method for an aminoalkyl thiosulfuric acid compound represented by formula (1), said method including processes (A1), (B1) and (C1) (in the formula, R1 and R2 each independently represent a hydrogen atom or s...
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WO/2011/158817 |
Disclosed are: a resist composition and a resist pattern formation method, both of which enable the formation of a fine resist pattern having good lithographic properties; a novel polymeric compound which is useful for the resist composi...
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WO/2011/118731 |
Provided are: a novel thiosulfonate compound which can cationize a wider variety of proteins and peptides precisely and reversibly with high quality stability and is thus useful for high-level purification and recovery; a reversibly cati...
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WO/2011/108667 |
Disclosed is a radiation-sensitive resin composition with excellent rectangularity of shape of the resist pattern cross section after development, which is not prone to form scum, and which is in particular not prone to cause defects in ...
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WO/2011/104127 |
The invention pertains to a compound generating an acid of the formula (I) or (II), for instance corresponding sulfonium and iodonium salts, as well as corresponding sulfonyloximes, Formula (I) and Formula (II), wherein X is CH2 or CO; Y...
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WO/2011/093139 |
Disclosed is a sulfonic acid derivative that is characterized by being represented by general formula (1). (1) RCOOCH2CH2CFHCF2SO3 -M+ (In formula (1), R represents a substituted or unsubstituted C1-30 linear, branched, or cyclic hydroca...
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WO/2011/088209 |
This present disclosure is directed to novel prodrugs of activated vitamin D3 compounds. The prodrugs can be designed to have one or more beneficial properties, such as selective inhibition of the enzyme CYP24, low calcemic activity, and...
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WO/2011/075553 |
Liquid radiation curable resins for additive fabrication comprising an R-substituted aromatic thioetber triaryl sulfonmm tetrakis(pentafluorophenyl) borate cationic photoinitiator is disclosed. A process for using the liquid radiation cu...
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WO/2011/053133 |
A radiation-curable liquid resin composition for additive fabrication that possesses good storage stability and is capable of being cured into a three- dimensional object which is colorless and transparent and has excellent heat resistan...
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WO/2011/052327 |
Disclosed are: a photoacid generator having excellent developing properties, a cationic polymerisation initiator having excellent curability, and a resist composition and a cationic polymer composition using the above. Specifically discl...
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WO/2011/048919 |
Disclosed are: a radiation-sensitive resin composition which can response to (extreme) far ultraviolet rays such as a KrF excimer laser and an ArF excimer laser, X-rays such as a synchrotron radiation beam, and electron beams effectively...
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WO/2011/030737 |
Disclosed is a radiation-sensitive composition capable of forming a chemically amplified positive resist film, which is effectively sensitive to (extreme) far ultraviolet rays such as KrF excimer lasers, ArF excimer lasers, and EUV, X-ra...
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WO/2010/149674 |
A method of use of an ionic liquid for sorption of a gas having an electric multipole moment is provided, wherein the ionic liquid comprises an anion and a non-aromatic cation. In particular, the electric multipole moment may be an elect...
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WO/2010/147228 |
A pattern forming method, including: (i) forming a film from a chemical amplification resist composition; (ii) exposing the film, so as to form an exposed film; and (iii) developing the exposed film by using a developer containing an org...
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WO/2010/145037 |
The invention relates to disubstituted-aminodifluorosulfinium salts represented by the formula (I). Processes for preparing same and methods of use as deoxofluorinating reagent is also provided.
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WO/2010/130977 |
This invention pertains generally to the field of chemical synthesis and purification, and more specifically to methods of synthesizing and purifying certain 3,7-diamino- phenothiazin-5-ium compounds (referred to herein as "diaminophenot...
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WO/2010/123599 |
This disclosure relates to compositions and methods including for the inhibition, prevention, and/or treatment of microbial infections, including infections from such pathogens as Staphylococcus aureus.
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WO/2010/123599 |
This disclosure relates to compositions and methods including for the inhibition, prevention, and/or treatment of microbial infections, including infections from such pathogens as Staphylococcus aureus.
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WO/2010/114107 |
An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid ...
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WO/2010/104177 |
A fluoroalkanesulfinic acid ammonium salt is obtained using an organic base when a bromofluoroalkyl carboxylate ester is sulfinated using a sulfinating agent. The fluoroalkanesulfinic acid ammonium salt is oxidized, thereby obtaining a f...
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WO/2010/104178 |
An ammonium hydroxyfluoroalkanesulfinate is obtained by using an organic base while sulfinating a bromofluoroalcohol with a sulfinating agent. An ammonium hydroxyfluoroalkanesulfonate is obtained by oxidizing said ammonium hydroxyfluoroa...
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WO/2010/095385 |
A sulfonium salt which is highly sensitive to i-line. The sulfonium salt is represented by formula (1). [In formula (1), R1 to R6 each independently represents an alkyl, hydroxy, an alkoxy, an alkylcarbonyl, an arylcarbonyl, an alkoxycar...
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WO/2010/069754 |
A UV radiation curable composition comprising a cationic photoinitiator according to Formula (I) or (II): wherein : R1, R2 and R3 independently represent a group selected from the group consisting of an aryl group and a heteroaryl group,...
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WO/2010/066380 |
This invention relates to novel compounds suitable for labeling by positron emitting isotopes, such as 18F, 11C, 13N and 15O, through appropriate labeling reagents, such as 18F reagents and methods of preparing such a compound, compositi...
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WO/2010/063767 |
The invention relates to compounds of the general formula (I) wherein the variable have the meanings as indicated in the claims, and optionally the enantiomers thereof. The active ingredients have advantageous pesticidal properties. They...
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WO/2010/064648 |
Disclosed is a novel sulfonium borate complex having a structure represented by formula (1). The sulfonium borate complex is capable of reducing the amount of fluorine ions generated during thermal cationic polymerization, and is capabl...
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WO/2010/055887 |
A novel β-(trifluoromethyl)vinyldiaryl sulfonium salt represented by general formula (I), which can be used for simple syntheses of various useful compounds each containing a trifluoromethyl group, or the like. (In formula (I), R1 and R...
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WO/2010/046240 |
Compounds of the formula (I), wherein Ar1 is for example phenylene or biphenylene both unsubstituted or substituted; Ar2 and Ar3 are for example independently of each other phenyl, naphthyl, biphenylylyl or heteroaryl, all optionally sub...
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WO/2010/044372 |
Provided are polymerizable fluorine-containing sulfonic acid onium salts represented by formula (2) and polymers wherein same have been polymerized. By using the invented sulfonate resins, resist compositions of superior resolution, broa...
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WO/2010/033360 |
The present invention provides methods of treating a botulinum toxin related condition in a subject. In certain embodiments, the methods involve administering a compound of the following formulas:(I), (II), (III), (IV), (V).
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WO/2010/016230 |
Disclosed is a benzoyl derivative represented by formula (I). [In formula (I), E represents an alkoxy group, an alkoxycarbonyl group or the like; R1 represents a halogen atom, an organic group or the like; p represents an integer of 0-3...
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WO/2010/007910 |
Disclosed is a fluorinated sulfonic acid salt or a compound having a fluorinated sulfonic acid group, which has a structure represented by general formula (1). The salt or the compound can act as a suitable photo-acid generator, and ena...
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WO/2009/152276 |
The present invention provides photoacid generators for use in chemically amplified resists and lithographic processes using the same.
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WO/2009/152276 |
The present invention provides photoacid generators for use in chemically amplified resists and lithographic processes using the same.
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WO/2009/120783 |
Compositions and uses thereof that inhibit HCV life cycle by inhibiting action of the HCV NS3/4A protease. An embodiment of the invention comprises a compound designated RS-2-19.
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WO/2009/116290 |
Provided are a 4-halogenobenzoyl derivative useful as the active ingredient of herbicides for paddy rice which can be industrially advantageously synthesized, ensures an efficacy in a lower dose and has a high safety; a salt thereof; and...
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WO/2009/113508 |
Disclosed is an acid having a fluorine-containing carbanion structure or a salt having a fluorine-containing carbanion structure, which is represented by general formula (1). By using a photoacid generator for chemically amplified resist...
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WO/2009/111309 |
Compounds having the following generic Formula (I) and their use in controlling pests are disclosed.
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WO/2009/089851 |
The present invention relates to sulphoximine-substituted quinazoline derivatives of the formula (I) processes for their preparation and their use as a medicament for the treatment of various diseases.
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WO/2009/078335 |
Disclosed is a sulfonate represented by the general formula (1) below. (In the formula, Rf's independently represent a fluorine atom or a perfluoroalkyl group having 1-3 carbon atoms; R1 represents a linear or branched alkyl group having...
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