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Matches 351 - 400 out of 2,239

Document Document Title
JP6618901B2  
JP2019207299A
To provide a resist composition having good lithographic characteristics, and a resist pattern forming method using the resist composition.The resist composition contains a compound represented by general formula (bd1) and comprising an ...  
JP2019534868A
The present invention can show the outstanding activity and can improve the efficiency and economical efficiency of a reaction using the catalyst whose endurance improved on high temperature and the reaction conditions of strong acid, Th...  
JP2019207407A
To provide a resist composition which achieves higher sensitivity and is capable of forming a resist pattern having a good shape with further reduced roughness, and a resist pattern forming method.The resist composition contains: a resin...  
JP6600472B2  
JP2019530709A
1R, (R [3]) -, or 1S and (3S) - Enantiomer of 2 and 2-dichloro 3- (substitution phenyl) cyclopropane carboxylic acid, It is manufactured by the method of following processing by the acid of the above-mentioned salt on isolation and the l...  
JP6559394B2  
JP2019131537A
To provide a process for direct conversion of alkenes to carboxylic acids.A process comprises the steps of: a) adding an alkene; b) adding a complex comprising the compound of structure (1) and Pd, or a complex comprising the compound of...  
JP6524693B2  
JP6512424B2  
JP2019511574A
The preparing method of transition metal adamantane-carboxylic-acid salt is shown. This method includes mixing transition metal hydroxide and the diamondoid compound which has at least one carboxylate moiety, and forming a reaction mixtu...  
JP2019507150A
The present invention provides a fatty acid compound, its manufacturing method, and its use, it has the structure shown by general formula I, and such a compound has the activity which activates AMPK, and the capability to check the outp...  
JP2019031455A
To provide an antibacterial agent, a deodorant and a cosmetic for deodorant, excellent in antibacterial property.The antibacterial agent, the deodorant and the cosmetic for deodorant contain effective dose of cypress acid.SELECTED DRAWIN...  
JP2019031454A
To provide a manufacturing method of cypress acid-containing essential oil high in cypress acid content by effectively extracting cypress acid, and a manufacturing method of cypress acid high in yield.The manufacturing method of a cypres...  
JP6473949B2  
JPWO2017154947A1
As for the present invention, the particle size distribution (volume standard) of a granular material is D for the purpose of fine particle fluidity providing good 1 of high purity, and the granular material of 4-cyclohexanedicarboxylic ...  
JP2019001742A
To provide a method for producing an adamantane carboxylic acid halide, and a high-purity adamantane carboxylic acid halide.A method for producing an adamantane carboxylic acid halide has a reaction step for reacting a compound represent...  
JP6429357B2  
JPWO2017130871A1
When the present invention manufactures a polymerization liquid crystal compound, it provides the manufacturing method of useful acid halide solution. The manufacturing method of the acid halide solution of the present invention is set i...  
JP2018524320A
The present invention relates to carboplatin as a cocrystal formation object, a series of cocrystal of cyclic amide, and those medicine uses. Cocrystal of the present invention is applicable to prevention or medical treatment of cancer. ...  
JP2018520147A
The present invention relates to a series of cocrystal and those medicine uses of a platinum analog. Cocrystal of the present invention is applicable to the medical treatment or prevention of cancer and virus infection. [Chosen drawing] ...  
JPWO2017056501A1
The present invention provides industrially a manufacturing method of acid halide solution useful as producing intermediate etc. which can be manufactured advantageously for a polymerization liquid crystal compound. A manufacturing metho...  
JP6358419B2  
JP2018516862A
A molecule in which this indication has a use of agricultural chemicals to a noxious insect of an arthropod gate, a mollusk gate, and a nemathelminth gate, It is related with a field concerning a process of generating this molecule, an i...  
JP6250104B2  
JP2017536378A
The present invention relates to 2* octyl cyclo propyl *1* carboxylic acid of one form in 2* octyl cyclo propyl *1* carboxylic acid, especially its opposite-sex object of an isolation form, or a form of at least two mixtures of the oppos...  
JP2017178808A
To provide a simple method for manufacturing trans-1,4-cyclohexanedicarboxylic acid from 1,4,-cyclohexanedicarboxylic acid at high purity and high yield.A manufacturing method includes isomerizing 1,4-cyclohexanedicarboxylic acid into tr...  
JP2017528478A
The present invention relates to pharmacological use of the compound of formula (II). The specific mode of the present invention is related with use of these compounds in the medical treatment of a fit related obstacle, bipolar disorder,...  
JP2017160179A
To provide 1,4-cyclohexanedicarboxylic acid dichloride that contains little acidic gas component and has a high cis ratio that enables easy industrial handling.Provided is a method for producing 1,4-cyclohexanedicarboxylic acid dichlorid...  
JP2017137285A
To provide a method for preparing cyclohexanedicarboxylic acid by polyester.The method for preparing cyclohexanedicarboxylic acid by polyester includes: a step of dispersing polyester together with salt of Group IA or Group IIA element i...  
JP6169478B2  
JP6166988B2  
JP6146301B2  
JP2017095506A
To provide a method for the preparation of cyclohexanecarboxylic acid.A method for the preparation of a compound of formula (I) includes making a compound of formula (II) react with a base in the presence of water.SELECTED DRAWING: None  
JP6138138B2  
JPWO2015186787A1
The manufacturing method which obtains the carboxylic anhydride and carboxylate ester which correspond from various carboxylic acid also at the temperature about a non-solvent and room temperature by quantity yield is provided. A manufac...  
JP2017076817A
To inhibit pattern collapse in dehydration after a liquid treatment.The method for manufacturing the semiconductor device comprises: a process of adhering a first liquid to a surface of a semiconductor substrate; and a process of replaci...  
JPWO2015125734A1
The characteristic which was excellent in polyimide of the former [present invention], such as heat resistance and chemical resistance, A Halohexa hydrophthalic acid derivative which is the synthetic intermediate of alicyclic or half-ali...  
JPWO2015108170A1
A residual substance after separating an object which arises in manufacture processes, such as a cyclo butane tetracarboxylic acid derivative, is used as materials, and a method of obtaining cyclo butane tetracarboxylic acid and/or its t...  
JP6101675B2  
JP6083270B2  
JP2015120698A5  
JP6055666B2  
JP6046646B2  
JP6011413B2  
JP2016180881A
To provide a resist composition, a resist pattern forming method, a photoreactive quencher, and a compound.The resist composition, which generates an acid upon exposure and whose solubility in a developer changes by the action of an acid...  
JP6001112B2  
JP2016121076A
To provide a method of producing a compound which has an E-olefin structure and is useful as a production intermediate and a raw material for a chemical product such as medicine, agricultural chemicals, liquid crystal material.Arylsulfin...  
JP2016065024A
To provide a method for optical resolution of carboxylic acid.Provided is a method for optical resolution of carboxylic acid in which (S)-3-cyclohexene-1-carboxylic acid represented by the chemical structure of the left side in formula (...  
JP5858386B2  

Matches 351 - 400 out of 2,239