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WO/1992/018463A1 |
Specified cinnamic acid derivatives, such as methyl 4-(4-acetoxy-3-methoxycinnamamide)-1-methyl-1-cyclohexanecar
boxylate, and pharmaceutically acceptable salts thereof, which are useful as an allergy type IV reaction inhibitor.
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WO/1992/009553A1 |
A water-soluble pentacyclic triterpene composition comprising a clathrate formed between a pentacyclic triterpene compound of the amyrin family, such as oleanolic acid, ursolic acid or hederagenin, and a cyclodextrin. The water-insoluble...
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WO/1992/002483A1 |
The racemates are obtained from non-racemic 3-oxocyclopentane or 3-oxocyclohexane carboxylic acids or their esters by esterification and ketalization of the non-racemic acid with orthoformic acid ester in an alcohol, racemization and hyd...
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WO/1991/014671A1 |
The new (S)-4-(2-bromobenzoyl)-5-hydroxy-benzocyclobutene-1-carboxyl
ic acid, i.e., the compound of formula (I), in free or salt form, can be used as the active substance in pharmaceutical preparations and can be made by a new process wh...
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WO/1991/013855A1 |
A novel phenanthrene derivative of general formula (1), its salt, a compound further derived therefrom, and its salt; a process for the production thereof; and an interleukin 1 (IL-1) inhibitor containing the derivative as the active ing...
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WO/1990/015045A1 |
The present invention is an oxidative process for the conversion of 21-unsaturated progesterones (I) to the corresponding 3,5-secoandrost-5-one-3,17$g(b)-dioic acids (II) by use of either ozone or an oxidizing agent, which are useful int...
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WO/1990/012798A2 |
Cyclohexadiene-cis-diols, of which many carboxyl-substituted compounds are novel, and which can be prepared by biotransformation, are used in the synthesis of (i) bicyclic lactams (en route to anti-viral carbocyclic nucleosides), (ii) ph...
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WO/1990/004921A1 |
Novel pesticidal compositions, which are characterized by biodegradability and do not bioaccumulate to an unacceptable level in fats and tissues of animals, fowl and fish, containing active compounds and optionally a carrier suitable for...
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WO/1990/001937A1 |
Pentacyclic triterpenoid compounds such as alpha-boswellic acid and its acetate, beta-boswellic acid and its acetate, which have an inhibitory effect on topoisomerase I and topoisomerase II, are disclosed. Compositions based on the penta...
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WO/1989/007102A1 |
Compounds having an optionally-substituted purine derivative portion and a carbobicyclic or heterobicyclic portion, which compounds are useful as phosphodiesterase inhibitors, are disclosed. Also disclosed are intermediates, methods for ...
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WO/1989/006645A1 |
The present invention includes compounds represented by formula (I), wherein n is 0 or 1; R1, R2, R3 and R4 are independently selected from hydrogen, hydroxyl, amino, alkylamino, alkylsulfonylamino, loweralkyl, loweralkoxy, halo, and thi...
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WO/1989/002427A1 |
A process for preparing a 3,4-dihydro 2-naphthanoic acid or an ester thereof comprises heating an alpha-vinyl cinnamic acid or a (C1-C12)alkyl, (C6-C12)aryl, (C6-C12)aralkyl or (C6-C12)alkylaryl ester thereof at a temperature effective t...
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WO/1987/006462A1 |
Compounds of formula (I) and the pharmaceutically acceptable esters thereof, wherein rings A and B are selected from the group consisting of formulae (a), (b), (c), (d), wherein x represents an aromatic ring, or the presence or absence o...
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WO/1987/004428A2 |
Novel compounds have formula (I) where (chi) represents one of the divalent cyclic groups (alpha), (beta), (psi), (delta), (epsilon), (phi), (gamma), (eta), (iota), (xi). The letters a and b indicating in each case the points of attachme...
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WO1987003278A2 |
A ring contraction approach is applied to preparation of cyclopentane derivatives, especially 2,2,5,5-tetra-methylcyclopentanecarboxylic acid from cyclohexane compounds. In one aspect, a cyclohexane diazoketone is reacted with an amine (...
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WO/1983/004019A1 |
Novel cycloaliphatic anti-androgenic compounds which block androgen receptor sites, with both topical and systemic administration being provided. Pharmaceutical methods are also provided.
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WO/1982/001371A1 |
Benzo(4,5)pyrano(2,3c)pyrrole derivatives of the general formula: (FORMULA) or pharmaceutically acceptable acid addition salts thereof, in which R1 and R2 represent hydrogen, alkyl, alkoxy, aralkoxy, hydroxy, halogen, methylenedioxy or a...
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WO/1982/000142A1 |
Novel compounds have a formula (I) (FORMULA) wherein (FORMULA) represents a bicyclo (2, 2, 1)hept-2Z-ene, bicyclo(2, 2, 1)heptane, 7-oxabicyclo(2, 2, 1)hept-2Z-ene, 7-oxabi-cyclo(2, 2, 1)heptane, bicyclo(2, 2, 2)oct-2Z-ene or bicyclo(2, ...
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JP2024031937A |
The present invention provides a carboxylic acid salt, a carboxylic acid generator, a resist composition, etc., which can produce a resist pattern with good CD uniformity. A carboxylic acid salt represented by formula (I), a carboxylic a...
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JP2024009782A |
An object of the present invention is to provide a carboxylic acid salt, etc., which can produce a resist pattern having good line edge roughness, and a resist composition containing the same. A carboxylic acid salt represented by formul...
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JP2023177295A |
To provide a carboxylate, a resist composition and the like which allow a resist pattern having a good focus margin to be produced.There are provided a carboxylate represented by formula (I), a carboxylic acid generator, and a resist com...
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JP2023177303A |
To provide a carboxylate, a resist composition and the like which allow a resist pattern having good CD uniformity to be produced.There are provided a carboxylate represented by formula (I), a carboxylic acid generator, and a resist comp...
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JP2023177297A |
To provide a carboxylate, a resist composition and the like which allow a resist pattern having a good mask error factor to be produced.There are provided: a carboxylate represented by formula (I) and the like; and a resist composition. ...
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JP2023160801A |
To provide a carboxylate and the like which allow a resist pattern having good CD uniformity to be produced, and a resist composition containing the same.There are provided: a carboxylate represented by formula (I) and the like; and a re...
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JP2023160799A |
To provide a carboxylate and the like which allow a resist pattern having good line edge roughness to be produced, and a resist composition containing the same.There are provided: a carboxylate represented by formula (I) and the like; an...
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JP2023156257A |
To provide a carboxylate which allows a resist pattern having good CD uniformity to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I), a car...
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JP2023156260A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition which allow a resist pattern having good line edge roughness to be produced.There are provided a carboxylate represented by formula (I), a carboxylic acid ge...
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JP2023156256A |
To provide a carboxylate and the like which allow a resist pattern having good line edge roughness to be produced.There are provided a carboxylate represented by formula (I), a carboxylic acid generator, and a resist composition containi...
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JP2023109732A |
To provide a carboxylate which allows a resist pattern having good line edge roughness to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I),...
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JP2023109734A |
To provide a carboxylate which allows a resist pattern having a good focus margin to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I), a ca...
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JP2023109729A |
To provide a carboxylate which allows a resist pattern having good CD uniformity to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I), a car...
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JP2023079204A |
To provide a carboxylate, a resin, and a resist composition which allow a resist pattern having good resolution to be produced.There are provided a carboxylate represented by formula (I), a carboxylic acid generator containing the carbox...
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JP2023079205A |
To provide a carboxylate, a resin, and a resist composition which allow a resist pattern having a good mask error factor to be produced.There are provided a carboxylate represented by formula (I), a carboxylic acid generator containing t...
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JP2023076400A |
To provide a carboxylate and the like which allow a resist pattern having a good mask error factor to be produced, and a resist composition.There are provided: a substituted triphenylsulfonium carboxylate having a polymerizable group rep...
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JP2023076401A |
To provide a carboxylate and the like which allow a resist pattern having a good pattern collapse margin to be produced, and a resist composition containing the same.There are provided: a carboxylate represented by formula (I) and the li...
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JP2023035962A |
To provide a carboxylate and a carboxylic acid generator which can produce a resist pattern having excellent pattern collapse resistance, and a resist composition comprising the same.The present invention provides a carboxylate represent...
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JP2023035960A |
To provide a carboxylate and a carboxylic acid generator which can produce a resist pattern having excellent line edge roughness, and a resist composition comprising the same.The present invention provides a carboxylate represented by th...
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JP2023033207A |
To provide a carboxylate which allows a resist pattern having good CD uniformity to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I), a car...
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JP2023027437A |
To provide a polyamide-based polymer which has high mechanical strength and toughness and excellent peelability after adhesion capable of easily being removed from a substrate after coating and to provide an adhesive and a molding materi...
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JP2023016036A |
To provide a carboxylate which allows a resist pattern having good line edge roughness to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by a specific f...
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JP2023016038A |
To provide a carboxylate which allows a resist pattern having good CD uniformity to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I), a car...
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JP2023016040A |
To provide a carboxylate which allows a resist pattern having good line edge roughness to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I),...
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JP2023010679A |
To provide a carboxylate that can produce a resist pattern having excellent line edge roughness, and a resist composition comprising the same.The present invention provides a carboxylate represented by the formula (I), a carboxylic acid ...
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JP2023010681A |
To provide a carboxylate or the like that can produce a resist pattern having excellent mask error factors, and a resist composition comprising the same.The present invention provides a carboxylate or the like, comprising a sulfonium cat...
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JP2023010675A |
To provide a carboxylate and a carboxylic acid generator that can produce a resist pattern having excellent resolution, and a resist composition comprising the same.The present invention provides a carboxylate represented by the formula ...
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JP2023008957A |
To provide a carboxylate which allows a resist pattern having good CD uniformity to be produced, and a resist composition containing the same.There are provided a carboxylate represented by formula (I) and a resist composition. [In the f...
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JP2023008964A |
To provide a carboxylate and a resist composition which allow a resist pattern having good line edge roughness (LER) to be produced.Specifically, there are provided: a carboxylate represented by, e.g., formula (I-1) and the like; and a r...
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JP2023008905A |
To provide a carboxylate which allows a resist pattern having good CD uniformity (CDU) to be produced, and a resist composition containing the same.There are provided a carboxylate represented by formula (I) and a resist composition. (R1...
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JP2023008954A |
To provide a carboxylate which allows a resist pattern having good line edge roughness (LER) to be produced, and a resist composition containing the same.Specifically, there are provided a carboxylate represented by, e.g., formula (I-1),...
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JP2023008903A |
To provide a carboxylate which allows a resist pattern having good line edge roughness to be produced, a resist composition containing the same, and the like.There are provided a carboxylate represented by formula (I), a resist compositi...
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