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Document Title |
JP2021008463A |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator, and a resist composition containing the same.The salt represented by formula (I), the acid generator, and the resist composition ...
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JP2021008455A |
To provide a carboxylate capable of producing a resist pattern having good line edge roughness (LER), a carboxylic acid generator, and a resist composition containing the same.The carboxylate represented by formula (I), the carboxylic ac...
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JP2021008454A |
To provide a salt capable of producing a resist pattern having good resolution, an acid generator, and a resist composition containing the same.The salt represented by formula (I), the acid generator, and the resist composition are provi...
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JP2021008461A |
To provide a carboxylate capable of producing a resist pattern having good resolution.The carboxylate is represented by formula (I) [where R1 and R2 each represent H, F or an alkyl group having F; R3 represents F or an alkyl group having...
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JP2021008460A |
To provide a salt capable of producing a resist pattern having a good mask error factor (MEF), an acid generator, and a resist composition containing the same.The salt represented by formula (I), the acid generator, and the resist compos...
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JP2021008465A |
To provide a carboxylate capable of producing a resist pattern having good pattern collapse resistance.The carboxylate is represented by formula (I) [where R1a and R2a each represent H or a hydrocarbon group optionally having F or are bo...
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JP2021008456A |
To provide a salt capable of producing a resist pattern having a good mask error factor (MEF), an acid generator, and a resist composition containing the same.The salt represented by formula (I), the acid generator, and the resist compos...
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JP2021008458A |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator, and a resist composition containing the same.The salt represented by formula (I), the acid generator, and the resist composition ...
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JP2021008459A |
To provide a carboxylate capable of producing a resist pattern with good line edge roughness, a carboxylic acid generator, and a resist composition.The carboxylate represented by formula (I) and the resist composition containing the same...
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JP6820846B2 |
The present invention relates to a compound having a general formula IbwhereinKrepresents an aromatic or heteroaromatic group in which at least one hydrogen atom may be substituted by a functional groups selected from the group consistin...
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JP6811435B1 |
To provide a polyphenol derivative exhibiting an epidermal cell proliferating action via a KGF receptor activating action. A polyphenol derivative exhibiting an epidermal cell proliferation action via a KGF receptor activating action is ...
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JP2021001162A |
To provide: a carboxylate capable of producing a resist pattern with good CD uniformity (CDU); and a resist composition containing the same.Provided are a carboxylate represented by formula (I) and a resist composition containing the sam...
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JP6803665B2 |
A compound represented by formula (I): wherein R1 represents a hydrogen atom or a methyl group; R2 represents a C1-C12 hydrocarbon group; Xa and Xb each independently represent an oxygen atom or a sulfur atom; X11 represents a C1-C12 div...
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JP2020200304A |
To provide a salt that makes it possible to produce a resist pattern with excellent CD uniformity (CDU), an acid generator and a resist composition containing the same.The present invention provides a salt represented by formula (I), an ...
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JP2020200305A |
To provide a salt that makes it possible to produce a resist pattern with excellent pattern collapse resistance, an acid generator and a resist composition containing the same.The present invention provides a salt represented by formula ...
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JP6801703B2 |
A photoresist composition comprising: a resin having an acid-labile group, an acid generator, and a compound represented by formula (I): wherein R1, R2 and R3 each independently represents a C1-C24 hydrocarbon group in which a hydrogen a...
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JPWO2019088270A1 |
The present invention is a highly safe compound useful for the prevention, alleviation and / or treatment of various diseases associated with enteropeptidase inhibition and / or trypsin inhibition, a pharmaceutical composition containing...
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JP6789034B2 |
To provide a salt, an acid generator, a resist composition and the like, from which a resist pattern can be produced with good CD uniformity.The salt is represented by formula (I); and the acid generator and the resist composition compri...
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JP2020183376A |
To provide a carboxylate capable of producing a resist pattern having good CD uniformity (CDU).A carboxylate is represented by formula (I), [where Z1+ represents an organic cation.]SELECTED DRAWING: None
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JP2020180121A |
To provide a salt and a resist composition capable of producing a resist pattern with good CD uniformity (CDU).A salt represented by formula (I), an acid generator, and a resist composition containing the same are provided. [R1, R2, R3, ...
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JP2020180115A |
To provide a salt, an acid generator, and a resist composition capable of producing a resist pattern with good CD uniformity (CDU).A salt of formula (I) and a resist composition containing the same are provided. [In the formula, R1a and ...
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JP2020180113A |
To provide a salt, an acid generator, and a resist composition capable of producing a resist pattern with good line edge roughness.A carboxylate of formula (I) and a resist composition containing the same are provided. [In the formula, R...
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JP2020176119A |
To provide a salt capable of producing a resist pattern having good line edge roughness, an acid generator, and a resist composition containing the same.A carboxylate represented by Formula (I), a carboxylic acid generator, and a resist ...
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JP2020176118A |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator, and a resist composition containing the same.A carboxylate represented by Formula (I), a carboxylic acid generator, and a resist ...
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JP2020176115A |
To provide a salt capable of producing a resist pattern having good line edge roughness, an acid generator, and a resist composition containing the same.A salt represented by Formula I, an acid generator, and a resist composition are pro...
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JP2020176114A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern with a good mask error factor (MEF).A carboxylate represented by Formula (I), a carboxylic acid generator, and a resist...
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JP2020176116A |
To provide a salt capable of producing a resist pattern having a good mask error factor (MEF), an acid generator, and a resist composition containing the same.A salt represented by Formula I, an acid generator, and a resist composition a...
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JP2020176117A |
To provide a salt capable of producing a resist pattern having a good mask error factor (MEF), an acid generator, and a resist composition containing the same.A carboxylate represented by Formula (I), an acid generator, and a resist comp...
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JP2020177238A |
To provide a resist composition capable of producing a resist pattern with good line edge roughness.The resist composition contains: a resin containing a structural unit represented by Formula (a2-A) and a structural unit having an acid-...
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JP2020176113A |
To provide a salt capable of producing a resist pattern having good line edge roughness (LER), an acid generator, and a resist composition containing the same.A carboxylate represented by Formula (I), a carboxylic acid generator, and a r...
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JP2020530044A |
The present invention relates to certain polyethers, polyether derivatives and methods for producing and using these polymers. For example, the starting material can be, for example, citronellol, prenol, isotitronellol and isoprenol.
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JP2020158495A |
To provide a compound, a resin and a resist composition containing the resin, from which a resist pattern having good CD uniformity (CDU) can be produced.The compound is represented by formulae (I-1) to (I-4), or the like; and the resin ...
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JP2020158496A |
To provide a compound from which a resist pattern with good line edge roughness (LER) can be produced.The compound is represented by formula (I). In the formula, R1 represents an alkyl group having 1 to 6 carbon atoms, H, or a halogen at...
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JP2020152718A |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), and a resist composition containing the same.The salt represented by formula (I), an acid generator, and the resist composition containing the same ...
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JP2020152720A |
To provide a carboxylate that makes it possible to produce a resist pattern having excellent line edge roughness, and a resist composition containing the same.The present invention provides a carboxylate represented by formula (I), a car...
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JP2020152719A |
To provide a carboxylate capable of producing a resist pattern having good CD uniformity (CDU), and a resist composition containing the same.The carboxylate represented by formula (I), a carboxylic acid generator, and the resist composit...
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JP6757171B2 |
To provide a salt with which a resist pattern having a good focus margin can be produced.Salts of an anion represented by at least one formula (Ia) and a cation represented by formula (IC) are provided. In the formulae, Xand Xeach indepe...
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JP6748493B2 |
To provide a resist composition from which a resist pattern can be produced with good CD uniformity (CDU).The resist composition comprises: a resin (A1) containing a structural unit represented by formula (a4-0) and a structural unit hav...
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JP6750177B2 |
To provide a low molecular organic compound having excellent Toll-like receptor (TLR) 3 activity inhibitory action.The present invention provides an anthranilamide derivative represented by formula 1 or pharmaceutically acceptable salt t...
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JP6730072B2 |
To provide a salt, an acid generator, a resist composition and the like, from which a resist pattern can be produced with good CD uniformity (CDU).The salt includes a group represented by formula (aa), preferably formula (aa1) in a catio...
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JP6706955B2 |
To provide a production method of a resist pattern having good line edge roughness.A salt is provided, which has an anion having a group represented by formula (Ia) and a cation represented by formula (IC). In the formulae, Xand Xeach in...
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JP6695203B2 |
To provide a salt, an acid generator, a resist composition, and others, from which a good resist pattern excellent in CD uniformity can be produced.The salt is represented by formula (I); and the acid generator and the resist composition...
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JP6674542B2 |
The invention relates to purely organic emitter molecules of a new type according to formula I and to the use thereof in optoelectronic devices, in particular in organic light-emitting diodes (OLEDs), comprising donor D: an aromatic or h...
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JP6664947B2 |
A salt represented by the formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; R1 represents a C1 to C12 alkyl group in which a methylene group may be replaced by an oxygen atom ...
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JP6663916B2 |
as well as a method of synthesising said compounds, and their use in perfumery.
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JP6665030B2 |
To provide a compound, an acid generator and a resist composition, from which a resist pattern can be produced with a good mask error factor (MEF).The compound is represented by the formula (I), and the acid generator and the resist comp...
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JP2020015713A |
To provide a salt from which a resist pattern having good CD uniformity (CDU) can be produced.The salt is a specific sulfonium compound represented by, for example, formula (1-1) below.SELECTED DRAWING: None
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JP6636768B2 |
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JP6625824B2 |
To provide an application method of a protective agent capable of transpiring a decomposition product of acid degradable polymer at low temperature.Steam pressure of a decomposition product can be reduced by using an acid degradable poly...
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JP6596483B2 |
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