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Matches 501 - 550 out of 1,214

Document Document Title
JP2021008463A
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator, and a resist composition containing the same.The salt represented by formula (I), the acid generator, and the resist composition ...  
JP2021008455A
To provide a carboxylate capable of producing a resist pattern having good line edge roughness (LER), a carboxylic acid generator, and a resist composition containing the same.The carboxylate represented by formula (I), the carboxylic ac...  
JP2021008454A
To provide a salt capable of producing a resist pattern having good resolution, an acid generator, and a resist composition containing the same.The salt represented by formula (I), the acid generator, and the resist composition are provi...  
JP2021008461A
To provide a carboxylate capable of producing a resist pattern having good resolution.The carboxylate is represented by formula (I) [where R1 and R2 each represent H, F or an alkyl group having F; R3 represents F or an alkyl group having...  
JP2021008460A
To provide a salt capable of producing a resist pattern having a good mask error factor (MEF), an acid generator, and a resist composition containing the same.The salt represented by formula (I), the acid generator, and the resist compos...  
JP2021008465A
To provide a carboxylate capable of producing a resist pattern having good pattern collapse resistance.The carboxylate is represented by formula (I) [where R1a and R2a each represent H or a hydrocarbon group optionally having F or are bo...  
JP2021008456A
To provide a salt capable of producing a resist pattern having a good mask error factor (MEF), an acid generator, and a resist composition containing the same.The salt represented by formula (I), the acid generator, and the resist compos...  
JP2021008458A
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator, and a resist composition containing the same.The salt represented by formula (I), the acid generator, and the resist composition ...  
JP2021008459A
To provide a carboxylate capable of producing a resist pattern with good line edge roughness, a carboxylic acid generator, and a resist composition.The carboxylate represented by formula (I) and the resist composition containing the same...  
JP6820846B2
The present invention relates to a compound having a general formula IbwhereinKrepresents an aromatic or heteroaromatic group in which at least one hydrogen atom may be substituted by a functional groups selected from the group consistin...  
JP6811435B1
To provide a polyphenol derivative exhibiting an epidermal cell proliferating action via a KGF receptor activating action. A polyphenol derivative exhibiting an epidermal cell proliferation action via a KGF receptor activating action is ...  
JP2021001162A
To provide: a carboxylate capable of producing a resist pattern with good CD uniformity (CDU); and a resist composition containing the same.Provided are a carboxylate represented by formula (I) and a resist composition containing the sam...  
JP6803665B2
A compound represented by formula (I): wherein R1 represents a hydrogen atom or a methyl group; R2 represents a C1-C12 hydrocarbon group; Xa and Xb each independently represent an oxygen atom or a sulfur atom; X11 represents a C1-C12 div...  
JP2020200304A
To provide a salt that makes it possible to produce a resist pattern with excellent CD uniformity (CDU), an acid generator and a resist composition containing the same.The present invention provides a salt represented by formula (I), an ...  
JP2020200305A
To provide a salt that makes it possible to produce a resist pattern with excellent pattern collapse resistance, an acid generator and a resist composition containing the same.The present invention provides a salt represented by formula ...  
JP6801703B2
A photoresist composition comprising: a resin having an acid-labile group, an acid generator, and a compound represented by formula (I): wherein R1, R2 and R3 each independently represents a C1-C24 hydrocarbon group in which a hydrogen a...  
JPWO2019088270A1
The present invention is a highly safe compound useful for the prevention, alleviation and / or treatment of various diseases associated with enteropeptidase inhibition and / or trypsin inhibition, a pharmaceutical composition containing...  
JP6789034B2
To provide a salt, an acid generator, a resist composition and the like, from which a resist pattern can be produced with good CD uniformity.The salt is represented by formula (I); and the acid generator and the resist composition compri...  
JP2020183376A
To provide a carboxylate capable of producing a resist pattern having good CD uniformity (CDU).A carboxylate is represented by formula (I), [where Z1+ represents an organic cation.]SELECTED DRAWING: None  
JP2020180121A
To provide a salt and a resist composition capable of producing a resist pattern with good CD uniformity (CDU).A salt represented by formula (I), an acid generator, and a resist composition containing the same are provided. [R1, R2, R3, ...  
JP2020180115A
To provide a salt, an acid generator, and a resist composition capable of producing a resist pattern with good CD uniformity (CDU).A salt of formula (I) and a resist composition containing the same are provided. [In the formula, R1a and ...  
JP2020180113A
To provide a salt, an acid generator, and a resist composition capable of producing a resist pattern with good line edge roughness.A carboxylate of formula (I) and a resist composition containing the same are provided. [In the formula, R...  
JP2020176119A
To provide a salt capable of producing a resist pattern having good line edge roughness, an acid generator, and a resist composition containing the same.A carboxylate represented by Formula (I), a carboxylic acid generator, and a resist ...  
JP2020176118A
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator, and a resist composition containing the same.A carboxylate represented by Formula (I), a carboxylic acid generator, and a resist ...  
JP2020176115A
To provide a salt capable of producing a resist pattern having good line edge roughness, an acid generator, and a resist composition containing the same.A salt represented by Formula I, an acid generator, and a resist composition are pro...  
JP2020176114A
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern with a good mask error factor (MEF).A carboxylate represented by Formula (I), a carboxylic acid generator, and a resist...  
JP2020176116A
To provide a salt capable of producing a resist pattern having a good mask error factor (MEF), an acid generator, and a resist composition containing the same.A salt represented by Formula I, an acid generator, and a resist composition a...  
JP2020176117A
To provide a salt capable of producing a resist pattern having a good mask error factor (MEF), an acid generator, and a resist composition containing the same.A carboxylate represented by Formula (I), an acid generator, and a resist comp...  
JP2020177238A
To provide a resist composition capable of producing a resist pattern with good line edge roughness.The resist composition contains: a resin containing a structural unit represented by Formula (a2-A) and a structural unit having an acid-...  
JP2020176113A
To provide a salt capable of producing a resist pattern having good line edge roughness (LER), an acid generator, and a resist composition containing the same.A carboxylate represented by Formula (I), a carboxylic acid generator, and a r...  
JP2020530044A
The present invention relates to certain polyethers, polyether derivatives and methods for producing and using these polymers. For example, the starting material can be, for example, citronellol, prenol, isotitronellol and isoprenol.  
JP2020158495A
To provide a compound, a resin and a resist composition containing the resin, from which a resist pattern having good CD uniformity (CDU) can be produced.The compound is represented by formulae (I-1) to (I-4), or the like; and the resin ...  
JP2020158496A
To provide a compound from which a resist pattern with good line edge roughness (LER) can be produced.The compound is represented by formula (I). In the formula, R1 represents an alkyl group having 1 to 6 carbon atoms, H, or a halogen at...  
JP2020152718A
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), and a resist composition containing the same.The salt represented by formula (I), an acid generator, and the resist composition containing the same ...  
JP2020152720A
To provide a carboxylate that makes it possible to produce a resist pattern having excellent line edge roughness, and a resist composition containing the same.The present invention provides a carboxylate represented by formula (I), a car...  
JP2020152719A
To provide a carboxylate capable of producing a resist pattern having good CD uniformity (CDU), and a resist composition containing the same.The carboxylate represented by formula (I), a carboxylic acid generator, and the resist composit...  
JP6757171B2
To provide a salt with which a resist pattern having a good focus margin can be produced.Salts of an anion represented by at least one formula (Ia) and a cation represented by formula (IC) are provided. In the formulae, Xand Xeach indepe...  
JP6748493B2
To provide a resist composition from which a resist pattern can be produced with good CD uniformity (CDU).The resist composition comprises: a resin (A1) containing a structural unit represented by formula (a4-0) and a structural unit hav...  
JP6750177B2
To provide a low molecular organic compound having excellent Toll-like receptor (TLR) 3 activity inhibitory action.The present invention provides an anthranilamide derivative represented by formula 1 or pharmaceutically acceptable salt t...  
JP6730072B2
To provide a salt, an acid generator, a resist composition and the like, from which a resist pattern can be produced with good CD uniformity (CDU).The salt includes a group represented by formula (aa), preferably formula (aa1) in a catio...  
JP6706955B2
To provide a production method of a resist pattern having good line edge roughness.A salt is provided, which has an anion having a group represented by formula (Ia) and a cation represented by formula (IC). In the formulae, Xand Xeach in...  
JP6695203B2
To provide a salt, an acid generator, a resist composition, and others, from which a good resist pattern excellent in CD uniformity can be produced.The salt is represented by formula (I); and the acid generator and the resist composition...  
JP6674542B2
The invention relates to purely organic emitter molecules of a new type according to formula I and to the use thereof in optoelectronic devices, in particular in organic light-emitting diodes (OLEDs), comprising donor D: an aromatic or h...  
JP6664947B2
A salt represented by the formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; R1 represents a C1 to C12 alkyl group in which a methylene group may be replaced by an oxygen atom ...  
JP6663916B2
as well as a method of synthesising said compounds, and their use in perfumery.  
JP6665030B2
To provide a compound, an acid generator and a resist composition, from which a resist pattern can be produced with a good mask error factor (MEF).The compound is represented by the formula (I), and the acid generator and the resist comp...  
JP2020015713A
To provide a salt from which a resist pattern having good CD uniformity (CDU) can be produced.The salt is a specific sulfonium compound represented by, for example, formula (1-1) below.SELECTED DRAWING: None  
JP6636768B2  
JP6625824B2
To provide an application method of a protective agent capable of transpiring a decomposition product of acid degradable polymer at low temperature.Steam pressure of a decomposition product can be reduced by using an acid degradable poly...  
JP6596483B2  

Matches 501 - 550 out of 1,214