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JP2023168293A |
To provide a resist composition from which a resist pattern having good CD uniformity can be produced.There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In the formula, R3, R4, and R5 each...
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JP2023166272A |
To provide a copolymer and a method for producing the same, and a cyclic carbonate compound.A copolymer includes a repeat unit represented by the following formula (II) and another repeat unit including an oxygen atom. (R1 and R2 each re...
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JP2023160797A |
To provide a carboxylate and the like which allow a resist pattern having a good mask error factor to be produced, and a resist composition containing the same.There are provided: a carboxylate represented by formula (I) and the like; an...
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JP2023160800A |
To provide a salt which allows a resist pattern having good CD uniformity to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and a resi...
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JP2023160801A |
To provide a carboxylate and the like which allow a resist pattern having good CD uniformity to be produced, and a resist composition containing the same.There are provided: a carboxylate represented by formula (I) and the like; and a re...
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JP2023160799A |
To provide a carboxylate and the like which allow a resist pattern having good line edge roughness to be produced, and a resist composition containing the same.There are provided: a carboxylate represented by formula (I) and the like; an...
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JP2023160798A |
To provide a salt which allows a resist pattern having good line edge roughness to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and ...
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JP2023160796A |
To provide a salt which allows a resist pattern having a good focus margin to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and a res...
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JP7372756B2 |
A salt represented by formula (I):In formula (I), R1, R2, R3 and R4 each independently represent a halogen atom or a perfluoroalkyl group having 1 to 6 carbon atoms, R5, R6 and R7 each independently represent a halogen atom, a hydroxy gr...
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JP2023156257A |
To provide a carboxylate which allows a resist pattern having good CD uniformity to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I), a car...
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JP2023156261A |
To provide a salt which allows a resist pattern having good CD uniformity to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and a resi...
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JP2023156259A |
To provide a salt and the like which allow a resist pattern having good CD uniformity to be produced.There are provided a salt represented by formula (I), an acid generator, and a resist composition containing the same. [In the formula, ...
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JP2023156258A |
To provide a salt which allows a resist pattern having good line edge roughness to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and ...
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JP2023156260A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition which allow a resist pattern having good line edge roughness to be produced.There are provided a carboxylate represented by formula (I), a carboxylic acid ge...
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JP2023156256A |
To provide a carboxylate and the like which allow a resist pattern having good line edge roughness to be produced.There are provided a carboxylate represented by formula (I), a carboxylic acid generator, and a resist composition containi...
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JP2023153089A |
To provide a resist composition that produces a resist pattern with excellent CD uniformity.A resist composition contains an acid generator containing a salt represented by formula (I), and an acid-stable resin containing one or more str...
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JP2023145501A |
To provide an acid generator and a resist composition which contain a salt allowing a resist pattern to be produced with good line edge roughness (LER).There are provided: a salt represented by formula (I) and the like; and a resist comp...
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JP7340608B2 |
An object of the present invention is to provide a compound having an excellent rate of change in HTP caused by exposure. Another object of the present invention is to provide a liquid crystal composition formed of the compound, a cured ...
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JP2023121152A |
To provide a salt, an acid generator, and a resist composition which allow a resist pattern having good line edge roughness to be produced.There are provided: a salt represented by formula (I); and an acid generator and a resist composit...
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JP2023109732A |
To provide a carboxylate which allows a resist pattern having good line edge roughness to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I),...
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JP2023109731A |
To provide a salt which allows a resist pattern having good CD uniformity to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and a resi...
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JP2023109734A |
To provide a carboxylate which allows a resist pattern having a good focus margin to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I), a ca...
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JP2023109729A |
To provide a carboxylate which allows a resist pattern having good CD uniformity to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I), a car...
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JP2023109733A |
To provide a salt which allows a resist pattern having good line edge roughness to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and ...
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JP2023109728A |
To provide a salt which allows a resist pattern having a good mask error factor to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and ...
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JP2023101395A |
To provide a salt, a resin, and a resist composition which allow a resist pattern having good line edge roughness to be produced.The resist composition contains: an acid generator containing a salt represented by formula (I); and a resin...
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JP2023081849A |
To provide salt, an acid generator, and a resist composition including the same, with which it is possible to manufacture a resist pattern having good CD uniformity (CDU).Salt has a specific structure that triphenylsulfonium cation has, ...
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JP7269317B2 |
A compound having an excellent rate of change in HTP caused by exposure is achieved and is represented by General Formula (1). In addition, a composition is formed of the compound, and a cured product, an optically anisotropic body, or a...
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JP2023058024A |
To provide a resist composition from which a resist pattern having good CD uniformity (CDU) can be produced.The resist composition contains a compound represented by formula (I), a resin containing a structural unit having an acid-labile...
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JP2023058023A |
To provide a resist composition from which a resist pattern having good line edge roughness can be produced.The resist composition contains a compound represented by formula (I), a resin having an acid-labile group, and an acid generator...
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JP2023514581A |
The present invention relates to the use of lignin derivatives to reduce and/or prevent deposits on objects during machine dishwashing processes. Further, the present invention relates to methods for reducing and/or preventing deposits o...
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JP2023035962A |
To provide a carboxylate and a carboxylic acid generator which can produce a resist pattern having excellent pattern collapse resistance, and a resist composition comprising the same.The present invention provides a carboxylate represent...
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JP2023035959A |
To provide a salt that can produce a resist pattern having excellent CD uniformity (CDU) and a resist composition comprising the same.The present invention provides a salt represented by formula (I), an acid generator and a resist compos...
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JP2023035960A |
To provide a carboxylate and a carboxylic acid generator which can produce a resist pattern having excellent line edge roughness, and a resist composition comprising the same.The present invention provides a carboxylate represented by th...
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JP2023035961A |
To provide a salt that can produce a resist pattern having excellent CD uniformity (CDU) and a resist composition comprising the same.The present invention provides a salt represented by formula (I), an acid generator and a resist compos...
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JP2023033206A |
To provide a salt which allows a resist pattern having good line edge roughness (LER) to be produced, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and a resist comp...
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JP2023033207A |
To provide a carboxylate which allows a resist pattern having good CD uniformity to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I), a car...
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JP2023508930A |
The present invention provides compounds, pharmaceutically acceptable compositions thereof, and methods of using them. [Selection figure] None
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JP7225335B2 |
To provide a resin composition which enables production of a resist pattern with a good mask error factor or the like.A resist composition for a negative type developer contains a salt represented by a formula (I), and a resin including ...
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JP2023016036A |
To provide a carboxylate which allows a resist pattern having good line edge roughness to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by a specific f...
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JP2023016038A |
To provide a carboxylate which allows a resist pattern having good CD uniformity to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I), a car...
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JP2023016037A |
To provide a salt which allows a resist pattern having good line edge roughness to be produced, an acid generator, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and ...
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JP2023016035A |
To provide a salt which allows a resist pattern having good CD uniformity (CDU) to be produced, an acid generator, and a resist composition containing the same.There are provided a salt of a specific structure, an acid generator, and a r...
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JP2023016040A |
To provide a carboxylate which allows a resist pattern having good line edge roughness to be produced, a carboxylic acid generator, and a resist composition containing the same.There are provided a carboxylate represented by formula (I),...
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JP2023016039A |
To provide a salt which allows a resist pattern having good CD uniformity to be produced, and a resist composition containing the same.There are provided a salt represented by formula (I), an acid generator, and a resist composition. [In...
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JP2023010679A |
To provide a carboxylate that can produce a resist pattern having excellent line edge roughness, and a resist composition comprising the same.The present invention provides a carboxylate represented by the formula (I), a carboxylic acid ...
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JP2023010674A |
To provide a salt that can produce a resist pattern having excellent pattern collapse resistance, and a resist composition comprising the same.The present invention provides a salt represented by the formula (I), an acid generator and a ...
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JP2023010681A |
To provide a carboxylate or the like that can produce a resist pattern having excellent mask error factors, and a resist composition comprising the same.The present invention provides a carboxylate or the like, comprising a sulfonium cat...
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JP2023010675A |
To provide a carboxylate and a carboxylic acid generator that can produce a resist pattern having excellent resolution, and a resist composition comprising the same.The present invention provides a carboxylate represented by the formula ...
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JP2023010680A |
To provide a salt and an acid generator that can produce a resist pattern having excellent focus margin (DOF), and a resist composition comprising the same.The present invention provides a salt having a specific structure, an acid genera...
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