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JP7056421B2 |
To provide a salt capable of producing a resist pattern with a good focus margin (DOF), and a resist composition containing the salt.A carboxylate is represented by formula (I) [where Lrepresents a C1-6 fluorinated alkanediyl group; Lrep...
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JP7044494B2 |
To provide a salt and a resist composition, which can produce a resist pattern with a good mask error factor (MEF).The salt is represented by formula (I), and the resist composition contains the salt and a resin containing a structural u...
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JP7042878B2 |
To provide a resist composition capable of producing a resist pattern with good CD uniformity.The resist composition contains an acid generator containing a salt represented by formula (I0), and a resin having an acid-labile group. [In t...
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JP2022517403A |
A method for preparing a compound containing at least one cyclic monothiocarbonate group, wherein a salt of an acidic compound having at least one acidic hydrogen atom is used in the formula (I) [formula, group R.1~ R4One of them is the ...
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JP2022517402A |
A method for preparing a compound having at least one 5-membered cyclic monothiocarbonate group, a) using compound C1 having at least one halohydrin group as a starting material and b) compound C1 as a phosgen. Alternatively, the adduct ...
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JP7032549B2 |
The present invention provides: an active-light-sensitive or radiation-sensitive resin composition containing (A) a resin that decomposes due to the action of an acid, the degree of solubility increasing in an alkaline developing solutio...
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JP7027711B2 |
A positive resist composition comprising a polymer adapted to be decomposed under the action of acid to increase its solubility in alkaline developer and a sulfonium compound of specific structure has a high resolution. When the resist c...
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JP2022028612A |
To provide a salt that makes it possible to produce a resist pattern having excellent line edge roughness, an acid generator, a resin and a resist composition comprising the same.The present invention discloses a salt represented by, for...
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JP2022028615A |
To provide a salt that makes it possible to produce a resist pattern having excellent CD uniformity (CDU), an acid generator, a resin and a resist composition comprising the same.The present invention discloses a salt represented by, for...
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JP7019291B2 |
To provide a compound which makes it possible to produce a resist pattern with excellent CD uniformity, a resin and a resist composition comprising the resin.A resist composition comprises a resin (A) comprising a compound represented by...
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JP6998957B2 |
The present invention relates to a method for preparing 3-substituted 2-vinylphenyl sulfonates.
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JP2022022216A |
To identify additional compounds capable of modulating GPR119 activity, and compounds that are therapeutically useful for treatment of diseases and conditions associated with dysregulation of GPR119 such as T2DM, diabetes-mediated diseas...
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JP7009076B2 |
To provide a salt and a resist composition comprising the salt, from which a resist pattern can be produced with a good MEF (mask error factor).A resist composition comprises an acid generator represented by formula (I0), and a resin inc...
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JP2022014782A |
To provide a resist composition having good fine resolution, a resist pattern formation method, a compound, and an acid diffusion control agent.A resist composition contains a base material component whose dissolubility to a developer is...
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JP2022508261A |
A method of preparing a coating or sealed material, the first component containing compound A) having at least one 5-membered ring monothiocarbonate group, and a primary component, hereinafter referred to as an amino group. Alternatively...
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JP2022506713A |
The present invention relates to a 1,3-oxathiolan-2-thione derivative, a method for producing the same, and its use. The present invention also relates to silylated polymers obtained from the 1,3-oxathiolan-2-thione derivatives and formu...
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JP2022502374A |
Ben Ming, α2- Drena Drena Drena Receptor Sub-tapping C (α-2c) Ango GototoOcclusive and central sleep without breathing Good morning good nothing.
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JP2022001567A |
To provide a salt, an acid generator, and a resist composition capable of producing a resist pattern having good CD uniformity (CDU).The salt represented by formula (I), the acid generator, and the resist composition are provided. [In th...
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JP2021191745A |
To provide a salt capable of producing a resist pattern having a good pattern collapse margin (PCM), an acid generator, and a resist composition containing the same.The salt represented by formula (I), the acid generator, and the resist ...
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JP2021191746A |
To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern having good resolution.The carboxylate represented by formula (I), the carboxylic acid generator, and the resist compos...
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JP6974981B2 |
To provide a salt capable of producing a resist pattern with good CD uniformity (CDU), a resist composition containing the same, and a method for producing a resist pattern.There are provided a salt represented by formula (I), an acid ge...
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JP2021178812A |
To provide a salt and an acid generator which make it possible to produce a resist pattern with excellent focus margin (DOF) and a resist composition comprising the same.The present invention discloses a salt represented by, for example,...
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JP2021178813A |
To provide a carboxylate and a carboxylic acid generator which make it possible to produce a resist pattern with excellent mask error factor (MEF) and a resist composition comprising the same.The present invention discloses a carboxylate...
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JP2021176851A |
To provide a salt capable of producing a resist pattern with excellent CD uniformity (CDU), and to provide a resist composition containing the salt.A salt has an anion expressed by a formula (aa1). [In the formula (aa1), X1 represents a ...
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JP2021169440A |
To provide: a method for producing an allylic position-substituted methacrylate having a hydroxy group and a sulfide group by using as a raw material a hydroxyl group-containing mercaptan having a hydroxyl group and a mercapto group in a...
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JPWO2020105505A1 |
An object of the present invention is a composition of an actinic light-sensitive or radiation-sensitive resin in which the cross-sectional shape of the pattern to be formed is excellent in rectangularity and the dimensional fluctuation ...
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JP6948880B2 |
To improve CD uniformity (CDU) of a resist pattern.There are provided: a salt represented by formula (I); an acid generator containing the salt; a resist composition containing the acid generator and a resin containing a structural unit ...
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JP6944246B2 |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), an acid generator, and a resist composition containing the acid generator.The salt is represented by formula (I) [where Qand Qeach represent a fluor...
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JP2021151989A |
To provide a salt capable of producing a resist pattern having good CD uniformity (CDU), and a resist composition containing the same.A salt represented by formula (I), an acid generator, and a resist composition containing the same are ...
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JP2021151990A |
To provide a salt capable of producing a resist pattern having good line edge roughness (LER), and a resist composition containing the same.A salt represented by formula (I), an acid generator, and a resist composition containing the sam...
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JP6932943B2 |
To provide a salt capable of producing a resist pattern with good CD uniformity (CDU), and a resist composition containing the salt.The salt is represented by formula (I) [Rand Rare each independently H, a hydroxy group, or a C1-12 hydro...
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JP6931310B2 |
To provide: a chemically amplified positive photosensitive resin composition capable of suppressing occurrence of "footing", in which a width of a bottom (a side proximal to the surface of a support) becomes narrower than a top (a side p...
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JP2021123579A |
To provide a salt capable of producing a resist pattern having good CD uniformity, and a resist composition containing the same.There are provided: a salt represented by formula (I); and an acid generator and a resist composition contain...
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JP6923805B2 |
The present invention provides an industrially applicable method for production of a fluorine-containing cyclopropane carboxylic acid compound useful as an intermediate for pharmaceutical and agrichemical products. A fluorine-containing ...
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JP6925982B2 |
The present application relates to spirobifluorene derivatives of a formula (I), to the use thereof in electronic devices, and to processes for preparing said derivatives.
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JP6913031B2 |
[Problem] The present invention addresses the problem of providing a radiation-sensitive composition having excellent LWR, CDU, and EL performance, and a compound and polymer used in the same. [Solution] A polymer having structural units...
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JP6910173B2 |
To provide a novel dithiocarbonate compound that provides epoxy resin composition having viscosity which hardly increases even when the dithiocarbonate compound is applied to epoxy resin and to provide a resin composition using the dithi...
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JP6910838B2 |
To provide a salt and a resist composition from which a resist pattern can be produced with a good MEF (mask error factor).A salt is represented by formula (I); and a resist composition comprises the salt, a resin including a structural ...
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JP6909909B2 |
To provide a compound capable of forming a resin for use in a resist composition allowing production of a resist pattern with a good focus margin (DOF).The compound is represented by formula (I') in the figure. [In formula (I'), R1 repre...
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JP6904970B2 |
The present invention discloses compounds of Formula (I), or pharmaceutically acceptable salts, esters, or prodrugs thereof:X-A-Y-L-R (I)which inhibit the protein(s) encoded by hepatitis B virus (HBV) or interfere with the function ...
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JP2021103234A |
To provide a resist composition excellent in all of sensitivity, roughness reduction, and resolution, and to provide a resist pattern forming method.The resist composition contains: a resin component (A1) whose solubility in a developer ...
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JP6902831B2 |
To provide a resist composition excellent in temporal stability, excellent in lithographic characteristics such as sensitivity, and capable of forming a resist pattern having an excellent shape, a resist pattern forming method, and a com...
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JP6902832B2 |
Provided is a resist composition which generates an acid upon exposure and changes a solubility in a developing solution under an action of the acid, the resist composition containing a base material component whose solubility in the dev...
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JP6900276B2 |
To provide a salt that makes it possible to produce a resist pattern with good CD uniformity (CDU), a resist composition containing the same, and a method for producing a resist pattern.A salt represented by formula (I), a resist composi...
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JP6891657B2 |
To provide a laminate obtained by strongly adhering a metal layer and a plastic layer and to provide a method for producing the laminate obtained by strongly adhering the metal layer and the plastic layer.There is provided a laminate hav...
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JP2021514996A |
Benzoylamide of general formula (I) is described as a herbicide. In this equation (I), B represents N or X1And X2Is O or S (O)nRepresents R, Ra, Rb b, Rc, Rd, Re, RfAnd RxIs hydrogen, fluorine, chlorine, hydroxyl, (C1~ C6)-Alkyl, Halo-(C...
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JP6879811B2 |
To provide a novel lithium salt complex compound.There is provided a lithium salt complex compound composed of one lithium salt selected from a lithium sulfonate salt, a lithium sulfate salt and a sulfonylimidic acid lithium salt and one...
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JP6879813B2 |
To provide a novel lithium salt complex compound.There is provided a lithium salt complex compound composed of one lithium salt selected from a lithium sulfonate salt, a lithium sulfate salt and a sulfonylimidic acid lithium salt and one...
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JP6879812B2 |
To provide a novel lithium salt complex compound.There is provided a lithium salt complex compound composed of one lithium salt selected from a lithium sulfonate salt, a lithium sulfate salt and a sulfonylimidic acid lithium salt and one...
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JP6874634B2 |
A resist composition comprising a base polymer and a sulfonium salt of thiophenecarboxylic acid offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.
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