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WO/2024/070091A1 |
Provided are: a compound suitable for use as a photoacid generator for resist compositions that has favorable sensitivity to actinic energy such as EB and EUV, has excellent resolution in lithography, and can reduce line width roughness ...
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WO/2024/070671A1 |
The purpose of the present invention is to provide a positive resist composition that can form a resist pattern that exhibits an excellent clarity and resolution. A positive resist composition according to the present invention comprises...
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WO/2024/073211A1 |
Synthesis of guanidinium-based polymers is disclosed. Chemical Mechanical Planarization (CMP) slurries comprise abrasives; activator; oxidizing agent; additive comprising guanidinium-based polymers; and water. The use of the synthesized ...
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WO/2024/070964A1 |
The present invention provides: an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) and a non-ionic compound (C), wherein the resin (A) has a repeating unit represented by general formula (A1) describ...
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WO/2024/070773A1 |
The present invention provides a vinyl compound that has excellent solvent solubility, that yields a cured product having excellent heat resistance, thermal decomposition stability, thermal conductivity, low dielectric constant, low diel...
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WO/2024/054550A2 |
Systems and methods for securing a sheet-like implant to soft tissue and/or bone at a treatment site may include a tissue anchor delivery device configured to deliver at least one tissue anchor to the treatment site. Some systems may inc...
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WO/2024/053282A1 |
One embodiment of the present invention relates to a polymer, a composition, a cured product, a laminate, and an electronic device. The polymer has a repeating structural unit represented by formula (1). [R11 represents a divalent substi...
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WO/2024/049621A1 |
An additive for a water-based wood stain includes a polymeric particle including a polymer that includes a repeating unit formed from a compound having the formula X-L1 -A, wherein X is a substituted or unsubstituted (C2- C8)alkenyl cont...
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WO/2024/041995A1 |
Ultra-low loss curable hydrocarbon resin compositions comprising vinylbenzyl compounds, a method for the preparation thereof and their use for the manufacture of articles which find application in the electric/electronic industries.
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WO/2024/036679A1 |
An anti-reflective coating composition, comprising an organic polymer. The organic polymer comprises a cross-linkable polymer. The cross-linkable polymer comprises a monomer unit formed by a monomer shown in Formula (I). Compared with th...
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WO/2024/033429A1 |
The present invention relates to side-chain functionalized polymers and copolymers and their use as alkaline anion exchange membrane materials, for example in alkaline water electrolyzers, fuel cells or flow batteries.
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WO/2024/024669A1 |
The present invention provides: an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) the polarity of which is increased by action of acid and a specific compound (B) represented by a general formula (B...
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WO/2024/014462A1 |
This resist composition comprises a resin component (A1) that exhibits change in solubility in a developing solution due to the action of an acid. The resin component (A1) has a constitution unit (a0) derived from a compound represented ...
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WO/2024/015644A1 |
The present disclosure provides compositions including a polyacrylamide-based copolymer, one or more preservatives, and insulin or an analog thereof. Also provided are methods of using the insulin compositions, including methods of admin...
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WO/2024/010179A1 |
The present invention relates to a polystyrene polymer comprising two or more of functional groups in one repeating unit, wherein the two or more functional groups are positioned to be adjacent to each other so that a hydrogen bond betwe...
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WO/2024/005049A1 |
This composition comprises a compound (A) represented by formula (1) below and a compound (B) represented by formula (2) below. (The definitions of the elements in formula (1) are indicated in the description.) (In formula (2), the eleme...
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WO/2024/004802A1 |
The present invention provides: an active-ray-sensitive or radiation-sensitive resin composition comprising (A) a resin which contains a repeating unit (a) represented by a specific general formula (a) and having a group capable of being...
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WO/2023/239406A2 |
A formulation for forming a styrene-based scintillator using light-directed additive manufacturing techniques includes a base monomer, a primary dye, a secondary dye, and a cationic photoinitiator. The base monomer includes one or more s...
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WO/2023/218970A1 |
Provided are, inter alia, an active-ray-sensitive or radiation-sensitive resin composition containing a resin that increases in polarity under the action of acid and a compound having a specified structure, an active-ray-sensitive or rad...
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WO/2023/210520A1 |
Provided are: a resist composition having favorable sensitivity, roughness characteristics, and etching resistance; a resist pattern formation method; and a new compound that is useful as a resin component for said resist composition. Th...
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WO/2023/199876A1 |
Provided is a hydrogenation method using a solvent that satisfactorily dissolves a polymer before and after hydrogenation. The present invention provides a method for producing a hydrogenated polymer by hydrogenating the aromatic ring of...
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WO/2023/190590A1 |
[Problem] To provide an anion exchange resin which has an anion exchange group having high alkali resistance and in which a main chain structure is not affected even if the anion exchange group decomposes. [Solution] The anion exchange r...
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WO/2023/189411A1 |
Provided are a maleimide compound, a curable resin composition and a cured product thereof that have high heat resistance, excellent low dielectric properties and good curability, and an amine compound and a reaction product of an amine ...
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WO/2023/190070A1 |
Provided are a compound represented by formula (X), a method for producing same, a polymerizable composition, a resin composition, a polymer, a cured product, and a laminate [In formula (X), R1, R3, R5, and R7 each independently represen...
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WO/2023/189424A1 |
Provided are a compound that exhibits an excellent solvent stability and excellent low dielectric characteristics, and a curable resin composition and a cured product therefrom. This compound is the compound given by formula (1), wherein...
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WO/2023/181838A1 |
The present invention addresses the problem of providing a composition for a resin starting material, in order to obtain a cured product that exhibits excellent dielectric characteristics and also a satisfactory mechanical strength and a...
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WO/2023/172993A1 |
The present teachings relate to a polymer system including a coacervate or precipitate formed through dipole-charge interactions or dipole-dipole interactions such as between a polyelectrolyte and a polyzwitterion, which form a polyzwitt...
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WO/2023/171670A1 |
This resist composition, which generates an acid by being exposed to light and of which the solubility in a developer changes due to the action of the acid, contains a resin component (A1) of which the solubility in a developer changes d...
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WO/2023/171743A1 |
The present invention employs a resist composition containing a resin component that has a constituent unit derived from a compound represented by general formula (a0-1). In formula (a0-1), W01 is a polymerizable group-containing group, ...
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WO/2023/171739A1 |
The present invention employs a resist composition that contains a resin component that has a structural unit derived from a compound represented by general formula (a0-1). In the general formula, Rm is an alkyl group, a halogenated alky...
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WO/2023/171597A1 |
Provided are high-purity styrenesulfonic acids having markedly decreased bound bromine and polymers thereof that are useful as modifiers for secondary batteries, dopants for conductive polymers, additives for semiconductor abrasives and ...
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WO/2023/168218A2 |
The disclosure relates to hydrogen mediated anionically copolymerized conjugated diene vinyl aromatic compositions, copolymers of isoprene and/or butadiene with styrene, and processes and compositions for preparing them.
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WO/2023/163008A1 |
This resist composition contains a resin component (A1) having constituent unit (a01) expressed by formula (a0-1) and constituent unit (a10) expressed by formula (a10-1). R and Rx1 represent a hydrogen atom or the like; Y01, L01, and Yax...
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WO/2023/163084A1 |
Provided are hollow particles that make it possible to remove a hydrophobic solvent contained within the particles at low temperatures. The present invention provides hollow particles that comprise a shell containing a resin and a hollow...
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WO/2023/157526A1 |
Provided are an actinic ray-sensitive or radiation-sensitive resin composition and the like that can form a pattern in which occurrence of defects is suppressed. The present invention pertains to: an actinic ray-sensitive or radiation-se...
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WO/2023/157597A1 |
Provided are hollow resin particles having a shell part and a hollow portion surrounded by the shell part, said hollow resin particles being capable of achieving dielectric lowering and dielectric loss tangent lowering and exhibiting exc...
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WO/2023/149272A1 |
Provided is a resin composition containing a resin B and a colorant A that contains a pigment, wherein the quantity of the colorant A in the total solids content of the resin composition is at least 50 mass%, and the resin B contains a r...
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WO/2023/145936A1 |
In this styrenic polymer production method, a monomer including a styrene compound is polymerized at 110°C or greater in the presence of a reversible addition-fragmentation chain transfer agent and an azo polymerization initiator whose ...
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WO/2023/147183A1 |
A polymer having the structure N+ Ar is a N-containing monocyclic or bicyclic aromatic ring having 1 or 2 N atoms, at least one of the N atoms is substituted with Ra to have a positive charge and the ring is optionally substituted with R...
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WO/2023/120731A1 |
The present invention provides a novel polyelectrolyte membrane and a monomer that has, through a spacer structure, a composite polymer membrane, an ionomer for a solid polymer-type fuel cell, a phosphonate group, and/or a phosphonate es...
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WO/2023/112746A1 |
A resist composition having a solid content concentration of at least 15 mass% contains a polymer compound (A1) having a constituent unit (a10) represented by general formula (a10-1), an onium salt-based acid generator (B1), a crosslinki...
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WO/2023/106364A1 |
A resist underlayer film which is a burned coating film from a composition for resist underlayer film formation, wherein the composition for resist underlayer film formation includes a polymer having a unit structure (A) having a polycyc...
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WO/2023/093598A1 |
The present invention discloses the use of a styrene sulfonium salt polymer containing a repeating unit as shown in the following formula (I) as an acid generator or a photoresist host material. Such a photoresist material has a good sol...
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WO/2023/089982A1 |
The present invention addresses the problem of overcoming issues caused by volatilization of a curing agent during heat curing and issues regarding deterioration in performance of a cured product associated with reduction in the usage am...
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WO/2023/074408A1 |
The purpose of the present invention is to provide: a novel thiophene compound; a method for synthesizing said thiophene compound; and a composition containing said thiophene compound. This composition can be used in coating materials, i...
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WO/2023/068075A1 |
The purpose of the present invention is to provide: a method for producing a semiconductor substrate, the method using a resist underlayer film-forming composition from which it is possible to form a resist underlayer film that has excel...
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WO/2023/063203A1 |
Provided is a resist composition which generates an acid upon exposure to light and for which the solubility in a developing solution changes due to the action of an acid. The resist composition contains a resin component (A1) for which ...
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WO/2023/058781A2 |
The present invention provides a novel naphthalene compound, a synthesis method for said naphthalene compound, and a composition containing said naphthalene compound. This composition can be employed in coating materials, inks, adhesives...
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WO/2023/048163A1 |
The present invention relates to: a multifunctional phenolic compound obtained by carrying out oxidative polymerization of a phenolic compound (A) that is derived from a plant and has a C15-17 unsaturated aliphatic hydrocarbon group, whe...
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WO/2023/032794A1 |
The present invention provides: an actinic ray sensitive or radiation sensitive resin composition containing a compound (C) that generates an acid when being irradiated with an actinic ray or radiation and that is represented by a specif...
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