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WO/2014/182244A1 |
The present invention provides a polymer comprising an aliphatic backbone having a plurality of aromatic rings bonded thereon, said plurality of aromatic rings comprising a first aromatic ring type that has an alkyl halide group substitu...
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WO/2014/156778A1 |
Provided are a curable resin composition suited to the production of transparent resin molded articles having improved moldability, heat resistance, dimensional stability, and productivity, and a method for molding the same, a molded art...
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WO/2014/160604A1 |
The present invention provides coating compositions for forming a toner coating on a substrate containing a polymer comprising: (a) a N-vinyl amide monomer, (b) a vinyl acetate monomer, and (c) a solvent. The coating compositions may fur...
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WO/2014/155807A1 |
Provided is a reflective particle that comprises a resin containing a structural unit that is derived from a compound that is represented by formula (1). In formula (1), R represents a polymerizable group other than a vinyl group, Ar rep...
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WO/2014/156524A1 |
Provided are a compound, actinic-ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, a method for manufacturing an electronic device using the same, and an electronic device, whereby high re...
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WO/2014/148241A1 |
The present invention is a radiation-sensitive resin composition which contains: a polymer having a structural unit that contains a group represented by formula (1); a radiation-sensitive acid generator; and an organic solvent. In formul...
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WO/2014/140987A1 |
A method of producing vinyl polymer particles by suspension polymerization comprising: combining an aqueous media and a tricalcium phosphate to a reaction vessel; adding a p H stabilizing agent to the reaction vessel; adding a vinyl mono...
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WO/2014/142168A1 |
Provided is a liquid crystal aligning agent which exhibits excellent storage stability during refrigerated storage by using a crosslinkable compound that comprises a photoreactive group and has high solubility in liquid crystal aligning ...
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WO/2014/141807A1 |
Provided are: a pattern forming method which achieves excellent sensitivity, resolution, LWR and pattern shape in the formation of a fine pattern having a line width of 60 nm or less; a composition kit; a resist film which uses the compo...
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WO/2014/137134A1 |
The present invention relates to a method for synthesizing core material nanoparticles used for synthesizing hollow nano-silica particles, and the method for synthesizing a nano-core material, comprises the steps of: (a) adding polyvinyl...
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WO/2014/132898A1 |
The present invention produces a terminal-modified polymer by performing a polymerization reaction of a vinyl aromatic monomer and/or a conjugated diene monomer while in the presence of an anionic polymerization initiator, and thereafter...
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WO/2014/132636A1 |
This polymerizable monomer is represented by formula (1).
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WO/2014/132899A1 |
The present invention produces a terminal-modified polymer by performing a polymerization reaction of a vinyl aromatic monomer and/or a conjugated diene monomer while in the presence of an anionic polymerization initiator, and thereafter...
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WO/2014/132703A1 |
A pattern formation method including, in this order: a step (1) for forming a film using an electron-beam-sensitive or extreme-ultraviolet-sensitive resin composition containing a resin (Aa) having a fluorine atom and one or more groups ...
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WO/2014/118339A1 |
The invention relates to an anti-microbial polymer which preferably can be thermoplastically processed, to a method for producing the same and to the use thereof as an anti-microbial finish. The invention further relates to polymer blend...
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WO/2014/111629A1 |
The present invention provides a method of producing polystyrene beads, wherein styrene monomers, and optionally co-monomers, are subjected to a polymerisation reaction in the presence of a polymerisation initiator to produce polystyrene...
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WO/2014/098053A1 |
A curable resin characterized by containing a hydroxystyrene repeating unit which is represented by general formula (1) (wherein Ra represents a hydrogen atom or a methyl group; Rb represents an alkyl group having 1 to 4 carbon atoms; m ...
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WO/2014/098025A1 |
[Problem] To provide a bottom layer film-forming composition used in the bottom layer of a self-organizing film. [Solution] This bottom layer film-forming composition of a self-organizing film contains a polymer that consists of a unit s...
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WO/2014/091052A1 |
The invention relates to a method for producing structured surfaces by means of the controlled formation of creases of variable dimensions. The method is based on light irradiation and simultaneous heating of a photosensitive solution. T...
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WO/2014/088389A1 |
The invention relates to a process in which, once the medium impact polystyrene (waste or virgin) has been characterised, then the polymer can be sulphonated if brought into contact with fuming sulfuric acid (18-24% of SO3) between 70°C...
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WO/2014/065351A1 |
The purpose of the present invention is to provide a photosensitive resin composition which has high refractive index, while exhibiting excellent coatability in cases where the photosensitive resin composition is coated by a liquid-savin...
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WO/2014/065220A1 |
The photosensitive transfer material of the present invention has a support, a thermoplastic resin layer, and a photosensitive resin composition layer in this order, the photosensitive resin composition layer including: a polymer compone...
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WO/2014/061357A1 |
Provided are a high purity sodium p-styrene sulfonate with excellent hue which is useful as a reactive emulsifier or dispersant for producing a polymer emulsion or a synthetic paste for ironing clothes and a sodium polystyrenesulfonate w...
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WO/2014/054785A2 |
The present invention provides an in-plane switching-type liquid crystal display element imparted with a high-efficiency alignment control function, and having excellent burn-in properties. The present invention also provides a manufactu...
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WO/2014/054606A1 |
[Problem] To provide a composition for forming a fine pattern whereby a pattern with a high dry etching tolerance can be formed, and a pattern formation method using the same wherein pipe clogging hardly occurs in the production process....
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WO/2014/055853A1 |
A hierarchical catalyst composition comprising a continuous or particulate macroporous scaffold in which is incorporated mesoporous aggregates of magnetic nanoparticles, wherein an enzyme is embedded in mesopores of the mesoporous aggreg...
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WO/2014/050324A1 |
Provided is a photosensitive resin composition having excellent sensitivity, line-width stability, resolution, and rectangularity. The photosensitive resin composition contains: (A1) a polymer component including a polymer having a struc...
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WO/2014/035121A1 |
The present invention relates to a polymerization composition for an epoxy acrylic optical material and a method for manufacturing an epoxy acrylic optical material, and more specifically to a polymerization composition for an epoxy acry...
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WO/2014/035125A1 |
The present invention relates to a polymerization composition for an epoxy acrylic optical material and a method for manufacturing an epoxy acrylic optical material, and more specifically, to a polymerization composition for an epoxy acr...
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WO/2014/028485A1 |
A method of preparing a trihalide resin, where a trihalide ion solution is contacted with a styrene divinylbenzene polymer resin having polymer bonded -ER3+ X- groups where E is N, P, or As, R is a hydrocarbon group and X is C1, Br, or I...
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WO/2014/020984A1 |
Provided is a photosensitive resin composition which has excellent sensitivity, storage stability and heat-resistant transparency. This photosensitive resin composition contains (A) a polymer component which contains a polymer that satis...
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WO/2014/021086A1 |
This coloring curable composition contains a compound represented by general formula (1). In general formula (1), each of X1-X4 represents a halogen atom; M represents a metal atom, a metal oxide, a metal halide or a non-metal; each of R...
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WO/2014/017618A1 |
There is provided an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin having a repeating unit having a group capable of decomposing by the action of an acid to generate a polar group; (B) a compound c...
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WO/2014/017268A1 |
A resin composition of the present invention includes a polymer compound (A) containing a repeating unit (Q) represented by the following general formula (1): wherein R1 represents a hydrogen atom, a methyl group, or a halogen atom; R2 a...
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WO/2014/001234A1 |
The invention relates to a method for producing vinyl aromatic homopolymers or block copolymers by anionic polymerisation, wherein for the polymerisation of a vinyl aromatic a modified n-alkyl lithium initiator is used which can be obtai...
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WO/2013/183934A1 |
The present invention relates to thermoplastic expandable resin particles on which a nonflammable and insulating film is formed. A nonflammable and insulating film is formed on a surface layer of expandable resin particles by heating a n...
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WO/2013/172967A1 |
The invention provides carriers that enhance the absorption, half-life or bioavailability of therapeutic compounds. The carriers comprise targeting groups that bind the Vitamin D Binding protein (DBP), conjugation groups for coupling the...
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WO/2013/169561A1 |
Process for reducing thermally induced discoloration of fluoropolymer resin produced by polymerizing fluoromonomer in an aqueous dispersion medium to form aqueous fluoropolymer dispersion and isolating said fluoropolymer from said aqueou...
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WO/2013/165806A1 |
A method for casting a styrenic fluoropolymer film on a substrate includes preparing a polymer solution by dissolving the fluoropolymer in a solvent or solvent blend whose Hansen solubility parameters (HSPs, MPa1/2) satisfy the following...
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WO/2013/158224A1 |
Initiated chemical vapor deposition is used to prepare superhydrophobic and oleophobic surfaces by grafting poly(perfluoroalkyl acrylate) chains on silicon substrates. The grafting enhances the formation of the crystalline phase. The cry...
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WO/2013/146812A1 |
Provided is an active-light-sensitive or radiation-sensitive composition capable of forming a pattern, the composition simultaneously offering high sensitivity, high resolution, high time stability, reduced scum generation, and excellent...
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WO/2013/146934A1 |
A method for producing an aromatic vinyl compound polymer having a syndiotactic structure using a powder bed continuous polymerization device, said method comprising polymerizing an aromatic vinyl monomer in the presence of a catalyst co...
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WO/2013/141376A1 |
Provided are: a protectant of carboxyl groups or hydroxyl groups having excellent storage stability; a resin in which carboxyl groups or hydroxyl groups are protected by the protectant, the resin having excellent storage stability; a pho...
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WO/2013/131479A1 |
The present invention relates to a new macromolecular photo-acid generator based on poly(p-hydroxy styrene) (PHS), the synthesis process and use thereof in a chemically amplified photoresist. The poly(p-hydroxy styrene) derivate contains...
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WO/2013/129695A1 |
An object of the present invention is to provide a cyan toner having a high coloring ability, enabling suppression of fogging, and having high transfer efficiency. The object can be attained by a toner including toner particles containin...
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WO/2013/129976A1 |
The invention relates to the technique of producing polymer granules for use in manufacturing ion exchange resins. The method involves feeding an emulsion of monodisperse drops into a reactor, agitating the emulsion until it reaches the ...
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WO/2013/129975A1 |
The invention relates to technology for the production of polymer granules used for producing ion-exchange resins. The reactor comprises a housing having at least one inlet for introducing an emulsion of monodisperse droplets in an aqueo...
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WO/2013/122853A1 |
A method for the preparation of a fluoropolymer by means of emulsion polymerization of a reaction mixture in an aqueous medium is disclosed wherein the reaction mixture includes a fluoromonomer having the structure of (I), wherein R1, R2...
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WO/2013/114866A1 |
The present invention provides a flame retardant that can be used as a polymer, or a novel material that can be used as a raw material for a flame retardant. In particular, the present invention provides a compound represented by formula...
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WO/2013/116818A1 |
Novel polyphthalate compounds that do not release phthalate esters under environmental conditions, and methods for making the same.
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