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Patent Searching and Data


Matches 751 - 800 out of 3,738

Document Document Title
JP5333685B2
Provided is a liquid crystal alignment layer that has a compound represented by general formula (I) as a constituent (in the formula: L represents a polymerizable group; Sp1 and Sp2 represent spacer units; A01 and A02 each independently ...  
JP2013224442A
To provide a high molecular weight fumarate polymer, particularly diisopropyl fumarate polymer.A diisopropyl fumarate polymer is characterized by having a malate content of ≤0.3 wt.%.  
JP2013217964A
To provide a dichroic dye material which is excellent in absorption characteristics in the long wavelength side of a visible light region and is improved in solubility to a solvent to be incorporated into a liquid crystalline composition...  
JP5324080B2
To provide a new fluorene skeleton-having urethane (meth)acrylate excellent in hardness, heat resistance, and the like. The new fluorene skeleton-having urethane (meth)acrylate is obtained by reacting a specific fluorene skeleton-having ...  
JP2013211348A
To provide a chip protection coat formation film excellent in adhesiveness with a wafer and capable of satisfactory suppressing warp of the wafer.A chip protection coat formation film includes a protection coat formation layer 1 containi...  
JP2011530618A5  
JP5301070B2
To prevent the deterioration of a resist film and the deterioration of an immersion liquid at the same time in the liquid immersion lithography using various immersion liquids including water without increasing the number of processing s...  
JP5298497B2
To provide a method for producing a new N-alkylmaleimide-based polymer which has excellent heat resistance and transparency and is suitable for an optical material. The method for producing the N-alkylmaleimide-based polymer is character...  
JP2013182077A
To provide a positive photosensitive resin composition excellent in sensitivity, a residual film rate and a dielectric constant.The photosensitive resin composition comprises: (A) a polymer component including (a1) a repeating unit havin...  
JP2013181126A
To provide a new compound, a polymer compound and use methods thereof.There is provided a compound of formula (1-1), where in the formula, Y1 and Y2 are each independently a single bond or a bivalent linking group; R1 and R2 are each ind...  
JP2013180260A
To provide a waste water treatment method in which an inorganic coagulant is not added or an addition amount is reduced, and that obtains treated water with high clarity.A waste water treatment method includes: a first flocculation proce...  
JP5284866B2  
JP2013174660A
To provide a photosensitive resin composition having high sensitivity, a low dielectric constant and an excellent exposure margin.The photosensitive resin composition comprises: (A) a polymer component satisfying at least one of the foll...  
JP5280599B2  
JP2013533321A
The present invention relates to a method and polymer based on a vinyl system monomer containing a pendant carboxylic acid group and an ester functional group. A polymerization method includes adjusting a flow of heat and adjusting a par...  
JPWO2011158593A1
下記一般式(1)で表されるマレイミド誘導 体を含有することを特徴とする光硬化性イン クジェットインク。【化1】  
JPWO2011158593A
Optical hardenability ink-jet ink containing a maleimide derivative denoted by the following general formula (1). [Formula 1]  
JP5265400B2
A polymeric, phosphorus-containing composition made by heating, in the presence of an initiator, preferably a free radical initiator, and optionally in the presence of one or more comonomers, at least one ethylenically substituted phosph...  
JP5245118B2  
JP2013139563A
To provide a graft copolymer having sidechains including a polymer capable of exhibiting a lower critical solution temperature (LCST), and to provide a manufacturing method thereof, a rubber composition, and a tire.The copolymer includes...  
JP2013137537A
To provide an actinic ray-sensitive or radiation-sensitive composition simultaneously satisfying high resolution properties (high resolving power etc.), high sensitivity, preferable pattern shapes and preferable exposure latitude (EL), a...  
JP5228327B2  
JPWO2011108665A1
本発明の課題は、ライン幅のばらつきの発生 を抑制して、所望形状のパターンを精度良く 形成することのできる化学増幅型レジストを 与える感放射線性樹脂組成物及びそれを...  
JPWO2011108665A
The subject of the present invention is providing the resist pattern formation method using the radiation-sensitive resin composition and it which give the chemicals amplification type resist which can control generating of the variation...  
JPWO2011108520A
The present invention is a charge of skin material containing the ingredient chosen from the silicone ingredient content polymer produced by polymerizing the silicone monomer which has a carbon * carbon double bond, antibacterial medicin...  
JPWO2011108520A1
本発明は、炭素−炭素二重結合を有するシリ コーンモノマーを重合して得られるシリコー ン成分含有重合体、並びに抗菌剤およびアル コールから選ばれた成分を含む皮膚用材...  
JP2013122913A
To provide a battery excellent in adhesion between a collector and an electrode mixture layer, an electrode and slurry for the electrode for the battery in a system containing a polyacrylonitrile resin as a binder, and to provide a homog...  
JP5217522B2  
JP2013109236A
To provide a photosensitive resin composition that can absorb infrared rays, can be patterned even in a thick film state and can be cured at low temperature, and to provide a film and an electronic component.The photosensitive resin comp...  
JP2013109235A
To provide a photosensitive resin composition that enables the formation of a fine pattern even when the resin composition is formed into a film having a large thickness, has an excellent visible light transmissivity, and also has excell...  
JP2013107970A
To provide a method for producing an aqueous resin dispersion excellent in stability, even upon a large scale production, without viscosity increase in an emulsion and generation of a large amount of aggregates etc. when producing a poly...  
JP2013092723A
To provide a resist composition showing a high dissolution contrast by organic solvent development and having high sensitivity, and to provide a method for forming a pattern for forming a hole pattern through a positive-negative reversal...  
JP2013091791A
To provide a substrate insulating layer composition, and a prepreg and a substrate using the same.The substrate insulating layer composition includes a soluble liquid crystal thermosetting oligomer, an alkoxide metal compound, and graphe...  
JP2013087109A
To provide a polymerizable chiral compound having a strong HTP and excellent in solubility.The polymerizable chiral compound expressed by General Formula (1) has the strong HTP and a low melting point, has the excellent solubility with o...  
JP2013515825A
It is the hydrophilic macroscopic monomer which carried out high polymerization, and hardly has after a polymerization a composition ingredient which is not combined with a polymer chain, and obtain a hydrophilic macroscopic monomer mixt...  
JP2013514453A
The ester of itaconic acid is polymerized under a seed particle child's existence among a water medium. The seed particle child can absorb the monomer and can realize the polymerization to desired particle diameter. The generated polymer...  
JP5182876B2  
JP5180223B2  
JP5180440B2  
JP2013511614A
In this specification, the manufacturing method of the reactant solution of the polymer containing the reactive functional group which can be polymerized and which can be polymerized is indicated. In a way method, the polymer containing ...  
JP2013061599A
To provide a negative resist composition that has excellent physical properties including photosensitivity, adhesion with a substrate, developability, heat resistance, and transparency, has excellent image forming performance and surface...  
JP2013060424A
To provide a resist composition that can produce resist patterns with excellent resolution.This resist composition includes a resin insoluble or hardly soluble in an alkaline aqueous solution, but soluble in the alkaline solution by the ...  
JP5175052B2  
JP5170275B2  
JP2013053082A
To provide a polymerizable compound with excellent curing capability and a composition containing the same.A (meth)acrylamide compound that has a particular structure shown by general formula (I), and a composition that contains the same...  
JP5162985B2  
JP2013506647A
General structure: In an OLED compound of B*S*A*S*B, it is cylindrical core A, Condensation aromatic series ring structure is included and it is this condensation aromatic series ring structure, An OLED compound, wherein it includes at l...  
JP2013035942A
To provide a resist composition excellent in lithography characteristics, a novel polymer useful as the resist composition, and a method for forming a resist pattern using the resist composition.The polymer has an anion site to generate ...  
JP2013032434A
To provide a resist composition having excellent lithography properties and pattern shapes and a new compound useful as the resist composition, and to provide a method for forming a resist pattern using the resist composition.A polymer h...  
JP2013033208A
To provide a member suitable for manufacturing an organic electroluminescence (EL) element characterized in that light radiated from a light-emitting layer can be effectively extracted to the outside in a lighting device or a display usi...  

Matches 751 - 800 out of 3,738