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Matches 801 - 850 out of 3,774

Document Document Title
JP5228327B2  
JPWO2011108665A1
本発明の課題は、ライン幅のばらつきの発生 を抑制して、所望形状のパターンを精度良く 形成することのできる化学増幅型レジストを 与える感放射線性樹脂組成物及びそれを...  
JPWO2011108665A
The subject of the present invention is providing the resist pattern formation method using the radiation-sensitive resin composition and it which give the chemicals amplification type resist which can control generating of the variation...  
JPWO2011108520A
The present invention is a charge of skin material containing the ingredient chosen from the silicone ingredient content polymer produced by polymerizing the silicone monomer which has a carbon * carbon double bond, antibacterial medicin...  
JPWO2011108520A1
The present invention is a charge of skin material containing the ingredient chosen from the silicone ingredient content polymer produced by polymerizing the silicone monomer which has a carbon * carbon double bond, antibacterial medicin...  
JP2013122913A
To provide a battery excellent in adhesion between a collector and an electrode mixture layer, an electrode and slurry for the electrode for the battery in a system containing a polyacrylonitrile resin as a binder, and to provide a homog...  
JP5217522B2  
JP2013109236A
To provide a photosensitive resin composition that can absorb infrared rays, can be patterned even in a thick film state and can be cured at low temperature, and to provide a film and an electronic component.The photosensitive resin comp...  
JP2013109235A
To provide a photosensitive resin composition that enables the formation of a fine pattern even when the resin composition is formed into a film having a large thickness, has an excellent visible light transmissivity, and also has excell...  
JP2013107970A
To provide a method for producing an aqueous resin dispersion excellent in stability, even upon a large scale production, without viscosity increase in an emulsion and generation of a large amount of aggregates etc. when producing a poly...  
JP2013092723A
To provide a resist composition showing a high dissolution contrast by organic solvent development and having high sensitivity, and to provide a method for forming a pattern for forming a hole pattern through a positive-negative reversal...  
JP2013091791A
To provide a substrate insulating layer composition, and a prepreg and a substrate using the same.The substrate insulating layer composition includes a soluble liquid crystal thermosetting oligomer, an alkoxide metal compound, and graphe...  
JP2013087109A
To provide a polymerizable chiral compound having a strong HTP and excellent in solubility.The polymerizable chiral compound expressed by General Formula (1) has the strong HTP and a low melting point, has the excellent solubility with o...  
JP2013515825A
It is the hydrophilic macroscopic monomer which carried out high polymerization, and hardly has after a polymerization a composition ingredient which is not combined with a polymer chain, and obtain a hydrophilic macroscopic monomer mixt...  
JP2013514453A
The ester of itaconic acid is polymerized under a seed particle child's existence among a water medium. The seed particle child can absorb the monomer and can realize the polymerization to desired particle diameter. The generated polymer...  
JP5182876B2  
JP5180223B2  
JP5180440B2  
JP2013511614A
In this specification, the manufacturing method of the reactant solution of the polymer containing the reactive functional group which can be polymerized and which can be polymerized is indicated. In a way method, the polymer containing ...  
JP2013061599A
To provide a negative resist composition that has excellent physical properties including photosensitivity, adhesion with a substrate, developability, heat resistance, and transparency, has excellent image forming performance and surface...  
JP2013060424A
To provide a resist composition that can produce resist patterns with excellent resolution.This resist composition includes a resin insoluble or hardly soluble in an alkaline aqueous solution, but soluble in the alkaline solution by the ...  
JP5175052B2  
JP5170275B2  
JP2013053082A
To provide a polymerizable compound with excellent curing capability and a composition containing the same.A (meth)acrylamide compound that has a particular structure shown by general formula (I), and a composition that contains the same...  
JP5162985B2  
JP2013506647A
General structure: In an OLED compound of B*S*A*S*B, it is cylindrical core A, Condensation aromatic series ring structure is included and it is this condensation aromatic series ring structure, An OLED compound, wherein it includes at l...  
JP2013035942A
To provide a resist composition excellent in lithography characteristics, a novel polymer useful as the resist composition, and a method for forming a resist pattern using the resist composition.The polymer has an anion site to generate ...  
JP2013032434A
To provide a resist composition having excellent lithography properties and pattern shapes and a new compound useful as the resist composition, and to provide a method for forming a resist pattern using the resist composition.A polymer h...  
JP2013033208A
To provide a member suitable for manufacturing an organic electroluminescence (EL) element characterized in that light radiated from a light-emitting layer can be effectively extracted to the outside in a lighting device or a display usi...  
JP2013032398A
To provide polymerizable dimethicone copolyol macromers containing ethylenic unsaturation and to provide polymers obtained therefrom.The dimethicone copolyol polymers are synthesized from the dimethicone copolyol macromers. Polymers cont...  
JP2013028725A
To provide a curable resin composition capable of forming a cured product having flame retardancy and resistance to bleed, without ruining flexibility and insulation.The curable resin composition contains a carboxy group-containing (meth...  
JP2013023654A
To provide a low resistance electrode excellent in adhesiveness of an active substance layer to a collecting body, and a low resistance to the collecting body by having a carbon coat foil layer obtained by coating the carbon coat coating...  
JPWO2011024545A
[Subject] Offer of a photosensitive resin composition for micro lenses. [Means for Solution] (A) A photosensitive resin composition for micro lenses containing an ingredient, the (B) ingredient, and the (C) ingredient. (A) Ingredient: A ...  
JP2003505561A5  
JPWO2011024545A1
【課題】マイクロレンズ用感光性樹脂組成物 の提供。【解決手段】(A)成分、(B)成 分、及び(C)成分を含有するマイクロレン ズ用感光性樹脂組成物。(A)成分:下...  
JP2012509377A5  
JP5109085B2  
JP5107225B2  
JP2012241046A
To provide a composition which is a photo-curable composition including a maleimide derivative, and has high photo-curable properties and a low viscosity.The photo-curable composition includes a maleimide derivative expressed by a genera...  
JP2012530732A
The present invention relates to the manufacturing method of the use and the above-mentioned compound as the new compound which has the fluorinated end group, and a surface-active agent substance.  
JP2012219173A
To provide: a water absorbent polymer capable of absorbing water to form aqueous gel, in particular a water absorbent polymer hardly changing its water absorption quantity even by fluctuation of salt concentration in an aqueous solution;...  
JP2007535596A5  
JP5051134B2  
JP2012193325A
To provide a polybismaleimide crosslinked fine particle having a particle diameter in the range of 10 nm-10 μm and excellent monodispersity, and a method for producing the same.The polybismaleimide crosslinked fine particle simultaneous...  
JP5042885B2  
JP2012185947A
To provide a binder composition for a nonaqueous secondary battery electrode, which can produce a nonaqueous secondary battery that has superior adhesiveness with a collector and maintains high discharge capacity even though discharge an...  
JP2012181502A
To provide a colored radiation-sensitive composition capable of forming a colored pattern that shows excellent developability, is excellent in heat resistance and solvent resistance, and reduces color migration and color unevenness.A col...  
JP5028974B2  
JP2012521444A
Use of aqueous solution of non-ionic surfactants as gel phase-free emulsifier systems for the emulsion polymerization, is claimed, where the non-ionic surfactants are (a) addition products from 1-40 mole of ethylene- and/or propylene-oxi...  
JPWO2010103765A1
The polymerization monomer by which at least one of Ar1*Ar3 is the basis replaced with the following formula (2) in a following formula (1), and the basis containing one or more polymerization functional groups was replaced further. Ar1*...  

Matches 801 - 850 out of 3,774