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JP2008013772A |
To provide a curable composition containing a liquid maleimide compound and a maleimide compound.The new thermosetting resin composition does not need a solvent for giving a system having viscosity suitable for easy handling. The composi...
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JP4033909B2 |
In accordance with the present invention, there are provided novel compositions based on a defined maleimide moiety. Invention compositions have excellent moisture resistance (and, hence are much less prone to give rise to "popcorning"),...
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JP4033826B2 |
A photoresist resin of the invention contains at least a constitutional repeating unit A containing a group capable of partially leaving by the action of an acid to thereby become soluble in an alkali, and a constitutional repeating unit...
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JP4029440B2 |
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JP4026036B2 |
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JP4021483B2 |
The novel acrylic ester, allyl ether and allyl carbonate of the present invention are characterized by having the structures represented by the following general formulae (I) to (IV): The above acrylic ester, allyl ether and allyl carbon...
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JPWO2005044777A1 |
The (meth) acrylate compound represented by the following general formula (1) and the curable composition containing the (meth) acrylate compound can be used for various uses such as resist inks, paints, and molding materials. In additio...
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JP4012600B2 |
A resist composition includes a polymer principal chain, a carboxyl group having a protective group and bonding to a side chain of the polymer main chain, and an additional acidic functional group having an acid-cleavable protective grou...
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JP2007297548A |
To provide an acid anhydride group-containing vinylic polymer affording a coated film having good thermal yellowing resistance even when used in an acid/epoxy curing-based clear coating and to provide a method for production according to...
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JP2007291056A |
To provide a multi-functional vinylcyclopropane compound suitable for a holographic recording, a holographic recording composition, an optical recording medium and method of optically recording. This cyclopropane compound expressed by st...
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JP3999927B2 |
A vinylidene fluoride copolymer containing a carboxyl group or a carbonate group is formed by copolymerizing a monomer principally comprising vinylidene fluoride with a relatively small amount of an unsaturated dibasic acid monoester or ...
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JP4001445B2 |
A cross-linking monomer represented by the following Chemical Formula 1, process for preparing a photoresist polymer using the same, and said photoresist polymer: ```wherein, R' and R'' individually represent hydrogen or methyl; m repres...
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JP3989270B2 |
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JP3988552B2 |
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JP3975790B2 |
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JP3951039B2 |
To provide a solid electrolyte which can be cross-linked even at a low temperature. In a solid electrolyte containing cross-linked matter of alkylene oxide polymer having double bonds which can be polymerized with terminals and/or side c...
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JP3948799B2 |
To obtain a new compound of a polymerizable compound having tri(meth)acrylic structure and useful for an optical use, a display, a recording material or the like. This compound is a compound of formula I [R1 is H or methyl; (1) is 0-14; ...
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JP3945220B2 |
To provide a porous heat-resistant polymer having a low dielectric constant and, simultaneously, a small pore diameter to be used in electronic parts, and a polymer composition to form a crosslinked structure. The porous polymer is the o...
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JP3942263B2 |
To obtain a polymer compound useful for a chemically amplified positive resist material excellent in sensitivity, resolution, plasma etching resistance, etc., by substituting a part or the whole of the H atoms of the OH groups and/or COO...
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JP3942477B2 |
To obtain a maleimide compound which cures by practical light irradiation dose without using a photopolymerization initiator or by using it in an amount less than previous usage, a resin composition containing the compound and its cured ...
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JP3938896B2 |
To provide an alkali-soluble maleimide copolymer which excels in thermal heat yellowing resistance, has high hardness and excels in solubility in a solvent, is easy to form a uniform coating film, and has uncured portions sufficiently so...
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JP3932106B2 |
To provide a resin composition which is used for optical disks and can impart excellent durability (reliability), when used as a coating for protecting the recording films of optical disks and as an adhesive for laminating two disk subst...
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JP2007515538A |
The invention provides a process for synthesising functionalised chain transfer polymers of Formula (1) or Formula (2) using thiocarbonyl thio compounds as chain transfer agents. Why R1 is a moiety comprising a functional group; Q is obt...
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JP3918991B2 |
To provide a resin composition excellent in processability which gives a cured product suitable for an optical waveguide excellent in heat resistance, and a cured product thereof. The polymerizable compound has in the molecule a hydrogen...
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JP2007105486A |
To provide a new alkyl cyanoacrylate adhesive composition suitable for local application to the skin of a human being.An alkyl cyanoacrylate adhesive composition includes at least one kind of alkyl cyanoacrylate, a biocompatible plastici...
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JP3904064B2 |
To provide a resist material which is sensitive to high energy beams, particularly excellent in sensitivity at ≤170 nm wavelength and which has improved transparency of a resist and excellent plasma etching resistance. A high polymer c...
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JP2007086285A |
To provide a resist composition for excellently resolving a line and space pattern in liquid immersion exposure by improving resolution and line edge roughness in the resist composition and a pattern forming method using it used in a sem...
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JP3900987B2 |
To provide a liquid crystal polymer made of a polymerizable and optically active fumaric diester, high in light resistance, heat resistance, and mechanical strength, and to provide a light compensation film, an optically writable recordi...
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JP3897088B2 |
To obtain a new polymer compound useful as a base polymer for chemically amplified resist material with excellent transmittance to vacuum UV rays, to obtain a chemically amplified resist material comprising the polymer compound, and to p...
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JP2007056084A |
To provide a method for producing a single-layer or multi-layer film excellent in gas barrier properties, capable of effectively producing the film through a simple procedure, and to provide the single-layer or multi-layer gas barrier fi...
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JP3890521B2 |
To provide an acrylic cationic polymeric flocculant having a high flocclation capacity against sludge rich in organic matter. This acrylic cationic polymeric flocculant comprises a mixture containing homopolymers of respectively comprisi...
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JP3888163B2 |
To provide a (meth)acrylate compound hardly influenced by inhibition by oxygen when cured while maintaining a curing speed, a method for manufacturing the compound, and a polymerizable composition containing the compound. The modified (m...
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JP3884090B2 |
PURPOSE: To provide an aq. free-radical addition polymn. process for producing a water-soluble polymer wherein a base, a metal promotor, and a water-soluble initiator are added to a reaction mixture contg. a dicarboxylic acid monomer; a ...
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JP3878688B2 |
To obtain a film which is excellent in heat resistance, clarity, and adhesion to inorg. and org. compds. and has a low birefringence by forming it from a maleimide-olefin copolymer having a specified mol.wt. and comprising specific struc...
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JP2007016244A |
To provide a cleaning composition produced by an efficient method for producing a polymer product containing an unreacted dicarboxylic acid monomer in an amount of less than about 1.5 wt.% based on the total amount of the polymer product...
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JP2007017726A |
To provide a positive radiation-sensitive polymer composition developable with an alkaline aqueous solution, having high sensitivity and high resolution, and capable of forming a pattern form thin film that is superior in flatness, heat ...
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JP2007500767A |
Self-photoinitiating liquid oligomeric compositions are disclosed. The oligomeric compositions are formed from multifunctional mercaptans and Michael addition polyacrylate resins, synthesized from multifunctional acrylates and beta-dicar...
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JP3865890B2 |
To obtain a positive photosensitive compsn. which imparts satisfactory sensitivity and resolution at the time of using a light source of ≤220 nm for exposure and has satisfactory dry etching resistance, adhesion to a substrate and deve...
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JP3852395B2 |
To provide a 2-cyanoacrylate composition which changes its color according to curing: before the curing, it has good visibility and excellent workability since it is colored and after the curing, it becomes colorless or light-colored, ex...
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JP3835523B2 |
To obtain a new polymer compound useful as a base polymer for chemically amplified resist material with excellent transmittance to vacuum UV rays, to obtain a chemically amplified resist material comprising the polymer compound, and to p...
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JP3832564B2 |
To provide a polymer compound which, as a resist material, is excellent in sensitivity to high-energy rays, especially, to one having a wavelength of 170 nm or lower, has an improved plasma etching resistance because of fluorine-containi...
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JP3832301B2 |
To obtain a polymerizable liquid crystalline diester of fumaric acid, and further to provide a macromolecule thereof having excellent mechanical strength and heat resistance. This liquid crystalline diester of the fumaric acid is represe...
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JP2006259621A |
To provide a polarizer protection film having excellent transparency, moisture resistance and heat resistance, having a small photoelastic coefficient, and moreover, excellent film conveying property, film processability and rework prope...
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JP3827637B2 |
To provide a preparation process of a polymer which prevents gelling and gives uniform polymers of stable quality. The preparation process requires a monomer component and a polymerization initiator as necessary source materials and comp...
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JP3824284B2 |
To raise Q value, self-resonance frequency, to make less susceptible to the effect from outside magnetic field at mounting time, and to raise heat- resistance temperature, by allowing a resin dielectrics to comprise, as a monomer, a high...
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JP3821601B2 |
To provide a new acrylic acid ester derivative having high transparency, mechanical properties and heat-resistance and low water-absorption and useful as a material for optical parts requiring low birefringence such as an optical disk ba...
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JP2006519891A |
The method comprises photopolymerizing by means of a light radiation of the visible and/or near UV field of a composition free of mineral particles, comprising at least one photopolymerizable monomer and at least one photoinitiator selec...
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JP3801207B2 |
A process for producing a photochromic cured product by allowing an unpurified, impurities-containing polyfunctional (meth)acrylate monomer such as unpurified polyalkylene glycol dimethacrylate and a photochromic spirooxazine compound to...
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JP3797223B2 |
A microlens array comprising a laminate of a resin layer of high refractive index and a resin layer of low refractive index, wherein the resin layer of high refractive index contains as a component di(meth)acrylates of fluorene derivativ...
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JP3785992B2 |
To provide an interlaminar strength-improving agent which is used on the production of combination paper, has a particle size that is larger than the particle size of a polyion complex or emulsion and is approximately the same as the par...
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