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JP2016196588A |
To provide an addition copolymer having a small linear expansion coefficient and excellent low birefringence, a molding material containing the addition copolymer, and a resin molding obtained by molding the molding material.The addition...
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JP6028580B2 |
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JP6006457B2 |
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JP2016177012A |
To provide a photosensitive resin composition allowing stable manufacture of an electronic device while having excellent low-temperature curing property.The photosensitive resin composition comprises an alkali-soluble resin (A) and a cro...
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JP2016169349A |
To provide a method for efficiently producing a cast film of an addition polymer of a norbornene compound which is excellent in transparency and has excellent slipperiness (film-winding properties).There is provided a method for producin...
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JP2016161938A |
To provide a negative photosensitive resin composition, a photocuring pattern formed using the same, and an image display device.This invention relates to a negative photosensitive resin composition having excellent substrate adhesion, c...
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JP2016525219A |
A photosensitive composition which contains useful poly norbornene (PNB) polymer and a specific additive agent in the present invention forming microelectronics and/or an opto-electronics device, and its assembly object, It is related wi...
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JP5964236B2 |
Embodiments of the present disclosure encompass vinyl addition and ROMP polymers having at least one type of repeating unit that encompasses a comprise N+(CH3)3OH− moiety. Other embodiments in accordance with the disclosure include alk...
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JP5947809B2 |
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JP5936437B2 |
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JP2016089170A |
To provide a high heat resistant alicyclic olefin (co)polymer without gel content.There is provided an alicyclic olefin (co)polymer obtained by polymerizing a monomer component containing non-conjugated alicyclic diene (A1) and/or non-co...
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JP2016061933A |
A resist composition is provided, which comprises: a polymer containing a repeating unit that has a carboxyl group unsubstituted or substituted with an acid-labile group and/or a hydroxy group unsubstituted or substituted with an acid-la...
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JP2016056275A |
To provide a copolymer having excellent toughness while having high optical properties and heat resistance.The present invention provides a copolymer of cycloolefin and 1-alkene comprising 1-alkene-derived units of more than 21.6 mol% an...
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JP2016040372A |
To provide a manufacturing method of a copolymer of cyclic and non-cyclic conjugated diene monomers by using a catalyst composition of a transition metal and a lanthanide metal and a rubber composition containing the copolymer.There is p...
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JP2016037577A |
To provide a solution containing a norbornene-based polymer having a high glass transition temperature, and also a low relative dielectric constant and a low dielectric loss tangent.The norbornene-based polymer solution comprises a norbo...
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JP5867735B2 |
There is provided a photosensitive resin composition for forming a microlens. A photosensitive resin composition for forming a microlens, the photosensitive resin composition comprising: a component (A), a component (B), a component (C) ...
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JP5864966B2 |
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JP5860193B2 |
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JP5842893B2 |
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JP2016000792A |
To provide a pneumatic tire having improved dry grip performance, wear resistance performance, and anti-chunking performance in a balanced manner.A pneumatic tire comprises a tread composed of a rubber composition comprising a rubber com...
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JP5835228B2 |
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JP2015221874A |
To provide a method for producing a copolymer, which enables a copolymer having excellent mechanical characteristics and having a molecular weight suitable for usual fabrication to be obtained with less amount of a catalyst in better yie...
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JP5828700B2 |
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JP2015534598A |
A useful constituent is indicated by formation of a self-development film including various cycloolefin / maleic anhydride polymer which has a maleimide pendant machine, and such a copolymer. Some are Ring-opening (ed) even if this polym...
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JP5822225B2 |
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JP5814503B2 |
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JP5803035B2 |
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JP2015184325A |
To obtain a photosensitive resin composition having an excellent balance between stability with time and mechanical characteristics of a cured film.The photosensitive resin composition is used for forming a permanent film and comprises a...
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JP2015183024A |
To provide a photosensitive resin composition that can suppress generation of an undercut in patterning for forming an interlayer insulating film that constitutes an electronic device.A polymer having a structural unit represented by for...
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JP5787624B2 |
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JP5771905B2 |
Provided is a radiation-sensitive resin composition for immersion exposure, a curing pattern forming method and a curing pattern ideally used in an immersion exposure process for exposing a resist film via a liquid for immersion exposure...
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JP5761863B2 |
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JP5759542B2 |
The present invention relates to a photo-reactive norbornene-based copolymer which has superior miscibility to various organic solvents or additives while exhibiting superior liquid crystal alignment property and can be preferably used t...
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JP2015132779A |
To provide a photosensitive resin composition from which such a pattern film can be formed that maintains a high development residual film rate while having no development residue in the forming process of the pattern film, has excellent...
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JP5738097B2 |
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JP5736038B2 |
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JP5728762B2 |
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JP5728790B2 |
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JP5729079B2 |
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JP2015094910A |
To provide a radiation-sensitive resin composition which gives a resin film excellent in exposure sensitivity and excellent in reliability under a high-temperature and high-humidity environment, and to provide a laminate including a resi...
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JP5712963B2 |
A polymer for use in resist compositions is obtained from a monomer having formula (1) wherein R1 is methyl, ethyl, propyl, vinyl or ethynyl, the circle designates C3-C12 cycloalkyl, a combination wherein R1 is ethyl and the circle is cy...
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JP2015067822A |
To provide a resin composition which is excellent in temporal stability of dielectric characteristics and heat resistance and provides a crosslinked body excellent in transparency, mechanical characteristics and a balance between dielect...
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JPWO2013005429A |
A forming object of the present invention is used for an optical component chosen from ftheta lens, an image pick-up lens, or a light guide plate, and contains polymer which has alicyclic structure in a part or all of a repetition struct...
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JPWO2013005429A1 |
本発明の成形体は、ｆθレンズ、撮像レンズ
たは導光板から選ばれる光学部品に用いら
、繰り返し構造単位の一部または全部に脂
式構造を有するポリマーを含む。そし...
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JP2015025126A |
To provide a modifier and a compatibilizing material for modifying an engineering plastic such as a polyamide or compatibilizing an engineering plastic with a polyolefin-based resin and to provide a resin composition containing each comp...
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JP2015025987A |
To provide a resist protective film material that can prevent an overhang of a resist pattern caused by amine contamination in air and has a sensitizing effect on the resist film and thereby, can improve sensitivity of a resist film.The ...
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JP2015025880A |
To provide a novel resist pattern forming method capable of improving nano-edge roughness and capable of suppressing the occurrence of outgassing while sufficiently satisfying sensitivity.The present invention is the resist pattern formi...
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JP5664576B2 |
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JP5663721B2 |
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JP2015007762A |
To provide a negative photosensitive resin composition excellent in balance between resolution and time required for pattern formation, and to provide an electronic device and a polymer.There is provided the negative photosensitive resin...
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