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Patent Searching and Data


Matches 451 - 500 out of 2,277

Document Document Title
JP2016196588A
To provide an addition copolymer having a small linear expansion coefficient and excellent low birefringence, a molding material containing the addition copolymer, and a resin molding obtained by molding the molding material.The addition...  
JP6028580B2  
JP6006457B2  
JP2016177012A
To provide a photosensitive resin composition allowing stable manufacture of an electronic device while having excellent low-temperature curing property.The photosensitive resin composition comprises an alkali-soluble resin (A) and a cro...  
JP2016169349A
To provide a method for efficiently producing a cast film of an addition polymer of a norbornene compound which is excellent in transparency and has excellent slipperiness (film-winding properties).There is provided a method for producin...  
JP2016161938A
To provide a negative photosensitive resin composition, a photocuring pattern formed using the same, and an image display device.This invention relates to a negative photosensitive resin composition having excellent substrate adhesion, c...  
JP2016525219A
A photosensitive composition which contains useful poly norbornene (PNB) polymer and a specific additive agent in the present invention forming microelectronics and/or an opto-electronics device, and its assembly object, It is related wi...  
JP5964236B2
Embodiments of the present disclosure encompass vinyl addition and ROMP polymers having at least one type of repeating unit that encompasses a comprise N+(CH3)3OH− moiety. Other embodiments in accordance with the disclosure include alk...  
JP5947809B2  
JP5936437B2  
JP2016089170A
To provide a high heat resistant alicyclic olefin (co)polymer without gel content.There is provided an alicyclic olefin (co)polymer obtained by polymerizing a monomer component containing non-conjugated alicyclic diene (A1) and/or non-co...  
JP2016061933A
A resist composition is provided, which comprises: a polymer containing a repeating unit that has a carboxyl group unsubstituted or substituted with an acid-labile group and/or a hydroxy group unsubstituted or substituted with an acid-la...  
JP2016056275A
To provide a copolymer having excellent toughness while having high optical properties and heat resistance.The present invention provides a copolymer of cycloolefin and 1-alkene comprising 1-alkene-derived units of more than 21.6 mol% an...  
JP2016040372A
To provide a manufacturing method of a copolymer of cyclic and non-cyclic conjugated diene monomers by using a catalyst composition of a transition metal and a lanthanide metal and a rubber composition containing the copolymer.There is p...  
JP2016037577A
To provide a solution containing a norbornene-based polymer having a high glass transition temperature, and also a low relative dielectric constant and a low dielectric loss tangent.The norbornene-based polymer solution comprises a norbo...  
JP5867735B2
There is provided a photosensitive resin composition for forming a microlens. A photosensitive resin composition for forming a microlens, the photosensitive resin composition comprising: a component (A), a component (B), a component (C) ...  
JP5864966B2  
JP5860193B2  
JP5842893B2  
JP2016000792A
To provide a pneumatic tire having improved dry grip performance, wear resistance performance, and anti-chunking performance in a balanced manner.A pneumatic tire comprises a tread composed of a rubber composition comprising a rubber com...  
JP5835228B2  
JP2015221874A
To provide a method for producing a copolymer, which enables a copolymer having excellent mechanical characteristics and having a molecular weight suitable for usual fabrication to be obtained with less amount of a catalyst in better yie...  
JP5828700B2  
JP2015534598A
A useful constituent is indicated by formation of a self-development film including various cycloolefin / maleic anhydride polymer which has a maleimide pendant machine, and such a copolymer. Some are Ring-opening (ed) even if this polym...  
JP5822225B2  
JP5814503B2  
JP5803035B2  
JP2015184325A
To obtain a photosensitive resin composition having an excellent balance between stability with time and mechanical characteristics of a cured film.The photosensitive resin composition is used for forming a permanent film and comprises a...  
JP2015183024A
To provide a photosensitive resin composition that can suppress generation of an undercut in patterning for forming an interlayer insulating film that constitutes an electronic device.A polymer having a structural unit represented by for...  
JP5787624B2  
JP5771905B2
Provided is a radiation-sensitive resin composition for immersion exposure, a curing pattern forming method and a curing pattern ideally used in an immersion exposure process for exposing a resist film via a liquid for immersion exposure...  
JP5761863B2  
JP5759542B2
The present invention relates to a photo-reactive norbornene-based copolymer which has superior miscibility to various organic solvents or additives while exhibiting superior liquid crystal alignment property and can be preferably used t...  
JP2015132779A
To provide a photosensitive resin composition from which such a pattern film can be formed that maintains a high development residual film rate while having no development residue in the forming process of the pattern film, has excellent...  
JP5738097B2  
JP5736038B2  
JP5728762B2  
JP5728790B2  
JP5729079B2  
JP2015094910A
To provide a radiation-sensitive resin composition which gives a resin film excellent in exposure sensitivity and excellent in reliability under a high-temperature and high-humidity environment, and to provide a laminate including a resi...  
JP5712963B2
A polymer for use in resist compositions is obtained from a monomer having formula (1) wherein R1 is methyl, ethyl, propyl, vinyl or ethynyl, the circle designates C3-C12 cycloalkyl, a combination wherein R1 is ethyl and the circle is cy...  
JP2015067822A
To provide a resin composition which is excellent in temporal stability of dielectric characteristics and heat resistance and provides a crosslinked body excellent in transparency, mechanical characteristics and a balance between dielect...  
JPWO2013005429A
A forming object of the present invention is used for an optical component chosen from ftheta lens, an image pick-up lens, or a light guide plate, and contains polymer which has alicyclic structure in a part or all of a repetition struct...  
JPWO2013005429A1
本発明の成形体は、fθレンズ、撮像レンズ たは導光板から選ばれる光学部品に用いら 、繰り返し構造単位の一部または全部に脂 式構造を有するポリマーを含む。そし...  
JP2015025126A
To provide a modifier and a compatibilizing material for modifying an engineering plastic such as a polyamide or compatibilizing an engineering plastic with a polyolefin-based resin and to provide a resin composition containing each comp...  
JP2015025987A
To provide a resist protective film material that can prevent an overhang of a resist pattern caused by amine contamination in air and has a sensitizing effect on the resist film and thereby, can improve sensitivity of a resist film.The ...  
JP2015025880A
To provide a novel resist pattern forming method capable of improving nano-edge roughness and capable of suppressing the occurrence of outgassing while sufficiently satisfying sensitivity.The present invention is the resist pattern formi...  
JP5664576B2  
JP5663721B2  
JP2015007762A
To provide a negative photosensitive resin composition excellent in balance between resolution and time required for pattern formation, and to provide an electronic device and a polymer.There is provided the negative photosensitive resin...  

Matches 451 - 500 out of 2,277