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JP2012077296A5 |
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JP5594712B2 |
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JP2014167116A |
To provide a fluorescent material which absorbs light or different wavelengths, and then emits the light again.There is provided a composition containing an organic polymer matrix, rare-earth metal nano clusters dispersed in the polymer ...
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JP5585508B2 |
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JP2014071304A5 |
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JP5577572B2 |
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JP5580800B2 |
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JP2014520935A |
[Subject] Including a copolymer and this copolymer, it is useful to formation of a self-development film, and provides it with a constituent. [Means for Solution] At least one copy of a maleic anhydride type repeat unit is 開環 (ing) t...
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JP5576829B2 |
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JP2014136718A |
To provide a polymer for improving operational reliability of an electronic device, a photosensitive resin composition, and an electronic device.The polymer comprises a copolymer expressed by formula (1) described below, which has a mole...
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JP2014137429A |
To provide a photosensitive resin composition excellent in solvent resistance.The photosensitive resin composition comprises a polymer, a crosslinking agent and a photosensitive material. A film is formed from the photosensitive resin co...
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JP2014136720A |
To provide a production method of a polymer by which an amount of a carboxyl group in the polymer can be adjusted.The production method of a polymer includes: a step in which a norbornene type monomer and maleic acid anhydride are co-pol...
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JP2014136717A |
To stably produce a polymer for an electronic device.The polymer comprises a copolymer expressed by formula (1) described below and has an acid value of 15 mgKOH/g or more and 65 mgKOH/g or less on the polymer basis. In formula (1), l an...
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JPWO2012141000A1 |
本発明は、感度や現像性が良好であると共に
、耐熱分解性及び耐熱黄変性に優れた着色パ
ターンを与える共重合体、該共重合体を含む
樹脂組成物もしくは感光性樹脂組成物を...
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JP2014136719A |
To provide a polymer for improving the operational reliability of an electronic apparatus, and a photosensitive resin composition including the polymer and an electronic apparatus made using the photosensitive resin.This invention relate...
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JPWO2012141000A |
An object of the present invention is for sensitivity and development nature to be good and to provide the resin composition or photosensitive resin composition containing the copolymer which gives the coloring pattern excellent in heat-...
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JP2014137428A |
To provide a photosensitive resin composition having a high film retention rate after development.The photosensitive resin composition comprises a polymer, a crosslinking agent and a photosensitive material. After the photosensitive resi...
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JP2014137426A |
To provide a photosensitive resin composition which enables formation of a film with low dielectric constant.There is provided a photosensitive resin composition comprising a polymer composed of a copolymer of a specific structure, a the...
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JP5558671B2 |
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JP5556051B2 |
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JP2012046735A5 |
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JP2014124816A |
To provide a laminate excellent in barrier performance against oxygen or steam.A laminate 100 of the present invention comprises: a substrate 101; an inorganic layer 102 provided on at least one surface of the substrate 101; and a resin ...
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JPWO2012105288A |
[Subject] Provide a photosensitive resin composition for micro lens formation. [Means for Solution] (A) A photosensitive resin composition for micro lens formation containing an ingredient, the (B) ingredient, the (C) ingredient, and a s...
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JPWO2012105288A1 |
【課題】マイクロレンズ形成用感光性樹脂組
成物を提供すること。【解決手段】（Ａ）成
分、（Ｂ）成分、（Ｃ）成分及び溶剤を含有
するマイクロレンズ形成用感光性樹脂組...
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JP2014114385A |
To enhance characteristics of a case where a cycloolefinic compound including no polar groups is used such as low adhesion friendliness with other materials, low compatibilities with other compounds such as curatives, epoxy groups, etc. ...
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JP5530136B2 |
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JP5505538B2 |
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JPWO2012081691A1 |
熱硬化性樹脂、架橋剤、及び（メタ）アクリ
ロイルオキシ基を有する縮合芳香族多環化合
物を含有してなる架橋性樹脂成形体、及び該
架橋性樹脂成形体を架橋してなる架橋樹...
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JPWO2012081691A |
Thermosetting resin, a crosslinking agent, the bridge construction resin-molding object containing the condensation aromatic series polycyclic compound which has a (meth) acryloyloxy machine, the bridge construction resin-molding object ...
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JP2014091793A |
To provide a stretched film which is suitable as an optical film such as a retardation film and is composed of a hydrogenated product of an alicyclic structure-containing ring-opened polymer.A film, which is composed of a hydrogenated pr...
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JP2014092792A |
To provide a deep-ultraviolet chemically amplified positive photoresist having good sensitivity.A deep-ultraviolet chemically amplified positive photoresist is disclosed. The deep-ultraviolet chemically amplified positive photoresist acc...
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JP2014510798A |
Some modes by the present invention provide polymer for forming useful layer/film in manufacture of an opto-electronics display of various types. This mode also provides a constituent of starting polymer for the formed layer/film to form...
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JP2014071304A |
To provide a pattern forming method which suppresses generation of standing waves, which allows formation of a pattern with high rectangularity while minimizing scum in patterning on a stepped substrate, which can achieve excellent expos...
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JP2014067012A |
To provide a resist composition and a pattern forming method using the composition which can minimize outgassing from a resist film and prevent formation of blob defects in EUV exposure.The resist material comprises a polymeric compound ...
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JP5472072B2 |
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JP5461180B2 |
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JP2014055243A |
To provide a method of easily manufacturing a polar group-containing norbornene (co)polymer excellent in transparency, heat resistance, low water absorption and having less transition metal catalyst residue.A polar group-containing norbo...
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JP5443985B2 |
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JP5446826B2 |
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JP5440690B2 |
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JP5440468B2 |
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JP2014040600A |
To provide a photosensitive resin composition that can be used in a film state that has high transparency and a low dielectric constant, is readily photo-patternable, and has high heat resistance.An alkali-soluble binary or ternary copol...
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JP5429073B2 |
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JP5417680B2 |
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JP5422498B2 |
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JP5419614B2 |
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JP2014028962A |
To provide a compound which has excellent thermal stability and an improved photoreaction rate and can be used as a monomer of a photoreactive polymer, a photoreactive polymer using the same, and a method for producing the photoreactive ...
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JP5411407B2 |
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JP5406731B2 |
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JP5410792B2 |
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