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Matches 501 - 550 out of 2,232

Document Document Title
JP2014092792A
To provide a deep-ultraviolet chemically amplified positive photoresist having good sensitivity.A deep-ultraviolet chemically amplified positive photoresist is disclosed. The deep-ultraviolet chemically amplified positive photoresist acc...  
JP2014510798A
Some modes by the present invention provide polymer for forming useful layer/film in manufacture of an opto-electronics display of various types. This mode also provides a constituent of starting polymer for the formed layer/film to form...  
JP2014071304A
To provide a pattern forming method which suppresses generation of standing waves, which allows formation of a pattern with high rectangularity while minimizing scum in patterning on a stepped substrate, which can achieve excellent expos...  
JP2014067012A
To provide a resist composition and a pattern forming method using the composition which can minimize outgassing from a resist film and prevent formation of blob defects in EUV exposure.The resist material comprises a polymeric compound ...  
JP5472072B2  
JP5461180B2  
JP2014055243A
To provide a method of easily manufacturing a polar group-containing norbornene (co)polymer excellent in transparency, heat resistance, low water absorption and having less transition metal catalyst residue.A polar group-containing norbo...  
JP5443985B2  
JP5446826B2  
JP5440690B2  
JP5440468B2  
JP2014040600A
To provide a photosensitive resin composition that can be used in a film state that has high transparency and a low dielectric constant, is readily photo-patternable, and has high heat resistance.An alkali-soluble binary or ternary copol...  
JP5429073B2  
JP5417680B2  
JP5422498B2  
JP5419614B2  
JP2014028962A
To provide a compound which has excellent thermal stability and an improved photoreaction rate and can be used as a monomer of a photoreactive polymer, a photoreactive polymer using the same, and a method for producing the photoreactive ...  
JP5411407B2  
JP5406731B2  
JP5410792B2  
JP5369405B2
To provide an image forming method in an image forming device such as a copier, a facsimile, and a printer capable of demonstrating a sufficient protective effect for a surface of an image carrier, and a protective effect for stress part...  
JP2013242540A
To provide a radiation-sensitive resin composition capable of forming an insulator film such as an interlayer insulator film for a display element or the like, excellent in transparency, heat-resistance, hardness, etching resistance and ...  
JP2013237858A
To provide a fluoromonomer and a fluoropolymer which are useful in lithographic resist compositions or as ingredients for synthesizing various optical materials.A fluoropolymer is represented by formula (I): -(M)-(N)- (wherein M is a str...  
JP5353243B2
Disclosed is a plastic optical element having high precision optical characteristics. This plastic optical element exhibits high durability over a long time, while being excellent in short-term optical stability. Also disclosed are a len...  
JP5350798B2
Provided are a resin composition comprising 100 parts by mass of the polymer having an alicyclic structure at least in a part of a repeating structural unit and 0.05 to 5 parts by mass of a hindered amine compound having a carbon atom at...  
JP5346438B2
To provide a new norbornene-based polymer, a film using the norbornene-based polymer and having excellent wavelength dispersion characteristics of phase difference, a polarizing plate using the film, and a liquid crystal display using th...  
JP2013231096A
To provide a method for producing a cyclic olefin-α-olefin copolymer excellent in thermal decomposition resistance.A method for producing a cyclic olefin-α-olefin copolymer involves copolymerizing a cyclic olefin and a 2-30C straight-c...  
JP2013227433A
To provide a polymeric compound suitable as a positive resist material giving a resist film that has higher resolution than a conventional positive resist material, has small line edge roughness and a good pattern profile after exposure,...  
JP2013216908A
To provide a molding for optical components excellent in appearance quality.A molding is used in optical components selected from an fθ lens, an imaging lens or a light guide plate, and includes a polymer having an alicyclic structure i...  
JP2013211559A
To provide a manufacturing method of an electret having improved surface potential, and a manufacturing method of an electrostatic induction-type conversion element using the manufacturing method.A manufacturing method of an electret inc...  
JP2013536287A
Embodiments include copolymers obtainable by reacting styrenic compound, maleic anhydride, and a cyclo-olefin, wherein the cyclo-olefin is selected from the group consisting of dicyclopentadiene, dicyclopentadiene derivatives, norbornene...  
JP2013185066A
To provide a novel modified polycycloolefin which is reacted with a photoinitiator activated by ultraviolet irradiation and can impart transparency and toughness, an ultraviolet cure composition using the same, and further a method for e...  
JP5295566B2
A novel cycloolefin copolymer that can be employed in the production of molding with fewer defects, for example, fewer gel particles (fish eyes). There is provided a cycloolefin copolymer comprising 80 to 20 mol% of repeating units deriv...  
JP5294159B2
A catalyst system and a process for the bulk addition polymerization or of polycyclic olefins, such as norbornene, methylnorbornene, ethylnorbornene, butylnorbornene or hexylnorbornene, 1,2,3,4,4a,5,8,8a-octahydro-1,4:5,8-dimethanonaptha...  
JP2013164588A
To provide a chemically amplified negative resist composition which improves resolution, prevents errors caused by kinds of patterns and line widths even when a dense pattern and a sparse pattern are formed, and enables desired line widt...  
JP2013533350A
The present invention relates to the film for 配 containing the specific photoactive norbornene system copolymer which is excellent in various organic solvents and additive agents, and miscibility, and can be preferably used for the fil...  
JP5247035B2  
JPWO2011132589A
An optical semiconductor protective layer containing a chain-like オレフィン * cyclic olefin copolymer elastomer which uses chain-like オレフィン and cyclic olefin as a polymerization ingredient is prepared. The elastomer is th...  
JPWO2011132589A1
鎖状オレフィンと環状オレフィンとを重合成 分とする鎖状オレフィン−環状オレフィン共 重合体エラストマーを含む光半導体保護材を 調製する。前記エラストマーは、α−鎖...  
JP5240139B2  
JP2013133471A
To provide a water-soluble resin composition with which a fine photoresist pattern can be formed by efficiently reducing a size of a contact hole pattern of a photoresist of a semiconductor process.The water-soluble resin composition inc...  
JP5227236B2  
JP5227237B2  
JPWO2011115042A1
製造が容易であり、架橋密度を容易に調整す ることができる硬化性樹脂組成物を提供する 。含フッ素重合体(A)とヒドロシリル化架 橋剤(B)とからなる硬化性樹脂組成物...  
JPWO2011115042A
Manufacture is easy and it provides a hardening resin constituent which can adjust bridge construction density easily. It is a hardening resin constituent which consists of a fluorine polymer (A) and a hydrosilyl-ized crosslinking agent ...  
JP5218713B2  
JP5220132B2  
JP5222804B2  
JP5220616B2  
JP5212666B2  

Matches 501 - 550 out of 2,232