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Matches 651 - 700 out of 2,211

Document Document Title
JP4632009B2  
JP4631229B2  
JP2011026372A
To provide a method for manufacturing a copolymer for an organic antireflection film.The method for manufacturing a copolymer for an organic antireflection film includes manufacturing a copolymer, which contains at least two kinds of rep...  
JP4626736B2  
JP2011022564A
To provide a chemically amplified positive photoresist material that hardly produces a solubility problem for a polymerization solvent in polymer manufacturing, a refining solvent, and a resist solvent, and to provide a resist pattern fo...  
JP4626023B2  
JP4619218B2  
JP4620530B2  
JP2011013419A
To provide a positive resist composition having an enhanced etching resistance and an excellent resolution and providing an excellent pattern profile on a substrate boundary face, in photolithography for fine processing, and particularly...  
JP4615248B2  
JP4610335B2  
JP2011001433A
To provide a compatibilizer improving compatibility of a polyolefin resin and a thermoplastic resin having a polar group and giving a resin composition having a stable domain dispersion structure and excellent organic solvent resistance,...  
JP2010275555A
To provide a resin and a polymerizable compound which can be used for a photosensitive composition excellent in resolution and line edge roughness and a method for forming a pattern using the composition, in relation to the photosensitiv...  
JP2010276910A
To provide a negative resist composition having superior resolution and enhanced etching resistance in photolithography for fine processing, and in particular, in lithography adopting as an exposure source, KrF laser, extreme-ultraviolet...  
JP4595140B2  
JP2010270254A
To provide a rubber composition capable of exerting excellent dry and wet grip performances when used as a rubber composition for a tire, and to provide a pneumatic tire using the same.The rubber composition comprises: 100 pts.mass rubbe...  
JP2010266842A
To provide a pattern forming method in which a second pattern is formed in a portion of a first resist pattern where a pattern has not been formed yet, double patterning by which a pitch between patterns is halved is performed, and a sub...  
JP4588150B2  
JP4587679B2  
JP4587635B2  
JP2010262304A
To provide a phase difference film not only useful for improving viewing angle characteristics of liquid crystal displays but also of good reworkability and exhibiting good durability when laminated to other components such as polarizers...  
JP4576737B2  
JP4578971B2  
JP2010248373A
To provide a resin composition and a semiconductor device, with which, when a gap is formed between a substrate and a plate body by heating the resin composition after placing the plate body extending from one end to the other end of the...  
JP2010241931A
To provide an olefin copolymer having high refraction index and low Abbe's number and a process for producing the same, and an optical component including the copolymer.An α-olefin/cyclic olefin copolymer includes a 2-30C α-olefin cons...  
JP2010241932A
To provide an olefin copolymer having high refraction index and low Abbe's number and a process for producing the same, and an optical component including the copolymer.An α-olefin/cyclic olefin copolymer includes a 2-30C α-olefin unit...  
JP2010235719A
To provide a polymer for forming a film having an inverse wavelength dependency even though the film is a single body, to provide the film formed by using the polymer and to provide another optical material.A cyclic olefinic polymer comp...  
JP4567158B2  
JP2007146182A5  
JP2010215880A
To provide a novel liquid resin, and an adhesive composition blending it, which exhibits an excellent adhesive property.The terpene-based liquid resin is obtained by copolymerizing a terpene monomer with an aromatic monomer in the presen...  
JP4544389B2  
JP2010195704A
To provide a novel oxetane derivative necessary for preparation of a crosslinkable liquid crystal film excellent in orienting properties, heat resistance and molding processability, and a crosslinkable liquid crystalline polymer obtained...  
JP2010196045A
To provide a norbornene copolymer excellent in transparency, heat resistance, low water-absorbing property, and electric insulation characteristic.This norbornene copolymer is a high molecular weight addition copolymer of a norbornene co...  
JP2010530441A
A catalyst precursor resin composition includes an organic polymer resin; a fluorinated-organic complex of silver ion; a monomer having multifunctional ethylene-unsaturated bonds; a photoinitiator; and an organic solvent. The metallic pa...  
JP2010189619A
To provide a norbornene-based polymer that is variously applicable as a low-loss insulating material and an insulation material produced using the same.A norbornene-based polymer has at least one substituent selected from the group consi...  
JP4529245B2  
JP4529247B2  
JP4525912B2  
JPWO2008143302A1
(A)樹脂、(B)ブチルエーテル基を有す る架橋剤及び(C)溶剤を含有するレジスト 下層膜形成用組成物。  
JPWO2008143095A1
【課題】耐熱性、高解像度、高い光取り出し 効率を有するマイクロレンズ用材料を提供す る。【解決手段】芳香族縮合環又はその誘導 体を有する単位構造を含むアルカリ可溶...  
JPWO2008133311A1
イマージョンリソグラフィー用レジスト保護 膜組成物を提供する。ヒドロキシ基、カルボ キシ基、スルホン酸基、スルホニルアミド基 、アミノ基またはリン酸基を有する重合...  
JP4506968B2  
JP2010522253A
The present invention relates to a photoreactive polymer that comprises a multi-cyclic compound in a main chain, and a polymerization method thereof. Since the photoreactive polymer according to the present invention comprises a multi-cy...  
JP4493660B2  
JP4487532B2  
JP2010520930A
It is a thermosetting lower layer constituent of the etching tolerance for using it in the multilayer lithography process for the two-layer coat board manufacture for photo lithography, the polymer in which the constituent includes the r...  
JP2010126545A
To provide a method for producing a cycloolefin/-olefin addition copolymer having excellent transparency, heat resistance and toughness, a high monomer conversion and a wide molecular weight distribution.The cycloolefin/-olefin addition ...  
JP2010519594A
It is an etching tolerance thermosetting lower layer constituent for using it in a multilayer lithography process which forms a photolithography two-layer application board, and is the constituent, (a) At least one repeat unit of structu...  
JP2010122579A
To provide a positive resist material improved in resolution, particularly in dependence on density distribution and faithfulness to a mask and excellent in etching resistance, and to provide a pattern forming method using the resist mat...  
JP2010519340A
Polymer includes the 1 type repeating unit denoted by chemical formula I, and the inside of a formula and X are -CH (s).2- -CH2-CH2- or -- it is chosen from -O- and;m is 0* about 5 integer --; -- here -- the 1 type repeating unit -- R1R2...  

Matches 651 - 700 out of 2,211