Login| Sign Up| Help| Contact|

Patent Searching and Data


Matches 751 - 800 out of 2,211

Document Document Title
JP2009179769A
To provide an organic and inorganic composite material having a high transparency and refractive index, and excellent in heat resistance and moldability.This organic and inorganic composite material is provided by dispersing inorganic fi...  
JP4312268B2  
JP2009173824A
To provide a cyclic olefin addition copolymer containing a cyclic olefin-functional polysiloxane, to provide a method for producing the same, to provide a composition for crosslinking use, to provide a crosslinked form, and to provide a ...  
JP4307663B2  
JP4310028B2  
JP4305637B2  
JP2009161770A
To provide another new resist composition for use at a wavelength of 193 nm or lower, in particular at a wavelength of 157 nm, which has not only high transparency at these short wavelengths but also other key properties including good p...  
JP4299775B2  
JP4300774B2  
JP4298863B2  
JP4290328B2  
JP4289121B2  
JP4275284B2  
JP2009120857A
To produce a polymer having a sufficiently high impact resistance for industrial uses.The polymer blend includes at least one of cycloolefin copolymers, and at least one core-shell particle, or at least one of copolymers constituted part...  
JP4268249B2  
JP2009108332A
To provide a catalyst composition and its preparation method and a use of the catalyst composition for preparing a polymer from an ethylenic unsaturated monomer.The catalyst composition contains a pair of cationic metal complexes contain...  
JP2009109751A
To provide a negative resist composition capable of forming a resist film whose surface has high hydrophobicity and also having good lithography characteristics, and to provide a method of forming a resist pattern.The negative resist com...  
JP2009108282A
To provide a resin material capable of providing an optical component having both high refractive index and high Abbe number, and an optical component such as an optical lens obtained using the resin material.An alicyclic structure-conta...  
JP4266101B2  
JPWO2007060723A1
本発明は、成形体の欠陥、例えば、ゲル粒子 (フィッシュアイ)が少ない成形体の製造に 用いることができる新規なシクロオレフィン 共重合体を提供することを目的とする。...  
JP2009098638A
To provide a resist composition preventing degradation of a pattern profile.A resist composition comprises a polymer compound as base resin which improves or reduces its alkali solubility under the action of an acid, and a polymer compou...  
JP2009079087A
To provide a cyclic olefin resin sheet or film with low moisture absorption properties and moisture permeability which has few defects resulting from a gel component formed in a synthetic process of the cyclic olefin resin.The cyclic ole...  
JP2009079098A
To provide a film having low hygroscopicity, low moisture permeability, moderate elasticity, no brittleness and excellent mechanical strength, and a polarizing plate and an image display using the same.The film comprises a copolymer of (...  
JP4254745B2  
JP2009073979A
To provide a copolymer which has low hygroscopicity and low moisture permeability and has moderate elasticity and excellent mechanical strength and no brittleness, and to provide a molded article, film, polarizing plate and image display...  
JP4247592B2  
JPWO2007034828A1
エチレンと特定の環状オレフィンとを、遷移 金属触媒成分および共触媒成分を含む重合触 媒の存在下に共重合させて環状オレフィン系 ランダム共重合体を生成させるに際して...  
JP4240202B2  
JP4240786B2  
JP4235810B2  
JP2009046614A
To provide a cycloolefin copolymer that effectively exhibits reverse wavelength dispersion of birefringence, and a film composed of the copolymer.The cycloolefin copolymer is obtained by addition polymerization of at least one non-cycloo...  
JP2009046613A
To provide a cycloolefin copolymer that effectively exhibits wavelength dispersion of birefringence, and a film composed of the copolymer.The cycloolefin copolymer is obtained by addition polymerization of at least one non-cycloolefin mo...  
JP4232632B2  
JP2009042748A
To provide a positive-working resist composition which has high sensitivity and satisfies both of pattern falling and variation in line width, and a method for pattern formation.The positive-working resist composition uses a resin having...  
JP4230733B2  
JP2009035746A
To provide a norbornene-based addition copolymer obtained by copolymerizing (a) a norbornene-based monomer having a carbon-carbon unsaturated bond in addition to a norbornene ring.The norbornene-based addition copolymer including an unsa...  
JP4222700B2  
JP2009029848A
To provide a polymer having high sensitivity and high resolution and causing little defect in development when it is used for a resist composition in DUV excimer laser lithography and the like.The polymer contains at least one constituen...  
JP2009024019A
To provide fulvene-based compounds, and to provide a production method thereof.A fulvene compound having substituents at 2,5-positions by using as a starting material an unsaturated ketone having a substituent at -position and a halogen ...  
JP2009025670A
To provide a resist underlayer film forming composition excellent in embedding property, generating a small amount of sublimate, and capable of forming a resist underlayer film excellent in antireflection function and etching resistance....  
JP2009020456A
To provide a resist lower layer film material for a three-layer resist process having an optimal n-value and k-value in exposure of short wavelength and having excellent etching resistance in a substrate etching conditions and excellent ...  
JPWO2007004321A1
樹脂組成物を水素添加処理する工程を含む環 状オレフィン系樹脂組成物の製造方法である 。前記工程において用いられる水素添加前の 樹脂組成物は、該樹脂組成物100重量...  
JP2009003439A
To provide: an optical film having high birefringence, that is, a large phase-difference in a surface direction of a film and in a depth direction thereof, the optical film being useful as a retardation film; an optical member having the...  
JP4205061B2  
JP2008308691A
To provide a material for a chemically amplifying type photoresist for F2 laser which possesses excellent transparency and improved dry etching resistance.The material is a fluorine-containing polymer having a ring structure in a polymer...  
JP2008310229A
To provide a resist underlayer film material having an optimum n value and k value in exposure to short-wavelength light, excellent also in etching resistance under substrate etching conditions, and having promise as a resist underlayer ...  
JP4200145B2  
JPWO2006118261A1
本発明のα−オレフィン・環状オレフィン・ リエン共重合体は、エチレンを含むα−オ フィンモノマーから導かれる構成単位(A 、環状オレフィンモノマーから導かれ...  
JP2008304947A
To provide an optical waveguide and an optical waveguide structure excelling in heat resistance, low in water absorbing properties and kept low in material cost.The optical waveguide structure 9 has an optical waveguide 90 having a core ...  
JP4197493B2  

Matches 751 - 800 out of 2,211