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Matches 751 - 800 out of 2,234

Document Document Title
JP4382925B2  
JP4386200B2  
JP4375785B2  
JP2009256468A
To provide a polymer of fluorine-containing norbornenes having a chemically stable terminal structure and narrow molecular weight distribution.A method of producing the fluorine-containing polymer essentially comprising a repeating unit ...  
JPWO2009128513A
[Subject] The resist pattern forming method using an effective resist lower layer film formation constituent for lithography at the time of semiconductor substrate processing and the resist lower layer film formation constituent and a ma...  
JP2009244904A
To provide a photoresist composition which can be used on the far-ultraviolet ray region and contains a copolymer for photoresist excellent in post-exposure heat treatment delay stability.The photoresist composition which contains a poly...  
JP4347179B2  
JP2009235286A
To provide a copolymer of a cyclic olefin monomer having a polar group and a 2-12C -olefin monomer, excellent in heat resistance, strength and molding workability, and a production method therefor free from generation of black metal deri...  
JP2009235375A
To provide a film of low hygroscopicity and moisture permeability, having proper elasticity, having no brittleness, and excellent in mechanical strength; and a polarizing plate and an image display using the same.This copolymer contains ...  
JP2009235414A
To provide a polycyclic polymer and a polycyclic resist composition useful for a photoresist composition transparent to a short wavelength of image focusing irradiation, and having resistance in a dry etching method.The present invention...  
JP4344119B2
Photoresist monomers, polymers thereof, photoresist compositions containing the same for preventing acid generated in the exposed area during the course of a photolithography process from being diffused to the unexposed area. The line ed...  
JP2009227810A
To provide a cycloolefin copolymer having a glass transition point suitable for an optical material and a film excellent in productivity and surface properties.The cycloolefin copolymer is obtained by addition copolymerization of at leas...  
JP2009535444A
The present invention indicates the manufacturing method of Al Ken * acrylate * norbornene the copolymer of 3 yuan which polymerizes the monomer mixture which consists of Al Ken, acrylate, and norbornene by a radical initiator under exis...  
JP4336326B2  
JP2009534710A
The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer...  
JP2009215379A
To provide a film having low hygroscopicity and moisture permeability, adequate elasticity, no fragility, and excellent mechanical strength, and to provide a polarizing plate using the film and an image display.The film contains a copoly...  
JPWO2007129528A1
優れた光安定性を長時間に亘って維持する。 本発明に係る光学素子としての対物レンズ1 0は、樹脂組成物から構成されている光学素 子であって、前記樹脂組成物が熱可塑性...  
JP2009203479A
To provide a catalyst composition, a manufacturing method thereof, and a using method thereof for manufacturing a polymer from an ethylenic unsaturated monomer.Disclosed are the catalyst composition containing a specific neutral metal pa...  
JP4327360B2  
JP2009198962A
To provide a resin composition having high sensitivity to light and excelling in patterning property, especially a resin composition suitably usable for formation of a spacer provided joined to the functional surface side of a semiconduc...  
JP2009185298A
To provide a new photoresist composition having sufficiently low optical density for short wavelength radiation at 193 nm and below.A method of polymerizing polycyclic olefin monomers encompassing (a) combining a monomer composition cont...  
JP2009179749A
To provide a norbornene-based polymer film having good peeling-off properties and high productivity.The norbornene-based polymer comprises 0.01-2.00 mol%, in the total repeating units, of a repeating unit (1) derived from a norbornene-ba...  
JP2009179769A
To provide an organic and inorganic composite material having a high transparency and refractive index, and excellent in heat resistance and moldability.This organic and inorganic composite material is provided by dispersing inorganic fi...  
JP4312268B2  
JP2009173824A
To provide a cyclic olefin addition copolymer containing a cyclic olefin-functional polysiloxane, to provide a method for producing the same, to provide a composition for crosslinking use, to provide a crosslinked form, and to provide a ...  
JP4307663B2  
JP4310028B2  
JP4305637B2  
JP2009161770A
To provide another new resist composition for use at a wavelength of 193 nm or lower, in particular at a wavelength of 157 nm, which has not only high transparency at these short wavelengths but also other key properties including good p...  
JP4299775B2  
JP4300774B2  
JP4298863B2  
JP4290328B2  
JP4289121B2  
JP4275284B2  
JP2009120857A
To produce a polymer having a sufficiently high impact resistance for industrial uses.The polymer blend includes at least one of cycloolefin copolymers, and at least one core-shell particle, or at least one of copolymers constituted part...  
JP4268249B2  
JP2009108332A
To provide a catalyst composition and its preparation method and a use of the catalyst composition for preparing a polymer from an ethylenic unsaturated monomer.The catalyst composition contains a pair of cationic metal complexes contain...  
JP2009109751A
To provide a negative resist composition capable of forming a resist film whose surface has high hydrophobicity and also having good lithography characteristics, and to provide a method of forming a resist pattern.The negative resist com...  
JP2009108282A
To provide a resin material capable of providing an optical component having both high refractive index and high Abbe number, and an optical component such as an optical lens obtained using the resin material.An alicyclic structure-conta...  
JP4266101B2  
JPWO2007060723A1
本発明は、成形体の欠陥、例えば、ゲル粒子 (フィッシュアイ)が少ない成形体の製造に 用いることができる新規なシクロオレフィン 共重合体を提供することを目的とする。...  
JP2009098638A
To provide a resist composition preventing degradation of a pattern profile.A resist composition comprises a polymer compound as base resin which improves or reduces its alkali solubility under the action of an acid, and a polymer compou...  
JP2009079087A
To provide a cyclic olefin resin sheet or film with low moisture absorption properties and moisture permeability which has few defects resulting from a gel component formed in a synthetic process of the cyclic olefin resin.The cyclic ole...  
JP2009079098A
To provide a film having low hygroscopicity, low moisture permeability, moderate elasticity, no brittleness and excellent mechanical strength, and a polarizing plate and an image display using the same.The film comprises a copolymer of (...  
JP4254745B2  
JP2009073979A
To provide a copolymer which has low hygroscopicity and low moisture permeability and has moderate elasticity and excellent mechanical strength and no brittleness, and to provide a molded article, film, polarizing plate and image display...  
JP4247592B2  
JPWO2007034828A1
エチレンと特定の環状オレフィンとを、遷移 金属触媒成分および共触媒成分を含む重合触 媒の存在下に共重合させて環状オレフィン系 ランダム共重合体を生成させるに際して...  
JP4240202B2  

Matches 751 - 800 out of 2,234