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Patent Searching and Data


Matches 801 - 850 out of 2,232

Document Document Title
JP2009046614A
To provide a cycloolefin copolymer that effectively exhibits reverse wavelength dispersion of birefringence, and a film composed of the copolymer.The cycloolefin copolymer is obtained by addition polymerization of at least one non-cycloo...  
JP2009046613A
To provide a cycloolefin copolymer that effectively exhibits wavelength dispersion of birefringence, and a film composed of the copolymer.The cycloolefin copolymer is obtained by addition polymerization of at least one non-cycloolefin mo...  
JP4232632B2  
JP2009042748A
To provide a positive-working resist composition which has high sensitivity and satisfies both of pattern falling and variation in line width, and a method for pattern formation.The positive-working resist composition uses a resin having...  
JP4230733B2  
JP2009035746A
To provide a norbornene-based addition copolymer obtained by copolymerizing (a) a norbornene-based monomer having a carbon-carbon unsaturated bond in addition to a norbornene ring.The norbornene-based addition copolymer including an unsa...  
JP4222700B2  
JP2009029848A
To provide a polymer having high sensitivity and high resolution and causing little defect in development when it is used for a resist composition in DUV excimer laser lithography and the like.The polymer contains at least one constituen...  
JP2009024019A
To provide fulvene-based compounds, and to provide a production method thereof.A fulvene compound having substituents at 2,5-positions by using as a starting material an unsaturated ketone having a substituent at -position and a halogen ...  
JP2009025670A
To provide a resist underlayer film forming composition excellent in embedding property, generating a small amount of sublimate, and capable of forming a resist underlayer film excellent in antireflection function and etching resistance....  
JP2009020456A
To provide a resist lower layer film material for a three-layer resist process having an optimal n-value and k-value in exposure of short wavelength and having excellent etching resistance in a substrate etching conditions and excellent ...  
JPWO2007004321A1
樹脂組成物を水素添加処理する工程を含む環 状オレフィン系樹脂組成物の製造方法である 。前記工程において用いられる水素添加前の 樹脂組成物は、該樹脂組成物100重量...  
JP2009003439A
To provide: an optical film having high birefringence, that is, a large phase-difference in a surface direction of a film and in a depth direction thereof, the optical film being useful as a retardation film; an optical member having the...  
JP4205061B2  
JP2008308691A
To provide a material for a chemically amplifying type photoresist for F2 laser which possesses excellent transparency and improved dry etching resistance.The material is a fluorine-containing polymer having a ring structure in a polymer...  
JP2008310229A
To provide a resist underlayer film material having an optimum n value and k value in exposure to short-wavelength light, excellent also in etching resistance under substrate etching conditions, and having promise as a resist underlayer ...  
JP4200145B2  
JPWO2006118261A1
本発明のα−オレフィン・環状オレフィン・ リエン共重合体は、エチレンを含むα−オ フィンモノマーから導かれる構成単位(A 、環状オレフィンモノマーから導かれ...  
JP2008304947A
To provide an optical waveguide and an optical waveguide structure excelling in heat resistance, low in water absorbing properties and kept low in material cost.The optical waveguide structure 9 has an optical waveguide 90 having a core ...  
JP4197493B2  
JP2008299350A
To provide a positive photoresist composition having superior sensitivity in the resolution of contact holes in the production of a semiconductor device, the photoresist composition preventing the occurrence of particles in the dissoluti...  
JP2008299351A
To provide a positive photoresist composition having superior sensitivity in the resolution of contact holes in the production of a semiconductor device, the photoresist composition preventing the occurrence of particles in the dissoluti...  
JP2008291219A
To provide a cycloolefin polymer applicable to a method for film casting under cooling.The cycloolefin polymer is a cycloolefin polymer containing at least repeating units represented by formula (1A) and repeating units represented by fo...  
JP2008285656A
To provide cycloolefin copolymers characterized by racemic diad polycyclic units and triad polycyclic units, methods for producing the same, and selected catalysts which can be used for these methods.The cycloolefin copolymers can be pro...  
JPWO2008143095A
[Subject] The charge of micro lens material which has heat resistance, high resolution, and optical high extraction efficiency is provided. [Means for Solution] It is a positive resist constituent containing a compound (B) which has an o...  
JPWO2008143302A
(A) A constituent for resist lower layer film formation containing a crosslinking agent which has resin and (B) butyl ether machine, and the (C) solvent.  
JP4186213B2  
JP4183815B2  
JP4181760B2  
JP4183283B2  
JPWO2008133311A
The resist protective film constituent for immersion lithography is provided. The polymerization compound (m) which has a hydroxy group, a カルボキシ machine, a sulfonic group, a sulfo nil amide machine, an amino group, or a phospha...  
JP4174968B2  
JP2008260891A
To provide a process for preparing an acrylic copolymer having a structural unit based on an acrylate monomer and a structural unit based on a norbornene monomer using a radical polymerization initiator at a temperature higher than the 1...  
JP2008248063A
To provide a polymeric compound for a resist material significantly high in alkali dissolving speed contrast before and after light exposure, having high resolution with high photosensitivity, good in pattern form after subjected to ligh...  
JP2008249762A
To provide a chemically amplified negative resist composition less liable to cause bridges and having small substrate dependency of a pattern thereof, and to provide a patterning process using the same.The chemically amplified negative r...  
JP2008249951A
To provide a negative resist material having a significantly high alkali dissolution rate contrast before and after exposure, high sensitivity, high resolution and small line edge roughness, showing excellent etching durability, and suit...  
JP2008239982A
To provide a cyclic olefin-diene copolymer excellent in heat resistance, and to provide a method for producing the same.The present invention relates to a copolymer comprising units represented by formula (1) and cyclic olefin units, and...  
JP2008233362A
To provide a low-loss optical waveguide and a manufacturing method therefor.The optical waveguide is provided which is obtained by irradiating a polymer matrix of which the core has a repeating unit represented by formula (I) with light ...  
JP4160374B2
Photosensitive polymers containing repeat units with a 2,2,4,4,4-pentafluoro-1,3,3-trihydroxybutyl group or a 3,3-difluoro-4-hydroxy-4-trifluoromethyloxetan-1-yl group. Photosensitive polymers (I) with an average mol. wt. of 3000-100000 ...  
JP4159601B2  
JP4155253B2  
JP4156599B2  
JPWO2006104049A1
本発明は、(A)ノルボルネン系単量体、( B)芳香族ビニル化合物、および(C)炭素 数が2〜20のα−オレフィンを付加共重合 て得られる共重合体であって、(A)...  
JPWO2006100974A1
透明性、防湿性、耐候性および耐薬品性に優 れ、太陽電池用容器の素材として好適な太陽 電池容器用樹脂組成物、湿式太陽電池容器用 樹脂組成物並びに、該樹脂組成物を成形...  
JP2007063409A5  
JP4136996B2  
JP4133376B2  
JP4133399B2  
JP2006323243A5  
JP2008179685A
To provide a new norbornene-based polymer, a film using the norbornene-based polymer and having excellent wavelength dispersion characteristics of phase difference, a polarizing plate using the film, and a liquid crystal display using th...  

Matches 801 - 850 out of 2,232