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Matches 801 - 850 out of 2,211

Document Document Title
JP2008299351A
To provide a positive photoresist composition having superior sensitivity in the resolution of contact holes in the production of a semiconductor device, the photoresist composition preventing the occurrence of particles in the dissoluti...  
JP2008291219A
To provide a cycloolefin polymer applicable to a method for film casting under cooling.The cycloolefin polymer is a cycloolefin polymer containing at least repeating units represented by formula (1A) and repeating units represented by fo...  
JP2008285656A
To provide cycloolefin copolymers characterized by racemic diad polycyclic units and triad polycyclic units, methods for producing the same, and selected catalysts which can be used for these methods.The cycloolefin copolymers can be pro...  
JPWO2008143095A
[Subject] The charge of micro lens material which has heat resistance, high resolution, and optical high extraction efficiency is provided. [Means for Solution] It is a positive resist constituent containing a compound (B) which has an o...  
JPWO2008143302A
(A) A constituent for resist lower layer film formation containing a crosslinking agent which has resin and (B) butyl ether machine, and the (C) solvent.  
JP4186213B2  
JP4183815B2  
JP4181760B2  
JP4183283B2  
JPWO2008133311A
The resist protective film constituent for immersion lithography is provided. The polymerization compound (m) which has a hydroxy group, a カルボキシ machine, a sulfonic group, a sulfo nil amide machine, an amino group, or a phospha...  
JP4174968B2  
JP2008260891A
To provide a process for preparing an acrylic copolymer having a structural unit based on an acrylate monomer and a structural unit based on a norbornene monomer using a radical polymerization initiator at a temperature higher than the 1...  
JP2008248063A
To provide a polymeric compound for a resist material significantly high in alkali dissolving speed contrast before and after light exposure, having high resolution with high photosensitivity, good in pattern form after subjected to ligh...  
JP2008249762A
To provide a chemically amplified negative resist composition less liable to cause bridges and having small substrate dependency of a pattern thereof, and to provide a patterning process using the same.The chemically amplified negative r...  
JP2008249951A
To provide a negative resist material having a significantly high alkali dissolution rate contrast before and after exposure, high sensitivity, high resolution and small line edge roughness, showing excellent etching durability, and suit...  
JP2008239982A
To provide a cyclic olefin-diene copolymer excellent in heat resistance, and to provide a method for producing the same.The present invention relates to a copolymer comprising units represented by formula (1) and cyclic olefin units, and...  
JP2008233362A
To provide a low-loss optical waveguide and a manufacturing method therefor.The optical waveguide is provided which is obtained by irradiating a polymer matrix of which the core has a repeating unit represented by formula (I) with light ...  
JP4160374B2
Photosensitive polymers containing repeat units with a 2,2,4,4,4-pentafluoro-1,3,3-trihydroxybutyl group or a 3,3-difluoro-4-hydroxy-4-trifluoromethyloxetan-1-yl group. Photosensitive polymers (I) with an average mol. wt. of 3000-100000 ...  
JP4159601B2  
JP4155253B2  
JP4156599B2  
JPWO2006104049A1
本発明は、(A)ノルボルネン系単量体、( B)芳香族ビニル化合物、および(C)炭素 数が2〜20のα−オレフィンを付加共重合 て得られる共重合体であって、(A)...  
JPWO2006100974A1
透明性、防湿性、耐候性および耐薬品性に優 れ、太陽電池用容器の素材として好適な太陽 電池容器用樹脂組成物、湿式太陽電池容器用 樹脂組成物並びに、該樹脂組成物を成形...  
JP2007063409A5  
JP4136996B2  
JP4133376B2  
JP4133399B2  
JP2006323243A5  
JP2008179685A
To provide a new norbornene-based polymer, a film using the norbornene-based polymer and having excellent wavelength dispersion characteristics of phase difference, a polarizing plate using the film, and a liquid crystal display using th...  
JP2008179824A
To provide a photosensitive polymer which upgrades the characteristics, such as transmittance and resistance to dry etching, of a resist composition, thus enabling still more detailed pattern formation.The photosensitive polymer has a st...  
JP4129433B2  
JP4126539B2  
JP4128417B2
To provide a polymer for a chemical amplification type photoresist suitable for ArF excimer laser, and further to provide a photoresist composition. This polymer for the chemical amplification type photoresist is represented by general f...  
JP2002338627A5  
JP2008163347A
To provide a photosensitive polymer which improves characteristics of a resist such as a high transmittance and good dry etching resistance and which can form a fine pattern.The photosensitive polymer having the structural formula can so...  
JP2008163332A
To provide a gel polymer electrolyte precursor and a secondary battery equipped with it.The gel polymer electrolyte precursor comprises an alkali metal electrolyte, an aprotic solvent, a bismaleimide monomer or a bismaleimide oligomer, a...  
JP2008158088A
To provide a retardation film for extending a film making a principal component of a ring-like olefin-based additional copolymer exhibiting characteristics such as melting molding working, excellent transparency, heat resistance, low wat...  
JP4116235B2  
JP4109715B2  
JP4111016B2  
JP4107055B2  
JP4107946B2  
JP4107064B2  
JP4107081B2  
JPWO2008068897A
[A] An apparent initial softening (TMA) contains a specific cyclic olefin system polymer which is 120*300 ℃, and a specific cyclic olefin system polymer whose [B] glass transition point (Tg) is 50 ℃ or less, and it is n about a refra...  
JP2008519882A
It is an optical anisotropy film containing the copolymer manufactured by the production method of the copolymer of cyclic olefin and a polar vinyl olefin system, and its method, and the above-mentioned copolymer. According to the produc...  
JPWO2006067950A1
(1)下記式(1)で表されるアルキル基、 アルキルシリル基およびアルキルシリルメチ ル基から選ばれる置換基を有する環状オレフ ィン化合物5〜80モル%、および(2...  
JPWO2006057309A1
本発明は、耐熱性、低比重性、低複屈折性、 低光弾性、低波長分散性に優れ、しかも高い 位相差補償性を有するノルボルネン系共重合 体からなる位相差フィルムを提供するこ...  
JPWO2008065912A
The present invention possesses the optical characteristic of high accuracy, and it provides a plastic optical element, a lens for optical pickups, and an optical pickup device which have the high endurance over a long period of time, an...  
JP2008518276A
A multilayer and a heat developing nature element useful as a lithography version precursor are indicated. The picture formation nature element concerned contains a base substance, the lower layer on this base substance, and the top laye...  

Matches 801 - 850 out of 2,211