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Matches 851 - 900 out of 2,211

Document Document Title
JP4088672B2  
JPWO2006030797A1
耐湿性が高く寸法安定性も良好であり、例え ば液晶表示装置に組み込まれ、視野角改善、 コントラストの改善、色補償など液晶の表示 品位の改善に効果的に用いることができ...  
JP4085034B2  
JP2008095008A
To provide a new catalyst composition containing a metallocene complex, and to provide a method for producing various polymeric compounds, preferably a new polymeric compound and a method for producing the same.The invention relates to a...  
JPWO2008047468A
As opposed to 100 mass parts of polymers to which the present invention has alicycle fellows structure in at least one copy of a repetition structure unit, The rates of the carbon atom to in molecular structure are 67 % of the weight or ...  
JP1999505877A5  
JP4080916B2  
JP4075610B2  
JP4075261B2  
JP4075789B2  
JP2003531923A5  
JP2008081716A
To provide a resist protective coating material useful for liquid immersion lithography having excellent process applicability, which is capable of conducting good liquid immersion lithography and also capable of removing at the same tim...  
JP2008081674A
To provide a method for manufacturing a copolymer of a cyclic olefin and a styrenic compound that is excellent in heat resistance and optical characteristics and high in the mechanical strength.The method for manufacturing a copolymer of...  
JP4073253B2  
JP4072063B2  
JP4067251B2  
JP4067284B2  
JP2008065304A
To provide a resist protective film material removable in resist development by reducing an outgas from a resist film, and to provide a pattern forming method.The resist protective film material for forming a protective film by the resis...  
JP4059051B2  
JP2008050495A
To provide a cyclic olefinic copolymer having a structural unit derived from a cyclic olefinic compound having an aromatic ring and a structural unit derived from a cyclic olefinic compound having no aromatic ring with little unevenness ...  
JP2003518169A5  
JP4055402B2  
JP4055406B2  
JP4056337B2  
JP4057225B2  
JP4056208B2  
JP4055391B2  
JP4055401B2  
JP2008045069A
To provide a new cyclic olefin-based addition copolymer having excellent low birefringence, transparency, heat resistance and low water absorptivity, and exhibiting high solubility in an organic solvent and melt molding processability; t...  
JP2008045133A
To provide a crosslinked resin film having an optical transparency, heat resistance, liquid crystal resistance, dimensional stability and adhesion which can be used as a substitute of a substrate glass in a liquid crystal display device ...  
JP4053891B2  
JP4054084B2  
JP4048944B2  
JP2008031160A
To provide new ester compounds each as a monomer of a macromolecular compound for a base resin of a chemical amplification-type resist material suitable for the fine processing technology, and to provide methods for producing the ester c...  
JP2008031304A
To provide a film suffering from small changes in optical properties even when the humidity changes and having small photoelasticity and appropriate moisture permeability.The film is comprised of a norbornene copolymer represented by gen...  
JP4047319B2  
JP4045210B2  
JP4045405B2  
JPWO2008015969A
The suitable pattern formation method for the fine pattern formation by an electron beam (it is hereafter called EB for short), X-rays, and extreme ultraviolet rays (it is hereafter called EUV for short), etc. are provided. The process o...  
JP4044947B2  
JP2004530159A5  
JP4041335B2  
JP2008013709A
To provide a new cyclic olefin-based addition copolymer which is excellent in melt molding processability, transparency, and heat resistance, has low water absorptivity and permittivity, has a low metal content, and can be suitably used ...  
JP2008015162A
To provide a positive resist composition capable of achieving excellent MEF and a resist pattern forming method.The positive resist composition comprises a resin component A having acid-dissociable dissolution inhibiting groups and alkal...  
JP4036773B2  
JP2007334278A
To provide a positive resist composition for immersion exposure, which is suitable for immersion exposure and forms a resist film having high hydrophobicity of a surface thereof and good lithography characteristics, and also to provide a...  
JP2007332256A
To provide a method for producing a cyclic olefin addition copolymer. A monomer composition containing 10-90 mol% 5-alkylbicyclo[2.2.1]hept-2-ene having a 10-12C alkyl group and 10-90 mol% bicyclo[2.2.1]hept-2-ene is subjected to an addi...  
JP2007538111A
The present invention offers the method of preparing polymer with an end propionic group. The water-soluble non-peptide polymer which contains in this method at least one hydroxyl machine which has the weight average molecular weight of ...  
JP4025956B2  
JP4028131B2  

Matches 851 - 900 out of 2,211