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Matches 851 - 900 out of 2,232

Document Document Title
JP2008179824A
To provide a photosensitive polymer which upgrades the characteristics, such as transmittance and resistance to dry etching, of a resist composition, thus enabling still more detailed pattern formation.The photosensitive polymer has a st...  
JP4129433B2  
JP4126539B2  
JP4128417B2
To provide a polymer for a chemical amplification type photoresist suitable for ArF excimer laser, and further to provide a photoresist composition. This polymer for the chemical amplification type photoresist is represented by general f...  
JP2002338627A5  
JP2008163347A
To provide a photosensitive polymer which improves characteristics of a resist such as a high transmittance and good dry etching resistance and which can form a fine pattern.The photosensitive polymer having the structural formula can so...  
JP2008163332A
To provide a gel polymer electrolyte precursor and a secondary battery equipped with it.The gel polymer electrolyte precursor comprises an alkali metal electrolyte, an aprotic solvent, a bismaleimide monomer or a bismaleimide oligomer, a...  
JP2008158088A
To provide a retardation film for extending a film making a principal component of a ring-like olefin-based additional copolymer exhibiting characteristics such as melting molding working, excellent transparency, heat resistance, low wat...  
JP4116235B2  
JP4109715B2  
JP4111016B2  
JP4107055B2  
JP4107946B2  
JP4107064B2  
JP4107081B2  
JPWO2008068897A
[A] An apparent initial softening (TMA) contains a specific cyclic olefin system polymer which is 120*300 ℃, and a specific cyclic olefin system polymer whose [B] glass transition point (Tg) is 50 ℃ or less, and it is n about a refra...  
JP2008519882A
It is an optical anisotropy film containing the copolymer manufactured by the production method of the copolymer of cyclic olefin and a polar vinyl olefin system, and its method, and the above-mentioned copolymer. According to the produc...  
JPWO2006067950A1
(1)下記式(1)で表されるアルキル基、 アルキルシリル基およびアルキルシリルメチ ル基から選ばれる置換基を有する環状オレフ ィン化合物5〜80モル%、および(2...  
JPWO2006057309A1
本発明は、耐熱性、低比重性、低複屈折性、 低光弾性、低波長分散性に優れ、しかも高い 位相差補償性を有するノルボルネン系共重合 体からなる位相差フィルムを提供するこ...  
JPWO2008065912A
The present invention possesses the optical characteristic of high accuracy, and it provides a plastic optical element, a lens for optical pickups, and an optical pickup device which have the high endurance over a long period of time, an...  
JP2008518276A
A multilayer and a heat developing nature element useful as a lithography version precursor are indicated. The picture formation nature element concerned contains a base substance, the lower layer on this base substance, and the top laye...  
JP4088672B2  
JPWO2006030797A1
耐湿性が高く寸法安定性も良好であり、例え ば液晶表示装置に組み込まれ、視野角改善、 コントラストの改善、色補償など液晶の表示 品位の改善に効果的に用いることができ...  
JP4085034B2  
JP2008095008A
To provide a new catalyst composition containing a metallocene complex, and to provide a method for producing various polymeric compounds, preferably a new polymeric compound and a method for producing the same.The invention relates to a...  
JPWO2008047468A
As opposed to 100 mass parts of polymers to which the present invention has alicycle fellows structure in at least one copy of a repetition structure unit, The rates of the carbon atom to in molecular structure are 67 % of the weight or ...  
JP1999505877A5  
JP4080916B2  
JP4075610B2  
JP4075261B2  
JP4075789B2  
JP2003531923A5  
JP2008081716A
To provide a resist protective coating material useful for liquid immersion lithography having excellent process applicability, which is capable of conducting good liquid immersion lithography and also capable of removing at the same tim...  
JP2008081674A
To provide a method for manufacturing a copolymer of a cyclic olefin and a styrenic compound that is excellent in heat resistance and optical characteristics and high in the mechanical strength.The method for manufacturing a copolymer of...  
JP4073253B2  
JP4072063B2  
JP4067251B2  
JP4067284B2  
JP2008065304A
To provide a resist protective film material removable in resist development by reducing an outgas from a resist film, and to provide a pattern forming method.The resist protective film material for forming a protective film by the resis...  
JP4059051B2  
JP2008050495A
To provide a cyclic olefinic copolymer having a structural unit derived from a cyclic olefinic compound having an aromatic ring and a structural unit derived from a cyclic olefinic compound having no aromatic ring with little unevenness ...  
JP2003518169A5  
JP4055402B2  
JP4055406B2  
JP4056337B2  
JP4057225B2  
JP4056208B2  
JP4055391B2  
JP4055401B2  
JP2008045069A
To provide a new cyclic olefin-based addition copolymer having excellent low birefringence, transparency, heat resistance and low water absorptivity, and exhibiting high solubility in an organic solvent and melt molding processability; t...  

Matches 851 - 900 out of 2,232