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Patent Searching and Data


Matches 901 - 950 out of 2,217

Document Document Title
JP2007332256A
To provide a method for producing a cyclic olefin addition copolymer. A monomer composition containing 10-90 mol% 5-alkylbicyclo[2.2.1]hept-2-ene having a 10-12C alkyl group and 10-90 mol% bicyclo[2.2.1]hept-2-ene is subjected to an addi...  
JP2007538111A
The present invention offers the method of preparing polymer with an end propionic group. The water-soluble non-peptide polymer which contains in this method at least one hydroxyl machine which has the weight average molecular weight of ...  
JP4025956B2  
JP4028131B2  
JP4028283B2  
JP4025074B2
A positive resist composition comprising the components of: (A) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation; (B) a resin that is insoluble or slightly soluble in alkalis, but becom...  
JP4025062B2
To provide a positive photosensitive composition having high resolving power and excellent in defocus latitude and side-lobe margin. The positive photosensitive composition comprises (A1) at least one compound that generates a specified ...  
JP4025162B2  
JP2007314806A
To provide a high-active production method of a cycloolefin copolymer without damaging heat resistance, clarity, mechanical properties and so on. The production method comprises copolymerizing (A) ethylene and (B) a specific cycloolefin ...  
JP4018454B2  
JP4016270B2  
JP2004523806A5  
JP4014262B2  
JP2007302765A
To efficiently provide a heat-moldable copolymer having improved molecular weight and prepared from an acrylic or a methacrylic ester monomer and an olefin monomer. A method for producing the copolymer comprises polymerizing a polymeriza...  
JPWO2007129528A
A long time is covered and the outstanding Mitsuyasu quality is maintained. Object lens 10 as an optical element concerning the present invention is an optical element which comprises a resin composition, and the resin composition contai...  
JP4008322B2  
JP2007286161A
To provide a negative resist composition having good alkali solubility, and to provide a method of forming a resist pattern. The negative resist composition contains an alkali-soluble resin component (A), an acid generator component (B) ...  
JP4001445B2  
JP4000473B2  
JP3994680B2  
JP2007269965A
To provide a resin composition excellent in electric properties and adhesion when forming a resin layer of a wiring board, to provide a laminated product excellent in processibility, to provide a wiring board excellent in electric proper...  
JP3994486B2  
JP3988038B2  
JP2007254576A
To provide a method for manufacturing a cycloolefin copolymer, the one formed by copolymerizing a cycloolefin, an alkenyl aromatic hydrocarbon and an α-olefin, which method gives a higher molecular weight copolymer. The method manufactu...  
JP2007231033A
To obtain a copolymer or a modified copolymer that comprises an acenaphthylene derivative with excellent low hygroscopicity, low dielectric constant property, heat resistance, etc., in a resin backbone and has heat-curability and/or phot...  
JP2007525543A
By the multi-ring type olefin monomer and request, in existence of the catalyst which contains [アリル] nickel or Pd for the oligomer of an olefin monomer and a multi-ring type olefin monomer, Or the method of manufacturing such an ol...  
JP3971476B2
To obtain the subject copolymer, having a specific recurring unit and capable of producing a copolymer excellent in electrical characteristics such as permittivity and dielectric loss tangent and heat resistance and exhibiting excellent ...  
JP3962893B2
To provide a polymer compound which is sensitive to high-energy rays, is excellent in sensitivity particularly in a wavelength range of 170 nm or lower, and has improved transparency and excellent plasma-etching resistance. This polymer ...  
JP3957409B2
To obtain the subject resin having physical properties allowing the use as a copolymer resin for photoresist by copolymerizing two specific kinds of monomers in such a manner as to form a copolymer having a specific structure and improve...  
JP2007197624A
To provide an addition polymer of norbornene which is excellent in transparency, chemical resistance, and optical properties, has a high glass-transition temperature, a low water absorption, and a low linear expansion coefficient and is ...  
JP3955489B2
To provide a positive resist composition suitable for use under an exposure light source of ≤160 nm, particularly F2 excimer laser light (157 nm) and to concretely provide a positive resist composition having satisfactory transmittance...  
JP3953780B2
To provide a new polymer which has a high fluorine content, can have polar groups in the same molecule, and can form films having high adhesiveness to substrates, to provide an anti-reflective material coated with the polymer, and to pro...  
JP3953713B2
To provide a well-balanced laminated stretch film for packaging food, excellent in packaging properties such as practical heal sealability, finish properties or the like while putting characteristics possessed by a film comprising a cycl...  
JP3952135B2
To provide a resist material, having superior transmittance for vacuum UV rays, resistance against decrease in the solubility of the resist (like a negative resist) and durability against dry etching and showing small surface roughness a...  
JP3946449B2
To provide a photoresist monomer suitably used for a bilayer resist and a photoresist polymer containing such a monomer. The photoresist polymer comprises a compound bearing a silicon-containing group of chemical formula (4), an alicycli...  
JP3945309B2
To obtain a cyclic olefin copolymer improved in transparency, heat resistance and water resistance (low water absorption) by resolving the problems in conventional transparent resins and further improved in low birefringence and an impro...  
JP3944724B2
To obtain a polymeric compound useful as a base polymer for a resist material suitable for a fine processing technology, especially a chemically amplifying resist material, a resist material, and to provide a method for forming a pattern...  
JP3943445B2
To provide a photoresist monomer and a photoresist polymer that can be used with a VUV (157 nm) light source. This photoresist monomer is represented by the following formula (1) (wherein R1 is a 1-10C, substituted or unsubstituted, stra...  
JP3936503B2
To provide a resist composition which retains satisfactory intrasurface uniformity even in a thin film process and reproduces the desired resist pattern with high sensitivity and high resolving power. The positive photoresist composition...  
JP2007516321A
The refractive index n (25 °C) is 1.50*1.60, and the present invention relates to the coloring ornament material in which an Abbe number contains the cyclo オレフィンコ oligomer of 50*60. The technical property of this material, e...  
JP2007153982A
To provide a resist material having excellent resolution, transparency and etching resistance in ArF exposure, and exhibiting the high performance even in ArF-immersion lithography.The resist material contains a repeating unit (2) obtain...  
JP3934053B2  
JP3933445B2
To provide a packaging material which has a paper layer, a barrier layer inside the paper layer and further a polyethylene layer inside the barrier layer and makes the outward appearance of a container excellent when used as the containe...  
JP2007146182A
To provide an ArF photosensitive film resin having etching resistance, heat resistance and adhesive strength and not easily dissolved in a developing solution, to provide a method for producing the resin, to provide a copolymer used for ...  
JP2007138045A
To provide a cycloolefin polymer which exhibits little reduction of light transmittance due to white turbidity or the like even when the accumulated irradiance level of a blue laser beam is increased at a wavelength of around 400 nm, a m...  
JP2001350263A5  
JP2007138044A
To provide a resin composition for an optical element, which is capable of improving optical stability and maintaining the property for a long time period, an optical element, a beam condesing unit, and an optical pickup apparatus.The re...  
JP2007133226A
To ensure stable refractive index characteristics of a high refractive index and low birefringence.An objective lens 10 as an optical element is an optical element obtained by molding a resin composition for an optical element based on a...  
JPWO2007060723A
An object of the present invention is to provide the new cycloolefin copolymer which can be used for manufacture of the defect of a forming object, for example, a forming object with few gel particles (fish eye). The monomer to which the...  
JP2007131771A
To provide a resin composition which has resistance to environmental changes and light irradiation for long time and is used for optical elements, to provide an optical element molded from the resin composition, and to provide an optical...  

Matches 901 - 950 out of 2,217