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Patent Searching and Data


Matches 951 - 1,000 out of 2,253

Document Document Title
JP2007286161A
To provide a negative resist composition having good alkali solubility, and to provide a method of forming a resist pattern. The negative resist composition contains an alkali-soluble resin component (A), an acid generator component (B) ...  
JP4001445B2  
JP4000473B2  
JP3994680B2  
JP2007269965A
To provide a resin composition excellent in electric properties and adhesion when forming a resin layer of a wiring board, to provide a laminated product excellent in processibility, to provide a wiring board excellent in electric proper...  
JP3994486B2  
JP3988038B2  
JP2007254576A
To provide a method for manufacturing a cycloolefin copolymer, the one formed by copolymerizing a cycloolefin, an alkenyl aromatic hydrocarbon and an α-olefin, which method gives a higher molecular weight copolymer. The method manufactu...  
JP2007231033A
To obtain a copolymer or a modified copolymer that comprises an acenaphthylene derivative with excellent low hygroscopicity, low dielectric constant property, heat resistance, etc., in a resin backbone and has heat-curability and/or phot...  
JP2007525543A
By the multi-ring type olefin monomer and request, in existence of the catalyst which contains [アリル] nickel or Pd for the oligomer of an olefin monomer and a multi-ring type olefin monomer, Or the method of manufacturing such an ol...  
JP3971476B2
To obtain the subject copolymer, having a specific recurring unit and capable of producing a copolymer excellent in electrical characteristics such as permittivity and dielectric loss tangent and heat resistance and exhibiting excellent ...  
JP3962893B2
To provide a polymer compound which is sensitive to high-energy rays, is excellent in sensitivity particularly in a wavelength range of 170 nm or lower, and has improved transparency and excellent plasma-etching resistance. This polymer ...  
JP3957409B2
To obtain the subject resin having physical properties allowing the use as a copolymer resin for photoresist by copolymerizing two specific kinds of monomers in such a manner as to form a copolymer having a specific structure and improve...  
JP2007197624A
To provide an addition polymer of norbornene which is excellent in transparency, chemical resistance, and optical properties, has a high glass-transition temperature, a low water absorption, and a low linear expansion coefficient and is ...  
JP3955489B2
To provide a positive resist composition suitable for use under an exposure light source of ≤160 nm, particularly F2 excimer laser light (157 nm) and to concretely provide a positive resist composition having satisfactory transmittance...  
JP3953780B2
To provide a new polymer which has a high fluorine content, can have polar groups in the same molecule, and can form films having high adhesiveness to substrates, to provide an anti-reflective material coated with the polymer, and to pro...  
JP3953713B2
To provide a well-balanced laminated stretch film for packaging food, excellent in packaging properties such as practical heal sealability, finish properties or the like while putting characteristics possessed by a film comprising a cycl...  
JP3952135B2
To provide a resist material, having superior transmittance for vacuum UV rays, resistance against decrease in the solubility of the resist (like a negative resist) and durability against dry etching and showing small surface roughness a...  
JP3946449B2
To provide a photoresist monomer suitably used for a bilayer resist and a photoresist polymer containing such a monomer. The photoresist polymer comprises a compound bearing a silicon-containing group of chemical formula (4), an alicycli...  
JP3945309B2
To obtain a cyclic olefin copolymer improved in transparency, heat resistance and water resistance (low water absorption) by resolving the problems in conventional transparent resins and further improved in low birefringence and an impro...  
JP3944724B2
To obtain a polymeric compound useful as a base polymer for a resist material suitable for a fine processing technology, especially a chemically amplifying resist material, a resist material, and to provide a method for forming a pattern...  
JP3943445B2
To provide a photoresist monomer and a photoresist polymer that can be used with a VUV (157 nm) light source. This photoresist monomer is represented by the following formula (1) (wherein R1 is a 1-10C, substituted or unsubstituted, stra...  
JP3936503B2
To provide a resist composition which retains satisfactory intrasurface uniformity even in a thin film process and reproduces the desired resist pattern with high sensitivity and high resolving power. The positive photoresist composition...  
JP2007516321A
The refractive index n (25 °C) is 1.50*1.60, and the present invention relates to the coloring ornament material in which an Abbe number contains the cyclo オレフィンコ oligomer of 50*60. The technical property of this material, e...  
JP2007153982A
To provide a resist material having excellent resolution, transparency and etching resistance in ArF exposure, and exhibiting the high performance even in ArF-immersion lithography.The resist material contains a repeating unit (2) obtain...  
JP3934053B2  
JP3933445B2
To provide a packaging material which has a paper layer, a barrier layer inside the paper layer and further a polyethylene layer inside the barrier layer and makes the outward appearance of a container excellent when used as the containe...  
JP2007146182A
To provide an ArF photosensitive film resin having etching resistance, heat resistance and adhesive strength and not easily dissolved in a developing solution, to provide a method for producing the resin, to provide a copolymer used for ...  
JP2007138045A
To provide a cycloolefin polymer which exhibits little reduction of light transmittance due to white turbidity or the like even when the accumulated irradiance level of a blue laser beam is increased at a wavelength of around 400 nm, a m...  
JP2001350263A5  
JP2007138044A
To provide a resin composition for an optical element, which is capable of improving optical stability and maintaining the property for a long time period, an optical element, a beam condesing unit, and an optical pickup apparatus.The re...  
JP2007133226A
To ensure stable refractive index characteristics of a high refractive index and low birefringence.An objective lens 10 as an optical element is an optical element obtained by molding a resin composition for an optical element based on a...  
JPWO2007060723A
An object of the present invention is to provide the new cycloolefin copolymer which can be used for manufacture of the defect of a forming object, for example, a forming object with few gel particles (fish eye). The monomer to which the...  
JP2007131771A
To provide a resin composition which has resistance to environmental changes and light irradiation for long time and is used for optical elements, to provide an optical element molded from the resin composition, and to provide an optical...  
JP2007119660A
To provide a cycloolefin addition copolymer excellent in heat resistance, transparency, low water absorption and moldability and capable of forming an optical material having a high linear expansion coefficient (high in temperature respo...  
JP3916532B2
To provide an interlayer insulating film which is low in dielectric constant and hygroscopic property and which at the same time is superior in mechanical strengths. The interlayer insulating film comprises a polymer in which a first mon...  
JP2007511651A
As for the present invention, a technical property, especially an optical property are related with a material outstanding as an ornament material by the aptitude outstanding as an ornament material. The above-mentioned material contains...  
JP2007112863A
To provide a method for preparing a cyclic olefin copolymer which does not produce oxidatively deteriorated components from the cyclic olefin, and excels in polymerization activity, has high efficiency of copolymerization of the cyclic o...  
JP3912484B2
To provide a resist material which is sensitive to a high-energy ray being excellent in sensitivity for the wavelength of 200 nm or below, particularly 170 nm or below, besides in which plasma-etching resistance is improved by introducti...  
JP3912512B2
To obtain a new polymer silicone compound which is preferably usable not only as a material for a two-layer resist method, having high sensitivity and high resolution, especially suitable for forming a pattern with a high aspect ratio bu...  
JP3912516B2
To obtain a polymeric compound useful as a base polymer for a resist material suitable for a fine processing technology, especially chemically amplifying resist material, a resist material, and to provide a method for forming a pattern. ...  
JP3912483B2
To provide a resist material which is sensitive to a high-energy ray being excellent in sensitivity, resolution and plasma-etching resistance for the wavelength of 200 nm or below, particularly 170 nm or below, and by these characteristi...  
JP3909829B2
To provide a positive resist composition having satisfactory transmittance at the time of using an exposure light source of ≤160 nm, concretely F2 excimer laser light (157 nm) and improved in line edge roughness and development defects...  
JP2007102228A
To provide a new composition giving improved lithographic results, particularly, to provide a new composition and a method resulting in improved resolution of a developed relief image.An overcoating layer composition is applied above a p...  
JP3907485B2
To provide a positive resist composition having highly transparency to radiations ranging from vacuum ultraviolet rays to visible rays, good adhesion to substrates, high film-forming properties, etc., and comprising a new fluorocopolymer...  
JP2007084733A
To obtain a resin composition having excellent infrared absorption property, heat resistance, low water absorption and high transparency and an infrared absorbing molding using the same.The resin composition comprises an epoxy group-cont...  
JP2007084764A
To provide a coating material having high heat resistance and transparency, further having good electric insulation, low water absorption and a low dielectric constant, and especially suitable for an optical material and a printed circui...  
JP2001235677A5  
JP2007084667A
To provide a new cyclized copolymer having all the excellent heat resistance, transparency and melt moldability and to provide a method for producing the same.The cyclized copolymer is obtained by polymerizing a norbornene-based monomer ...  
JP3900276B2
To provide a resist material having excellent transmittance for vacuum UV rays, in particular, to provide a chemically amplifying positive resist material and a method for forming a pattern by using this resist material. The resist mater...  

Matches 951 - 1,000 out of 2,253