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Matches 951 - 1,000 out of 2,213

Document Document Title
JP2007511651A
As for the present invention, a technical property, especially an optical property are related with a material outstanding as an ornament material by the aptitude outstanding as an ornament material. The above-mentioned material contains...  
JP2007112863A
To provide a method for preparing a cyclic olefin copolymer which does not produce oxidatively deteriorated components from the cyclic olefin, and excels in polymerization activity, has high efficiency of copolymerization of the cyclic o...  
JP3912484B2
To provide a resist material which is sensitive to a high-energy ray being excellent in sensitivity for the wavelength of 200 nm or below, particularly 170 nm or below, besides in which plasma-etching resistance is improved by introducti...  
JP3912512B2
To obtain a new polymer silicone compound which is preferably usable not only as a material for a two-layer resist method, having high sensitivity and high resolution, especially suitable for forming a pattern with a high aspect ratio bu...  
JP3912516B2
To obtain a polymeric compound useful as a base polymer for a resist material suitable for a fine processing technology, especially chemically amplifying resist material, a resist material, and to provide a method for forming a pattern. ...  
JP3912483B2
To provide a resist material which is sensitive to a high-energy ray being excellent in sensitivity, resolution and plasma-etching resistance for the wavelength of 200 nm or below, particularly 170 nm or below, and by these characteristi...  
JP3909829B2
To provide a positive resist composition having satisfactory transmittance at the time of using an exposure light source of ≤160 nm, concretely F2 excimer laser light (157 nm) and improved in line edge roughness and development defects...  
JP2007102228A
To provide a new composition giving improved lithographic results, particularly, to provide a new composition and a method resulting in improved resolution of a developed relief image.An overcoating layer composition is applied above a p...  
JP3907485B2
To provide a positive resist composition having highly transparency to radiations ranging from vacuum ultraviolet rays to visible rays, good adhesion to substrates, high film-forming properties, etc., and comprising a new fluorocopolymer...  
JP2007084733A
To obtain a resin composition having excellent infrared absorption property, heat resistance, low water absorption and high transparency and an infrared absorbing molding using the same.The resin composition comprises an epoxy group-cont...  
JP2007084764A
To provide a coating material having high heat resistance and transparency, further having good electric insulation, low water absorption and a low dielectric constant, and especially suitable for an optical material and a printed circui...  
JP2001235677A5  
JP2007084667A
To provide a new cyclized copolymer having all the excellent heat resistance, transparency and melt moldability and to provide a method for producing the same.The cyclized copolymer is obtained by polymerizing a norbornene-based monomer ...  
JP3900276B2
To provide a resist material having excellent transmittance for vacuum UV rays, in particular, to provide a chemically amplifying positive resist material and a method for forming a pattern by using this resist material. The resist mater...  
JPWO2007034828A
It makes it face to make ethylene and specific cyclic olefin copolymerize under existence of the polymerization catalyst containing a transition metal catalyst ingredient and a 共触媒 ingredient, and to generate a cyclic olefin system...  
JP2007078812A
To provide a photosensitive resin composition excellent in adhesion, with the view to the situation that a pattern of a resin composition used so far peels from a base because of weak adhesion to the base in the case of using an aqueous ...  
JP2007077395A
To provide a method of making a copolymer containing a unit derived from a noncyclic aliphatic olefin, and a unit derived from a polar monomer.The method of making the copolymer and terpolymer containing the unit derived from the noncycl...  
JP3899771B2
To provide a chemically amplified positive type resist composition which shows good properties such as sensitivity, resolution, adhesion to a sub strate and the like and shows less dependence on the substrate to give a good profile even ...  
JP3895886B2
To obtain a polymer excellent in etching resistance and heat resistance and capable of forming a fine pattern by a dry developing process by adding a polymerization initiator to an organic solvent in which two specified compounds have be...  
JP2007506846A
The present invention relates to the optical picture formation method which uses these composites for low multi-dispersibility コポリマー useful to optical picture formation and a photoresist composite at a row. Low multi-dispersibi...  
JP2007063409A
To provide a process for producing a cycloolefin copolymer from ethylene and/or a 3-20C α-olefin and a cycloolefin compound in a simpler and more efficient manner on an industrial scale.The cycloolefin copolymer is produced by copolymer...  
JP2007063356A
To provide an optical substrate which excels in transparency, heat resistance, moisture resistance, water resistance, solvent resistance, and chemical resistance to an acid, an alkali and the like, has a small coefficient of thermal expa...  
JP3890979B2
To provide a positive chemical amplification type resist composition having favorable various kinds of resist performances such as sensitivity and resolution and particularly excellent in dry etching durability. The positive resist compo...  
JP3889685B2
To provide a photosensitive polymer containing a hydroxyalkyl vinyl ether monomer unit, and a resist composition using the same. The photosensitive polymer has a weight-average molecular weight of 3,000-50,000 and contains an alkyl vinyl...  
JP3885841B2
To obtain a copolymer having a narrow molecular weight distribution, useful as a tacky agent, an adhesive, etc., and having high performances, by copolymerizing a specific cyclopentadiene with dicyclopentadiene and a vinyl- substituted a...  
JP3882706B2
To provide a base material covered with a coating material having excellent heat resistance, moisture resistance, chemical resistance and transparency and excellent adhesion, adhesive properties and destruction characteristics and to pro...  
JP3879829B2
To provide a resist material which is sensitive to high-energy rays and is excellent in the sensitivity at a wave length of 200 nm or less, especially of 170 nm or less. The polymer compound has repeating units (m unit and n unit) expres...  
JP3876982B2
To provide a polymer compound having excellent reactivity, stiffness and adhesivity with a substrate and less swelling at the development, a resist material using the polymer compound as the base resin, and having largely improved resolu...  
JP3874061B2
To provide a resist material which exhibits a little absorption especially at the exposure wavelength of an F2 excimer laser, can be used as an alkali-developable resist material, can easily form a fine pattern vertical to a substrate bo...  
JP3876164B2
To provide a high molecular compound having excellent reactivity, inflexibility and adhesion to a substrate and less liable to swell in development and a resist material using the high molecular compound as a base resin and having much h...  
JP3874094B2
To provide a resist material which is sensitive to high-energy radiation and excellent in sensitivity to rays of a wavelength of 200 nm or shorter, particularly 170 nm or shorter. This resist material comprises a polymer compound having ...  
JP3874093B2
To provide a resist material which is sensitive to high-energy rays and is excellent in the sensitivity at a wave length of 200 nm or less, especially of 170 nm or less. The polymer compound contains repeating units expressed by formulae...  
JP3874070B2
To obtain a resist material responsive to a high-energy ray, having excellent sensitivity, resolution and oxygen plasma etching resistance at a wavelength of ≤300 nm, consequently the resist material capable of being made into an excel...  
JP3871721B2
PURPOSE: To provide a cycloolfin copolymer which is excellent in clarity, resistance to heat distortion, and hardness and is chemically inert and resistant to hydrolysis. CONSTITUTION: This cycloolefin copolymer has a solution viscosity ...  
JP3872808B2
To provide novel catalyst compositions useful for polymerizing ethylene, acyclic olefins, and/or selected cyclic olefins, and optionally selected olefinic esters or carboxylic acids, and other monomers. Transition metal compounds such as...  
JP3871024B2
To provide a resist material having a high contrast in alkali dissolution rate before and after exposure, having high sensitivity and high resolution and exhibiting superior etching resistance by adding a high molecular compound obtained...  
JP3869166B2
To obtain a new compound of a polyalicyclic derivative containing oxygen or sulfur in the cyclic compound, and having hydroxy group, excellent in etching resistance and useful for a photoresist. This new compound is a photoresist monomer...  
JP3868196B2
To obtain both a photosensitive polymer suitable for a lithographic technique with an ArF excimer laser and a resist composition prepared from the polymer. This photosensitive polymer is represented by the chemical formula 1: [R1 is t-bu...  
JPWO2007004321A
It is a manufacturing method of a cyclic olefin system resin composition including a process of carrying out hydrotreating of the resin composition. A resin composition before hydrogenation used in the process contains 0.01 thru/or 20 we...  
JP2007004131A
To suppress adherence of dust and stain due to the environment, to obtain an optical element that can maintain optical characteristics for a long period of time, and to have superior durability and reliability, and to obtain an optical p...  
JP3867778B2
To provide a resist material such as a chemical amplification type resist material having very high contrast between velocity of dissolution in alkali before exposure and that after exposure, high sensitivity, high resolution and particu...  
JP2006342290A
To provide a modified low molecular weight ethylenic polymer excellent in adhesiveness, printability, compatibility in polymer blends, mold releasability at high temperatures, fixability at low temperatures, dispersibility of pigments, i...  
JP3859585B2
To obtain a cyclic diene copolymer which is prepared by copolymerizing an unsaturated compound with an easily producible cyclic conjugated diene monomer having a high polymerization activity. This bicyclic conjugated diene copolymer is p...  
JP3859391B2
To obtain a photosensitive polymer having high etching resistance and further excellent in adhesive strength to a lower film material, a dissolution suppressant and a chemical amplification type photoresist composition containing the pho...  
JP2006336005A
To provide a polymer for immersion lithography, making it possible that a photoacid generator is not dissolved in a liquid for immersion lithography, and to provide a photoresist composition containing the same.This polymer for the immer...  
JP2006335774A
To provide a method for producing a fluorine-containing polymer for photoresist transparent in a vacuum ultraviolet region, especially F2 laser (157 nm) beams and having excellent solubility in alkali developers and to provide a photores...  
JP3855770B2
To provide a radiation-sensitive resin composition having high transparency for radiation, excellent basic performances as a resist such as sensitivity, resolution, dry etching durability, pattern profile, and suitable as a chemical ampl...  
JP3854494B2
To provide a method for producing an olefin-based copolymer having a cyclic structure, which comprises ethylene and dicyclopentadiene or tricyclopentadiene, and a cyclic olefin to be introduced at need, for copolymerization. A catalyst c...  
JP2006323243A
To provide an optical waveguide and an optical waveguide structure, having superior heat resistance and low water absorption, while suppressing the material cost to be low.The optical waveguide structure includes an optical waveguide whi...  
JP2006323241A
To provide an optical waveguide and an optical waveguide structure which has excellent heat resistance and low water-absorbing property and whose material cost is low.The optical waveguide structure 9 has: the optical waveguide 90 having...  

Matches 951 - 1,000 out of 2,213