Login| Sign Up| Help| Contact|

Patent Searching and Data


Matches 1,001 - 1,050 out of 2,217

Document Document Title
JP2006323243A
To provide an optical waveguide and an optical waveguide structure, having superior heat resistance and low water absorption, while suppressing the material cost to be low.The optical waveguide structure includes an optical waveguide whi...  
JP2006323241A
To provide an optical waveguide and an optical waveguide structure which has excellent heat resistance and low water-absorbing property and whose material cost is low.The optical waveguide structure 9 has: the optical waveguide 90 having...  
JP2006323240A
To provide an optical waveguide and an optical waveguide structure which has excellent heat resistance and low water-absorbing property and whose material cost is low.The optical waveguide structure 9 has: the optical waveguide 90 having...  
JP3847783B2  
JP3847454B2
To provide a photoresist having an excellent pattern profile and an excellent substrate close contact characteristic by making resin that is dissolved by the action of acid to thereby increase its soluble characteristic to alkali, contai...  
JP3847991B2
To solve a problem of malodor and to provide a photoresist having an excellent resolution. A copolymer resin is obtained from a law material containing a monomethyl-cis-5-norbornene-endo-2,3-dicarboxylate monomer. A photoresist comprises...  
JP2006307194A
To provide a cyclic olefinic copolymer excellent in the balance between thermal resistance and strength.This cyclic olefinic copolymer is produced by copolymerizing an α-olefin having a carbon number of 2 to 30 with a cyclic olefin repr...  
JPWO2006118261A
The alpha* olefin ring-like オレフィン polyene copolymer of the present invention, It is characterized by being amorphia or the crystal heat of fusion being 90 kJ (s) /less than kg including the constitutional unit (C) drawn from th...  
JP2006299194A
To provide a new (meth)acrylic copolymer with low water absorption property that is suitable for use as a material for a molded article such as an optical material, a sheet suffering from the problem of curling caused by water absorption...  
JP2006301278A
To provide a positive resist composition for liquid immersion exposure which is used in manufacturing processes of a semiconductor such as an IC, fabrication of a circuit board of a liquid crystal, a thermal head or the like, and other p...  
JP2006297843A
To provide a fluororesin laminate of a fluorine-containing imparting strong adhesive properties to polyamide resin, copolymer general-purpose resins such as a polyolefin resin and various kinds of engineering resins.This laminate (I)/(II...  
JP3841406B2
To provide a resist composition excellent in sensitivity, resolving power and profile. The resist composition contains a specified sulfonium compound which contains a group having a -CON- bond or a -SO2N- bond and generates an acid upon ...  
JP3839218B2
To provide a new polymeric silicon compound having high sensitivity and high resolution, which is not only used preferably as a material for two- layered resist method particularly suitable for forming a pattern of high aspect ratio, but...  
JP2006293380A
To provide a chemical amplification type resist material which ensures a high resolution, good resist pattern profile and improved storage stability.A polymer using an ester of (meth)acrylic acid, bicycloheptenecarboxylic acid or bicyclo...  
JP2006294276A
To provide a highly reliable organic EL element with superior performance such as high transparency and low water absorptivity.The organic EL element is provided with a substrate, a lower-side electrode, an insulating film, an organic mu...  
JP2006293331A
To provide an optical compensation sheet which has a small optical characteristic change with respect to an environmental temperature/humidity changes and has high freedom of design of in-plane retardation Re and film-thickness-direction...  
JP3835506B2
To obtain a new compound useful as a monomer for a copolymer resin, for photoresist, which is used for ultra-short wavelength light sources such as ArF, has high transparency at a specific wavelength, high etching resistance, a high prot...  
JP2006278995A
To provide a resin composition which is superior in electric characteristics, has low coefficient of linear expansion, has high solder thermal resistance, and is superior in adhesiveness to a metal, when it acts as a resin layer.The resi...  
JP3830739B2
To obtain a fluorine-containing copolymer soluble in many general-purpose solvents, capable of giving a transparent coating film and comprising a principal chain having a ring structure having a saturated perfluoro group. A fluorine-cont...  
JPWO2006104049A
The present invention is (A) norbornene system monomer and (B) aromatic vinyl compound, And the (C) carbon number is a copolymer produced by carrying out addition copolymerization of the alpha* オレフィン of 2*20, and the sum of abu...  
JP3828577B2  
JP3829913B2
To provide a resist material excellent in resolving power and dry etching resistance in exposure with EB(electron beam), EUV(extreme-ultraviolet radiation) or X-rays. The resist material contains a polymer having repeating units each con...  
JPWO2006100974A
It excels in transparency, dampproofing, weatherability, and chemical resistance, and provides the transparent substrate for the container for wet solar cells, and wet solar cells produced by fabricating the resin composition for solar c...  
JP2005535753A5  
JP2006255996A
To provide a sheet suitable as the material of a packaging member high in flexibility and moistureproofness and having hygroscopicity, a packaging sheet comprising the sheet, and a PTP and blister pack package obtained by molding the she...  
JPWO2005012427A1
低誘電率、低誘電正接、低線膨張率、高耐熱 性及び密着性に優れ、泡かみのない成形体を 与えることのできる、環状オレフィン系モノ マーに充填材を多量に配合した、低粘度...  
JP2006241399A
To provide a composition exhibiting high-level processability and sufficient compatibility with ordinary polymers used in forming packaging materials, and having significant deoxigenating capacity either singly or as part of a film or ar...  
JP2006233117A
To obtain an olefin-terpenoid copolymer having a low gel content and to provide a method for producing the same.The olefin-terpenoid copolymer is obtained by copolymerizing an olefin with a terpenoid containing at least one unsaturated b...  
JP3817015B2
To obtain a cycloolefin copolymer having high heat insulating properties and a high clarity by selecting a cycloolefin copolymer comprising structural units derived from a linear or branched α-olefin, a cycloolefin, and an arom. vinyl c...  
JP2006213835A
To provide a new fluorine-containing polymer compound for manufacturing a resist material which is excellent in the transparency to a laser beam having a wavelength of 300 nm or less, especially a wavelength of 200 nm or less, and in the...  
JP2006518779A
(a). Include adding the polymerization catalyst containing the thing; for which a forming [set the monomer combination thing, non-olefin system chain transfer agent, and active agent compound containing a multi-ring type olefin monomer, ...  
JP2002521464A5  
JP2006206630A
To provide an ethylene-acenaphthylene copolymer excellent in optical properties and its manufacturing method.The ethylene-acenaphthylene random copolymer is obtained by copolymerizing ethylene and an acenaphthylene derivative represented...  
JP3805988B2
To obtain a photosensitive polymer comprising an alkyl vinyl ether copolymer and a resist composition containing the same. The photosensitive polymer comprises an alkyl vinyl ether/ maleic anhydride copolymer represented by formula I [wh...  
JP2006201532A
To provide a negative resist material having higher sensitivity, resolution, temporal stability and process adaptability than a conventional negative resist material, further having excellent etching resistance, and providing a good patt...  
JP2006203213A
To provide a lens composition of a light-emitting diode device for a liquid crystal display which has high resistance to heat and high transparency, and also to provide a light-emitting diode device comprising the same, a backlight unit ...  
JP3803173B2
To obtain the subject rubber composition capable of exhibiting excellent hermetically sealing property, weatherability, creep resistance, etc., by including an ethylene α-olefin-polyene amorphous copolymer exhibiting a specific structur...  
JP3804735B2
To obtain an antireflection material which exhibits a high surface hardness, a high scratch resistance, an excellent durability, a low reflectance, a high light transmission, a good adhesion to a transparent material, and an excellent fi...  
JP2006195050A
To provide a negative resist composition suppressing swelling of a resist pattern and a resist pattern forming method.The negative resist composition contains: (A) an alkali-soluble resin component; (B) an acid generator component which ...  
JP2006193641A
To provide a new aliphatic hydrocarbon resin petroleum resin having excellent properties to applications for hot melt adhesives and inks.The resin is obtained by carrying out heat polymerization of a raw material oil composed of 25-45 wt...  
JP2006193554A
To provide a cyclohexene copolymer which consists of ethylene and/or a 3-20C α-olefin and of a substituted and/or an unsubstituted cyclohexene, and an industrially manufacturing method thereof, and also a molded body comprising this cop...  
JP3800554B2
To provide a chemical-amplification-type resist composition containing a polymer containing a repeating unit derived from perfluoro-2,2-dimethyl-1,3-dioxole. The resist composition includes: (a) a photosensitive polymer comprising (a-1) ...  
JP3800318B2
To provide a resist material, a base resin of which is a polymer compound by this invention, which is useful for the microfabrication by the electron beam or far ultraviolet ray because the material is sensitive to a high energy beam and...  
JP3801018B2
To obtain a cycloolefin based addition copolymer that contains a reactive silyl group having a specific structure, has excellent optical transparency, heat resistance and adhesiveness, and can produce crosslinked substance having improve...  
JP3796568B2
To provide a resist material excellent in stability when allowed to stand in vacuum after exposure with electron beams, hardly causing trail on a Cr substrate and excellent in sensitivity, resolution and plasma etching resistance. The re...  
JP2006178150A
To provide an optical lens having small distribution of refractive index and small aberration of the lens (the deviation of focal length) in the inside part of of the lens.The optical lens is obtained by forming an α-olefin monomer norb...  
JP3793453B2
To provide a novel polymer which can be used to compose a useful resist for a minute processing using various radial rays and a resist composition containing the polymer. This acid-labile polymer is represented by the formula 1 wherein R...  
JP2006171684A
To provide a polymer for upper anti-reflective coating that is used in immersion lithography without being dissolved in water, prevents multiple interaction of light in a photoresist film during photoresist pattern formation, and can sup...  
JP2006516298A
The present invention relates to the resin composite containing an ester compound and polymer, and the ester compound and polymer are obtained by making ジエン, philharmonic ジエノ, and carboxylic acid react. Moreover, the present ...  
JP2006169302A
To provide a positive resist material, especially a chemical amplification positive type resist material, which has high resolution, high exposure margin, small compressional dimension difference, and process adaptability, forms good pat...  

Matches 1,001 - 1,050 out of 2,217