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Patent Searching and Data


Matches 1,051 - 1,100 out of 2,253

Document Document Title
JP3835506B2
To obtain a new compound useful as a monomer for a copolymer resin, for photoresist, which is used for ultra-short wavelength light sources such as ArF, has high transparency at a specific wavelength, high etching resistance, a high prot...  
JP2006278995A
To provide a resin composition which is superior in electric characteristics, has low coefficient of linear expansion, has high solder thermal resistance, and is superior in adhesiveness to a metal, when it acts as a resin layer.The resi...  
JP3830739B2
To obtain a fluorine-containing copolymer soluble in many general-purpose solvents, capable of giving a transparent coating film and comprising a principal chain having a ring structure having a saturated perfluoro group. A fluorine-cont...  
JPWO2006104049A
The present invention is (A) norbornene system monomer and (B) aromatic vinyl compound, And the (C) carbon number is a copolymer produced by carrying out addition copolymerization of the alpha* オレフィン of 2*20, and the sum of abu...  
JP3828577B2  
JP3829913B2
To provide a resist material excellent in resolving power and dry etching resistance in exposure with EB(electron beam), EUV(extreme-ultraviolet radiation) or X-rays. The resist material contains a polymer having repeating units each con...  
JPWO2006100974A
It excels in transparency, dampproofing, weatherability, and chemical resistance, and provides the transparent substrate for the container for wet solar cells, and wet solar cells produced by fabricating the resin composition for solar c...  
JP2005535753A5  
JP2006255996A
To provide a sheet suitable as the material of a packaging member high in flexibility and moistureproofness and having hygroscopicity, a packaging sheet comprising the sheet, and a PTP and blister pack package obtained by molding the she...  
JPWO2005012427A1
低誘電率、低誘電正接、低線膨張率、高耐熱 性及び密着性に優れ、泡かみのない成形体を 与えることのできる、環状オレフィン系モノ マーに充填材を多量に配合した、低粘度...  
JP2006241399A
To provide a composition exhibiting high-level processability and sufficient compatibility with ordinary polymers used in forming packaging materials, and having significant deoxigenating capacity either singly or as part of a film or ar...  
JP2006233117A
To obtain an olefin-terpenoid copolymer having a low gel content and to provide a method for producing the same.The olefin-terpenoid copolymer is obtained by copolymerizing an olefin with a terpenoid containing at least one unsaturated b...  
JP3817015B2
To obtain a cycloolefin copolymer having high heat insulating properties and a high clarity by selecting a cycloolefin copolymer comprising structural units derived from a linear or branched α-olefin, a cycloolefin, and an arom. vinyl c...  
JP2006213835A
To provide a new fluorine-containing polymer compound for manufacturing a resist material which is excellent in the transparency to a laser beam having a wavelength of 300 nm or less, especially a wavelength of 200 nm or less, and in the...  
JP2006518779A
(a). Include adding the polymerization catalyst containing the thing; for which a forming [set the monomer combination thing, non-olefin system chain transfer agent, and active agent compound containing a multi-ring type olefin monomer, ...  
JP2002521464A5  
JP2006206630A
To provide an ethylene-acenaphthylene copolymer excellent in optical properties and its manufacturing method.The ethylene-acenaphthylene random copolymer is obtained by copolymerizing ethylene and an acenaphthylene derivative represented...  
JP3805988B2
To obtain a photosensitive polymer comprising an alkyl vinyl ether copolymer and a resist composition containing the same. The photosensitive polymer comprises an alkyl vinyl ether/ maleic anhydride copolymer represented by formula I [wh...  
JP2006201532A
To provide a negative resist material having higher sensitivity, resolution, temporal stability and process adaptability than a conventional negative resist material, further having excellent etching resistance, and providing a good patt...  
JP2006203213A
To provide a lens composition of a light-emitting diode device for a liquid crystal display which has high resistance to heat and high transparency, and also to provide a light-emitting diode device comprising the same, a backlight unit ...  
JP3803173B2
To obtain the subject rubber composition capable of exhibiting excellent hermetically sealing property, weatherability, creep resistance, etc., by including an ethylene α-olefin-polyene amorphous copolymer exhibiting a specific structur...  
JP3804735B2
To obtain an antireflection material which exhibits a high surface hardness, a high scratch resistance, an excellent durability, a low reflectance, a high light transmission, a good adhesion to a transparent material, and an excellent fi...  
JP2006195050A
To provide a negative resist composition suppressing swelling of a resist pattern and a resist pattern forming method.The negative resist composition contains: (A) an alkali-soluble resin component; (B) an acid generator component which ...  
JP2006193641A
To provide a new aliphatic hydrocarbon resin petroleum resin having excellent properties to applications for hot melt adhesives and inks.The resin is obtained by carrying out heat polymerization of a raw material oil composed of 25-45 wt...  
JP2006193554A
To provide a cyclohexene copolymer which consists of ethylene and/or a 3-20C α-olefin and of a substituted and/or an unsubstituted cyclohexene, and an industrially manufacturing method thereof, and also a molded body comprising this cop...  
JP3800554B2
To provide a chemical-amplification-type resist composition containing a polymer containing a repeating unit derived from perfluoro-2,2-dimethyl-1,3-dioxole. The resist composition includes: (a) a photosensitive polymer comprising (a-1) ...  
JP3800318B2
To provide a resist material, a base resin of which is a polymer compound by this invention, which is useful for the microfabrication by the electron beam or far ultraviolet ray because the material is sensitive to a high energy beam and...  
JP3801018B2
To obtain a cycloolefin based addition copolymer that contains a reactive silyl group having a specific structure, has excellent optical transparency, heat resistance and adhesiveness, and can produce crosslinked substance having improve...  
JP3796568B2
To provide a resist material excellent in stability when allowed to stand in vacuum after exposure with electron beams, hardly causing trail on a Cr substrate and excellent in sensitivity, resolution and plasma etching resistance. The re...  
JP2006178150A
To provide an optical lens having small distribution of refractive index and small aberration of the lens (the deviation of focal length) in the inside part of of the lens.The optical lens is obtained by forming an α-olefin monomer norb...  
JP3793453B2
To provide a novel polymer which can be used to compose a useful resist for a minute processing using various radial rays and a resist composition containing the polymer. This acid-labile polymer is represented by the formula 1 wherein R...  
JP2006171684A
To provide a polymer for upper anti-reflective coating that is used in immersion lithography without being dissolved in water, prevents multiple interaction of light in a photoresist film during photoresist pattern formation, and can sup...  
JP2006516298A
The present invention relates to the resin composite containing an ester compound and polymer, and the ester compound and polymer are obtained by making ジエン, philharmonic ジエノ, and carboxylic acid react. Moreover, the present ...  
JP2006169302A
To provide a positive resist material, especially a chemical amplification positive type resist material, which has high resolution, high exposure margin, small compressional dimension difference, and process adaptability, forms good pat...  
JPWO2006067950A
(1) Cyclic olefin compound 5* 80-mol % which has a substitution machine chosen from the アルキル machine, アルキル silyl group, and アルキル silyl methyl group which are denoted by a following formula (1), And the monomer con...  
JP2006152173A
To provide a resin composition which has excellent electric characteristics and gives a resin layer for a circuit board having a good adhesion to the base material and can have micro via holes created by laser, also to provide a carrier ...  
JP2006143930A
To provide an optical element improved in light stability and capable of sustaining the stability for a long time, to provide a method for producing the same, and to provide an optical pick-up device given by using the optical element.Th...  
JP3783780B2
To provide (1) a resist material containing a polymer compound as a base resin which contains an ester compound giving a polymer compound with excellent acid decomposing property as a structural unit and which realizes the sensitivity, r...  
JPWO2006057309A
The present invention is excellent in heat resistance, low-specific-gravity nature, low double reflex nature, low photoelasticity, and low wavelength dispersion nature, and an object of the present invention is to provide the phase contr...  
JP2006133712A
To provide a positive resist composition which is employed in manufacturing steps of semiconductors such as ICs and when manufacturing liquid crystals, circuit boards for thermal heads, and used in the lithographic steps of other photo a...  
JP3773545B2
PURPOSE: To obtain a copolymer useful for moldings, etc., in a high space-time yield by polymerizing a polycyclic olefin, a cycloolefin, a noncyclic olefin, which are specified respectively and mixed in a specified ratio, in the presence...  
JP3773546B2
PURPOSE: To efficiently obtain the subject copolymer excellent in low temperature characteristics such as low temperature impact resistance and suitable as a molding material for automotive external parts, etc., by copolymerizing ethylen...  
JP2006514156A
The stage of the present invention polymerizing a cyclic olefin monomer or a cyclic olefin monomer, and ethylene, and manufacturing a cyclic olefin polymer solution, b) The stage of adding by the system which trickles a non-solvent into ...  
JPWO2004056882A1
粘着付与樹脂に用いるシクロペンタジエン系 化合物とビニル芳香族化合物とからなる水添 石油樹脂の製造方法において、粘着付与樹脂 の粘着性能を向上させつつ、生産性の向...  
JP2006106606A
To provide an optical film which can be simply and inexpensively manufactured, is excellent in mechanical characteristics and thermal durability, has low specific gravity, low birefringence, low photoelastic modulus and low wavelength di...  
JP2006096812A
To provide a cycloolefinic resin composition containing an epoxy group and most suitable for a surface protection film for a semiconductor element and provide a semiconductor device to improve poor workability in the production of a resi...  
JP3761078B2
To provide a polymer which contains repeating units derived from perfluoro-2,2-dimethyl-1,3-dioxole; and a chemical-amplification-type resist composition containing the same. This resist composition contains (a) a photosensitive polymer ...  
JPWO2006030797A
Moisture resistance of dimensional stability is highly good, for example, is included in a liquid crystal display, and the phase contrast film which can be effectively used to an improvement of the display quality of liquid crystals, suc...  
JP2006076235A
To provide, in manufacturing an optical element having high permeability for short wavelength light and little in birefringence by molding a resin composition, a method for manufacturing the same which does not cause defects on the optic...  
JP2006077228A
To provide a new copolymer to be used for preparing resists useful for microprocessing using various kinds of radiations, and to provide a resist composition containing the copolymer.The new copolymer is represented by chemical formula(1...  

Matches 1,051 - 1,100 out of 2,253