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Patent Searching and Data


Matches 1,051 - 1,100 out of 2,213

Document Document Title
JP2006143930A
To provide an optical element improved in light stability and capable of sustaining the stability for a long time, to provide a method for producing the same, and to provide an optical pick-up device given by using the optical element.Th...  
JP3783780B2
To provide (1) a resist material containing a polymer compound as a base resin which contains an ester compound giving a polymer compound with excellent acid decomposing property as a structural unit and which realizes the sensitivity, r...  
JPWO2006057309A
The present invention is excellent in heat resistance, low-specific-gravity nature, low double reflex nature, low photoelasticity, and low wavelength dispersion nature, and an object of the present invention is to provide the phase contr...  
JP2006133712A
To provide a positive resist composition which is employed in manufacturing steps of semiconductors such as ICs and when manufacturing liquid crystals, circuit boards for thermal heads, and used in the lithographic steps of other photo a...  
JP3773545B2
PURPOSE: To obtain a copolymer useful for moldings, etc., in a high space-time yield by polymerizing a polycyclic olefin, a cycloolefin, a noncyclic olefin, which are specified respectively and mixed in a specified ratio, in the presence...  
JP3773546B2
PURPOSE: To efficiently obtain the subject copolymer excellent in low temperature characteristics such as low temperature impact resistance and suitable as a molding material for automotive external parts, etc., by copolymerizing ethylen...  
JP2006514156A
The stage of the present invention polymerizing a cyclic olefin monomer or a cyclic olefin monomer, and ethylene, and manufacturing a cyclic olefin polymer solution, b) The stage of adding by the system which trickles a non-solvent into ...  
JPWO2004056882A1
粘着付与樹脂に用いるシクロペンタジエン系 化合物とビニル芳香族化合物とからなる水添 石油樹脂の製造方法において、粘着付与樹脂 の粘着性能を向上させつつ、生産性の向...  
JP2006106606A
To provide an optical film which can be simply and inexpensively manufactured, is excellent in mechanical characteristics and thermal durability, has low specific gravity, low birefringence, low photoelastic modulus and low wavelength di...  
JP2006096812A
To provide a cycloolefinic resin composition containing an epoxy group and most suitable for a surface protection film for a semiconductor element and provide a semiconductor device to improve poor workability in the production of a resi...  
JP3761078B2
To provide a polymer which contains repeating units derived from perfluoro-2,2-dimethyl-1,3-dioxole; and a chemical-amplification-type resist composition containing the same. This resist composition contains (a) a photosensitive polymer ...  
JPWO2006030797A
Moisture resistance of dimensional stability is highly good, for example, is included in a liquid crystal display, and the phase contrast film which can be effectively used to an improvement of the display quality of liquid crystals, suc...  
JP2006076235A
To provide, in manufacturing an optical element having high permeability for short wavelength light and little in birefringence by molding a resin composition, a method for manufacturing the same which does not cause defects on the optic...  
JP2006077228A
To provide a new copolymer to be used for preparing resists useful for microprocessing using various kinds of radiations, and to provide a resist composition containing the copolymer.The new copolymer is represented by chemical formula(1...  
JP3758973B2
To obtain a photosensitive polymer having main chain composed completely solely of a norbornene-type alicyclic unit, and a resist composition containing the same. The photosensitive polymer is represented by formula I (wherein R1 is an a...  
JP2006072383A
To provide a chemical-amplification-type resist composition containing a polymer containing a repeating unit derived from perfluoro-2,2-dimethyl-1,3-dioxole.The resist composition includes: (a) a photosensitive polymer comprising (a-1) a...  
JP3755361B2
To provide a copolymer capable of taking a structure contg. no halogen regarded questionable from a view point of environmental pollution, transparent, and excellent in flexibility and heat resistance, an efficient manufacturing method o...  
JP2006063239A
To provide a macromolecular compound for photoresists capable of forming highly water-resistant resist film.The macromolecular compound is composed of monomer units each represented by formula (I) (wherein, Ra is H, a halogen atom, 1-6C ...  
JP2006056920A
To provide a molded product of a cyclic olefinic polymer maintaining transparency and suppressing discoloring or fading.The method for producing the molded product of the cyclic olefinic resin is carried out as follows. A polymer represe...  
JP2006057105A
To provide a method for efficiently producing a copolymer transparent, excellent in flexibility and heat resistance and capable of containing no halogen viewed with suspicion from a viewpoint of environmental pollution.The method for pro...  
JP3749674B2  
JP2006053543A
To provide an undercoat-forming material which, optionally combined with an intermediate layer having an antireflective effect, has an absorption coefficient sufficient to provide an antireflective effect at a thickness of ≥200 nm, has...  
JP2006053404A
To provide a radiation-sensitive composition which forms a crosslinked structure upon exposure to radiation, is degraded to low molecular weight by heating at a relatively low temperature after crosslinking, can easily be removed without...  
JP2006052347A
To provide a method for producing a cyclic olefin-based addition polymer, with which addition polymerization is readily carried out up to a high polymerization conversion ratio even if an alkyl substituent group-containing bicyclo[2.2.1]...  
JPWO2004035641A1
It has a structure unit originating in the monomer which may contain the fluorine atom which can give fatty series ring structure to the structure unit and/or polymer main chain originating in a fluorine-containing ethylenic monomer, And...  
JP3745620B2  
JP2006036891A
To provide a compound having a new lactone skeleton which is useful as a constituent monomer for photoresist resins.The α-unsaturated acyloxy-γ-butylolactone derivative is represented by formula (1) (wherein Ra is a hydrogen atom, a ha...  
JP2006036892A
To provide a compound having a new lactone skeleton which is useful as a constituent monomer for photoresist resins.The α-unsaturated acyloxy-γ-butylolactone derivative is represented by formula (1) (wherein Ra is a hydrogen atom, a ha...  
JP2006036890A
To provide a compound having a new lactone skeleton which is useful as a constituent monomer for photoresist resins.The β-carboxy-α-unsaturated acyloxy-γ-butylolactone derivative is represented by formula (1) (wherein Ra is a hydrogen...  
JP2006028525A
To provide a method of producing at least one homopolymer of a cationically polymerizable monomer, or producing a copolymer from the monomer and a norbornene-type monomer, and to provide a polymer which is obtained by the production meth...  
JP3741522B2  
JP2006022266A
To provide a resin composition having improved transfer properties at molding of an optical lens or the like such as various kinds of lenses of a pickup lens, a collimator lens or the like for an optical system of an optical disk, hardly...  
JP2006022310A
To provide a vinyl-added polymer composition and to provide a method for forming the composition and a method for using the composition for forming electronics and optoelectronic devices.The polymer is composed of a vinyl-added polymer h...  
JP3739251B2
To provide a positive type resist composition used for laser light in the vacuum ultraviolet region as a positive type resist composition containing a base resin having solubility in an alkaline aqueous solution varied by the action of a...  
JP3739401B2  
JP2006016533A
To provide a copolymerization catalyst system industrially more simply synthesizable and having high polymerization activity and high copolymerizability and to provide a method for producing a copolymer of an α-olefin and a cyclic olefi...  
JP2002341539A5  
JP2006016403A
To provide a metallocene compound providing a method for preparing a cycloolefin copolymer by which a chemically homogeneous copolymer is provided in higher space time yield based on the polymerization through a double bond, and the effe...  
JP2002131917A5  
JP3736994B2
To obtain a resist composition, which is resistant to dry etching and is adapted for lithography using an ArF exima laser, by comprising a specific type of photosensitive polymer for chemical amplification-type resist and a photo acid-ge...  
JP3737012B2
To provide an antireflection film forming composition for forming a high hardness antireflection film on an article and an article with an antireflection film formed using the composition. The antireflection film forming composition cont...  
JP3736606B2
To provide a resist material suitable to a fine pattern forming material for producing VLSI, which is responsed to high energy rays and excellent in sensitivity, resolution and resistance to oxygen plasma etching at ≤300 nm wavelengths...  
JP2006009003A
To provide catalytic compositions, a process for their preparation and their use for preparation of a polymer from an ethylenic unsaturated monomer.The catalytic cationic metal complex compositions are cationic metal pair complexes havin...  
JP2001356478A5  
JP2002202606A5  
JP2002099087A5  
JP3734015B2
To obtain a resist material used for a method for forming a pattern, inducing high energy line and excellent in sensitivity, resolution and plasma etching resistance at ≤180 nm, especially ≤160 nm of wavelength. This polymer is chara...  
JP3732695B2
To provide the photoresist cross-linking agent superior in the cross- linking ability by low exposure energy by incorporating a specified compound. The compound to be incorporated is represented by the formula in which each of R1, R2, an...  
JP2005351942A
To provide a positive resist composition for forming a resist pattern superior in a shape and etching resistance, and to provide a resist pattern forming method.The positive resist composition includes a resin (A) having an acid dissocia...  
JP2005536589A
The present invention, If small. The repeating unit guided from the fluorination olefin of も一種. And fluoride content コポリマー which has the repeating unit and other repeating units typically guided from a アクリ rate in o...  

Matches 1,051 - 1,100 out of 2,213