Login| Sign Up| Help| Contact|

Patent Searching and Data


Matches 1,101 - 1,150 out of 2,253

Document Document Title
JP3758973B2
To obtain a photosensitive polymer having main chain composed completely solely of a norbornene-type alicyclic unit, and a resist composition containing the same. The photosensitive polymer is represented by formula I (wherein R1 is an a...  
JP2006072383A
To provide a chemical-amplification-type resist composition containing a polymer containing a repeating unit derived from perfluoro-2,2-dimethyl-1,3-dioxole.The resist composition includes: (a) a photosensitive polymer comprising (a-1) a...  
JP3755361B2
To provide a copolymer capable of taking a structure contg. no halogen regarded questionable from a view point of environmental pollution, transparent, and excellent in flexibility and heat resistance, an efficient manufacturing method o...  
JP2006063239A
To provide a macromolecular compound for photoresists capable of forming highly water-resistant resist film.The macromolecular compound is composed of monomer units each represented by formula (I) (wherein, Ra is H, a halogen atom, 1-6C ...  
JP2006056920A
To provide a molded product of a cyclic olefinic polymer maintaining transparency and suppressing discoloring or fading.The method for producing the molded product of the cyclic olefinic resin is carried out as follows. A polymer represe...  
JP2006057105A
To provide a method for efficiently producing a copolymer transparent, excellent in flexibility and heat resistance and capable of containing no halogen viewed with suspicion from a viewpoint of environmental pollution.The method for pro...  
JP3749674B2  
JP2006053543A
To provide an undercoat-forming material which, optionally combined with an intermediate layer having an antireflective effect, has an absorption coefficient sufficient to provide an antireflective effect at a thickness of ≥200 nm, has...  
JP2006053404A
To provide a radiation-sensitive composition which forms a crosslinked structure upon exposure to radiation, is degraded to low molecular weight by heating at a relatively low temperature after crosslinking, can easily be removed without...  
JP2006052347A
To provide a method for producing a cyclic olefin-based addition polymer, with which addition polymerization is readily carried out up to a high polymerization conversion ratio even if an alkyl substituent group-containing bicyclo[2.2.1]...  
JPWO2004035641A1
It has a structure unit originating in the monomer which may contain the fluorine atom which can give fatty series ring structure to the structure unit and/or polymer main chain originating in a fluorine-containing ethylenic monomer, And...  
JP3745620B2  
JP2006036891A
To provide a compound having a new lactone skeleton which is useful as a constituent monomer for photoresist resins.The α-unsaturated acyloxy-γ-butylolactone derivative is represented by formula (1) (wherein Ra is a hydrogen atom, a ha...  
JP2006036892A
To provide a compound having a new lactone skeleton which is useful as a constituent monomer for photoresist resins.The α-unsaturated acyloxy-γ-butylolactone derivative is represented by formula (1) (wherein Ra is a hydrogen atom, a ha...  
JP2006036890A
To provide a compound having a new lactone skeleton which is useful as a constituent monomer for photoresist resins.The β-carboxy-α-unsaturated acyloxy-γ-butylolactone derivative is represented by formula (1) (wherein Ra is a hydrogen...  
JP2006028525A
To provide a method of producing at least one homopolymer of a cationically polymerizable monomer, or producing a copolymer from the monomer and a norbornene-type monomer, and to provide a polymer which is obtained by the production meth...  
JP3741522B2  
JP2006022266A
To provide a resin composition having improved transfer properties at molding of an optical lens or the like such as various kinds of lenses of a pickup lens, a collimator lens or the like for an optical system of an optical disk, hardly...  
JP2006022310A
To provide a vinyl-added polymer composition and to provide a method for forming the composition and a method for using the composition for forming electronics and optoelectronic devices.The polymer is composed of a vinyl-added polymer h...  
JP3739251B2
To provide a positive type resist composition used for laser light in the vacuum ultraviolet region as a positive type resist composition containing a base resin having solubility in an alkaline aqueous solution varied by the action of a...  
JP3739401B2  
JP2006016533A
To provide a copolymerization catalyst system industrially more simply synthesizable and having high polymerization activity and high copolymerizability and to provide a method for producing a copolymer of an α-olefin and a cyclic olefi...  
JP2002341539A5  
JP2006016403A
To provide a metallocene compound providing a method for preparing a cycloolefin copolymer by which a chemically homogeneous copolymer is provided in higher space time yield based on the polymerization through a double bond, and the effe...  
JP2002131917A5  
JP3736994B2
To obtain a resist composition, which is resistant to dry etching and is adapted for lithography using an ArF exima laser, by comprising a specific type of photosensitive polymer for chemical amplification-type resist and a photo acid-ge...  
JP3737012B2
To provide an antireflection film forming composition for forming a high hardness antireflection film on an article and an article with an antireflection film formed using the composition. The antireflection film forming composition cont...  
JP3736606B2
To provide a resist material suitable to a fine pattern forming material for producing VLSI, which is responsed to high energy rays and excellent in sensitivity, resolution and resistance to oxygen plasma etching at ≤300 nm wavelengths...  
JP2006009003A
To provide catalytic compositions, a process for their preparation and their use for preparation of a polymer from an ethylenic unsaturated monomer.The catalytic cationic metal complex compositions are cationic metal pair complexes havin...  
JP2001356478A5  
JP2002202606A5  
JP2002099087A5  
JP3734015B2
To obtain a resist material used for a method for forming a pattern, inducing high energy line and excellent in sensitivity, resolution and plasma etching resistance at ≤180 nm, especially ≤160 nm of wavelength. This polymer is chara...  
JP3732695B2
To provide the photoresist cross-linking agent superior in the cross- linking ability by low exposure energy by incorporating a specified compound. The compound to be incorporated is represented by the formula in which each of R1, R2, an...  
JP2005351942A
To provide a positive resist composition for forming a resist pattern superior in a shape and etching resistance, and to provide a resist pattern forming method.The positive resist composition includes a resin (A) having an acid dissocia...  
JP2005536589A
The present invention, If small. The repeating unit guided from the fluorination olefin of も一種. And fluoride content コポリマー which has the repeating unit and other repeating units typically guided from a アクリ rate in o...  
JP2005536589A5  
JP2005331824A
To provide a radiation-sensitive resin composition having excellent latitude characteristics of the focal depth, line edge roughness characteristics and line end foreshortening characteristics while keeping high resolution as a chemicall...  
JP3721190B1
The directions for the composite concerned for forming the formation method of a vinyl addition polymer composite and the composite concerned, electronics, and an opto-electronics device are offered. The vinyl addition polymer composite ...  
JP3720970B2
To obtain a photosensitive compsn. which has extremely little absorption on a light source of a short wavelength and has excellent solubility, alkaline developability, resolution and dry etching resistance by incorporating a polymer incl...  
JP2005535780A
At least one repeating unit guided from the ethylene nature unsaturated compound which has at least one fluorine atom in which the covalent bond of the present invention was carried out to (a) ethylene nature unsaturated carbon atom, (b)...  
JP2005325325A
To provide a polymeric compound the alkali solubility of which changes in a large way before and after exposure in a chemically amplified positive resist, a photoresist composition containing the polymeric compound and capable of forming...  
JP2005535709A
The present invention offers in option new fluoride content コポリマー containing at least one sort of fluorination olefins, at least one sort of multi-ring type ethylene nature unsaturated monomers which have condensation 4 member ...  
JP3719308B2
To obtain a random addition copolymer of a cyclic olefin having a polar group such as an ester group or an acid anhydride group with ethylene. This copolymer has (a) a structural unit derived from ethylene and (b) a structural unit deriv...  
JP2005535478A
The technology which produces the lens form block which can be used for manufacturing the soft contact lens of a variously different type is offered. The form block for this lens production contains 脂環 type コポリマー containing...  
JP2005325349A
To provide a thermoplastic resin material having extremely small refractive index variation with temperature and provide an optical element produced by using the material.The thermoplastic resin material contains surface-treated inorgani...  
JP2005535753A
The present invention offers in option new fluoride content polymer containing at least one sort of multi-ring type ethylene nature unsaturated monomers which have at least one sort of fluorination olefins, and condensation 4 member annu...  
JP2005320420A
To provide a norbornene-based copolymer which is used for various applications requiring polarity.The polar group-containing cycloolefin-based copolymer contains 50-99.9 mol% of a cycloolefin and 0-49.9 mol% of an alkenyl unit and has a ...  
JP2005321685A
To provide fluorine-containing copolymer for plastic optical fiber that is amorphous, flexible, low in transmission loss, and has a sufficiently high glass transition temperature (Tg).The fluorine-containing copolymer for plastic optical...  
JP2005307218A
To provide novel catalyst compositions useful for polymerizing ethylene, acyclic olefins, and/or selected cyclic olefins, and optionally selected olefinic esters or carboxylic acids, and other monomers.Transition metal compounds such as ...  

Matches 1,101 - 1,150 out of 2,253