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Matches 1,101 - 1,150 out of 2,213

Document Document Title
JP2005536589A5  
JP2005331824A
To provide a radiation-sensitive resin composition having excellent latitude characteristics of the focal depth, line edge roughness characteristics and line end foreshortening characteristics while keeping high resolution as a chemicall...  
JP3721190B1
The directions for the composite concerned for forming the formation method of a vinyl addition polymer composite and the composite concerned, electronics, and an opto-electronics device are offered. The vinyl addition polymer composite ...  
JP3720970B2
To obtain a photosensitive compsn. which has extremely little absorption on a light source of a short wavelength and has excellent solubility, alkaline developability, resolution and dry etching resistance by incorporating a polymer incl...  
JP2005535780A
At least one repeating unit guided from the ethylene nature unsaturated compound which has at least one fluorine atom in which the covalent bond of the present invention was carried out to (a) ethylene nature unsaturated carbon atom, (b)...  
JP2005325325A
To provide a polymeric compound the alkali solubility of which changes in a large way before and after exposure in a chemically amplified positive resist, a photoresist composition containing the polymeric compound and capable of forming...  
JP2005535709A
The present invention offers in option new fluoride content コポリマー containing at least one sort of fluorination olefins, at least one sort of multi-ring type ethylene nature unsaturated monomers which have condensation 4 member ...  
JP3719308B2
To obtain a random addition copolymer of a cyclic olefin having a polar group such as an ester group or an acid anhydride group with ethylene. This copolymer has (a) a structural unit derived from ethylene and (b) a structural unit deriv...  
JP2005535478A
The technology which produces the lens form block which can be used for manufacturing the soft contact lens of a variously different type is offered. The form block for this lens production contains 脂環 type コポリマー containing...  
JP2005325349A
To provide a thermoplastic resin material having extremely small refractive index variation with temperature and provide an optical element produced by using the material.The thermoplastic resin material contains surface-treated inorgani...  
JP2005535753A
The present invention offers in option new fluoride content polymer containing at least one sort of multi-ring type ethylene nature unsaturated monomers which have at least one sort of fluorination olefins, and condensation 4 member annu...  
JP2005320420A
To provide a norbornene-based copolymer which is used for various applications requiring polarity.The polar group-containing cycloolefin-based copolymer contains 50-99.9 mol% of a cycloolefin and 0-49.9 mol% of an alkenyl unit and has a ...  
JP2005321685A
To provide fluorine-containing copolymer for plastic optical fiber that is amorphous, flexible, low in transmission loss, and has a sufficiently high glass transition temperature (Tg).The fluorine-containing copolymer for plastic optical...  
JP2005307218A
To provide novel catalyst compositions useful for polymerizing ethylene, acyclic olefins, and/or selected cyclic olefins, and optionally selected olefinic esters or carboxylic acids, and other monomers.Transition metal compounds such as ...  
JP2005305941A
To provide a method for molding an article free from a fish-eye generated when a cyclic olefin copolymer is melt-molded.In the method for melt-molding an article using a thermoplastic norbornene resin composed of a cyclic olefin and an ...  
JP3712043B2
To obtain a material for an antireflection film excellent in dimensional accuracy and aligning accuracy and capable of reproducibly forming a fine resist pattern. The polymeric compound is obtained by polymerizing a cyclic perfluoro mono...  
JP3712048B2
To provide a resist material excellent in resolving power and dry etching resistance in exposure with EB(electron beam), EUV(extreme-ultraviolet radiation) or X-rays. The resist material contains a polymer having repeating units each con...  
JP2005532413A
Fluorination polymer, the photoresist, and the related method which are used for micro lithography are explained. Such polymers and photoresist consist of ester guided from the full オロア record functional group which gives the high ...  
JP2005290375A
To provide a catalyst complex for polymerization and copolymerization of a cyclic olefin.In a method for polymerization and copolymerization of the cyclic olefin such as norbornene, the catalyst complex showing a high activity for polyme...  
JP3706805B2
To provide a photosensitive polymer, a resist composition containing the polymer and a method for producing the polymer. The photosensitive polymer is represented by formula I (where R1 is an acid decomposable tertiary alkyl; R2 is γ-bu...  
JP2005281219A
To provide a new alicyclic structure-containing monomer capable of obtaining a polymer having extremely low birefringence and high heat resistance as well as excellent transparency and non-water absorbency.A norbornene derivative contain...  
JP3705734B2
To provide a new photoresist monomer that can be used in the far ultraviolet ray area. This monomer is a bicyclo compound represented by formula (1) (B means a group selected from those represented by formula II (R is H, a 1-10C alkyl, -...  
JP3703525B2
PURPOSE: To obtain a thermoplastic cycloolefin copolymer having excellent tensile strength and transparency and a high viscosity number by polymerizing a cycloolefin with an acryclic olefin in the presence of a specified catalyst. CONSTI...  
JP2005264014A
To provide a cycloolefinic resin composition which is capable of forming a crosslink or a quasi-crosslink due to a carboxylic group generated in the molecule of a commercially producible cycloolefinic addition polymer under a specific co...  
JP2005255732A
To provide a manufacturing method for a hydrogenated cyclic conjugated diene copolymer excellent in impact resistance, heat resistance and transparency, and a resin molded product for optical applications made of the same.The manufacturi...  
JP2005255731A
To obtain a hydrogenated cyclic conjugated diene copolymer excellent in impact resistance, heat resistance and transparency, and to provide a resin molded product for optical applications made of the same.The hydrogenated cyclic conjugat...  
JP3698437B2  
JP2005247942A
To obtain a low-molecular weight α-olefin/cycloolefin copolymer having many reactive double bonds on its terminals.This α-olefin/cycloolefin copolymer is the one comprising (A) a 2 to 30C linear or branched α-olefin and (B) a specifie...  
JP2005250434A
To provide a resist underlayer film material for a multilayer resist process, particularly for a two-layer resist process, which functions as an excellent antireflection film particularly for exposure at a short wavelength, that is, has ...  
JP2005527662A
The present invention is a hydrocarbon mixture including a denaturation polycyclic aromatic compound or the denaturation PAC, Have the chemical structure of the average molecular weight 200*10000, and this chemical structure is expressed...  
JP2005527673A
Polymer contains at least one of the acetal content monomer unit which has the general structure I, and the fluoride content monomer units which have the general structures II and III. Independently R, R, R, and R here, respectively H, l...  
JP2005239903A
To obtain a polymer for a resist, having small line edge roughness and slightly forming microgel and defects when used as a resist resin in DUV excimer laser lithography, electron beam lithography, etc., and a resist composition and to p...  
JP2005240024A
To provide a resist material excellent in the transmissivity of far ultraviolet rays with a wavelength of 300 nm or below, especially ArF (193 nm), especially a novel polymer compound useful as the base polymer of a chemically amplified ...  
JP2005239975A
To provide a production method for an aromatic-containing cycloolefin copolymer having excellent characteristics of an optical material, such as heat resistance, impact resistance, thermal aging resistance and transparency together with ...  
JP2005227718A
To provide a micropattern forming method using a highly practical fluorine-containing polymer capable of improving dry etching resistance with respect to a fluorine-containing polymer having high transparency to exposure light of a short...  
JP2005220274A
To provide a polymer compound excellent in resolution in exposure to an ArF excimer laser and dry etching resist, capable of suppressing line edge roughness small and useful for a base resin for use in a radiation sensitive resist.The po...  
JP3682229B2  
JP2005202205A
To provide a positive resist composition which exhibits satisfactory transmittance at the time of using an exposure light source of ≤200 nm, specifically F2 excimer laser light (157 nm) and is improved in surface roughness, development...  
JP3676331B2
To obtain a resist pattern having a good pattern shape when a resist pattern is formed using exposing light having a wavelength of ≤180 nm band with minimally producing scum. A pattern formation material comprising a base resin contain...  
JP3675133B2
To obtain a resist compsn. which shows excellent adhesion strength to a film material and excellent durability against etching and for which a normal developer can be used for development, by incorporating a specified polymer and a PAG (...  
JP2005194498A
To provide a new polymer capable of forming a resist useful for microprocessing using radiation and to provide a resist composition comprising the polymer.The polymer is represented by formula 1 wherein X is one or more kinds of derivati...  
JP2005196209A
To provide a positive photoresist composition that exhibits excellent solubility in an aqueous base developer, and its usage.The positive photoresist composition contains a radiation sensitive acid generator and a polymer, wherein this p...  
JP2005519167A
Useful fluorination コポリマー is indicated in the photoresist composite for the micro lithographing method, and the related process. These コポリマー, Into such materials, high ultraviolet-rays (UV) transparency. And the repea...  
JP2005162990A
To provide a method for producing a cyclic olefin-based addition polymer excellent in heat resistance, optical transparency, and adhesion and close bonding property to another member, also controlled with its molecular weight for capable...  
JP3656991B2
To provide a method for producing a cyclic olefinic copolymer in the presence of a catalyst simultaneously satisfying characteristics which comprise not producing a gel-like polymer component or a solvent-insoluble polymer component, hav...  
JP2005133049A
To provide a resin for an offset printing ink, without using an alkylphenol and formaldehyde, capable of obtaining more than equivalent performance with that of the conventional rosin-modified phenolic resin.This resin for the offset ink...  
JP2005133052A
To provide a resin for an offset ink, whereby an equal or higher level of properties are obtained in comparison with those obtained from a conventional rosin-modified resin, without using an alkylphenol and formaldehyde.The resin for an ...  
JP2005126514A
To provide a cycloolefin copolymer in which a structural unit (a) derived from a specific cycloolefin compound having a methoxysilyl group and a structural unit (b) derived from another cycloolefin compound are randomly arranged in a uni...  
JP2005126692A
To provide a resist material having excellent transmittance to exposure light having a wavelength zone of not more than 300 nm, and further having excellent adhesion to a substrate and solubility in a developing solution.This resist mate...  
JP3646334B2
PURPOSE: To efficiently obtain a cyclic olefin polymer by using minute amounts of catalyst consisting mainly of a palladium compound component and a specific compound component. CONSTITUTION: This polymer is obtained by polymerizing a cy...  

Matches 1,101 - 1,150 out of 2,213