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JP3465070B2 |
PURPOSE: To obtain a surface converted paper having excellent transparency, surface gloss, scratching resistance, moisture resistance and gas barrier properties, by coating base paper with a cyclic olefinic emulsion. CONSTITUTION: An aqu...
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JP2003313247A |
To obtain an α-olefin/cycloolefin copolymer having a narrow molecular weight distribution and a process for producing the copolymer with high polymerization activity.The α-olefin/cycloolefin copolymer is obtained by copolymerizing a 2-...
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JP2003311773A |
To provide a highly accurate optical part, which is obtained by injection molding and has at least one effective curved surface.In the optical part, which is obtained by injection molding and has at least one effective curved surface, th...
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JP2003307838A |
To provide a positive photosensitive composition excellent in line edge roughness to solve a technical problem to enhance the performance of microphotofabrication using far-ultraviolet rays especially ArF eximer laser beam.The positive p...
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JP2003531923A |
The present invention describes a novel transparent polymer mixture with modified relaxation behavior and modified shrinkage behavior, comprising cycloolefin polymers. The polymer mixture comprises at least one amorphous polyolefin. The ...
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JP2003302762A |
To provide a positive photoresist composition for far UV exposure excellent in edge roughness, etching resistance and adhesion.The positive resist composition comprises (A) a photoacid generator, (B) a resin which has a repeating unit ha...
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JP2003295442A |
To provide a positive resist composition having satisfactory transmittance when a light source of ≤160 nm, concretely F2 excimer laser light (157 nm) is used, excellent in sensitivity and contrast and ensuring a small number of particl...
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JP2003295443A |
To provide a resist composition excellent in transmittance to light of ≤170 nm wavelength and suitable particularly for F2 excimer laser lithography.The resist composition comprises a resin and an acid generator, wherein the resin unde...
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JP3453396B2 |
PURPOSE: To obtain the subject composition containing a base polymer and a specific tackiness-providing resin at a specific ratio, having low molecular weight, excellent in adhesion at high temperature, creep property at high temperature...
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JP2003280204A |
To provide a positive resist composition having satisfactory transmittance when an exposure light source of ≤160 nm, concretely F2 excimer laser light (157 nm) is used and ensuring improved line edge roughness and development defects.T...
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JP2003280203A |
To provide a positive resist composition having satisfactory transmittance when an exposure light source of ≤160 nm, concretely F2 excimer laser light (157 nm) is used and ensuring improved line edge roughness and development defects.T...
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JP2003270790A |
To provide a positive resist composition having satisfactory transmittance at the time of using an exposure light source of ≤160 nm, concretely F2 excimer laser light (157 nm) and improved in line edge roughness and development defects...
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JP2003255541A |
To provide a positive resist composition having satisfactory transmittance to ≤160 nm, concretely F2 excimer laser light (157 nm) and excellent in line edge roughness and development defects.The positive resist composition comprises (A...
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JP2003248313A |
To provide a new radiation-sensitive resin composition having high transparency to a radiation, excellent in basic physical properties as a resist, such as sensitivity, resolution, pattern shape and adhesion to a substrate, causing no de...
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JP2003248970A |
To provide an optical recording medium that has small warping and excellent electric characteristics even if there are changes in environments.An optical recording medium has, at least, a reflector film, a light transmissive layer formed...
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JP2003241383A |
To provide a radiation-sensitive resin composition excellent in contrast, capable of forming a fine resist pattern with a high degree of accuracy and excellent also in transparency to a radiation, sensitivity and resolution.The radiation...
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JP2003240755A |
To provide a microchip made of a resin with a microchannel with a channel sealed by an upper substrate which is transparent and absorbs little in ultraviolet region, is minute and has satisfactory surface smoothness, and is high in dimen...
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JP3418971B2 |
To obtain a photoresist composition using an acid as a catalyst, capable of forming an image with radiation of 193 nm and capable of forming a photoresist structure having high resolution and high etching resistance by development. The p...
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JP3416244B2 |
PURPOSE: To produce a transparent cycloolefin copolymer having a high tensile strength by copolymerizing a polycyclic olefin and ethylene in the presence of a catalyst comprising a specific asymmetric metallocene and a cocatalyst. CONSTI...
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JP3416243B2 |
PURPOSE: To produce a cycloolefin polymer having a high viscosity number by polymerizing a polycyclic olefin in the presence of a catalyst comprising an aluminoxane and a specific metallocene compd. CONSTITUTION: Based on the total monom...
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JP2003162059A |
To solve the problem of a performance enhancing technique proper to microphotofabrication using far ultraviolet light, particularly ArF excimer laser light, to provide a positive photosensitive composition having small density dependence...
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JP2003518169A |
This invention relates to olefin polymers particularly suited to satisfying the dielectric properties required in electrical device use. The olefin polymers can be prepared by contacting polymerizable olefin monomers with catalyst comple...
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JP2003156848A |
To provide a positive photosensitive composition excellent in suitability to halftone exposure (side lobe resistance) and less liable to cause development defects.The positive photosensitive composition comprises (A) a compound which gen...
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JP2003156846A |
To solve the problem of a performance enhancing technique proper to microphotofabrication using far ultraviolet light, particularly ArF excimer laser light and to provide a positive photosensitive composition having excellent density dep...
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JP3410712B2 |
To provide an unfunctionalized, functionalized or grafted olefin- cycloolefin-alkylstyrene copolymer. The copolymer can be functionalized by functionalizing the benzyl proton of an alkylstyrene unit. The functionalized or grafted olefin-...
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JP2003137939A |
To provide a new polymer which has a high fluorine content, can have polar groups in the same molecule, and can form films having high adhesiveness to substrates, to provide an anti-reflective material coated with the polymer, and to pro...
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JP2003131375A |
To develop a method for forming a patterned insulating film having high transmittance in the visible region and having high heat resistance and high dry etching durability and to improve the performance of a display device.A radiation-se...
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JP2003122010A |
To provide a positive resist composition excellent in edge roughness and sensitivity.The positive resist composition is characterized in containing a resin which has a specified aliphatic cyclic hydrocarbon group and which increases the ...
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JP2003115212A |
To provide a planar illuminant easy to increase its area, with excellent heat resistance and suitable for a high-rigidity display device or signboard without causing camber due to moisture absorption or the like.This planar illuminant is...
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JP2003096123A |
To provide a copolymerization catalyst for α-olefins and cycloolefins which can be easily synthesized industrially and exhibits a high activity in polymerization and in copolymerization.This catalyst comprises an activator and an easily...
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JP3387533B2 |
PURPOSE: To provide a resin excellent in heat resistance, transparency, photo- deterioration resistance, low birefringence, electrical insulation, high-frequency properties, electrical insulation stability, low dissolution of organic mat...
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JP3376335B2 |
To obtain a polymeric, optically oriented and crosslinked film material excellent in processibility and good in thermal stability. As a novel optically oriented and crosslinked film material, is provided a maleimide-norbornene-based copo...
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JP2003034705A |
To provide a photoresist material suitable for a lithography using light of 180 nm or less wave length and its raw material, and a method capable of forming a fine pattern. The fluorine-containing phenylmaleimide derivative is shown in f...
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JP2003029663A |
To provide a plastic transparent insulating substrate having excellent heat resistance which can be used for an active matrix substrate as the structural member of a display device.The transparent insulating substrate is produced by usin...
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JP2003025365A |
To provide a method for injection-molding a molded article reduced in wall thickness and good in the transfer properties of the surface of a mold by allowing a cyclic olefin resin having high heat resistance to flow well.Carbon dioxide i...
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JP2003020328A |
To provide a hydrocarbon resin for modifying a rubber composition that maintains piercing strength and tear strength of the rubber composition and at the same time exhibits an excellent improvement effect of wear resistance, elongation a...
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JP2003502490A |
Oil-soluble copolymers having an OH number of from 10 to 250 and a molecular weight of from 1000 to 100,000 g/mol, obtained from the reaction of a copolymer precursor which comprises structural units ofA) from 5 to 95 mol-% of an olefini...
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JP3361808B2 |
PCT No. PCT/EP94/00263 Sec. 371 Date Aug. 10, 1995 Sec. 102(e) Date Aug. 10, 1995 PCT Filed Jan. 31, 1994 PCT Pub. No. WO94/18251 PCT Pub. Date Aug. 18, 1994Thermoplastic cycloolefin copolymers (COCs) having low melt viscosity and low op...
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JP3361809B2 |
A process for the production of cyclo-olefin copolymers (COC) with high tenacity by the copolymerisation of 0.1 to 99.9 wt %, in relation to the total quantity of monomers, of at least one monomer in which R<1>, R<2>, R<3>, R<4>, R<5>, R...
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JP2002371110A |
To provide an industrial and highly active catalytic system easily obtained for copolymerization between an α-olefin and a cyclic olefin, and to provide a method for producing the copolymer by use of the catalytic system. This copolymer...
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JP2002371117A |
To provide an olefinic resin having excellent heat resistance, transparency, nonhygroscopicity and chemical resistance with excellent casting workability, and to provide a copolymerization method for the resin. The cyclic conjugated dien...
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JP2002371109A |
To provide an industrial and highly active catalytic system easily obtained in for copolymerization between an α-olefin and a cyclic olefin, and to provide a method for producing the copolymer by the use of the catalytic system. This co...
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JP2002362614A |
To provide a wrap film showing superior heat resistance, waterproof and resilient characteristics which is most suitable for cooking operation through heating at a micro wave oven. There is provided a wrap film made of elastomer type cyc...
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JP3357126B2 |
A polymer comprises at least 20 wt.% monoethylenically-unsatd. acid(s) or salt(s) and an amine-sulphide terminal moiety being the residue of an amine-thiol attached via a S gp.. Pref. amine-sulphide terminators are from (i) amino-thiols ...
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JP3355045B2 |
A polymer alloy containing a) one or more cycloolefin copolymers and b) one or more types of core/shell particles.
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JP2002348324A |
To provide a polymer having a polycyclic cycloolefin, and having a high viscosity and a high glass transition temperature. A polycyclic cycloolefin such as norbornene in an amount of 0.1-100 wt.%, and at least one of 0-99.9 wt.% of a mon...
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JP2002348333A |
To provide a norbornene copolymer for a photoresist which has transparency, high sensitivity, high resolution and etching resistance in order to be suitable for fine fabricating ultrahigh integrated semiconductor by excimer laser; a meth...
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JP2002338627A |
To obtain a polymer compound which exhibits a high etching resistance when used for a photoresist.This polymer compound contains at least one kind of monomer unit selected from monomer units represented by formulas (Ia)-(Ig) [wherein Ra ...
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JP2002338633A |
To provide a polymer compound which is sensitive to a high-energy ray, is excellent in sensitivity, resolution, and etching resistance, and hence is useful for fine processing using an electron beam or ultraviolet rays.This polymer compo...
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JP3350951B2 |
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