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Matches 1,151 - 1,200 out of 2,277

Document Document Title
JP3737012B2
To provide an antireflection film forming composition for forming a high hardness antireflection film on an article and an article with an antireflection film formed using the composition. The antireflection film forming composition cont...  
JP3736606B2
To provide a resist material suitable to a fine pattern forming material for producing VLSI, which is responsed to high energy rays and excellent in sensitivity, resolution and resistance to oxygen plasma etching at ≤300 nm wavelengths...  
JP2006009003A
To provide catalytic compositions, a process for their preparation and their use for preparation of a polymer from an ethylenic unsaturated monomer.The catalytic cationic metal complex compositions are cationic metal pair complexes havin...  
JP2001356478A5  
JP2002202606A5  
JP2002099087A5  
JP3734015B2
To obtain a resist material used for a method for forming a pattern, inducing high energy line and excellent in sensitivity, resolution and plasma etching resistance at ≤180 nm, especially ≤160 nm of wavelength. This polymer is chara...  
JP3732695B2
To provide the photoresist cross-linking agent superior in the cross- linking ability by low exposure energy by incorporating a specified compound. The compound to be incorporated is represented by the formula in which each of R1, R2, an...  
JP2005351942A
To provide a positive resist composition for forming a resist pattern superior in a shape and etching resistance, and to provide a resist pattern forming method.The positive resist composition includes a resin (A) having an acid dissocia...  
JP2005536589A
The present invention, If small. The repeating unit guided from the fluorination olefin of も一種. And fluoride content コポリマー which has the repeating unit and other repeating units typically guided from a アクリ rate in o...  
JP2005536589A5  
JP2005331824A
To provide a radiation-sensitive resin composition having excellent latitude characteristics of the focal depth, line edge roughness characteristics and line end foreshortening characteristics while keeping high resolution as a chemicall...  
JP3721190B1
The directions for the composite concerned for forming the formation method of a vinyl addition polymer composite and the composite concerned, electronics, and an opto-electronics device are offered. The vinyl addition polymer composite ...  
JP3720970B2
To obtain a photosensitive compsn. which has extremely little absorption on a light source of a short wavelength and has excellent solubility, alkaline developability, resolution and dry etching resistance by incorporating a polymer incl...  
JP2005535780A
At least one repeating unit guided from the ethylene nature unsaturated compound which has at least one fluorine atom in which the covalent bond of the present invention was carried out to (a) ethylene nature unsaturated carbon atom, (b)...  
JP2005325325A
To provide a polymeric compound the alkali solubility of which changes in a large way before and after exposure in a chemically amplified positive resist, a photoresist composition containing the polymeric compound and capable of forming...  
JP2005535709A
The present invention offers in option new fluoride content コポリマー containing at least one sort of fluorination olefins, at least one sort of multi-ring type ethylene nature unsaturated monomers which have condensation 4 member ...  
JP3719308B2
To obtain a random addition copolymer of a cyclic olefin having a polar group such as an ester group or an acid anhydride group with ethylene. This copolymer has (a) a structural unit derived from ethylene and (b) a structural unit deriv...  
JP2005535478A
The technology which produces the lens form block which can be used for manufacturing the soft contact lens of a variously different type is offered. The form block for this lens production contains 脂環 type コポリマー containing...  
JP2005325349A
To provide a thermoplastic resin material having extremely small refractive index variation with temperature and provide an optical element produced by using the material.The thermoplastic resin material contains surface-treated inorgani...  
JP2005535753A
The present invention offers in option new fluoride content polymer containing at least one sort of multi-ring type ethylene nature unsaturated monomers which have at least one sort of fluorination olefins, and condensation 4 member annu...  
JP2005320420A
To provide a norbornene-based copolymer which is used for various applications requiring polarity.The polar group-containing cycloolefin-based copolymer contains 50-99.9 mol% of a cycloolefin and 0-49.9 mol% of an alkenyl unit and has a ...  
JP2005321685A
To provide fluorine-containing copolymer for plastic optical fiber that is amorphous, flexible, low in transmission loss, and has a sufficiently high glass transition temperature (Tg).The fluorine-containing copolymer for plastic optical...  
JP2005307218A
To provide novel catalyst compositions useful for polymerizing ethylene, acyclic olefins, and/or selected cyclic olefins, and optionally selected olefinic esters or carboxylic acids, and other monomers.Transition metal compounds such as ...  
JP2005305941A
To provide a method for molding an article free from a fish-eye generated when a cyclic olefin copolymer is melt-molded.In the method for melt-molding an article using a thermoplastic norbornene resin composed of a cyclic olefin and an ...  
JP3712043B2
To obtain a material for an antireflection film excellent in dimensional accuracy and aligning accuracy and capable of reproducibly forming a fine resist pattern. The polymeric compound is obtained by polymerizing a cyclic perfluoro mono...  
JP3712048B2
To provide a resist material excellent in resolving power and dry etching resistance in exposure with EB(electron beam), EUV(extreme-ultraviolet radiation) or X-rays. The resist material contains a polymer having repeating units each con...  
JP2005532413A
Fluorination polymer, the photoresist, and the related method which are used for micro lithography are explained. Such polymers and photoresist consist of ester guided from the full オロア record functional group which gives the high ...  
JP2005290375A
To provide a catalyst complex for polymerization and copolymerization of a cyclic olefin.In a method for polymerization and copolymerization of the cyclic olefin such as norbornene, the catalyst complex showing a high activity for polyme...  
JP3706805B2
To provide a photosensitive polymer, a resist composition containing the polymer and a method for producing the polymer. The photosensitive polymer is represented by formula I (where R1 is an acid decomposable tertiary alkyl; R2 is γ-bu...  
JP2005281219A
To provide a new alicyclic structure-containing monomer capable of obtaining a polymer having extremely low birefringence and high heat resistance as well as excellent transparency and non-water absorbency.A norbornene derivative contain...  
JP3705734B2
To provide a new photoresist monomer that can be used in the far ultraviolet ray area. This monomer is a bicyclo compound represented by formula (1) (B means a group selected from those represented by formula II (R is H, a 1-10C alkyl, -...  
JP3703525B2
PURPOSE: To obtain a thermoplastic cycloolefin copolymer having excellent tensile strength and transparency and a high viscosity number by polymerizing a cycloolefin with an acryclic olefin in the presence of a specified catalyst. CONSTI...  
JP2005264014A
To provide a cycloolefinic resin composition which is capable of forming a crosslink or a quasi-crosslink due to a carboxylic group generated in the molecule of a commercially producible cycloolefinic addition polymer under a specific co...  
JP2005255732A
To provide a manufacturing method for a hydrogenated cyclic conjugated diene copolymer excellent in impact resistance, heat resistance and transparency, and a resin molded product for optical applications made of the same.The manufacturi...  
JP2005255731A
To obtain a hydrogenated cyclic conjugated diene copolymer excellent in impact resistance, heat resistance and transparency, and to provide a resin molded product for optical applications made of the same.The hydrogenated cyclic conjugat...  
JP3698437B2
A process for the preparation of ethylene polymers is disclosed, comprising the polymerization reaction of ethylene in the presence of a catalyst consisting of the reaction product of: (A) a mixture of the racemic and meso isomers of a s...  
JP2005247942A
To obtain a low-molecular weight α-olefin/cycloolefin copolymer having many reactive double bonds on its terminals.This α-olefin/cycloolefin copolymer is the one comprising (A) a 2 to 30C linear or branched α-olefin and (B) a specifie...  
JP2005250434A
To provide a resist underlayer film material for a multilayer resist process, particularly for a two-layer resist process, which functions as an excellent antireflection film particularly for exposure at a short wavelength, that is, has ...  
JP2005527662A
The present invention is a hydrocarbon mixture including a denaturation polycyclic aromatic compound or the denaturation PAC, Have the chemical structure of the average molecular weight 200*10000, and this chemical structure is expressed...  
JP2005527673A
A polymer comprises an acetal-containing monomer unit having the general structure I and at least one of the fluorine-containing monomer units having the general structures II and III:wherein R<1>, R<4>, R<5 >and R<6 >are each independen...  
JP2005239903A
To obtain a polymer for a resist, having small line edge roughness and slightly forming microgel and defects when used as a resist resin in DUV excimer laser lithography, electron beam lithography, etc., and a resist composition and to p...  
JP2005240024A
To provide a resist material excellent in the transmissivity of far ultraviolet rays with a wavelength of 300 nm or below, especially ArF (193 nm), especially a novel polymer compound useful as the base polymer of a chemically amplified ...  
JP2005239975A
To provide a production method for an aromatic-containing cycloolefin copolymer having excellent characteristics of an optical material, such as heat resistance, impact resistance, thermal aging resistance and transparency together with ...  
JP2005227718A
To provide a micropattern forming method using a highly practical fluorine-containing polymer capable of improving dry etching resistance with respect to a fluorine-containing polymer having high transparency to exposure light of a short...  
JP2005220274A
To provide a polymer compound excellent in resolution in exposure to an ArF excimer laser and dry etching resist, capable of suppressing line edge roughness small and useful for a base resin for use in a radiation sensitive resist.The po...  
JP3682229B2  
JP2005202205A
To provide a positive resist composition which exhibits satisfactory transmittance at the time of using an exposure light source of ≤200 nm, specifically F2 excimer laser light (157 nm) and is improved in surface roughness, development...  
JP3676331B2
To obtain a resist pattern having a good pattern shape when a resist pattern is formed using exposing light having a wavelength of ≤180 nm band with minimally producing scum. A pattern formation material comprising a base resin contain...  
JP3675133B2
To obtain a resist compsn. which shows excellent adhesion strength to a film material and excellent durability against etching and for which a normal developer can be used for development, by incorporating a specified polymer and a PAG (...  

Matches 1,151 - 1,200 out of 2,277