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Matches 1,151 - 1,200 out of 2,217

Document Document Title
JP2005126692A
To provide a resist material having excellent transmittance to exposure light having a wavelength zone of not more than 300 nm, and further having excellent adhesion to a substrate and solubility in a developing solution.This resist mate...  
JP3646334B2
PURPOSE: To efficiently obtain a cyclic olefin polymer by using minute amounts of catalyst consisting mainly of a palladium compound component and a specific compound component. CONSTITUTION: This polymer is obtained by polymerizing a cy...  
JP2005511870A
The method of preparing the poly (alpha* olefin) コポリマー is indicated. This method under existence of an effective amount of catalysts as hydrogen and a catalyst containing the output obtained by setting a metallocene catalyst pr...  
JP3642048B2
To provide a composition which is excellent in adhesion to a substrate, heat resistance, solvent resistance, and capability for controlling an uneven shape and can easily form a film used as a light-diffusing reflective film of a reflect...  
JP3641748B2
To provide a photoresist monomer which can be used with a VUV (157 nm) light source, and a photoresist polymer. The photoresist monomer is represented by formula (1) (wherein X1, X2, R1, 1 and m are as defined in the specification). The ...  
JP2005097635A
To obtain an ethylene copolymer having a uniform distribution of a comonomer unit along a polymer chain and a broad molecular weight distribution.The ethylene copolymer is a copolymer of ethylene with at least one comonomer selected from...  
JP2005084238A
To provide a positive resist composition suitable for the use of an exposure light source at ≤160 nm, in particular, F2 excimer laser light (at 157 nm), and specifically, to provide a positive resist composition which suppresses develo...  
JP2005508512A
A photoresist composite suitable for drawing by wavelength irradiation of sub 200nm including the ether bond containing a certain disconnection machine is indicated. The method of offering the photoresist relief picture which uses a phot...  
JP2005084239A
To provide a positive resist composition which suppresses development defects and to provide a method for forming a pattern by using the composition.The positive resist composition contains: (A) a fluorine-containing resin which has such...  
JP2005062722A
To provide a positive resist composition which shows sufficient transmitting property when an exposure light source at ≤160 nm, specifically, F2 excimer laser light (at 157 nm) is used and which is improved in surface roughness, develo...  
JP2005060350A
To provide a raw material for alkali-soluble photosensitive resin composition that permits easy pattern formation and has excellent high heat resistance, high reliability, for example, moisture-resistance reliability, further high transp...  
JP2005060440A
To provide a method for producing a copolymer having excellent weather, water and heat resistances, adhesion, transparency and solubility in solvents and to provide the copolymer produced by the method and a curable composition comprisin...  
JP2005048060A
To provide a cyclic olefin copolymer moldable by solution casting method or the like because of being good in solubility to hydrocarbon solvent, having especially low coefficient of linear expansion and good in dimensional stability whil...  
JP2005505649A
Ethylene and a ノルボルネン type monomer copolymerize efficiently with a certain kind of metal complex containing the selected anion nature and neutral 2 seat ligand, especially a nickel complex. This polymerization method has tole...  
JP3623058B2  
JP2005043723A
To provide a positive resist composition which is little in development defect.The positive resist composition is characterised in that it contains (A) a fluorine-containing resin having a structure in which fluorine has been substituted...  
JP2005036146A
To provide a resist material, of a chemically amplified type in particular, for use in lithography with a high-energy light source in particular, having a practically sufficient level of etching resistance, excellent in adhesion to a sub...  
JPWO2003031487A1
【請求項1】式(Ma):[式中、構造単位 M1が、炭素数2または3のエチレン性単量 体であって少なくとも1個のフッ素原子を有 する単量体に由来する構造単位、構造単...  
JP2005015601A
To obtain a hydrocarbon resin and a rubber composition compounded with the resin suitable for the purpose in view of the fact that rubber compositions having mild crosslinking rate while having postcure mechanical strength and durability...  
JP2005015532A
To provide an antireflection film forming composition which has a high antireflection effect, does not cause intermixing, and can form a resist pattern excellent in resolution, pattern shape, etc.; and a polymer useful as a constituting ...  
JP2005008769A
To provide a polymer compound suitable for a base resin of a positive resist material, particularly for a chemically amplified positive resist material, which exhibits high resolution, wide exposure latitude, a small dimensional differen...  
JP2005010392A
To provide a positive resist composition suitable for use under an exposure light source of ≤250 nm, particularly F2 excimer laser light (157 nm), and specifically to provide a positive resist composition exhibiting satisfactory transm...  
JP3609326B2
To obtain a photosensitive polymer and a chemical amplification type photoresist composition containing the photosensitive polymer. The photosensitive polymer is obtained using a norbornene ester having a bonded 1-12C aliphatic alcohol g...  
JP3607761B2  
JP2004361578A
To provide a positive resist composition suitable for use under an exposure light source of ≤250 nm, particularly F2 excimer laser light (157 nm), and to specifically provide a positive resist composition which exhibits satisfactory tr...  
JP2004361473A
To provide a positive resist composition suitable for use under an exposure light source of ≤200 nm, particularly F2 excimer laser light (157 nm), and to specifically provide a positive resist composition which exhibits satisfactory tr...  
JP2004359964A
To provide a thermally polymerized resin having a relatively low molecular weight and a relatively high softening point, which is produced using a low-cost DCPD feed stock as a base and does not substantially change with time in a reacto...  
JP2004359704A
To provide a transparent norbornene resin having high heat resistance.A random and a block copolymers are obtained from a norbornene compound and a diene compound represented by formula (2) [wherein, R11 to R16 are each at least one kind...  
JP2004359798A
To obtain a block copolymer consisting of an α-olefin-cyclic olefin copolymer unit and to provide a process for manufacturing the block copolymer with a high polymerization activity.The olefinic copolymer contains the α-olefin-cyclic o...  
JP2004361579A
To provide a positive resist composition suitable for use under an exposure light source of ≤300 nm, particularly F2 excimer laser light (157 nm), and to specifically provide a positive resist composition which exhibits satisfactory tr...  
JPWO2003016365A1
(A)環状共役ジエン系単量体に由来する繰 り返し単位と、(B)α位に水素を有するビ ル芳香族系単量体に由来する繰り返し単位 少なくとも含有し、ランダム構造であ...  
JP2004331965A
To provide a catalyst for olefin polymerization effectively incorporating a cycloolefin, a conjugated polyene or an aromatic vinyl compound, and exhibiting a high polymerization activity, and to provide a method for production of olefin ...  
JP2004331966A
To provide a method for producing a copolymer of an α-olefin/cycloolefin in high polymerization activity and effectively incorporating the cycloolefin.The copolymer is obtained by copolymerizing (A) a straight-chain or branched 2-30C α...  
JP3589302B2  
JP2004318044A
To provide a resist composition having excellent sensitivity and low line edge roughness and significantly reducing development defects.The positive resist composition contains: (A) a resin which has a structure containing a specified re...  
JP3587739B2  
JP3587770B2  
JP3587743B2  
JP3587689B2  
JPWO2003006413A1
透明性に優れ、かつ耐ドライエッチング性が 改善されており、F2レーザー用の化学増幅 型フォトレジスト用の材料であって、ノルボ ルネン骨格に直接含フッ素ケトン部位ま...  
JP3578430B2  
JP2004277473A
To provide a method for producing a cyclic olefinic copolymer, by which the high mol. wt. cyclic olefinic copolymer having a structure comprising structural units based on a norbornene-based monomer and structural units based on an acryl...  
JP2004277523A
To obtain a new cyclic olefin-based copolymer having excellent transparency and heat stability.This cyclic olefin copolymer is a cyclic olefin-based copolymer obtained by copolymerizing an α-olefin with a cyclic olefin and has ≥50 mol...  
JP2004269728A
To provide a catalyst which satisfies both high polymerization activity and high copolymerization ability in the copolymerization of an α-olefin and a cycloolefin, and can easily be synthesized.A 2-20C α-olefin and a cycloolefin are co...  
JP2004530159A
[Solution means] The present invention contains polymer with new photoresist, the photoactive ingredient, and the solvent about the processing method of the new photoresist composite which has sensitivity in 深紫外線域, and new phot...  
JP2004271843A
To provide a positive resist composition exhibiting sufficient transmitting property when a light source at 157 nm is used and causing little line edge roughness, development defects and scum.The positive resist composition contains: (A)...  
JP2004269718A
To provide a method for producing a norbornene resin excellent in moldability or film processability, and excellent in transparency and toughness.The norbornene resin can be produced by subjecting a norbornene compound and a styrene comp...  
JP2004271844A
To provide a positive resist composition exhibiting sufficient transmitting property when a light source at 157 nm is used and improved in development defects, coating property and line edge roughness.The positive resist composition cont...  
JP3570415B2
To provide an optical retardation plate which makes it possible to conduct uniform polarization conversion within a wide wavelength region using a single plate and which has a low wavelength dispersion coefficient. The optical retardatio...  
JP2004529245A
The present invention relates to new polymer including at least one sort of units guided from the ethylene nature unsaturated compound containing at least one シアノ functional group, and at least one sort of non-aromatic series syste...  

Matches 1,151 - 1,200 out of 2,217