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Matches 1,201 - 1,250 out of 2,245

Document Document Title
JP2005010392A
To provide a positive resist composition suitable for use under an exposure light source of ≤250 nm, particularly F2 excimer laser light (157 nm), and specifically to provide a positive resist composition exhibiting satisfactory transm...  
JP3609326B2
To obtain a photosensitive polymer and a chemical amplification type photoresist composition containing the photosensitive polymer. The photosensitive polymer is obtained using a norbornene ester having a bonded 1-12C aliphatic alcohol g...  
JP3607761B2  
JP2004361578A
To provide a positive resist composition suitable for use under an exposure light source of ≤250 nm, particularly F2 excimer laser light (157 nm), and to specifically provide a positive resist composition which exhibits satisfactory tr...  
JP2004361473A
To provide a positive resist composition suitable for use under an exposure light source of ≤200 nm, particularly F2 excimer laser light (157 nm), and to specifically provide a positive resist composition which exhibits satisfactory tr...  
JP2004359964A
To provide a thermally polymerized resin having a relatively low molecular weight and a relatively high softening point, which is produced using a low-cost DCPD feed stock as a base and does not substantially change with time in a reacto...  
JP2004359704A
To provide a transparent norbornene resin having high heat resistance.A random and a block copolymers are obtained from a norbornene compound and a diene compound represented by formula (2) [wherein, R11 to R16 are each at least one kind...  
JP2004359798A
To obtain a block copolymer consisting of an α-olefin-cyclic olefin copolymer unit and to provide a process for manufacturing the block copolymer with a high polymerization activity.The olefinic copolymer contains the α-olefin-cyclic o...  
JP2004361579A
To provide a positive resist composition suitable for use under an exposure light source of ≤300 nm, particularly F2 excimer laser light (157 nm), and to specifically provide a positive resist composition which exhibits satisfactory tr...  
JPWO2003016365A1
(A)環状共役ジエン系単量体に由来する繰 り返し単位と、(B)α位に水素を有するビ ル芳香族系単量体に由来する繰り返し単位 少なくとも含有し、ランダム構造であ...  
JP2004331965A
To provide a catalyst for olefin polymerization effectively incorporating a cycloolefin, a conjugated polyene or an aromatic vinyl compound, and exhibiting a high polymerization activity, and to provide a method for production of olefin ...  
JP2004331966A
To provide a method for producing a copolymer of an α-olefin/cycloolefin in high polymerization activity and effectively incorporating the cycloolefin.The copolymer is obtained by copolymerizing (A) a straight-chain or branched 2-30C α...  
JP3589302B2  
JP2004318044A
To provide a resist composition having excellent sensitivity and low line edge roughness and significantly reducing development defects.The positive resist composition contains: (A) a resin which has a structure containing a specified re...  
JP3587739B2  
JP3587770B2  
JP3587743B2  
JP3587689B2  
JPWO2003006413A1
透明性に優れ、かつ耐ドライエッチング性が 改善されており、F2レーザー用の化学増幅 型フォトレジスト用の材料であって、ノルボ ルネン骨格に直接含フッ素ケトン部位ま...  
JP3578430B2  
JP2004277473A
To provide a method for producing a cyclic olefinic copolymer, by which the high mol. wt. cyclic olefinic copolymer having a structure comprising structural units based on a norbornene-based monomer and structural units based on an acryl...  
JP2004277523A
To obtain a new cyclic olefin-based copolymer having excellent transparency and heat stability.This cyclic olefin copolymer is a cyclic olefin-based copolymer obtained by copolymerizing an α-olefin with a cyclic olefin and has ≥50 mol...  
JP2004269728A
To provide a catalyst which satisfies both high polymerization activity and high copolymerization ability in the copolymerization of an α-olefin and a cycloolefin, and can easily be synthesized.A 2-20C α-olefin and a cycloolefin are co...  
JP2004530159A
[Solution means] The present invention contains polymer with new photoresist, the photoactive ingredient, and the solvent about the processing method of the new photoresist composite which has sensitivity in 深紫外線域, and new phot...  
JP2004271843A
To provide a positive resist composition exhibiting sufficient transmitting property when a light source at 157 nm is used and causing little line edge roughness, development defects and scum.The positive resist composition contains: (A)...  
JP2004269718A
To provide a method for producing a norbornene resin excellent in moldability or film processability, and excellent in transparency and toughness.The norbornene resin can be produced by subjecting a norbornene compound and a styrene comp...  
JP2004271844A
To provide a positive resist composition exhibiting sufficient transmitting property when a light source at 157 nm is used and improved in development defects, coating property and line edge roughness.The positive resist composition cont...  
JP3570415B2
To provide an optical retardation plate which makes it possible to conduct uniform polarization conversion within a wide wavelength region using a single plate and which has a low wavelength dispersion coefficient. The optical retardatio...  
JP2004529245A
The present invention relates to new polymer including at least one sort of units guided from the ethylene nature unsaturated compound containing at least one シアノ functional group, and at least one sort of non-aromatic series syste...  
JP2004244594A
To provide a novel cyclic conjugated diene copolymer excellent in cast film formation processibility, transparency, surface smoothness, and impact resistance; its production method; and a hydrogenation product of the cyclic conjugated di...  
JP2004244436A
To provide a new polymer useful as a resist material having excellent transmittance in vacuum ultraviolet rays such as ≤300 nm, especially F2 (157 nm), Kr2 (146 nm), KrAr (134 nm) or Ar2 (126 nm), especially a chemically amplified resi...  
JP2004526844A
Very, the method in relation to multi-ring type fluoride content polymer for micro lithography, the photoresist, and it in 遠 and 近 UV is indicated. This multi-ring type fluoride content polymer is guided from a repeat unit including ...  
JP2004244439A
To provide a new polymer useful as a resist material having excellent transmittance in vacuum ultraviolet rays such as ≤300 nm, especially F2 (157 nm), Kr2 (146 nm), KrAr (134 nm) or Ar2 (126 nm), especially a chemically amplified resi...  
JP2004244469A
To provide an optical material made of a novel cyclic conjugated diene resin and excellent in discoloration resistance at high temperatures; an optical product prepared by forming the optical material excellent in impact resistance, stab...  
JPWO2002092641A1
(a)一般式(I)(Mは周期律表第3〜1 0族又はランタノイド系列の金属元素、R1 〜R3は、それぞれ独立にハロゲン原子、炭 素数1〜20の炭化水素基、炭素数1〜...  
JP3557274B2  
JP2004235539A
To provide a solar cell superior to flexibility, crashproof, transparency, and thermal resistance and having a semiconductor film formed by coating a composite for forming a silicon film on a base substance having a lower linear expansio...  
JP3554532B2  
JP3552828B2  
JP2004523806A
The present invention is the method of manufacturing suitable film forming nature resin to use it for a photoresist composite, In the following stage, i. E. , the stage which prepares the solution of film forming nature resin in the (a) ...  
JP2004219822A
To provide a positive type resist composition exhibiting sufficient permeability in the use of F2 excimer laser light (157 nm) as an exposure light source and satisfying coating property and compensating development defect.In the positiv...  
JP3550641B2
To provide a maleimide-norbornene copolymer composed of specific constituent units, capable of stably keeping the non-linear characteristics over a long period and giving a polymer material having good processability. The objective copol...  
JP2004210868A
To provide a molding for automobile, excellent in marring resistance, having high gloss, and also excellent in weatherability.The molding for automobile has a part comprising an elastomer material containing an olefinic random copolymer ...  
JP3547376B2
To obtain the subject copolymer excellent in permeability at a specific wave length, etching resistance, heat resistance and adhesiveness by bringing the copolymer to contain a specific dicarboxylate compound having an aliphatic cyclic o...  
JP3545903B2
To obtain a copolymer, exposable to light by using the wavelength of an ArF excimer laser, good in resistance to dry etching and adhesive strength to a membranous material and used for a chemical amplification type resist developable wit...  
JP2004198952A
To provide an optical film which has transparency and thermal resistance and is superior in productivity and economical efficiency to thereby produced industrially suitably and has less optical distortion and is hardly discolored caused ...  
JP2004189764A
To provide a tackifying resin excellent in tackifying performance, such as tackiness and holding power.The preparation process for the petroleum resin comprises copolymerizing a cyclopentadiene compound and an aromatic vinyl compound sub...  
JP2004190008A
To provide a photosensitive resin composition curable at a low temperature.This resin composition contains a resin composed of a structural unit expressed by general formula (1) [R1 and R2 are each H, D (deuterium), F, Cl, Br, CF3, a 1-1...  
JP2004175864A
To provide an extruded product having transparency and heat resistance equal to those of a conventionally well known light guide plate comprising a cyclic olefinic resin, industrially suitably produced with excellent productivity and eco...  
JP2004175928A
To obtain a cyclic diene copolymer which is prepared by copolymerizing an unsaturated compound with an easily producible cyclic conjugated diene monomer having a high polymerization activity.This bicyclic conjugated diene copolymer is pr...  

Matches 1,201 - 1,250 out of 2,245