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Matches 1,201 - 1,250 out of 2,217

Document Document Title
JP2004244594A
To provide a novel cyclic conjugated diene copolymer excellent in cast film formation processibility, transparency, surface smoothness, and impact resistance; its production method; and a hydrogenation product of the cyclic conjugated di...  
JP2004244436A
To provide a new polymer useful as a resist material having excellent transmittance in vacuum ultraviolet rays such as ≤300 nm, especially F2 (157 nm), Kr2 (146 nm), KrAr (134 nm) or Ar2 (126 nm), especially a chemically amplified resi...  
JP2004526844A
Very, the method in relation to multi-ring type fluoride content polymer for micro lithography, the photoresist, and it in 遠 and 近 UV is indicated. This multi-ring type fluoride content polymer is guided from a repeat unit including ...  
JP2004244439A
To provide a new polymer useful as a resist material having excellent transmittance in vacuum ultraviolet rays such as ≤300 nm, especially F2 (157 nm), Kr2 (146 nm), KrAr (134 nm) or Ar2 (126 nm), especially a chemically amplified resi...  
JP2004244469A
To provide an optical material made of a novel cyclic conjugated diene resin and excellent in discoloration resistance at high temperatures; an optical product prepared by forming the optical material excellent in impact resistance, stab...  
JPWO2002092641A1
(a)一般式(I)(Mは周期律表第3〜1 0族又はランタノイド系列の金属元素、R1 〜R3は、それぞれ独立にハロゲン原子、炭 素数1〜20の炭化水素基、炭素数1〜...  
JP3557274B2  
JP2004235539A
To provide a solar cell superior to flexibility, crashproof, transparency, and thermal resistance and having a semiconductor film formed by coating a composite for forming a silicon film on a base substance having a lower linear expansio...  
JP3554532B2  
JP3552828B2  
JP2004523806A
The present invention is the method of manufacturing suitable film forming nature resin to use it for a photoresist composite, In the following stage, i. E. , the stage which prepares the solution of film forming nature resin in the (a) ...  
JP2004219822A
To provide a positive type resist composition exhibiting sufficient permeability in the use of F2 excimer laser light (157 nm) as an exposure light source and satisfying coating property and compensating development defect.In the positiv...  
JP3550641B2
To provide a maleimide-norbornene copolymer composed of specific constituent units, capable of stably keeping the non-linear characteristics over a long period and giving a polymer material having good processability. The objective copol...  
JP2004210868A
To provide a molding for automobile, excellent in marring resistance, having high gloss, and also excellent in weatherability.The molding for automobile has a part comprising an elastomer material containing an olefinic random copolymer ...  
JP3547376B2
To obtain the subject copolymer excellent in permeability at a specific wave length, etching resistance, heat resistance and adhesiveness by bringing the copolymer to contain a specific dicarboxylate compound having an aliphatic cyclic o...  
JP3545903B2
To obtain a copolymer, exposable to light by using the wavelength of an ArF excimer laser, good in resistance to dry etching and adhesive strength to a membranous material and used for a chemical amplification type resist developable wit...  
JP2004198952A
To provide an optical film which has transparency and thermal resistance and is superior in productivity and economical efficiency to thereby produced industrially suitably and has less optical distortion and is hardly discolored caused ...  
JP2004189764A
To provide a tackifying resin excellent in tackifying performance, such as tackiness and holding power.The preparation process for the petroleum resin comprises copolymerizing a cyclopentadiene compound and an aromatic vinyl compound sub...  
JP2004190008A
To provide a photosensitive resin composition curable at a low temperature.This resin composition contains a resin composed of a structural unit expressed by general formula (1) [R1 and R2 are each H, D (deuterium), F, Cl, Br, CF3, a 1-1...  
JP2004175864A
To provide an extruded product having transparency and heat resistance equal to those of a conventionally well known light guide plate comprising a cyclic olefinic resin, industrially suitably produced with excellent productivity and eco...  
JP2004175928A
To obtain a cyclic diene copolymer which is prepared by copolymerizing an unsaturated compound with an easily producible cyclic conjugated diene monomer having a high polymerization activity.This bicyclic conjugated diene copolymer is pr...  
JP2004518018A
The present invention relates to use of コポリマー to the inside of the detergent composite for preventing the glass corrosion in the cleaning process in the inside of a dish washer. This コポリマー The inside of at least one s...  
JP2004168923A
To provide a method of treatment for obtaining a film or a sheet containing a cycloolefin copolymer which has a high heat resistance and transparency, an excellent chemical resistance, dimensional stability and tensile property and a fil...  
JP2004161975A
To provide an injection molded product which can be widely used for application to optical parts since which is obtained from a resin material for molding containing a specified cyclic olefinic copolymer, which does not cause thermal deg...  
JP2004161836A
To provide a method for advantageously manufacturing a high-molecular-weight cycloolefin copolymer which has a structure wherein structural units based on a norbornene monomer and structural units based on an acrylate monomer are alterna...  
JP2004161880A
To provide a norbornene resin that has excellent molding processability and film processability and realizes both heat resistance and optical properties at the same time.The manufacturing process of the norbornene resin comprises copolym...  
JP3536015B2
To provide novel photoresist substances which can be used in the region of far ultraviolet rays. Photoresist compositions comprise a bisnor-bornene carboxylate represented by the formula or a polymer containing a bis(norbornene dicarboxy...  
JP3534127B2
PURPOSE: To obtain a new thermoplastic norbornene-based copolymer, excellent in transparency, low birefringent properties, moisture, water and chemical resistances, electrical characteristics and low eluting properties of impurities and ...  
JP2004149756A
To obtain a positive resist material, especially a chemically amplified positive resist material, having a high sensitivity, a high resolution, an exposure latitude, process adaptability which are superior to those of a conventional posi...  
JP2004515618A
The styrene by which hydrocarbon resin was replaced by * with a (1) and (a) abbreviation of 5 % of the weight 25% of the weight of styrene, the fatty series, or the aromatic series, (b) It is provided by carrying out thermal polymerizati...  
JP2004149754A
To obtain a positive resist material, especially a chemically amplified positive resist material, having a high sensitivity, a high resolution, an exposure latitude, process adaptability which are superior to those of a conventional posi...  
JP2004514952A
The present invention relates to the protected material which was included in the photoresist composite and annular chemical structure which have a blocking group. In the present invention, the protected material has a cyclic ether machi...  
JP2004145048A
To provide a resist material having excellent transmittance for vacuum UV rays, in particular, to provide a chemically amplifying positive resist material and a method for forming a pattern by using this resist material.The resist materi...  
JP2004144953A
To provide a plastic-made optical element capable of easily maintaining excellent pickup characteristics by manufacturing a lens capable of maintaining highly accurate optical characteristics for a long time, and an optical pickup appara...  
JP2004133393A
To provide a chemically amplified positive resist material having excellent resolution and focal latitude and exhibiting little variation of line width and little shape distortion even when PED (post exposure delay) lasts over a long per...  
JPWO2004035641A
Acid reactivity machine Y which has a structure unit originating in the monomer which may contain the fluorine atom which can give fatty series ring structure to the structure unit and/or polymer main chain originating in a fluorine-cont...  
JP2004512396A
The spacer machine chosen from the group which consists of ethylene, alpha* olefin, 1, and 1'* disubstituted olefin, vinyl alcohol, vinyl ether and 1, and 3* ジエン at least, The following structure: *C (R) (R) Or (R and R among a for...  
JP2004123994A
To provide a method for manufacturing a copolymer from an α-olefin and a cyclic olefin, using a copolymerization catalyst that is more easily synthesized for industrial use, and has a high polymerization activity and can give a high deg...  
JP3520995B2
To provide a positive photoresist composition whose development defects are reduced in manufacturing of the positive photoresist composition and a pattern forming method using the same. The positive photoresist composition contains a res...  
JP2004115630A
To provide a positive-type resist material, particularly a chemically-amplified, positive-type resist material, having a high resolution, margin of exposure, a small difference between sparse and dense dimensions, and process adaptabilit...  
JP3517471B2
PURPOSE: To obtain a high-mol.-wt. cycloolefin copolymer in a high yield by copolymerizing a 2C or higher α-olefin and a specific cycloolefin in the presence of a specific catalyst in a hydrocarbon solvent. CONSTITUTION: A cycloolefin c...  
JPWO2002014392A1
非芳香族系溶剤への溶解性が良好な高軟化点 芳香族石油樹脂の製造法およびその石油樹脂 を含む印刷インキに係り、該製造法は、石油 類の熱分解により得られる沸点140〜...  
JP2004107377A
To provide a positive type resist material having high sensitivity and high resolution, exposure margin and process adaptability exceeding those of a conventional positive type resist material and a good pattern shape after exposure, esp...  
JP2004107563A
To provide a method for producing an α-olefin-cyclic olefin copolymer in high polymerization activity.The method for producing the α-olefin-cyclic olefin copolymer comprises carrying out a copolymerization of the corresponding monomers...  
JP2004109834A
To provide a positive resist composition which is suitable when an exposure light source of ≤160 nm wavelength, in particular, F2 excimer laser light (at 157 nm) is used, and specifically, which exhibits sufficient transparency when a ...  
JP2004107385A
To provide a new indene-hydroxystyrene copolymer and to provide a method for producing the copolymer and an epoxy resin composition comprising the copolymer compounded therein.The indene-containing copoloymer is a copolymer comprising 1-...  
JP3515949B2
To obtain a new photoresist monomer usable in a far ultraviolet region. This photoresist monomer is represented by formula (1) {E is any of substituent groups represented by formula (40), formula (41) or formula (42) [R1 to R13 are each ...  
JP3513202B2
PURPOSE: To obtain a fiber having good solvent resistance and thermal shape stability by specifying the residual catalyst amount of a cycloolefin copolymer. CONSTITUTION: At least a partially crystalline cycloolefin copolymer with 100 pp...  
JP2004093690A
To provide a positive resist composition having satisfactory transmittance when F2 excimer laser light (157nm) is used and ensuring small line edge roughness, few development defects and excellent heat resistance.In the positive resist c...  
JP3506594B2
To provide the photosensitive film copolymer and its manufacture superior in etching resistance, heat resistance, and adhesiveness and capable of preventing rounding of the upper parts of a pattern and forming a sharp pattern high in res...  

Matches 1,201 - 1,250 out of 2,217