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Matches 1,251 - 1,300 out of 2,217

Document Document Title
JP2004074662A
To improve adhesion/adhesive properties with another member by forming a film or a sheet having high appearance and shape stability without a wrinkle or a warp, providing a process which can remove the residual solvent of the film or the...  
JP2004077983A
To provide a positive type resist composition with high sensitivity and of high resolution which shows sufficient transparency when a light source of ≤160 nm, concretely of F2 excimer laser light (157 nm) is used.The positive type resi...  
JP3503622B2
To provide a resist composition which is imaged with 193 nm radiation and developed to form a resist structure having high resolution and excellent etching resistance. The acid catalyst type positive type resist composition contains a co...  
JP2004067972A
To obtain a polymeric compound useful as a base polymer for a resist material suitable for a fine processing technology, especially a chemically amplifying resist material, a resist material, and to provide a method for forming a pattern...  
JP2004067975A
To obtain a polymeric compound useful as a base polymer for a resist material suitable for a fine processing technology, especially chemically amplifying resist material, a resist material, and to provide a method for forming a pattern.T...  
JP2004067877A
To provide an interlayer insulating film which is low in dielectric constant and hygroscopic property and which at the same time is superior in mechanical strengths.The interlayer insulating film comprises a polymer in which a first mono...  
JP2004067888A
To provide a method for manufacturing an indene polymer wherein a polymer with a high molecular weight is easily obtained, and a polymer with excellent optical properties and low water absorption, and especially improved mechanical stren...  
JP2004066533A
To provide a heat-shrinkable laminated polyolefin film which is excellent in heat-shrinkage finish and heat resistance, can be suitably used as a label stuck to a PET bottle for a hot drink, and is accurately applicable to segregated rec...  
JP2004058339A
To provide a base material covered with a coating material having excellent heat resistance, moisture resistance, chemical resistance and transparency and excellent adhesion, adhesive properties and destruction characteristics and to pro...  
JP2004062175A
To provide (1) a resist material containing a polymer compound as a base resin which contains an ester compound giving a polymer compound with excellent acid decomposing property as a structural unit and which realizes the sensitivity, r...  
JP2004059732A
To provide a method for easily producing an indene-based polymer having good physical properties including optical properties, mechanical strength and low water absorptivity, and to provide high-quality and inexpensive molded products an...  
JP2004505129A
The present invention relates to the method of polymerization-izing a polymer composite and such a composite. Furthermore, when the present invention forms a wave guide tube, it relates to the method for producing a wave guide tube using...  
JP2004051949A
To provide a material soluble in either one of toluene, cyclohexane and their mixture at 25°C, excellent in optical transparency, heat resistance and stiffness, having a small expansion coefficient and suitable for sheets, films and thi...  
JP2004505308A
The present invention forms the core structure object containing the core composite which carried out partial hardening at least on the master which defines (a) wave guide tube pattern, (b) Apply the cladding layer containing a liquefied...  
JP2004043807A
To provide a photosensitive polymer which satisfactorily ensures dry etching resistance while keeping the production cost low and has superior adhesiveness to an under film.The photosensitive polymer is characterized by containing a copo...  
JP2004504635A
The present invention is a. Polymer and b which are insolubility and contain at least one sort of acid sensitivity machines in a water alkaline solution It is related with the chemistry amplification type system which shows sensitivity t...  
JP3496237B2
PURPOSE: To obtain an acrylic copolymer having further improved strength characteristics, compression set, etc., by copolymerizing an alkyl (meth)acrylate, an alkoxyalkyl (meth)acrylate and a crosslinking monomer by a specific method. CO...  
JP2004035671A
To obtain a new polymer silicone compound which is preferably usable not only as a material for a two-layer resist method, having high sensitivity and high resolution, especially suitable for forming a pattern with a high aspect ratio bu...  
JP2004503614A
The present invention relates to コポリマー of ノルボルネン and functional group content ノルボルネン comonomer, and its manufacturing process. These polymer can be made into randomness, alternation, a block co-polymer, ...  
JP2004026969A
To economically provide a hydrogenated copolymer preferably used for a hot melt adhesive or the like as an adhesiveness donating agent having a high softening point and a high softening point copolymer used for its raw material.The high ...  
JP2004018753A
To provide a method for producing an α-olefin-cycloolefin copolymer having high molecular weight and broad molecular weight distribution, keeping excellent polymerization activity especially even in a non-aromatic solvent without loweri...  
JP2004018832A
To provide a coating material for a metal pipe which can improve a defect caused in graft-modification of a polyolefin using a conventional silane coupling agent and can express a high adhesive strength so far unattainable, and also to p...  
JP2004012551A
To provide a radiation-sensitive resin composition having high transparency to a radiation, excellent in basic properties as a resist, such as sensitivity, resolution, dry etching resistance and pattern shape and suitable for use as a ch...  
JP2004004226A
To provide a positive resist composition which is suitably used for a light source for exposure of ≤160 nm, particularly, an F2 excimer laser beam (157 nm), and specifically to provide a positive resist composition which exhibits suffi...  
JP2004002721A
To provide a copolymer having excellent heat resistance and usable for an optical product.The copolymer is obtained by copolymerizing ethylene and/or a linear α-olefin, a cycloolefin and the following vinyl compound (1): the vinyl compo...  
JP2004004227A
To provide a positive resist composition which is suitably used for a light source for exposure of ≤160, particularly an F2 excimer laser beam (157 nm), and more specifically to provide a positive resist composition which exhibits suff...  
JP2004004703A
To provide a positive chemically amplified resist composition suitable for F2 excimer laser lithography, which is good in various kinds of resist performance such as sensitivity and resolution, and is particularly excellent in dry etchin...  
JP2004004965A
To provide a positive photoresist composition whose development defects are reduced in manufacturing of the positive photoresist composition and a pattern forming method using the same.The positive photoresist composition contains a resi...  
JP2004500596A
The process to which it relates for nitril / full オロア record content photoresist, and micro lithography is indicated. Such photoresist consists of compounds containing a full オロア record functional group and nitril, and they b...  
JP2004002724A
To provide a polymer compound and a resist material responding to a high energy beam and having an alkali-dissolving contrast and excellent plasma etching resistance without impairing transparency in ≤200 nm wavelength.The polymer comp...  
JP3476783B2
To provide a copolymer which can be easily processed to form e.g. a thin film, has high light transmittance in the far ultraviolet region, and is suitable for a photoresist in the semiconductor manufacturing technology. The copolymer is ...  
JP3476466B2  
JP2003345018A
To provide a positive resist composition having a sufficient transmitting property at ≤160 nm wavelength, practically when a light source of F2 excimer laser light (at 157 nm) is used, and having high sensitivity, high resolution and a...  
JP2003335826A
To provide a radiation-sensitive resin composition, particularly a copolymer useful as a resin component of the same, high in transparency to radiation; excellent in basic characteristics of a resist such as sensitivity, resolution, and ...  
JP2003535097A
(57) Summary book invention relates to the method of using the method, the new transition metal compound, and this which manufacture a specific transition metal compound for polymerization of an olefin.  
JP3470967B2
To provide a photoresist composition having so improved resolution as to enable high resolution lithography performance using imaging radiation of 193 nm. The photoresist composition is obtained by using an imaging copolymer so as to imp...  
JP2003327631A
To obtain a photosensitive polymer having uniformly distributed hydrophilic units and hydrophobic units, and a resist composition containing the same.The photosensitive polymer comprises a structure represented by formula (1) [wherein, R...  
JP2003330193A
To provide a radiation-sensitive resin composition having high transparency for radiation and an excellent balance in the characteristics as a resist such as sensitivity, resolution, dry etching durability, pattern profile, mask pattern ...  
JP2003330195A
To provide a positive resist composition which significantly decreases development defects and gives an excellent square profile.The positive photoresist composition contains (A) a resin which contains a repeating unit having a specified...  
JP2003327630A
To obtain a cyclic olefin copolymer improved in transparency, heat resistance and water resistance (low water absorption) by resolving the problems in conventional transparent resins and further improved in low birefringence and an impro...  
JP3465070B2
PURPOSE: To obtain a surface converted paper having excellent transparency, surface gloss, scratching resistance, moisture resistance and gas barrier properties, by coating base paper with a cyclic olefinic emulsion. CONSTITUTION: An aqu...  
JP2003313247A
To obtain an α-olefin/cycloolefin copolymer having a narrow molecular weight distribution and a process for producing the copolymer with high polymerization activity.The α-olefin/cycloolefin copolymer is obtained by copolymerizing a 2-...  
JP2003315502A
To provide an optical member having excellent optical characteristics and heat resistance and to provide an optical member which can suppress changes in the tone of display when the member is used, for example, as a structural member or ...  
JP2003311773A
To provide a highly accurate optical part, which is obtained by injection molding and has at least one effective curved surface.In the optical part, which is obtained by injection molding and has at least one effective curved surface, th...  
JP2003307838A
To provide a positive photosensitive composition excellent in line edge roughness to solve a technical problem to enhance the performance of microphotofabrication using far-ultraviolet rays especially ArF eximer laser beam.The positive p...  
JP2003307839A
To provide a resist composition excellent in sensitivity, resolving power and profile.The resist composition contains a specified sulfonium compound which contains a group having a -CON- bond or a -SO2N- bond and generates an acid upon i...  
JP2003531923A
(57) Summary book invention indicates the new transparent polymer mixing thing equipped with the property modification relief action and property modification contraction action containing cycloolefin polymer. The polymer mixing thing of...  
JP2003302762A
To provide a positive photoresist composition for far UV exposure excellent in edge roughness, etching resistance and adhesion.The positive resist composition comprises (A) a photoacid generator, (B) a resin which has a repeating unit ha...  
JP2003292542A
To provide a copolymer to be used in a photoresist composition for lithography, particularly a chemical amplification photoresist.The copolymer is preferably substantially transparent to deep ultraviolet radiation, i.e., radiation of a w...  
JP2003295442A
To provide a positive resist composition having satisfactory transmittance when a light source of ≤160 nm, concretely F2 excimer laser light (157 nm) is used, excellent in sensitivity and contrast and ensuring a small number of particl...  

Matches 1,251 - 1,300 out of 2,217