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Matches 1,351 - 1,400 out of 2,217

Document Document Title
JP2003084440A
To provide a resist material such as a chemical amplification type resist material having very high contrast between velocity of dissolution in alkali before exposure and that after exposure, high sensitivity, high resolution and particu...  
JP3387533B2
PURPOSE: To provide a resin excellent in heat resistance, transparency, photo- deterioration resistance, low birefringence, electrical insulation, high-frequency properties, electrical insulation stability, low dissolution of organic mat...  
JP2003064115A
To provide a method for efficiently producing a copolymer of an α-olefin (excluding ethylene) and a cycloolefin having uniform composition and narrow molecular weight distribution.The α-olefin-cycloolefin copolymer is produced by copol...  
JP2003055408A
To provide a photoresist monomer and a photoresist polymer that can be used with a VUV (157 nm) light source. This photoresist monomer is represented by the following formula (1) (wherein R1 is a 1-10C, substituted or unsubstituted, stra...  
JP2003048918A
To provide a cyclic olefin-based addition type copolymer crosslinked product which has high transparency, excellent heat resistance, excellent dimensional stability, excellent solvent resistance, excellent chemical resistance, excellent ...  
JP2003048998A
To provide a liquid crystal oriented film-formed substrate having good heat resistance, solvent resistance and dimensional stability and excellent in transparency, and to provide a liquid crystal display element using the same. This liqu...  
JP3376335B2  
JP2003034706A
To provide a polymer compound having excellent reactivity, stiffness and adhesivity with a substrate and less swelling at the development, a resist material using the polymer compound as the base resin, and having largely improved resolu...  
JP2003034705A
To provide a photoresist material suitable for a lithography using light of 180 nm or less wave length and its raw material, and a method capable of forming a fine pattern. The fluorine-containing phenylmaleimide derivative is shown in f...  
JP2003029663A
To provide a plastic transparent insulating substrate having excellent heat resistance which can be used for an active matrix substrate as the structural member of a display device.The transparent insulating substrate is produced by usin...  
JP2003025365A
To provide a method for injection-molding a molded article reduced in wall thickness and good in the transfer properties of the surface of a mold by allowing a cyclic olefin resin having high heat resistance to flow well.Carbon dioxide i...  
JP2003020315A
To provide a photoresist monomer and a photoresist polymer usable even for a VUV (157 nm) light source.The photoresist monomer is represented by formula (1) (wherein X1, X2, R1, R2, and R3 are the same as defined in the specification), a...  
JP2003021904A
To provide a resist material having a high contrast in alkali dissolution rate before and after exposure, having high sensitivity and high resolution and exhibiting superior etching resistance by adding a high molecular compound obtained...  
JP2003020328A
To provide a hydrocarbon resin for modifying a rubber composition that maintains piercing strength and tear strength of the rubber composition and at the same time exhibits an excellent improvement effect of wear resistance, elongation a...  
JP2003502490A
(-- 57) summary -- the following structure unit, i. E. , A5* 95-mol% of a rate, The derivative of olefin nature unsaturated carboxylic acid or such carboxylic acid, B) An olefin nature unsaturated compound with at least one hydrocarbon m...  
JP3361808B2  
JP3361809B2  
JP2002371110A
To provide an industrial and highly active catalytic system easily obtained for copolymerization between an α-olefin and a cyclic olefin, and to provide a method for producing the copolymer by use of the catalytic system. This copolymer...  
JP2002371117A
To provide an olefinic resin having excellent heat resistance, transparency, nonhygroscopicity and chemical resistance with excellent casting workability, and to provide a copolymerization method for the resin. The cyclic conjugated dien...  
JP2002371109A
To provide an industrial and highly active catalytic system easily obtained in for copolymerization between an α-olefin and a cyclic olefin, and to provide a method for producing the copolymer by the use of the catalytic system. This co...  
JP2002362614A
To provide a wrap film showing superior heat resistance, waterproof and resilient characteristics which is most suitable for cooking operation through heating at a micro wave oven. There is provided a wrap film made of elastomer type cyc...  
JP3357126B2  
JP3355045B2  
JP2002348324A
To provide a polymer having a polycyclic cycloolefin, and having a high viscosity and a high glass transition temperature. A polycyclic cycloolefin such as norbornene in an amount of 0.1-100 wt.%, and at least one of 0-99.9 wt.% of a mon...  
JP2002348333A
To provide a norbornene copolymer for a photoresist which has transparency, high sensitivity, high resolution and etching resistance in order to be suitable for fine fabricating ultrahigh integrated semiconductor by excimer laser; a meth...  
JP2002338634A
To provide a polymer which contains repeating units derived from perfluoro-2,2-dimethyl-1,3-dioxole; and a chemical-amplification-type resist composition containing the same.This resist composition contains (a) a photosensitive polymer c...  
JP2002338627A
To obtain a polymer compound which exhibits a high etching resistance when used for a photoresist.This polymer compound contains at least one kind of monomer unit selected from monomer units represented by formulas (Ia)-(Ig) [wherein Ra ...  
JP2002341539A
To provide a positive resist composition excellent in resolution and exposure margin, which can be suitably used for microphotofabrication using far-UV rays, particularly ArF excimer laser light.The positive resist composition contains (...  
JP2002338633A
To provide a polymer compound which is sensitive to a high-energy ray, is excellent in sensitivity, resolution, and etching resistance, and hence is useful for fine processing using an electron beam or ultraviolet rays.This polymer compo...  
JP3350951B2  
JP2002332304A
To provide a copolymer latex excellent in stability during polymerization, and capable of giving excellent workability, adhesive strength, and blister resistance when used as a binder for paper coating.In this manufacturing method for a ...  
JP2002332312A
To obtain an α-olefin/cyclic olefin copolymer having a very narrow molecular weight distribution, and to provide a method for manufacturing this α-olefin/cyclic olefin copolymer with high polymerization activity.The α-olefin/cyclic ol...  
JP2002332315A
To obtain a coating material composition which has low foaming properties and excels in mechanical stability, chemical stability, water washability, and operating characteristics, and to prepare a paper coating copolymer latex from which...  
JP2002327024A
To provide a (crosslinked) resin film having an optical transparency, heat resistance, liquid crystal resistance, dimensional stability and adhesion which can be used as a substitute of a substrate glass in a liquid crystal display devic...  
JP2002327022A
To provide a fluorine-containing maleimide-based copolymer which can be used for various applications including an electronics material, substrate material or the like since it has excellent heat resistance and thermal stability and it c...  
JP2002327021A
To provide a novel polymer which can be used to compose a useful resist for a minute processing using various radial rays and a resist composition containing the polymer.This acid-labile polymer is represented by the formula 1 wherein R1...  
JP2002322185A
To provide a composition of a highly reactive trialkoxysilyl group- containing norbornene compound which shows high reactivity when used in various polymerization processes and also shows high modification rate when used as a resin-modif...  
JP2002322450A
To newly develop a resin tackifier having a good color tone, easy polymerized and having excellent adhesive properties such as adhesion, cohesion power and tackifying ability.This tackifier resin is obtained by polymerizing (A) 8-10C aro...  
JP2002311587A
To provide a chemical amplification resist composition having high reactivity to an acid, ensuring easy progress of release of the protective group of an acid sensitive material and having enhanced sensitivity.A compound having both an a...  
JP2002303981A
To provide a positive type photoresist composition for exposure with far UV having high resolving power, good fitness for a halftone phase shift mask (side lobe light resistance) and lowered density dependency.The positive type photoresi...  
JP2002303985A
To provide a high molecular compound having excellent reactivity, inflexibility and adhesion to a substrate and less liable to swell in development and a resist material using the high molecular compound as a base resin and having much h...  
JP3334106B2
To obtain a cycloolefin-based polymer having a large viscosity number and a high glass transition temperature, and useful for the extrusion molding of film, or the like, by copolymerizing a polycyclic olefin and an acyclic olefin under a...  
JP2002296783A
To provide a chemical amplification type positive resist composition containing a resin component and an acid generating agent and suitable for excimer laser lithography with ArF or KrF laser and to provide a composition showing excellen...  
JP2002293843A
To provide a cycloolefinic copolymer which is crosslinkable and capable of giving excellent properties in heat resistance, transparency, chemical resistance, solvent resistance, bonding and adhesion, its composite material, these erossli...  
JP3332368B2  
JP2002531586A
(57) Composite containing the ethylene / cyclic olefin polymer which has the toughness by which summary improvement was carried out, and the processability in film manufacture, and by which the catalyst was carried out with metallocene e...  
JP2002531648A
(57) Summary ノルボルネン, methyl ノルボルネン, ethyl ノルボルネン, ブチルノルボルネン, hexyl ノルボルネン, 1, 2, 3 and 4, 4a, 5, 8, 8a*オクタヒドロ*1, 4: 5, 8* ジメタノ naphthalene, The catalys...  
JP2002265890A
To provide a substrate which is used for an adhesive tape, generates no poisonous gas such as chlorine gas, is scarcely tacky, and has the same flexibility as that of polyvinyl chloride tape.This substrate for the adhesive tape comprises...  
JP2002265530A
To obtain a resin for photoresist which is excellent in homogeneity and can give a fine pattern with a high resolution.A compound represented by formula (1) (wherein Ra is H or methyl; and R1 is a 1-10C hydrocarbon group) is provided.  
JP2002256033A
To obtain a resist material responsive to a high-energy ray, having excellent sensitivity, resolution and oxygen plasma etching resistance at a wavelength of ≤300 nm, consequently the resist material capable of being made into an excel...  

Matches 1,351 - 1,400 out of 2,217