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Patent Searching and Data


Matches 1,401 - 1,450 out of 2,217

Document Document Title
JP2002529573A
(57) Summary book invention is (A) 0.1*100wt% (based on the sum total weight of a coating combination thing) of substantially random インターポリマー at least one sort of, (1) The vinyl of at least one sort of (i) s, or a ビニ...  
JP3320475B2  
JP2002244297A
To provide a resist material excellent in stability when allowed to stand in vacuum after exposure with electron beams, hardly causing trail on a Cr substrate and excellent in sensitivity, resolution and plasma etching resistance.The res...  
JP2002241442A
To obtain a resin for photoresist capable of giving a fine pattern having high resolution excellent in homogeneity.In the resin for photoresist there is used a compound represented by general formulas (1a) and (1b) (wherein, R1 is a hydr...  
JP2002234915A
To provide a polymer compound which, when used as a base resin, gives a resist material which is sensitive to high-energy rays and excellent in sensitivity, resolution, and etching resistance.This polymer compound contains repeating unit...  
JP2002234916A
To provide a polymer compound which is sensitive to high-energy rays, is excellent in sensitivity particularly in a wavelength range of 170 nm or lower, and has improved transparency and excellent plasma-etching resistance.This polymer c...  
JP2002526623A
(57) Summary book invention is in the state in contact with the medium used as the trigger of the inside of the air, and stress cracking, and relates to the polymer composite which is characterized by the improved tolerance over the crac...  
JP3315729B2  
JP2002525683A
(57) ホトレジスト for micro lithography by summary extreme ultraviolet rays, a far ultraviolet ray, and 近紫外線 and a related method are indicated. An enforcement form -- this ホトレジスト -- (a) -- at least one ethylene...  
JP2002220424A
To provide a useful maleimide copolymer as a resist resin excellent in the drying etching resistance.The copolymer contains the units represented by the formulas (1) and (2) [R is an alkyl group which may have a substituted group; Z ring...  
JP2002214786A
To provide a positive photoresist composition excellent in PED stability and capable of preventing the occurrence of development defects in the production of a semiconductor device.The positive photoresist composition contains a compound...  
JP2002523571A
(57) A summary カルボキシミダミダトネート machine can polymerize olefins, for example, ethylene, propylene, etc. In the covalent bond by a mediation machine, using as a catalyst the new transition metal complex which the scr...  
JP2002206012A
To provide a resist material which is produced by using a high- molecular compound of the present invention as a base resin, which is sensitive to high energy rays, and excellent in sensitivity, resolution and etching resistance, and acc...  
JP2002206005A
To provide a method for producing an olefin-based copolymer having a cyclic structure, which comprises ethylene and dicyclopentadiene or tricyclopentadiene, and a cyclic olefin to be introduced at need, for copolymerization.A catalyst co...  
JP2002205358A
To provide a packaging material which has a paper layer, a barrier layer inside the paper layer and further a polyethylene layer inside the barrier layer and makes the outward appearance of a container excellent when used as the containe...  
JP2002202607A
To provide a positive type photoresist composition for exposure with far UV having improved exposure margin and defocus latitude in the resolution of a contact hole pattern.The positive type photoresist composition contains a compound wh...  
JP2002202605A
To provide a positive type photoresist composition for exposure with far UV capable of preventing the occurrence of particles in the dissolution of solid components in a solvent and in storage over time and a variation of sensitivity due...  
JP2002201226A
To provide a radiation-sensitive resin composition which exhibits high transmission of various radiations, especially of far-ultraviolet rays represented by KrF excimer laser, and is excellent in sensitivity, resolution, adhesion to subs...  
JP2002202606A
To provide a positive type photoresist composition for exposure with far UV having superior sensitivity in the resolution of contact holes in the production of a semiconductor device, capable of preventing the occurrence of particles in ...  
JP2002521534A
(57) It is guided from summary solution means a palladium, nickel or platinum ion, and the acid that has pKa smaller than b3, and is an atom (VA fellows' atom) of VA fellows of an element periodic law table. It is replaced by at least on...  
JP2002521464A
(57) Summary book invention relates to manufacture of the new fine grain for the controlled release of a combination auxiliary agent and the activity substance preferably obtained in response to assistance of diatomite from at least one ...  
JP3301448B2
PURPOSE: To obtain a new modified copolymer rich in adhesivity, printability, hydrophilicity, polymer modifying properties, etc., by copolymerizing an α-olefin with a cyclic polyene and then modifying the resultant produced random copol...  
JP2002196495A
To provide a positive type resist composition which has high transmittance at 157 nm of a F2 excimer laser.The chemical amplification type positive type resist composition for a F2 excimer laser comprises a polymerization unit derived fr...  
JP2002519487A
(-- 57) summary -- the copolymer composition thing containing the repetition unit which polymerized from at least one kind of multi-ring type monomer and at least one kind of acrylics system monomer is indicated. This copolymer -- the --...  
JP2002179875A
To obtain a heat-resistant resin composition having excellent thermal aging resistance and especially suitable as a liquid crystal substrate material, a semiconductor coating material and an adhesive for lens by compounding a cyclic olef...  
JP2002179744A
To obtain a maleimide-based polymer useful as a resin for a photoresist having excellent dry-etching resistance.This maleimide-based polymer comprises at least a unit expressed by the formula (1) (where ring Z denotes a polycyclic hydroc...  
JP2002178453A
To provide a laminate of cyclic olefin copolymers which is excellent in heat melting adhesion properties, a method for heat melting adhesion of the laminate, and a method for the heat melting adhesion between an olefin resin and a non-ol...  
JP2002173513A
To provide a fluorine-containing copolymer containing hydroxy group and having high transparency, ≤1.42 low refractive index (nD) and high glass transition temperature.This fluorine-containing copolymer comprises 1-60 mol% perfluorocyc...  
JP2002174901A
To provide a positive type photoresist composition for exposure with far UV excellent in density dependence of a contact hole pattern.The positive type photoresist composition contains (A) a compound which generates an acid when irradiat...  
JP2002169290A
To provide a photoresist resin which can form a fine pattern with excellent homogeneity and high resolution.The polymer to be used for the photoresist resin contains at least one kind of monomer unit expressed by formula (I). In the form...  
JP2002156763A
To provide a resist material, having superior transmittance for vacuum UV rays, resistance against decrease in the solubility of the resist (like a negative resist) and durability against dry etching and showing small surface roughness a...  
JP2002155119A
To provide a resist material which is sensitive to a high-energy ray being excellent in sensitivity for the wavelength of 200 nm or below, particularly 170 nm or below, besides in which plasma-etching resistance is improved by introducti...  
JP2002155120A
To provide a resist material which is sensitive to a high-energy ray being excellent in sensitivity, resolution and plasma-etching resistance for the wavelength of 200 nm or below, particularly 170 nm or below, and by these characteristi...  
JP2002155117A
To provide a resist material which is sensitive to a high-energy ray being excellent in sensitivity, resolution and plasma-etching resistance for the wavelength of 200 nm or below, particularly 170 nm or below, and by these characteristi...  
JP2002145962A
To obtain a resist material used for a method for forming a pattern, inducing high energy line and excellent in sensitivity, resolution and plasma etching resistance at ≤180 nm, especially ≤160 nm of wavelength.This polymer is charac...  
JP3280445B2
PURPOSE: To obtain the subject copolymer free from catalyst residue, having excellent transparency and heat-resistance and useful for optical material, etc., by polymerizing ethylene and a specific cycloolefin, etc., in the presence of a...  
JP3280444B2
PURPOSE: To obtain the subject copolymer free from catalyst residue, having excellent transparency and heat-resistance and useful for optical material, etc., by polymerizing a specific cycloolefin, a specific α-olefin and ethylene in th...  
JP2002131917A
To provide a positive photoresist composition having a wide defocus latitude and excellent in process tolerance, line edge roughness and resolving power or having an improved margin for exposure in the production of a semiconductor devic...  
JP2002121231A
To provide a method for producing an indene compound polymer and effective for easily improving the weight-average molecular weigh and the yield in the cationic polymerization of a copolymer containing an indene derivative monomer and an...  
JP3277568B2
PURPOSE: To obtain a resin excellent in heat resistance, moisture resistance, transparency, low birefringent properties, chemical resistance, electrically insulating properties, mechanical properties, etc., by using a small amount of a h...  
JP2002116544A
To provide a positive type photoresist composition less liable to cause development defects in the production of a semiconductor device, excellent in adhesion on an inorganic antireflection film and excellent also in exposure margin (in ...  
JP2002511499A
(57) A summary and subject The Europe patent public presentation 0 707 In the point of elastic character, only the dissatisfied characteristic shows the metallocene and the polymer created here using the polypropylene especially created ...  
JP2002114827A
To provide a cycloolefin polymer film or sheet having excellent heat- resistance and dimensional stability as well as excellent transparency, moisture- proofness, tearability, seal-openability, incineration suitability, low birefringence...  
JP2002114820A
To provide pellets for molding comprising molded cyclic olefin resin enabling a molding excellent in yield of products in a continuous operation suppressing generation of black spots, and a method of manufacturing the pellets for molding...  
JP2002511503A
(57) A summary and subject The Europe patent public presentation 0 707 In the point of elastic character, only the dissatisfied characteristic shows the metallocene and the polymer created here using the polypropylene especially created ...  
JP2002114826A
To provide a optically transparent, heat-resistant, adhesive and crosslinkable optical material having excellent solvent resistance and provide a liquid crystal display substrate material produced by using the optical material.The optica...  
JP2002107934A
To provide a resist material excellent in resolving power and dry etching resistance in exposure with EB(electron beam), EUV(extreme-ultraviolet radiation) or X-rays.The resist material contains a polymer having repeating units each cont...  
JP2002105131A
To provide a cyclic olefinic polymer which has low birefringence, excellent mechanical characteristics, precision moldability, moisture resistance (low water absorption), and the like, is especially free from even a slight color, and has...  
JP2002107936A
To provide a positive type photoresist composition less liable to cause development defects in the production of a semiconductor device or excellent also in adhesion, exposure margin (particularly in the case of isolated lines), resistan...  
JP2002107933A
To provide a resist material excellent in resolving power and dry etching resistance in exposure with EB(electron beam), EUV(extreme-ultraviolet radiation) or X-rays.The resist material contains a polymer having repeating units each cont...  

Matches 1,401 - 1,450 out of 2,217