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Matches 201 - 250 out of 2,252

Document Document Title
WO/2003/085014A1
The invention concerns a hydrocarbon mixture comprising modified polycyclic aromatic compounds or modified PAC having a chemical structure of mean molecular weight ranging between 200 and 10000, said chemical structure being represented ...  
WO/2003/075094A1
Fluorinated copolymers useful in photoresist compositions and associated processes for microlithography are described. These copolymers are comprised of a fluoroalcohol or protected fluoroalcohol functional group which simultaneously imp...  
WO2002031002A9
A nanostructure formation process that includes the step of polymerizing a diene under conditions suitable to yield a structure having at least one dimension ranging from 1 to 100 nanometers. More specifically, the self-assembly of block...  
WO2002010810A3
The invention provides a method for producing an optical waveguide that includes the steps of: (a) forming a core structure, the core structure including an at least partially cured core composition, on a master defining a waveguide patt...  
WO/2003/051943A1
A process for the preparation of a poly($g(a)-olefin) copolymer is disclosed wherein the process comprises polymerizing at least one $g(a)-olefin, preferably 1-decene, and at least one bulky olefin, preferably norbornene, in the presence...  
WO2002062859A3
In accordance with the present invention, there are provided free-radical polymerizable compositions comprising polycyclic olefins, wherein the polycyclic olefins contain little, if any, cyclopentenyl unsaturation. As a result, these ole...  
WO/2003/040827A1
Fluorinated polymers, photoresists and associated processes for microlithography are described. These polymers and photoresists are comprised of esters derived from fluoroalcohol functional groups that simultaneously impart high ultravio...  
WO2002044845A3
The invention relates to a photoresist composition having a protecting group and a protected material incorporated in a cyclic chemical structure. In this invention a protected material has a cyclic ether group or cyclic ester group as a...  
WO/2003/031485A2
Ethylene and norbornene-type monomers are efficiently copolymerized by certain metal complexes, particularly nickel complexes, containing selected anionic and neutral bidentate ligands. The polymerization process is tolerant of polar fun...  
WO/2003/016365A1
A conjugated−cyclodiene copolymer of a random structure which comprises (A) repeating units derived from a conjugated cyclodiene monomer and (B) repeating units derived from a vinylaromatic monomer having hydrogen in the &agr −positi...  
WO/2003/002657A1
Disclosed are an olefinic thermoplastic elastomer which exhibits rubber elasticity, flexibility, moldability, and processability equivalent to those of olefinic thermoplastic elastomers of the prior art and has good mechanical characteri...  
WO2002077712A3
Disclosed are photoresist compositions suitable for imaging with sub 200 nm wavelength radiation including ether linkages containing certain leaving groups. Also disclosed are methods of providign photoresist relief images using the phot...  
WO2002084402A3
The present invention provides a method for producing a film forming resin suitable for use in a photoresist composition, involving the following steps: (a) providing a solution of a film forming resin in a solvent, the film forming resi...  
WO/2002/092651A1
The present invention relates to a novel polymer comprising at least one unit derived from an ethylenically unsaturated compound containing at least one cyano functionality and at least one nonaromatic cyclic unit. The novel polymer is p...  
WO/2002/093263A1
The present invention relates to a novel photoresist composition sensitive in the deep ultraviolet region and a method of processing the novel photoresist, where the photoresist comprises a novel copolymer, a photoactive component, and a...  
WO2002033489A3
A fluorine-containing polymer prepared from at least a spacer group selected from the group consisting of ethylene, alpha-olefins, 1,1'-disubstituted olefins, vinyl alcohols, vinyl ethers, and 1,3-dienes; and a norbornyl radical containi...  
WO/2002/084402A2
The present invention provides a method for producing a film forming resin suitable for use in a photoresist composition, involving the following steps: (a) providing a solution of a film forming resin in a solvent, the film forming resi...  
WO/2002/079287A1
Polycyclic fluorine-containing polymers and photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The polycyclic fluorine-containing polymer is derived from a repeat unit comprising th...  
WO/2002/077712A2
Disclosed are photoresist compositions suitable for imaging with sub 200 nm wavelength radiation including ether linkages containing certain leaving groups. Also disclosed are methods of providign photoresist relief images using the phot...  
WO2002006901A3
The present invention relates to a chemically amplified system, which is, sensitive to wavelengths between 300 nm and 100 nm, and comprises a) a polymer that is insoluble an aqueous alkaline solution and comprises at least one acid labil...  
WO/2002/064719A1
The invention relates to the use of copolymers in cleaner formulations for preventing glass from corroding when cleaned in a dishwasher. The copolymers contain: a) 20 to 70 % by weight of at least one monomer component (A) from the group...  
WO/2002/062859A2
In accordance with the present invention, there are provided free-radical polymerizable compositions comprising polycyclic olefins, wherein the polycyclic olefins contain little, if any, cyclopentenyl unsaturation. As a result, these ole...  
WO/2002/062757A1
In accordance with the present invention, there are provided novel heterobifunctional monomers and uses for the same. Invention compounds have many of the properties required by the microelectronics industry, such as, for example, hydrop...  
WO2002010231A3
The present invention relates to polymer compositions and methods of polymerizing such compositions. Furthermore, the present invention relates to polymer compositions that are useful in forming waveguides and to methods for making waveg...  
WO/2002/053622A1
The present invention relates to addition copolymers of cyclic olefins, and in particular, cyclic olefin copolymers of norbornene type compounds containing sulfur to provide excellent adhesiveness to metal, and methods for using the same...  
WO/2002/048221A1
A hydrocarbon resin is prepared by (1) thermally polymerizing a mixture consisting essentially of (a) about 5 % to 25 % by weight styrene or aliphatic or aromatic substituted styrene, and (b) about 95 % to 75 % by weight based on total m...  
WO/2002/044845A2
The invention relates to a photoresist composition having a protecting group and a protected material incorporated in a cyclic chemical structure. In this invention a protected material has a cyclic ether group or cyclic ester group as a...  
WO2000078824A9
The invention relates to oil-soluble copolymers with an OH number of from 10 to 250 and a molecular weight of from 1000 to 100,000 g/mol, obtained by reacting a copolymer precursor that contains structural units from A) 5 to 80 mole perc...  
WO2001092269A3
The invention relates to a method for producing special transition metal compounds, to novel transition metal compounds and to their use for the polymerization of olefins.  
WO/2002/033489A2
A fluorine-containing polymer prepared from at least a spacer group selected from the group consisting of ethylene, alpha-olefins, 1,1'-disubstituted olefins, vinyl alcohols, vinyl ethers, and 1,3-dienes; and a norbornyl radical containi...  
WO/2002/031002A1
A nanostructure formation process that includes the step of polymerizing a diene under conditions suitable to yield a structure having at least one dimension ranging from 1 to 100 nanometers. More specifically, the self-assembly of block...  
WO2001096406A3
The present invention is directed to copolymers of norbornene and functional group containing norbornene comonomers and processes for the preparation thereof. These polymers may be random, alternating or block copolymers or terpolymers, ...  
WO2001037047A3
Nitrile/fluoroalcohol-containing photoresists and associated processes for microlithography are described. These photoresists are comprised of a fluoroalcohol functional group and a nitrile-containing compound which together simultaneous...  
WO/2002/018510A1
A hot-melt composition which comprises specific amounts of: (a) an ethylene copolymer resin; (b) a modified aromatic petroleum resin with a specific weight-average molecular weight obtained by copolymerizing (1) a polymerizable ingredien...  
WO/2002/010231A2
The present invention relates to polymer compositions and methods of polymerizing such compositions. Furthermore, the present invention relates to polymer compositions that are useful in forming waveguides and to methods for making waveg...  
WO/2002/010810A2
The invention provides a method for producing an optical waveguide that includes the steps of: (a) forming a core structure, the core structure including an at least partially cured core composition, on a master defining a waveguide patt...  
WO/2002/006901A2
The present invention relates to a chemically amplified system, which is, sensitive to wavelengths between 300 nm and 100 nm, and comprises a) a polymer that is insoluble an aqueous alkaline solution and comprises at least one acid labil...  
WO/2001/096406A2
The present invention is directed to copolymers of norbornene and functional group containing norbornene comonomers and processes for the preparation thereof. These polymers may be random, alternating or block copolymers or terpolymers, ...  
WO/2001/092269A2
The invention relates to a method for producing special transition metal compounds, to novel transition metal compounds and to their use for the polymerization of olefins.  
WO/2001/064786A1
The invention relates to a novel transparent polymer mixture with modified relaxation and contraction characteristics, containing cycloolefinic polymers. The inventive polymer mixture contains at least one amorphous polyolefin and is use...  
WO/2001/057597A1
A polymeric compound for photoresists which comprises monomer units represented by formula (I); and a resin composition for photoresists which comprises the polymeric compound and a photo-acid generator. The composition has high adhesion...  
WO/2001/046273A1
This invention relates to olefin polymerization processes suitable for limiting or eliminating aromatic solvents or diluents. The invention processes can be conducted by contacting polymerizable olefin monomers with catalyst complexes of...  
WO/2001/037047A2
Nitrile/fluoroalcohol-containing photoresists and associated processes for microlithography are described. These photoresists are comprised of a fluoroalcohol functional group and a nitrile-containing compound which together simultaneous...  
WO2000006296A3
The invention relates to the preparation of novel microparticles that can be obtained from at least one cyclic olefin copolymer using formulating materials, preferably diatom earth, and to the use of the microparticles for the controlled...  
WO/2001/021670A1
A method of synthesizing polymers from acrylates, norbornenes and mixtures thereof, which comprises contacting under polymerization conditions and in the presence of a solvent (a) a least one monomer selected from the group consisting of...  
WO/2000/078824A1
The invention relates to oil-soluble copolymers with an OH number of from 10 to 250 and a molecular weight of from 1000 to 100,000 g/mol, obtained by reacting a copolymer precursor that contains structural units from A) 5 to 80 mole perc...  
WO/2000/034344A1
A catalyst system and a process for the bulk addition polymerization or of polycyclic olefins, such as norbornene, methylnorbornene, ethylnorbornene, butylnorbornene or hexylnorbornene, 1,2,3,4,4a,5,8,8a-octahydro-1,4:5,8-dimethanonaptha...  
WO/2000/027936A1
The present invention relates to a coating formulation comprising: (A) from 0.1 to 100 wt percent (based on the total weight of the coating formulation) of at least one substantially random interpolymer, which comprises: (1) polymer unit...  
WO/2000/020496A1
The present invention relates to a polymeric composition containing one or more cycloolefin copolymers and one or more additives of an appropriate composition, characterized by improved resistance to cracking under stress in the air and ...  
WO/2000/017712A1
Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer comprising a repeat unit derived from at least o...  

Matches 201 - 250 out of 2,252