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Matches 501 - 550 out of 2,319

Document Document Title
JP4839470B2  
JP2011530001A
Adducts of an unsaturated metathesis polymer or interpolymer and an unsaturated diacid anhydride. A process for producing adducts of an unsaturated metathesis polymer or interpolymer and unsaturated diacid anhydride.  
JP4837666B2  
JP4831275B2  
JP4831277B2  
JP4831270B2  
JP4831278B2  
JP4826366B2  
JP4826242B2  
JP2011237572A
To provide a reflection film with which better light reflectivity can be achieved and which enables better brilliance when it is used as a component of a liquid crystal apparatus.A reflection film is proposed which includes a cycloolefin...  
JP2011227290A
To provide a material for forming a protective film which is capable of improving water repellency while suppressing a deterioration in alkali solubility of the protective film, and to provide a forming method for a resist pattern using ...  
JP4813569B2  
JP2011221142A
To provide an optical waveguide structure having an optical waveguide that enables a greater degree of freedom in pattern shape design, allows a core part (an optical path) to be formed with high dimensional precision by a simple method ...  
JP2011180185A5  
JP2011209520A
To provide an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in development defect performance, liquid immersion defect performance and limit resolution and enables to form a pattern having a good shape...  
JP2011209664A
To provide a photosensitive resin composition for forming an optical waveguide, the composition showing high productivity and little optical loss, and to provide a film for forming an optical waveguide, an optical waveguide, optical wiri...  
JP2011202153A
To provide a palladium catalyst for addition polymerizing a norbornene system which has a sufficient catalytic activity for the addition polymerization of not only a non-substituted norbornene but also a norbornene derivative, is inexpen...  
JP2011192955A
To provide an insulating film which has superior adhesion to an inorganic film and suppresses a hillock of copper wiring, a semiconductor device with the insulating film, and a composition for film formation which provides the insulating...  
JP2011192758A
To provide a container containing a film forming composition that is less apt to generate particles.The container containing the film forming composition is obtained by storing a liquid-like film forming composition, including a polymeri...  
JP4780262B2  
JP4775759B2  
JP2011180185A
To provide a chemically amplified negative resist composition capable of giving a resist pattern with reduced line edge roughness and small substrate dependency thereof, and a patterning process using the same.In a chemically amplified n...  
JP2011180605A
To provide an optical waveguide structure including a durable optical waveguide, which has a great design flexibility of a pattern shape in an optical circuit and with which an optical path with high dimension accuracy can be formed with...  
JP2011173855A
To provide a photoacid generator for preparing a resist composition forming an excellent pattern shape because of excellent resolution, a wide margin of depth of focus (DOF), a small line edge roughness (LER) and further high sensitivity...  
JP4763916B2  
JP2011162772A
To provide a waveguide structure, and a method for forming such a structure composed of a core region and a cladding region laterally adjacent thereto, and to provide a waveguide structure where a core region is collectively surrounded b...  
JP2011164652A
To provide a positive resist composition and a method of pattern formation using the composition, the positive resist composition improved in performances relating to a pattern profile, pattern falling and scum and excellent in a recedin...  
JP4757439B2  
JP4747399B2  
JP2011154264A
To provide a negative resist composition for ion beam writing having good thermal stability and storage stability, containing few ionic impurities such as Cl and Na, excellent in transparency in a wide wavelength region, and giving a res...  
JP4744113B2  
JP4729803B2  
JP4722828B2  
JP4714955B2  
JP2009258586A5  
JP2011105688A
To provide a method for purifying an N-alkyl-substituted imide group-containing alicyclic olefin monomer which is a raw material monomer for a polar group-containing cyclic olefinic polymer useful as a sealing material and an insulating ...  
JP4686866B2  
JP2011100089A
To provide a pattern forming method for forming a pattern having a large depth of focus (DOF), small line width roughness (LWR) and reduced bridge defects, in order to more stably form a high-accuracy fine pattern for manufacturing a hig...  
JP2011085919A
To provide a material for forming a protective film that has favorable alkali solubility and gives a protective film excelling in water repellency, and to provide a method for forming a photoresist pattern using the material.The material...  
JP2011084681A
To provide a highly gas-permeable cyclic olefin addition polymer which is readily industrially producible, and has excellent gas permeability, and high thermal stability and mechanical strength, and further excellent solubility in combin...  
JP4678367B2  
JP4678091B2  
JP2011075751A
To provide a heat-resistant plastic optical fiber which maintains sufficient transmission performance over a long period of time, even in severe high temperature and high humidity surroundings.The heat-resistant plastic optical fiber con...  
JP4666771B2  
JP4665043B2  
JP4665322B2  
JP2011063744A
To provide a norbornene-based transannular polymer, excellent in heat resistance and film forming capability.A method of producing a norbornene-based polymer (A) represented by formula (1) includes polymerizing 5-alkylidene norbornene (a...  
JP2011063809A
To provide a method for producing a homopolymer or a copolymer having high impact strength and high-temperature resistance.A catalyst system and a method for the bulk addition polymerization of polycyclic olefins, such as norbornene, met...  
JP4663075B2  
JP4651774B2  

Matches 501 - 550 out of 2,319