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Matches 551 - 600 out of 2,322

Document Document Title
JP4663075B2  
JP4651774B2  
JP2011042789A
To provide a fluorine-containing monomer which is used as a raw material to produce a base resin for a material, such as a functional material, a medical drug, and an agricultural chemical, especially a radiation-sensitive resist materia...  
JP2011043794A
To provide new resins that comprise multi-ring, aromatic and/or multi-cyclic ester units which are photoacid-labile.The present invention provides a chemically amplified positive photoresist containing the new resin, as well as multi-rin...  
JP2011038106A
To provide a method for producing a polycyclic olefin polymer usable for photoresist compositions.The method for producing a polycyclic olefin polymer includes (a) combining a monomer composition containing polycyclic olefin monomers, a ...  
JP4631229B2  
JP2003525311A5  
JP2011017931A
To provide: a photosensitive resin composition that exhibits low optical propagation loss and excelling thermal properties, to provide a photosensitive resin composition for formation of an optical waveguide, which also exhibits low opti...  
JP4620530B2  
JP2011012114A
To provide an air-conditioning system that sufficiently blocks suspended matter in the air, such as SPM and sufficiently introduces outside air.In the air-conditioning system that supplies gas to a space to be air-conditioned and/or disc...  
JP2011012382A
To provide an economical and environmentally-friendly process for producing a microfiber webs comprising a cycloolefin polymer.The microfiber webs containing at least one cycloolefin polymer are produced by melt-blowing process in which ...  
JP2011012113A
To provide an asymmetric membrane excellent in hole characteristic, having fine holes of a nano-micron level on the surface and excellent in flexibility and heat resistance.The asymmetric membrane comprises a cyclic olefin polymer obtain...  
JP2011012272A
To provide an ultra-low dielectric material that is stable to the severe processing conditions required in fabricating semiconductors.The invention provides a composition comprising (a) a hydrocarbon-containing matrix precursor and (b) a...  
JP4614092B2  
JP2007246914A5  
JP2011008292A
To provide a dissolution rate modifier.The present invention relates to oligomers of polycyclic olefin monomers, and optionally allylic or olefinic monomers, and a method of making the oligomers, including reacting polycyclic olefin mono...  
JP4611137B2  
JP2010275555A
To provide a resin and a polymerizable compound which can be used for a photosensitive composition excellent in resolution and line edge roughness and a method for forming a pattern using the composition, in relation to the photosensitiv...  
JP2010275498A
To provide a resist composition that forms a pattern by using a high energy beam or electron beam having a wavelength of 300 nm or less, and to provide a resin that is used for a topcoat composition in immersion lithography and has water...  
JP2010260916A
To provide a photosensitive composition that synthesizes a functional substituent group-containing polynorbornene by bulk polymerization. The photosensitive composition includes a photoacid generator, a norbornene-based monomer containin...  
JP2010254910A
To provide a method for producing a cyclic olefin addition polymer, capable of giving a relatively low molecular weight cyclic olefin addition polymer without using a large amount of a polymerization catalyst or the large amount of a mol...  
JP2010256879A
To provide an actinic ray- or radiation-sensitive resin composition having good conformability to a liquid for liquid immersion during liquid immersion exposure and having good coverage dependence, from which a pattern reduced in the occ...  
JP2010250075A
To provide an active-ray sensitive or radiation-sensitive resin composition which is improved in development defects and distance dependence of a pattern, and to provide a method for forming a pattern that uses the composition.The active...  
JP2010250105A
To provide a resist material using an additive for a resist material for immersion lithography, which exhibits excellent water repellency and water slipping property, and forms a resist pattern of satisfactory profile after development, ...  
JP2010250076A
To provide an active ray-sensitive or radiation-sensitive resin composition, with which a pattern having good corner proximity and fewer developing defects can be formed, and which causes little elution of an acid into an immersion liqui...  
JP4570910B2  
JP2010237627A
To provide an active light or radiation sensitive resin composition which allows formation of a pattern having less water residue defects, bubble defects, and development residue defects and is superior in LWR, and a pattern forming meth...  
JP4557502B2  
JP4558941B2  
JP2010215834A
To provide a molded product which is high in both refraction and Abbe's number.The polymer to use has a sulfur-containing cyclic structure having a repeating unit represented by formula (1) (wherein R1-R4 are each hydrogen, an alkyl grou...  
JP4542075B2  
JP4539865B2  
JP2010189592A
To provide a new norbornene producible readily and efficiently.There is provided a compound expressed by formula (1) (wherein B1 to B3 are each independently hydrogen, 1-10C alkyl, 3-10C cycloalkyl, 6-12C aryl or 1-10C alkoxy; and m is a...  
JP4535303B2  
JP4531913B2  
JP2010174099A
To provide a cycloolefin addition polymer that is easily produced industrially, and has excellent gas permeability, heat stability and mechanical strengths, and to provide a method for producing the polymer.The cycloolefin addition polym...  
JP4519654B2  
JP4516963B2  
JPWO2008120721A1
本発明は、磁性体粉末が本来有する優れた磁 気特性を発現させ、同種の磁性体粉末であっ ても、磁気特性の向上された成形体を与えう る重合性組成物を提供することを目的と...  
JP2010523766A
A method of controlling a molecular weight of polycyclic type オレフィン monomer (norbornene type) polymer, and activating the polymerization using a single material is provided. This method includes adding chain transfer/activating...  
JP2010155934A
To provide a curable resin composition producing an insulating film for a circuit board having good electrical properties and excellent flame retardancy. The curable resin composition includes a cyclic olefin polymer and a curing agent. ...  
JP2010145959A
To provide a resin composition for an optical material having a high refractive index, low dispersion (high Abbe's number) and heat resistance. The resin composition for an optical material has a refractive index nD at 589 nm wavelength ...  
JP2010522254A
an exoopposite-sex object of the norbornene monomers which the present invention contains a norbornene monomer containing a photoactive functional group, and contain the photoactive functional group -- at least 50 -- more than mol % -- i...  
JP2010143838A
To provide a new liquid crystalline compound providing a liquid crystal film having excellent alignability, heat resistance and molding processability. The compound is represented by formula (1) [wherein, R1is hydrogen or methyl; L1and L...  
JP2010147495A
To provide a method of forming an air gap or gaps within solid structures and specifically semiconductor structures to reduce dielectric capacitive coupling between electrical elements such as metal lines. The method of forming an air ga...  
JP4488229B2  
JP4474544B2  
JP4475435B2  
JP4471942B2  
JP4469080B2  

Matches 551 - 600 out of 2,322