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JP4296408B2 |
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JP2009149726A |
To provide a film of a 2-norbornene addition polymer having high mechanical strength, excellent heat resistance and transparency, and a low water absorption rate.This 2-norbornene addition polymer film is the film of the 2-norbornene add...
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JP4294129B2 |
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JP4292910B2 |
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JPWO2007091551A1 |
In the present invention, a polymerizable composition containing a cyclic olefin monomer, a metathesis polymerization catalyst, a chain transfer agent and a cross-linking agent is heated to 50 ° C. or higher to carry out massive ring-op...
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JP2009134174A |
To provide a protective film forming material which has low environmental impact, substantially avoids damage to a photoresist pattern, and enables formation of a photoresist pattern having good rectangular geometry, and a photoresist pa...
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JP2009120794A |
To provide a film suitable for an optical use such as axial correction of polarizing plate for extending angles of visibility of liquid crystal display element etc.The film comprises a polymer (A) having an alicyclic structure and a spec...
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JP4269119B2 |
A resist composition contains as a base resin a polymer represented by the following formula and having a Mw of 1,000-500,000. R<1> is H, methyl or CO2R<2>, R<2> is alkyl, R<3> is H, methyl or CH2CO2R<2>, at least one of R<4> to R<7> is ...
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JP2009108332A |
To provide a catalyst composition and its preparation method and a use of the catalyst composition for preparing a polymer from an ethylenic unsaturated monomer.The catalyst composition contains a pair of cationic metal complexes contain...
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JP2009102654A |
To provide an optical waveguide structure equipped with an optical waveguide having wide degree of freedom of design of pattern configuration and capable of forming a core part (optical path) having high dimensional accuracy by a simple ...
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JPWO2007058239A1 |
To provide a norbornene compound addition polymer having excellent solubility in a general solvent and excellent dimensional stability while maintaining heat resistance and low water absorption, a molded product made of the same, and app...
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JP2009098672A |
To provide a positive photosensitive composition which is good in exposure latitude and pattern collapse and a pattern forming method using the same, with respect to a positive photosensitive composition for use in the production process...
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JP2009096970A |
To provide a preparation method of a cyclic olefin polymer, which is intended for preparing a polymer with a controlled molecular weight and a molecular weight distribution.In the preparation method of the cyclic olefin polymer, a cyclic...
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JP2009092711A |
To provide a material for forming a protection film used regardless of characteristics of a photoresist film formed in a liquid immersion exposure process, and to provide a method of forming a photoresist pattern using the material of fo...
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JP4257527B2 |
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JP4254058B2 |
A container comprised of a laminate having (I) a layer comprising a thermoplastic cycloolefin resin and (II) a layer comprising a resin other than the thermoplastic cycloolfin resin, characterized in that said thermoplastic cycloolefin r...
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JP4253996B2 |
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JPWO2007034962A1 |
The present invention is a composition having an asymmetric structure and a method for producing the same, which is obtained by mixing an achiral polymer having an aromatic ring in a side chain and an optically active dopant molecule. Di...
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JP4242833B2 |
The present invention relates to a catalyst system for preparing a cyclic olefin addition polymer, a method for preparing the catalyst system and a cyclic olefin addition polymer prepared by the method, and more particularly to the metho...
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JP4243981B2 |
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JP2009511731A |
A method for producing a cyclic olefin polymer by addition polymerization of a cyclic olefin monomer is provided, and a metal catalyst complex represented by the following chemical formula 1 and a cyclic olefin monomer represented by the...
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JPWO2007034653A1 |
To provide a norbornene compound addition polymer which is excellent in heat resistance and whose excellent transparency and mechanical properties are not deteriorated even when exposed to a high temperature during molding, processing an...
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JP2009057425A |
To provide a method for efficiently producing a cyclic olefin-based addition polymer excellent in physical and chemical heat resistances as well as in properties such as adhesion, tackiness, additive dispersiveness and solubility in a so...
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JP4240536B2 |
Classes of urea functional compounds and compositions containing the same are disclosed which are particularly suitable for use as a wet adhesion promoters in coatings, especially in aqueous emulsion systems used to make latex paints. Co...
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JP4242191B2 |
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JP4235810B2 |
A polymer comprising recurring units having a partial structure of formula (1) wherein R1 is a single bond or alkylene or fluoroalkylene, R2 and R3 are H or alkyl or fluoroalkyl, at least one of R2 and R3 contains at least one fluorine a...
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JPWO2007026527A1 |
To provide a cyclic olefin-added polymer capable of simultaneously satisfying high heat resistance and a high refractive index, a complex of the cyclic olefin-added polymer and an inorganic substance, and a molded product thereof. A cycl...
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JP4234636B2 |
Compounds of the formula wherein: M is selected from the group consisting of Os and Ru; R<9> and R<10> are independently selected from the group consisting of hydrogen, substituted or unsubstituted alkyl and substituted or unsubstituted ...
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JP2009502907A |
Regarding the method for producing a phosphonium compound co-catalyst, in detail, in [(R1) -P (R2) a (R2') b] HX, the protic phosphonium compound and [C] [Ani] Provided is a method for producing a co-catalyst composed of a salt compound ...
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JP4213838B2 |
The present invention is directed to photoresist cross-linkers selected from the group consisting of a cross-linker monomer represented by following Chemical Formula 1, and homopolymers and copolymers thereof. Such cross-linkers are suit...
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JP4208422B2 |
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JP4206656B2 |
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JP2009002999A |
To provide a new resist pattern forming method capable of reducing defects in immersion exposure, and a surface modifying material suitable for use in this method.The resist pattern forming method includes: a step of forming a resist fil...
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JP2009001585A |
To provide a ruthenium and osmium metal carbene complex that has high methathesis activity and high initiation speed.A polymerization method of cyclic olefin that includes a step wherein a cyclic olefin (except dicyclopentadiene) is cata...
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JP4203739B2 |
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JP4194762B2 |
In a process, a polymer is crosslinked and then reversibly bound to a template that is dissolved or suspended in a solvent. The polymer thereby acquires a conformation adapted to the template such that an interaction enthalpy between the...
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JP4186819B2 |
Manufacture of a fluorine-containing norbornene derivative having a fluorine-containing ketone structure comprises reacting a norbornene derivative and a fluoroalkylating agent. Manufacture of a fluorine-containing norbornene derivative ...
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JP4183815B2 |
The present invention relates to a semiconductor device using a copolymer-containing photoresist, and a process for manufacturing the same. As a norbornene derivative (monomer) having a hydrophilic group is synthesized and introduced to ...
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JP2008266523A |
To provide a method for efficiently producing a cyclic olefin addition polymer.The method for producing the cyclic olefin addition polymer comprises polymerizing the corresponding cyclic olefin monomer using a metallocene complex represe...
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JP2008255341A |
To provide a polymerization catalyst exhibiting a high polymerization activity for cyclic olefin addition polymerization and cyclic olefin/-olefin addition polymerization and a polymerization process.The manufacturing process of a cyclic...
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JP2008248171A |
To provide a method for producing a resin composition which exhibits improved transferability in the molding, is hardly colored even during the detention at a high temperature, and can be easily molded.The above favorable characteristics...
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JP2008247934A |
To provide an optical film that gives phase retardation exhibiting reverse dispersibility with respect to wavelengths in the visible light region and exhibits low photoelasticity.The optical film comprises a thermoplastic resin having a ...
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JP2008239960A |
To provide a production method of an olefinic polymer, realizing high activity and a high cyclic olefin incorporation ratio, as compared to a conventional polymerization catalyst for a cyclic olefin.The method produces an olefin polymer ...
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JP2008241871A |
To solve problems in techniques for improving performance in microprocessing of semiconductor elements using actinic rays or radiation, particularly, KrF excimer laser beams, electron beams, or EUV beams; to provide a positive resist com...
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JP2008231253A |
To provide a new method for producing a norbornene polymer having a 3C alkoxycarbonyl group and difficult to produce by conventional polymerization methods.The new method for producing a norbornene polymer comprises ester exchange of a n...
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JP4160374B2 |
Photosensitive polymers containing repeat units with a 2,2,4,4,4-pentafluoro-1,3,3-trihydroxybutyl group or a 3,3-difluoro-4-hydroxy-4-trifluoromethyloxetan-1-yl group. Photosensitive polymers (I) with an average mol. wt. of 3000-100000 ...
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JP4159601B2 |
The invention discloses methods of preparing copolymers from norbornene-type monomers and cationically polymerizable monomers or polymers from catalytically polymerizable monomers by employing Group VIII transition metal ion source in a ...
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JP2008222935A |
To provide a cyclic olefin polymer excellent in heat resistance and solubility in polar solvents and closely adhesive to inorganic substrates, and provide hydrogenated products of the same.The cyclic olefin polymer is prepared by polymer...
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JP2008222992A |
To provide a film-forming composition capable of giving a film which is low in relative dielectric constant, has high mechanical strength and is excellent in planarity, to provide an electrical insulation film produced by using the above...
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JP2008536956A |
A top-coat composition comprising a non-self imageable polymer consisting of norbornene-type repeating units, said polymer comprising a first norbornene-type repeating unit represented by Formula I: where X is -CH 2 -, -CH 2 CH 2 -, O or...
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