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Patent Searching and Data


Matches 601 - 650 out of 2,317

Document Document Title
JP2010083928A
To provide a method for preparing a norbornene polymer with high productivity, and a novel palladium complex suitably used as a catalyst in the method.The method for preparing the norbornene polymer uses at least one metal compound compo...  
JP2010084074A
To provide a polymerizable composition and a prepreg useful for manufacturing a layered product being excellent in mechanical strength and toughness and also excellent in anti-oxidation with sufficient production efficiency, and a layere...  
JP2010084073A
To provide an efficient method of manufacturing a norbornene based polymer excellent in anti-oxidation and a bending strength characteristic.The method of manufacturing the norbornene based molded article is characterized in that after a...  
JP4448782B2  
JP2010077323A
To provide a norbornene-based addition polymer applicable to a cooling flow casting film forming process.The norbornene-based addition polymer includes at least one of a repeating unit represented by general formula (1A), and at least on...  
JP2010511072A
It is manufactured from a norbornene system monomer and a straight-chain-shape olefin compound, excels in heat resistance and the optical characteristic, and indicates a polymer or a copolymer applicable also to heat-resistant optical co...  
JP2010077324A
To provide a norbornene-based addition polymer applicable to a cooling flow casting film forming process.The norbornene-based addition polymer includes at least one repeating unit represented by general formula (1B), (wherein R3 is hydro...  
JP2010065206A
To provide a novel norbornene-based polymer having a low dielectric constant, low-loss properties and excellent processability and useful as a low-loss insulating material, and to provide an insulating material, a printed circuit board a...  
JP2010509429A
[Subject] [Means for Solution] The present invention relates to a film manufactured by a method of removing remains catalyst metallic compounds in a polymer solution from a polymer solution manufactured using a catalyst containing 10 fel...  
JP4437232B2  
JP4438924B2  
JP2010059428A
To provide a method for manufacturing a polar functional group-containing high-molecular weight cyclic olefin polymer in a high yield.The method for manufacturing the polar functional group-containing cyclic olefin polymer includes a pro...  
JP2002542322A5  
JP2010053306A
To provide a cyclic olefin resin and a method for producing the same exhibiting excellent adhesiveness to metal while maintaining high transparency when molded into a film.In this cyclic olefin resin containing a structural unit having o...  
JP2010507831A
[Subject] The present invention is arbitrary, can adjust an angle which a direction of movement and an optic axis of a film accomplish using a film for 配 formed by a polymer containing norbornene, and relates to a polarizing plate cont...  
JP2010050480A
To provide a semiconductor device, with which a step or the like of applying an adhesive leading to a drawback in workability during production of an MCP in a stacked structure is improved, a semiconductor chip can be laminated without t...  
JP4422286B2  
JP4416941B2  
JP2010024399A
To provide an organic palladium complex-containing composition useful as a catalyst for polymerizing a norbornene-based compound.The organic palladium complex-containing composition contains (a) a compound represented by general formula ...  
JP2010024349A
To provide a norbornene-based resin film having excellent solvent resistance and thermal deformation resistance while maintaining its high transparency.The norbornene-based resin solution is produced by heating a solution of a norbornene...  
JP2010018785A
To provide a synthetic resin composition having excellent weather resistance, antistatic properties and excellent transparency.A fluorine-containing polymer contains a repeating unit shown by general formula (2) (wherein W represents a l...  
JP4400232B2  
JP2010007036A
To adjust an Rth (retardation in the thickness direction) value of an unstretched norbornene-based addition polymer film and to develop Re (retardation in the plane) and Rth with various values by using only uniaxial stretching, that is,...  
JP4388153B2  
JP4389158B2  
JP2009292982A
To provide a polymer for lithography balanced in LER and resistance to etching, the polymer allowing very fine and uniform patterning, and to provide a method for producing the same, a composition for lithography, and a method for produc...  
JP4386197B2
A noble alicyclic unsaturated compound represented by the general formula (1): wherein at least one of R1 and R2 is a fluorine atom or a fluorinated alkyl group; a polymer formed by the polymerization of a polymer precursor comprising th...  
JP4383810B2  
JP4379564B2  
JP2009275228A
To provide a method of forming an air gap or gaps within solid structures and specifically semiconductor structures to reduce capacitive coupling between electrical elements such as metal lines which can overcome one or more of the drawb...  
JP4371206B2  
JP4373335B2  
JP4369423B2  
JP4365172B2  
JP2009258586A
To provide a resist composition for negative type development superior in pattern collapse performance and trench pattern resolution in patterning with negative type development in order to stably form a highly precise fine pattern for m...  
JP4357747B2  
JP2009249610A
To provide a cycloolefin addition polymer which uses a cycloolefin-functional siloxane as a monomer and has both functions of polycycloolefin and siloxane, and to provide a production method of the cycloolefin addition polymer.The cycloo...  
JP2009249409A
To provide a novel polymer having excellent heat resistance and low hygroscopicity and containing alicyclic monomer units, which can be efficiently radical-polymerized without using any metal catalyst.The polymer contains at least one ki...  
JP4352776B2  
JP2009244904A
To provide a photoresist composition which can be used on the far-ultraviolet ray region and contains a copolymer for photoresist excellent in post-exposure heat treatment delay stability.The photoresist composition which contains a poly...  
JP2009242381A
To provide methods for efficiently producing a polycarbonate group-containing compound as a raw material monomer for a polycarbonate-based resin, and a (co)polymer of the compound, respectively.A method for producing a polycarbonate grou...  
JP2009242797A
To provide non-self developing type and developing type norbornene polymers applicable to a liquid-immersion lithography process, a manufacturing methods for the polymers, a composition using the polymer, and the liquid-immersion lithogr...  
JPWO2007142209A1
リソグラフィープロセスにおいて、被加工基 板をエッチングする条件で十分なエッチング 耐性を有するパターンを形成する。被加工基 板にレジストパターンを形成する工程と...  
JP2009235414A
To provide a polycyclic polymer and a polycyclic resist composition useful for a photoresist composition transparent to a short wavelength of image focusing irradiation, and having resistance in a dry etching method.The present invention...  
JP2009237376A
To provide a polarizing plate having a small change in transmissivity and a polarization degree by heat and humidity, and to provide a liquid crystal display device having high display quality without generating the problem such as light...  
JPWO2007141909A1
受光装置1の製造方法は、複数の透明基板部 13Aが一体化した透明基板13上に、透明 基板13を覆うように光硬化性樹脂を含有す る樹脂層14を設ける工程と、樹脂層1...  
JP4342721B2  
JP4344471B2  
JP2009227840A
To provide an optical molded article which is obtained by using a resin material containing a cyclic olefin addition polymer, whose part to be irradiated does not become clouded and is not deteriorated in transparency even when irradiate...  
JP2009221126A
To provide a method for efficiently producing an epoxy group-containing norbornene compound represented by formula (3) and its (co)polymer.Provided is the method for producing the epoxy group-containing norbornene compound represented by...  

Matches 601 - 650 out of 2,317