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Matches 651 - 700 out of 2,312

Document Document Title
JP4309532B2  
JP2009526781A
Bicyclo (2, 2, 1) hepta-*5* エン *2* methanol and ノルボルネニルメチルフルオロ alkyl ether which are produced by reaction with フルオロ (アルキ kana nil ether) and which is new monomers are indicated. These monomer...  
JP4299775B2  
JP4299670B2  
JP4296408B2  
JP2009149726A
To provide a film of a 2-norbornene addition polymer having high mechanical strength, excellent heat resistance and transparency, and a low water absorption rate.This 2-norbornene addition polymer film is the film of the 2-norbornene add...  
JP4294129B2  
JP4292910B2  
JPWO2007091551A1
本発明は、環状オレフィン系モノマー、メタ セシス重合触媒、連鎖移動剤及び架橋剤を含 有する重合性組成物を、50℃以上に加熱す ることにより塊状開環メタセシス重合し...  
JP2009134174A
To provide a protective film forming material which has low environmental impact, substantially avoids damage to a photoresist pattern, and enables formation of a photoresist pattern having good rectangular geometry, and a photoresist pa...  
JP2009120794A
To provide a film suitable for an optical use such as axial correction of polarizing plate for extending angles of visibility of liquid crystal display element etc.The film comprises a polymer (A) having an alicyclic structure and a spec...  
JP4269119B2  
JP2009108332A
To provide a catalyst composition and its preparation method and a use of the catalyst composition for preparing a polymer from an ethylenic unsaturated monomer.The catalyst composition contains a pair of cationic metal complexes contain...  
JP2009111356A
To provide materials, and methods that use such materials, that are useful for forming chip stack structure, chip and wafer bonding and wafer thinning.The surface of a substrate 10 is coated by a photosensitive polymer, having a weight-a...  
JP2009102654A
To provide an optical waveguide structure equipped with an optical waveguide having wide degree of freedom of design of pattern configuration and capable of forming a core part (optical path) having high dimensional accuracy by a simple ...  
JPWO2007058239A1
【課題】耐熱性及び低吸水性を維持したまま 、一般溶剤への溶解性に優れ、更に寸法安定 性にも優れるノルボルネン化合物付加重合体 、これからなる成形品、並びにこれらの...  
JP2009098672A
To provide a positive photosensitive composition which is good in exposure latitude and pattern collapse and a pattern forming method using the same, with respect to a positive photosensitive composition for use in the production process...  
JP2009096970A
To provide a preparation method of a cyclic olefin polymer, which is intended for preparing a polymer with a controlled molecular weight and a molecular weight distribution.In the preparation method of the cyclic olefin polymer, a cyclic...  
JP2009092711A
To provide a material for forming a protection film used regardless of characteristics of a photoresist film formed in a liquid immersion exposure process, and to provide a method of forming a photoresist pattern using the material of fo...  
JP4257527B2  
JP4254058B2  
JP4253996B2  
JPWO2007037085A1
射出成形体製造に供される下記化1または下 記化2で表される骨格を主鎖中に少なくとも 1種類含有する環状オレフィン系熱可塑性樹 であって、樹脂のガラス転移温度Tg(℃...  
JPWO2007034962A1
本発明は、側鎖に芳香環を有するアキラル高 分子と光学活性なドーパント分子とを混合す ることにより得られる、不斉構造を有する組 成物およびその製造方法。煩雑な不斉ア...  
JP4242833B2  
JP4243981B2  
JP2009511731A
It is a manufacturing method of a cyclic olefin system polymer including a stage of contacting a metal catalyst complex which provides a method of carrying out addition condensation of the cyclic olefin system monomer, and manufacturing ...  
JPWO2007034653A1
【課題】 耐熱性に優れ、成形、加工及び使用時に高温 に曝されてもその優れた透明性及び機械的特 性が低下することがないノルボルネン化合物 付加重合体、その製造方法、...  
JP2009057425A
To provide a method for efficiently producing a cyclic olefin-based addition polymer excellent in physical and chemical heat resistances as well as in properties such as adhesion, tackiness, additive dispersiveness and solubility in a so...  
JP2009511659A
It is a metal catalyst complex compound which carries out addition condensation of the cyclic olefin system monomer, and manufactures a cyclic olefin system polymer, and provides a metal catalyst complex compound denoted by the following...  
JP4240536B2  
JP4242191B2  
JP4235810B2  
JPWO2007026527A1
【課題】高耐熱性と高屈折率とを同時に満足 させ得る環状オレフィン付加重合体、この環 状オレフィン付加重合体と無機物との複合体 及びこれらの成形品を提供する。【解決...  
JP4234636B2  
JP2009029802A
To provide a chemically amplified type negative-type resist composition that is highly transparent to KrF excimer laser beams or ArF excimer laser beams, has a high resolution and affords a resist pattern having a rectangular cross-secti...  
JP2009029974A
To provide a monomer for a base resin of a resist material.A fluorine-containing monomer expressed by formula (1) is disclosed. In formula (1), R1 represents H or a 1-20C monovalent hydrocarbon group, and when R1 is a monovalent hydrocar...  
JP2009019199A
To provide a resist composition used when forming a pattern by using a high energy beam or an electron beam having a wavelength of 300 nm or less, and forming the pattern superior in a rectangular property without impairing transparency ...  
JP2009502907A
A phosphonium compound assistant catalyst manufacturing method is started, and it is in details, [(R1) *P (R2) a (R2') b] A method of manufacturing an assistant catalyst which consists of a salt compound which has phosphonium by the reac...  
JP2009013277A
To provide a resin for heat imprint with low resin modulus of elasticity at fluidization and sufficient fine pattern transferring property excellent in thermal deterioration resistance in order to suppress generation of a particulate sub...  
JP4213838B2  
JP2009007327A
To provide a compound showing a good burning property as a radiation sensitive acid generator responding to active radiations, especially KrF excimer laser, ArF excimer laser, far ultraviolet light represented by EUV, an electron beam or...  
JP4208422B2  
JP4206656B2  
JP2009002999A
To provide a new resist pattern forming method capable of reducing defects in immersion exposure, and a surface modifying material suitable for use in this method.The resist pattern forming method includes: a step of forming a resist fil...  
JP2009001585A
To provide a ruthenium and osmium metal carbene complex that has high methathesis activity and high initiation speed.A polymerization method of cyclic olefin that includes a step wherein a cyclic olefin (except dicyclopentadiene) is cata...  
JP4203739B2  
JPWO2006123679A1
本発明の成形材料は、繰り返し構造単位の一 部または全部に脂環式構造を含むポリマー、 フェノール系安定剤、ヒンダードアミン系光 安定剤およびリン系安定剤を含み、前記...  
JPWO2006123605A1
本発明は、高い基板密着性があり、現像時の 膨潤が低減し、かつ水中での露光時に取り込 む水の量が低く、ドライエッチング耐性が高 い一般式(1)又は(19)で表される...  
JP4194762B2  

Matches 651 - 700 out of 2,312