| Document |
Document Title |
|
JP3871721B2 |
PURPOSE: To provide a cycloolfin copolymer which is excellent in clarity, resistance to heat distortion, and hardness and is chemically inert and resistant to hydrolysis. CONSTITUTION: This cycloolefin copolymer has a solution viscosity ...
|
|
JP2007002082A |
To provide a method for producing a cyclic olefinic addition polymer with which a cyclic olefinic compound is subjected to addition (co)polymerization in the presence of a specific catalyst and a compound having a cyclopentene ring.The m...
|
|
JP3865048B2 |
To provide a resist material, particularly a chemical amplification positive type resist material having higher sensitivity, resolution, exposure margin and process adaptability than a conventional resist material, ensuring a good patter...
|
|
JP2006342265A |
To provide a resist composition having high dissolution rate with a developing fluid and excellent dry etching resistance and provide a fluorine-containing tricyclononene polymer to be used in the resist composition.The fluorine-containi...
|
|
JP3860198B2 |
To provide a new ring-closing polymerization monomer, and to provide a polymer or copolymer derived from the monomer. This ring-closing polymerization monomer represented by general formula (I) [X and Y are each independently selected fr...
|
|
JP3860197B2 |
To obtain a new ring-closing polymerization monomer, and polymers and copolymers derived therefrom. This monomer is represented by Formula (I): wherein X and Y independently are selected from the group consisting of CN, P(O)(OR7)2 and SO...
|
|
JP3859391B2 |
To obtain a photosensitive polymer having high etching resistance and further excellent in adhesive strength to a lower film material, a dissolution suppressant and a chemical amplification type photoresist composition containing the pho...
|
|
JP3859577B2 |
To provide a cyclic diene polymer manufactured from a cyclic conjugated diene monomer which is easy to manufacture and high in polymerization activity, and good in solubility in a solvent and hiving high heat resistance and high mechanic...
|
|
JP2006328034A |
To provide a new transition metal complex relatively stable and easy to handle, and usable in a highly active catalyst for cyclic olefin polymerization, to provide a cyclic olefin polymerization catalyst containing the above transition m...
|
|
JP2006321906A |
To provide a resin composition having high resolution optical properties and keeping the properties for a long time, to provide a molding molded by using the resin composition, to provide a plastic optical element, and to provide an opti...
|
|
JP2006321912A |
To provide a method for producing a cycloolefin-based addition polymer, capable of producing at a high yield the cycloolefin-based addition polymer having little remaining catalyst amount in the polymer and weight-average molecular weigh...
|
|
JP3847315B2 |
To provide a dissolution suppressant having high dry etching resistance and excellent adherence to an film material. The dissolution suppressant is a tricyclodecane derivative or a sarsasapogenin derivative, each having a group which cau...
|
|
JP2006312665A |
To provide a catalyst system exhibiting a good catalyst activity in polymerization reactions of polar group-containing norbornenes within a wide range.An organometallic compound is obtained by mixing the following (a), (b) and (c). (a) a...
|
|
JP2006305816A |
To provide a manufacturing method of a norbornene-based polymer film excellent in production efficiency, and the norbornene-based polymer film excellent in optical characteristics.In the manufacturing method of the norbornene-based polym...
|
|
JP2006299199A |
To provide a resin composition for a film that can form a film having few defects after molding and is capable of forming an optical film excellent in such properties as heat resistance, low specific gravity, low birefringence, low photo...
|
|
JP3839218B2 |
To provide a new polymeric silicon compound having high sensitivity and high resolution, which is not only used preferably as a material for two- layered resist method particularly suitable for forming a pattern of high aspect ratio, but...
|
|
JP2006291177A |
To provide norbornene-type polymers useful for immersion lithographic processes for producing microelectronic devices, to provide a method for producing the polymers and to provide a composition composed of the polymers.A non-self imagea...
|
|
JP3838329B2 |
To provide a polymer which has excellent oxygen plasma etching resistance and is especially useful as an excellent material for two layer resists. This polymer characterized by containing silicon-containing groups represented by the gene...
|
|
JP3835523B2 |
To obtain a new polymer compound useful as a base polymer for chemically amplified resist material with excellent transmittance to vacuum UV rays, to obtain a chemically amplified resist material comprising the polymer compound, and to p...
|
|
JP2006274165A |
To provide a cycloolefin-based polymer capable of being melt-kneaded at a low torque when melt-kneaded in an extruder, and having excellent moldability.The cycloolefin-based polymer is free from a gel component, and has the maximum value...
|
|
JP2006274166A |
To provide a cycloolefin-based polymer capable of being melt-kneaded at a low torque when melt-kneaded in an extruder, and having excellent moldability.The cycloolefin-based polymer has ≥0.52 proportional constant A obtained by the rel...
|
|
JP3833325B2 |
To produce a metathesis polymerization catalyst solution which has a good shelf stability, generates less smoke during molding, and has a reduced unpleasant odor by using a solvent comprising a cyclic olefin capable of undergo ing metath...
|
|
JP3832564B2 |
To provide a polymer compound which, as a resist material, is excellent in sensitivity to high-energy rays, especially, to one having a wavelength of 170 nm or lower, has an improved plasma etching resistance because of fluorine-containi...
|
|
JP3832398B2 |
To provide a film or sheet which is prepared from a composition having excellent optical properties and heat resistance and containing a cycloolefin addition polymer prepared by using a norbornene monomer as the main material, is prepare...
|
|
JP3827715B2 |
PCT No. PCT/EP94/03649 Sec. 371 Date May 22, 1996 Sec. 102(e) Date May 22, 1996 PCT Filed Nov. 8, 1994 PCT Pub. No. WO95/14652 PCT Pub. Date Jun. 1, 1995Novel triphenylene compounds which contain, bonded to the triphenylene framework, at...
|
|
JP3827290B2 |
To provide a positive photosensitive composition which improves the profile of lines and suppresses the falling of a pattern. The positive photosensitive composition comprises (A) a specified acid generator which generates an acid upon i...
|
|
JP2005534777T5 |
|
|
JP3820471B2 |
Composition of (a) dicyclopentadiene, by itself or in a mixture with a strained cycloolefin, and (b) a catalytic amount of at least one carbene-free, divalent-cationic ruthenium or osmium compound as a single-component catalyst, which co...
|
|
JP2006518476A |
The present invention relates to a photoresist composition comprising a photoacid generator and at least one polymer comprising at least one unit as described by structure 1, The invention also relates to a process for imaging the photor...
|
|
JP2006201736A |
To provide a polarizing plate which exhibits excellent adhesiveness between an optical film and a polarizing film, is excellent in heat resistance and chemical resistance, is hardly peeled off and deformed, even if it is used for a long ...
|
|
JP3805564B2 |
To obtain a polymer which can give a photoresist excellent in the ability to impart a high resolution, dry etching resistance, transparency, adhesion, etc., by using a (meth)acrylic ester having a specified structure and a norbornene der...
|
|
JP2006193666A |
To provide an adhesive film for semiconductors having low water-absorption, an adhesive film for semiconductors having excellent soldering heat-resistance after the moisture-absorption treatment and a semiconductor device having excellen...
|
|
JP2006188561A |
To provide a method for producing a polymer of an MTF from which the polymer having stable physical properties in a high conversion ratio of polymerization.The method is produced a polymer by polymerizing a 1, 4-methano-1, 4, 4a, 9a-tetr...
|
|
JP2006188559A |
To provide a method for producing a polymer of an MTF from which the polymer having stable physical properties in a high conversion ratio of polymerization is prepared.The method is produced a polymer by polymerizing a 1,4-methano-1,4,4a...
|
|
JP3794883B2 |
To provide a new photoresist compound having etching-resisting and adhesive properties suitable for lithography using far-ultraviolet light source. A compound of formula I [X is CH2, CH2CH2 or O; R1 is H or R'OH; R2 is H, OH, a 1-5C alko...
|
|
JP2006163066A |
To provide a negative resist composition suitable for exposure with light having a wavelength shorter than 200 nm and forming a high resolution resist pattern, and also to provide a resist pattern forming method.The negative resist compo...
|
|
JP3773545B2 |
PURPOSE: To obtain a copolymer useful for moldings, etc., in a high space-time yield by polymerizing a polycyclic olefin, a cycloolefin, a noncyclic olefin, which are specified respectively and mixed in a specified ratio, in the presence...
|
|
JP3773546B2 |
PURPOSE: To efficiently obtain the subject copolymer excellent in low temperature characteristics such as low temperature impact resistance and suitable as a molding material for automotive external parts, etc., by copolymerizing ethylen...
|
|
JP3772249B2 |
To provide a new ester compound composed of a specific ester compound and useful as a raw material for a polymer compound having excellent decomposability with an acid. The objective compound is expressed by formula I (R1 is H, methyl or...
|
|
JP2006102753A |
To provide a thermosetting flux, which can surely carry out a solder joining operation, and does not need to remove the remaining flux by washing after the solder joining operation, and can keep the electric insulation resistance even in...
|
|
JP3767679B2 |
To provide a resist material reactive with high-energy beams, and excellent in sensitivity, resolution and plasma etching resistance at wavelengths of 200 nm or less and, particularly, at wavelengths of 170 nm or less. The material is a ...
|
|
JP3767906B2 |
Disclosed herein is a process for the polymerization of ethylene, norbornenes and styrenes, by contacting in solution a selected nickel compound and a selected compound which is coordinated or can coordinate to the nickel with the olefin...
|
|
JP2006511628A |
Provided are polymers derived from bridged heterocyclic compounds, fluorinated norbornene compounds, fluorinated alkenes, heterocyclic compounds, and combinations of two or more thereof for use in a wide variety of applications, includin...
|
|
JP3763842B2 |
An olefin metathesis catalyst system and process for the metathesis polymerization of cyclic olefins, such as dicyclopentadiene, are disclosed. The catalyst system comprises the reaction product of: (a) an imido transition metal halide c...
|
|
JP2006085081A |
To provide a resist composition giving excellent solubility to a resist coating on exposure to light particularly at 193 nm wavelength, and to provide a method for forming a fine pattern with excellent contrast by using the resist compos...
|
|
JP3758973B2 |
To obtain a photosensitive polymer having main chain composed completely solely of a norbornene-type alicyclic unit, and a resist composition containing the same. The photosensitive polymer is represented by formula I (wherein R1 is an a...
|
|
JP2006052326A |
To provide an alicyclic structure polymer which holds the good optical characteristics, such as transparency, heat resistance, chemical resistance, electric characteristics, low water absorption, and the like of ordinary alicyclic struct...
|
|
JP3745620B2 |
The invention refers to a linear, isotactic polymer which has a structure of one or several C2 to C20 olefins, of which the isotacticity, due to a statistic distribution of stereoscopic errors in the polymer chain, is within the range of...
|
|
JP2006028489A |
To provide a catalyst composition and a method concerning the preparation thereof and to provide a method for preparing a polymer, which comprises polymerizing an ethylenic unsaturated monomer including a non-polar olefin monomer, a pola...
|
|
JP3739401B2 |
Polycyclic addition polymers derived from norbornene-type monomers are mixed with a variety of other polymers to generate families of new blends, alloys, and block copolymers.
|
