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WO/2017/011115A1 |
The present invention provides a slurry composition and method for polishing organic polymer-based ophthalmic substrates. The slurry composition according to the invention includes an aqueous dispersion of abrasive particles and one of a...
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WO/2016/208301A1 |
Provided is a polishing composition in which the abrasive grains are less likely to precipitate and the abrasive grains that have precipitated and agglomerated redisperse easily. The polishing composition contains abrasive grains, a liqu...
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WO/2016/207808A1 |
The present invention relates to a consumer goods product comprising a consumer goods product ingredient and a non-cross linked functionalised lignin oligomer, wherein the lignin oligomer: (a) has a number average molecular weight (Mn) i...
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WO/2016/207811A1 |
The present invention relates to a consumer goods product comprising a consumer goods product ingredient and a non-crosslinked functionalised lignin oligomer, wherein the functionalised lignin oligomer: (a) has an average number of ligni...
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WO/2016/207809A1 |
The present invention relates to a consumer goods product comprising a consumer goods product ingredient and a functionalised lignin oligomer, wherein the functionalised lignin oligomer: (a) comprises less than 1wt% sulphur content; (b) ...
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WO/2016/207810A1 |
The present invention relates to a consumer goods product comprising a consumer goods product ingredient and a functionalised lignin oligomer, wherein the functionalised lignin oligomer: (a) has an average number of lignin monomers of fr...
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WO/2016/207812A1 |
A consumer goods product comprising a consumer goods product ingredient and a cross-linked co-polymer of a lignin oligomer and a vinyl monomer, wherein the lignin oligomer has: (a) comprises less than 1wt% sulphur content; (b) has a numb...
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WO/2016/207807A1 |
The present invention relates to a consumer goods product comprising a consumer goods product ingredient and a lignin oligomer, wherein the lignin oligomer: (a) comprises less than 1wt% sulphur content; (b) has a number average molecular...
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WO/2016/201191A1 |
Floor coating compositions and methods of forming a floor coating composition are provided. The floor coating composition includes an acrylic wax, water, and an indicator that includes a color at a first pH and that is colorless at a sec...
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WO/2016/200941A1 |
The present invention refers to a polishing composition designed for conditioning surfaces, such as gears, seals, rings, and others. The composition is an oil in water emulsion, wherein the improvement was achieved when using a synergist...
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WO/2016/194614A1 |
This invention enables a high polishing speed in the polishing of ceramics that are used in electronic devices and include an oxide crystal, or the like, by suppressing the occurrence of defects such as scratches. A polishing composition...
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WO/2016/191248A1 |
A polishing composition with improved stability at low temperatures comprising from 10 to 50% by weight of water, from 10 to 60 % by weight of hydrocarbons, from 0.5 to 5% by weight of one or more organic acids and including its salts wh...
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WO/2016/186214A1 |
The present invention provides a method for manufacturing a glass substrate, in which polishing speed can be improved in a polishing process of using cerium oxide as polishing abrasive grains to polish the surface of a glass substrate. T...
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WO/2016/181600A1 |
The present invention is a polishing agent for synthetic quartz glass substrates which comprises abrasive grains, a polishing accelerator, and water, characterized in that the abrasive grains are wet-process ceria particles and that the ...
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WO/2016/150176A1 |
Provided is a cobalt-containing doped silicon dioxide nano-composite abrasive grain sol, a preparation method thereof comprising: mixing, by weight percentage, 0.43 wt% of cobalt nitrate solution and 2.5 wt% of silicic acid solution acco...
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WO/2016/143323A1 |
Provided are a composition for grinding, which can achieve both excellent surface quality and high grinding speed, and a method for grinding a silicon substrate. The composition for grinding contains abrasive grains, a basic compound, an...
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WO/2016/143797A1 |
This polishing agent for resin polishing contains: abrasive particles; a water-soluble polymer that has an ether bond; an organic solvent; and water. Therein, the abrasive particles have a positive charge within the polishing agent, and ...
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WO/2016/141259A1 |
The invention provides chemical-mechanical polishing compositions and methods of chemically-mechanically polishing a substrate, especially a substrate comprising a silicon oxide layer, with the chemical-mechanical polishing compositions....
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WO/2016/141260A1 |
The invention provides a chemical-mechanical polishing composition including wet-process ceria particles having a median particle size of about 25 nm to about 150 nm and a particle size distribution of about 300 nm or more, and an aqueou...
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WO/2016/140246A1 |
A CMP polishing liquid for polishing a ruthenium-based metal, wherein: the CMP polishing liquid contains abrasive grains, a metal oxidant, and water; the metal oxidant has an oxidation-reduction potential accompanied by exchange of hydro...
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WO/2016/136342A1 |
[Problem] To provide a polishing composition with which it is possible, in at least one of the acidic, neutral, and basic ranges, to sufficiently control the polishing rate for an object to be polished having a silicon-silicon bond. [Sol...
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WO/2016/136177A1 |
A composition for polishing, which is used for polishing of the surface of an object to be polished, said surface containing an oxide of a metal or a semimetal or a composite material of these oxides, and which contains at least water an...
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WO/2016/136314A1 |
A cerium-free polishing material is provided which has an excellent polishing speed, and which can cut production costs and has improved production efficiency; also provided is a production method for conveniently obtaining said polishin...
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WO/2016/136162A1 |
Provided is a polishing composition that, even when used for polishing an object to be polished containing a transition metal having a standard electrode potential between -0.45V and 0.33V inclusive, is less likely to etch or corrode the...
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WO/2016/136447A1 |
A polishing method is provided which yields a negatively charged substrate with excellent surface smoothness with good productivity while achieving high polishing speeds. Also provided is a method for achieving a negatively charged subst...
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WO/2016/132952A1 |
[Problem] To provide a polishing composition with which it is possible, in at least one of the acidic, neutral, and basic ranges, to sufficiently suppress the polishing rate for an object to be polished having a silicon-nitrogen bond, su...
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WO/2016/132951A1 |
[Problem] To provide a polishing composition with which it is possible, in at least one of the acidic, neutral, and basic ranges, to sufficiently control the polishing rate for an object to be polished having a silicon-oxygen bond, such ...
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WO/2016/129508A1 |
Provided is a polishing composition with which simple silicon substances can be polished at higher speeds.　The present invention is a polishing composition to be used for polishing objects to be polished that comprise a simple silicon ...
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WO/2016/129164A1 |
Provided is a glass article which has excellent surface smoothness. The glass article 1 comprises a polished main surface, the arithmetic average roughness (Ra) of the polished main surface being 0.2 nm or less.
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WO/2016/115096A1 |
Chemical Mechanical Planarization(CMP) polishing compositions comprising composite particles, such as ceria coated silica particles, offer low dishing, low defects, and high removal rate for polishing oxide films. Chemical Mechanical Pla...
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WO/2016/107406A1 |
The present invention relates to a chemically mechanical polishing liquid and an application thereof. The polishing liquid comprises grinding particles, an amino silane reagent, and water. The present invention is applicable to polishing...
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WO/2016/109786A1 |
The present disclosure relates to abrasive aggregates comprised of abrasive particles in a vitreous binder composition, and methods of making and using such abrasive aggregates, including in abrasive articles. The abrasive aggregates can...
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WO/2016/106766A1 |
Disclosed is a method. A silicon-containing organic compound is adopted. A significant synergistic effect exists between the silicon-containing compound and other complexing agents, so as to greatly increase the polishing rate of silicon...
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WO/2016/107414A1 |
The present invention aims to provide an application of a composition in polishing of a barrier layer. The composition is added into a chemical mechanical polishing (CMP) liquid, the CMP liquid comprises silica sol, and the composition i...
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WO/2016/106765A1 |
A method for preparing cerium oxide crystals, comprising: adding an alkaline precipitant to a cerium source aqueous solution to which an organic additive has been added, so as to obtain cerium hydroxide by precipitating; adding carbon di...
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WO/2016/107409A1 |
The polishing liquid of the present invention provides for polishing of silicon dioxide at very high speed. By means of the synergistic effect of a silicon-containing organic compound and an amphoteric surfactant, high grinding speeds ar...
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WO/2016/109780A1 |
Embodiments of the present disclosure are directed to methods of making high grade colored abrasive articles that are color stable at high temperatures, such as color stable at temperatures of at least about 185 degrees Celsius such that...
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WO/2016/107413A1 |
The present invention aims to providing a solution for poor stability of a polishing liquid prepared by amino silane modified grinding particles. The stability of the pH, nanometer particle size, and polishing speed of such a system in a...
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WO/2016/103576A1 |
Provided is a polishing composition that is inexpensive and can be used to impart a high-quality mirror finish to ceramic. The polishing composition contains abrasive grains made of carbide, and is used for polishing ceramic.
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WO/2016/102531A1 |
Use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) comprising (i) cobalt and/or (ii) a cobalt alloy, wherein the CMP composition (Q) comprises (A) Inorganic particles, (B) a ...
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WO/2016/101332A1 |
The present invention presents a chemical mechanical polishing (CMP) slurry, and the CMP slurry uses ceria as an abrasive and contains an organic polybasic acid and polymers. The CMP slurry disclosed in the present invention still has a ...
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WO/2016/105474A1 |
A method of forming a shaped abrasive particle including forming a mixture comprising a ceramic material into a sheet and sectioning at least a portion of the sheet using a mechanical object and forming at least one shaped abrasive parti...
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WO/2016/102204A1 |
Use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) comprising (i) cobalt and/or (ii) a cobalt alloy, wherein the CMP composition (Q) comprises (A) Inorganic particles (B) a t...
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WO/2016/102279A1 |
Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or co-balt alloy comprising substrates Abstract Use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a su...
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WO/2016/097915A1 |
A chemical mechanical polishing (CMP) composition (Q) comprising: (A) inorganic particles, (B) a compound of general formula (I) (C) an aqueous medium wherein the composition (Q) has a pH of from 2 to 6.
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WO/2016/089660A1 |
Provided herein are abrasive compositions that use surfactants containing block copolymers of both propylene oxide and ethylene oxide moieties. Abrasive compositions derived from these copolymers were capable of providing both superior l...
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WO/2016/081433A1 |
The present disclosure provides a composition for treating leather and similar materials. The composition comprises from about 40% (w/w) to about 60% (w/w) of an oil obtained from natural sources; from about 1% (w/w) to about 15% (w/w) o...
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WO/2016/075880A1 |
Provided is a polishing composition capable of polishing a subject to be polished which has a crystalline metal compound in the surface thereof, with higher polishing efficiency. The polishing composition, used for the purpose of polishi...
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WO/2016/072864A1 |
The invention relates to an abrasive composition for abrading the surface of materials such as metals and plastics to provide a polished finish. In particular the abrasive composition includes aluminium dross (a by-product of aluminium s...
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WO/2016/072370A1 |
Provided is a method for polishing a material that has a Vickers hardness of 1,500 Hv or more. This polishing method comprises: a step for performing preliminary polishing with use of a composition for preliminary polishing, which contai...
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