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Patent Searching and Data


Matches 951 - 1,000 out of 7,165

Document Document Title
WO/2007/020606A1
The present invention relates to a solid laundry detergent composition in particulate form, comprising: (a) anionic detersive surfactant; (b) a solid carrier material having: (i) a total pore volume of greater than 0.3ml/g; (ii) an avera...  
WO/2007/020608A1
The present invention relates to a process for preparing a solid laundry detergent composition comprising: (a) anionic detersive surfactant; (b) from 0% to less than 5%, by weight of the composition, of zeolite builder; (c) from 0% to le...  
WO/2007/020609A1
The present invention relates to a solid laundry detergent composition in particulate form, comprising: (a) anionic detersive surfactant; (b) a calcium-augmented technology; (c) from 0% to less than 5%, by weight of the composition, of z...  
WO/2007/019249A1
A composition and method for the removal of biological fouling from wetted surfaces intermittently or continuously in contact with water is disclosed. The method includes the steps of preparing a cleaning composition of basic pH from a s...  
WO/2007/017801A3
The present invention relates to a process for preparing a textile treatment auxiliary composition in particulate form, wherein the composition comprises anionic surfactant, clay and silicone, and wherein the process comprises the steps ...  
WO/2007/016968A1
A micellar solution is used to seal pores exposed at the bottom and sidewall surfaces of a structure etched in or through a porous low dielectric constant material. The micellar solution is also effective to clean away etch residues from...  
WO/2007/017801A2
The present invention relates to a process for preparing a textile treatment auxiliary composition in particulate form, wherein the composition comprises anionic surfactant, clay and silicone, and wherein the process comprises the steps ...  
WO/2007/014897A1
The invention relates to the use of surface-active non-enzymatic proteins for washing textiles, detergents for washing textiles comprising surface-active, non-enzymatic proteins and method for washing using said proteins.  
WO/2007/012451A1
The invention relates to a method for the production of bleaching catalyst granules, containing a bleaching catalyst, an acidic polymer, a support material and optionally further adjuncts, characterised in that a fluid bed is formed from...  
WO/2007/014152A1
A cleaner composition comprises a surfactant, a sodium source, an odor neutralizer, a fragrance, and a biocide, wherein the odor neutralizer comprises a betaine compound, aminoalcohol, a polyol, and an ionone, and wherein the cleaner com...  
WO/2007/009621A1
This invention relates to the incorporation of single and double emulsions into a cross-linking polysaccharide matrix selected from alginate and carrageenan, particularly when cured in a saline solution. Beading and extrusion were used a...  
WO/2007/006357A1
The present invention provides a granule comprising one or more shading dyes solubilized in a solvent. The granule, for use in laundry compositions, has reduced spotting properties.  
WO/2007/008389A3
The invention describes uses of various acid-base indicators in combination with consumer products, such as herbicides, where upon application the surface treated is visualized by color and then, with time, the color disappears.  
WO/2007/008389A2
The invention describes uses of various acid-base indicators in combination with consumer products, such as herbicides, where upon application the surface treated is visualized by color and then, with time, the color disappears.  
WO/2007/007699A1
[PROBLEMS] To provide a detergent granule having a reduced paste-forming property and a low thermogenic property, a process for producing the detergent granule, and a high bulk density detergent composition comprising the detergent granu...  
WO/2007/003584A3
The invention relates to compositions which comprise at least one carrier material and at least one silicic acid and/or at least one silicate, and to the use of said compositions for removing foreign substances, especially silicone compo...  
WO/2007/003584A2
The invention relates to compositions which comprise at least one carrier material and at least one silicic acid and/or at least one silicate, and to the use of said compositions for removing foreign substances, especially silicone compo...  
WO/2007/005207A1
The use of an effervescent product to clean soiled dishes and methods of cleaning soiled dishes by hand washing.  
WO/2006/133868A1
Detergents for hard surfaces which comprise oligoesters obtained by condensation of one or more dicarboxylic acids or esters thereof and one or more polyhydric alcohols are claimed.  
WO2006066278A3
A process of extracting liquid from a fabric having a first content of liquid includes the steps of creating a surfactant surface layer including at least one surfactant at an air-liquid interface of the liquid on the fabric, wherein the...  
WO/2006/133146A3
Compositions, methods, apparatuses, kits, and combinations are described for neutralizing a stain on a surface. The compositions useful in the present disclosure include a composition that is formulated to be applied and affixed to a sur...  
WO/2006/131197A1
The dirt removal effect of detergents may be improved by application of a polymer which boosts dirt removal, obtained by the polymerisation of the monomers styrol, methacrylic acid, hydroxyethyl methacrylate and methyl methacrylate.  
WO/2006/132989A3
The present invention is a method of use of a novel cleaning solution in a single wafer cleaning process. According to the present invention the method involves using a cleaning solution in a single wafer mode and the cleaning solution c...  
WO/2006/133146A2
Compositions, methods, apparatuses, kits, and combinations are described for neutralizing a stain on a surface. The compositions useful in the present disclosure include a composition that is formulated to be applied and affixed to a sur...  
WO/2006/132989A2
The present invention is a method of use of a novel cleaning solution in a single wafer cleaning process. According to the present invention the method involves using a cleaning solution in a single wafer mode and the cleaning solution c...  
WO2006107517A3
A front end of the line (FEOL) stripping and cleaning composition for cleaning unashed ion-implanted photoresist from a wafer substrate comprises: a) at least one organic stripping solvent, b) fluoride ions from at least one of ammonium ...  
WO/2006/130683A1
Premoistened wipes for household use. The wipes are disposable. The wipes may be used to treat household surfaces including fabric-based surfaces. The wipes may include microencapsulated materials such as perfume and/or other benefit age...  
WO/2006/128538A3
The invention relates to a method for distributing active substances in a liquid supporting medium at an active substance concentration of from 0.0001 to 2.0 % by weight, based on the weight of the liquid supporting medium. The inventive...  
WO/2006/128554A1
A process for incorporation of up to 2% antioxidant into a granular detergent formulation comprising at least 5% organic surfactant, including the steps of: a) dissolving the antioxidant in an organic surfactant selected from the group c...  
WO/2006/130220A1
A method for the on-line cleaning of a heat exchanger used with petroleum process fluids which create coke deposits of asphaltenic origin on the exchanger tubes. The asphaltenes are removed by re-dissolution in a solvent oil of high solu...  
WO/2006/128538A2
The invention relates to a method for distributing active substances in a liquid supporting medium at an active substance concentration of from 0.0001 to 2.0 % by weight, based on the weight of the liquid supporting medium. The inventive...  
WO/2006/128498A1
Composition for cleaning surfaces which are susceptible to corrosion in alkaline liquids, comprising at least one alkalinity source, at least one inorganic salt conĀ­taining at least one cation selected from the elements of the second or...  
WO/2006/125462A1
A cleaning solution for a semiconductor wafer comprises ammonia, hydrogen peroxide, a complexing agent and a block copolymer surfactant diluted in water. The cleaning solution can be used in single wafer cleaning tools to remove both par...  
WO/2006/125461A1
A treatment solution for a semiconductor wafer (126) comprising water, a passivating reagent and a surfactant. The treatment solution is either mixed with a cleaning fluid, a rinsing fluid or a drying vapour, and is used in a cleaning ap...  
WO/2006/124261A1
The invention includes methods in which one or more components of a carboxylic acid having an aqueous acidic dissociation constant of at least 1 x 10-6 are utilized during the etch of oxide (such as silicon dioxide or doped silicon dioxi...  
WO/2006/120011A1
A process is disclosed for preparing fast-dissolving bentonite granulates, as well as a bentonite granulate prepared by this process. To prepare the bentonite granulate, an overactivated bentonite overactivated with at least 110 % of its...  
WO/2006/117542A1
Improved cleaning compositions useful in the cleaning of hard surfaces, particularly in the cleaning of glass and hard surfaces, particularly hard surfaces having a shiny or reflective character. Preferred compositions comprise amine oxi...  
WO/2006/119162A1
A method of washing ware in an automatic institutional warewashing machine, using a cleaning composition containing a surfactant which eliminates the need for a surfactant in the rinse step. A surfactant is employed in the wash step in a...  
WO/2006/115658A1
Cleaning formulations, methods, and systems are effective, mild, and non-hazardous. Embodiments of the cleaning formulation comprise a fatty acid, a saponifier, a water conditioner, a solvent, a nonionic surfactant, and an anionic surfac...  
WO2006048142A3
Disclosed are low-dust or dust-free granulates/agglomerates for detergents or cleaning agents as well as coated aggregates having a core-shell structure for the detergent or cleaning agent sector and a method for forming such aggregates....  
WO/2006/112994A1
Photoresist strippers and cleaning compositions of this invention are provided by non-aqueous, non-corrosive cleaning compositions that resist galvanic corrosion when used on stacked layer structures of different types of metals at a sur...  
WO/2006/111223A1
The invention relates to a method for producing liquid preparations having a solid body content, which improves the product with respect to aesthetic qualities and product user values when using existing production systems. Said method e...  
WO/2006/109076A1
A process for treating a soil on a laundry item before it is washed, which comprises contacting the soil with a laundry cleaning product having an enclosing wall and containing a composition in the form of a powder, said composition comp...  
WO2005057281A3
An aqueous-based composition and process for removing photoresist, bottom anti-reflective coating (BARC) material, and/or gap fill material from a substrate having such material(s) thereon. The aqueous-based composition includes a fluori...  
WO/2006/109089A1
A process for treating a laundry item, which comprises contacting the laundry item with a cleaning composition in the form of a solid comprising an insoluble active agent that is capable of binding soil and free dyes, such that soil on t...  
WO/2006/108475A1
The present invention provides a method for removing soil or stains from a hard surface, the method comprising the steps in sequence of treating the surface with a malonic acid derivative, allowing the soil or stain to deposit and cleani...  
WO/2006/108883A1
The present invention relates to a method for preparing a highly soluble linear alkyl benzene sulphonate (LAS). Specifically, the method includes adding a hydrotropic composition before or after the sulphonation of the linear alkyl benze...  
WO/2006/107475A1
A cleaning solution is provided for cleaning metal-containing microelectronic substrates, particularly for post etch, via formation and post CMP cleaning. The cleaning solution consists of a quaternary ammonium hydroxide, an organic amin...  
WO/2006/107517A2
A front end of the line (FEOL) stripping and cleaning composition for cleaning unashed ion-implanted photoresist from a wafer substrate comprises: a) at least one organic stripping solvent, b) fluoride ions from at least one of ammonium ...  
WO2006028539A3
A method for formulating a cleaning composition, wherein the cleaning composition comprises a water-soluble organic solvent, an ionic surfactant, a nonionic surfactant, a chelating agent, and distilled water.  

Matches 951 - 1,000 out of 7,165