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Matches 951 - 1,000 out of 7,100

Document Document Title
WO/2006/088737A3
A method of cleaning a substrate includes contacting a surface of a semiconductor substrate with a composition comprising an ionic liquid. Another method of cleaning a substrate includes contacting a surface of a semiconductor substrate ...  
WO/2006/087108A1
The invention provides a granular detergent composition which comprises (i) from 20 to 50 wt %, preferably from 30 to 40 wt %, of an alkyl ether sulphate, (ii) from 40 to 75 wt %, preferably from 50 to 65 wt %, of a solid carrier, (iii) ...  
WO/2006/088561A3
A method and system (100, 200) is described for treating a substrate (105, 205) with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the su...  
WO2005091771A3
Water-soluble solvent compositions, including from about 10% to about 60% by weight of an aromatic ester; from about 30% to about 60% by weight of an aliphatic ester; from 0% to about 15% by weight of a co-solvent; from 0% to about 20% o...  
WO/2006/088560A1
A method and system (100, 200) is described for treating a substrate (105, 205) with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry is introduced to the high pressure fluid for treating the su...  
WO/2006/087234A1
The present invention concerns a fully hardened or partially hardened triglyceride vegetable oil composition and derivatives thereof comprising inter alia fatty acids, mono-glycerides, di-glycerides and so forth. These compositions may c...  
WO/2006/086198A1
The present invention relates to detergent composition comprising at least two granular components: (1) a first granule comprising high levels of a polycarboxylate-polymer and phosphate salt and at least 8 wt% surfactant and optional add...  
WO2005104214A3
A method and composition for removing a bottom anti-reflection coating (BARC) layer from semiconductor substrates having such BARC layers is described. The removal composition includes a supercritical fluid, a co-solvent, an etchant and ...  
WO/2006/081960A1
Disclosed are methods in which a mixture of a granulate, a separate solid neutralizer, and at least one acid is granulated in a mixer. The concentration of the separate solid neutralizer relative to the total weight of the mixture is at ...  
WO2006069118A3
This invention provides a continuous process for the preparation of a surfactant, the process comprises the step of mixing a first component comprising a surfactant acid precursor with a second component comprising at least a molar equiv...  
WO2006052578A3
A method of cleaning recycled glass containers comprising exposing a container to a caustic solution and rinsing the container with a rinse solution is taught herein. The rinse solution comprises a chelating agent and optionally an acid,...  
WO2005004199A3
A composition including supercritical fluid and at least one additive selected from fluoro species, and primary and/or secondary amines, optionally with co-solvent, low k material attack-inhibitor(s) and/or surfactant(s). The composition...  
WO/2006/081470A1
Polishing compositions and methods for removing conductive materials and barrier materials from a substrate surface are provided. Polishing compositions are provided for removing at least a barrier material from a substrate surface by a ...  
WO/2006/072780A1
A cleaning formulation for cleaning aluminium surfaces. The formulation has a pH of 0.5 to 5 and incorporates sulphuric acid, at least one aluminium sequestrant, at least one surface active agent, ions of at least one d-block transition ...  
WO2003062520A8
The present invention provides a method for the removal of stains from articles, especially fabric, using densified carbon dioxide. More particularly the invention is concerned with a method of dry cleaning an article comprising the succ...  
WO/2006/069118A2
This invention provides a continuous process for the preparation of a surfactant, the process comprises the step of mixing a first component comprising a surfactant acid precursor with a second component comprising at least a molar equiv...  
WO/2006/067439A1
A method of disinfecting textile articles during laundering is disclosed wherein at least one wash cycle is followed by at least one rinse cycle and at least one laundry preparation is used. The laundry preparation collectively o compris...  
WO/2006/067360A1
Disclosed is a process for preparing a granular detergent composition or component having a bulk density of at least 500 g/l. The process disclosed herein comprises the steps of (i) providing an aqueous solution of a surfactant (ii) addi...  
WO/2006/066278A2
A process of extracting liquid from a fabric having a first content of liquid includes the steps of creating a surfactant surface layer including at least one surfactant at an air-liquid interface of the liquid on the fabric, wherein the...  
WO/2006/066115A3
A process extracts liquid from a fabric having a first content of liquid through the use of a mechanical extraction means and penetration of a surfactant monolayer created at the air-liquid interface of the first liquid contained in the ...  
WO/2006/065256A1
Photoresist strippers and cleaning compositions of this invention are provided by non-aqueous cleaning compositions that are essentially non-corrosive toward copper as well as aluminum and that comprise at least one polar organic solvent...  
WO2005040320A8
The present invention relates to a stable cleaning composition including a borate salt and spores (bacterial or fungal), vegetative bacteria, or fungi. The composition can also include a polyol.  
WO/2006/066115A2
A process extracts liquid from a fabric having a first content of liquid through the use of a mechanical extraction means and penetration of a surfactant monolayer created at the air-liquid interface of the first liquid contained in the ...  
WO/2006/062534A1
Back end photoresist strippers and cleaning compositions of this invention are provided by amino acid-free, non-aqueous cleaning compositions that are essentially non-corrosive toward copper as well as aluminum and that comprise at least...  
WO2005024095A8
The present invention is directed to a gas turbine cleaner. The composition of the present invention includes a glycol alkyl ether compound, an alkoxylated surfactant with an alkyl chain length of from about 3 to 18 carbons and a metal c...  
WO/2006/058570A1
The invention relates to an aqueous cleaning agent concentrate containing: a) water; b) glycol ether of general formula R-O-(CH2-CH(CH3)-0)n-H, in which R represents an alkyl radical with 1 to 4 C atoms or a phenyl radical, and n represe...  
WO/2006/056298A1
The present invention relates to new compositions for cleaning of microelectronic substrates, especially for copper metallizations or copper surfaces in semiconductor processing and wafer production. It also relates to the use of such cl...  
WO2006028894A3
Chromate free treatments and compositions for applying a conversion or passivation coating to metal surfaces. Preferred compositions comprise a film forming latex polymer, fluoacid, phosphoric acid, and a polyoxyethylene/oxypropylene blo...  
WO/2006/051255A1
The invention relates to the formulation and application of water based predominantly pH neutral microemulsions and microemulsion forming surfactant systems essentially comprising a surfactant or surfactant ˜ end, lactates) - esters) of...  
WO/2006/052578A2
A method of cleaning recycled glass containers comprising exposing a container to a caustic solution and rinsing the container with a rinse solution is taught herein. The rinse solution comprises a chelating agent and optionally an acid,...  
WO2005068074A3
The invention accordingly relates to the use as catalysts of at least one metal complex of formula (1) [LnMemXp]2Yq (1), wherein L is a ligand of formula (2) wherein Q1 is N or CR 10, Q2 is N or CR11, and wherein the remaining substituen...  
WO/2006/050323A1
Improved compositions and processes for removing photoresists, polymers, post etch residues, and post oxygen ashing residues from interconnect, wafer level packaging, and printed circuit board substrates are disclosed. One process compri...  
WO/2006/048142A2
Disclosed are low-dust or dust-free granulates/agglomerates for detergents or cleaning agents as well as coated aggregates having a core-shell structure for the detergent or cleaning agent sector and a method for forming such aggregates....  
WO/2006/045391A1
A method of preparing a composition for use in a unit dose fabric treatment system, the method comprising the steps of reacting together, in the presence of water, a ester-containing soap precursor, a base material, and optionally a solv...  
WO/2006/042589A1
Disclosed is a method that makes it possible to obtain particles which can absorb large quantities of perfume. The resulting particles are mechanically stable, flow freely, and have no tendency to stick together even when being charged w...  
WO/2006/042316A1
A composition for cleaning and degreasing substrates, methods of forming and using the composition, and a system and method for recycling the composition are provided. The composition includes a 2-ethylhexyl ester and may also include co...  
WO/2006/039983A1
The invention relates to a degreasing method for descalling or/and removing laser scales from iron-containing metal part surfaces consisting in treating said iron-containing metal part surfaces optionally tainted with laser scales by an ...  
WO/2006/036718A1
A process for forming a low density detergent granule has the steps of providing from about 0.1% to about 6% of a hydrotrope, providing from about 22% to about 50% crutcher mix moisture, providing from about 0.2% to about 8% of a water-s...  
WO2005066325A3
The invention relates to a method of cleaning the surface of a substrate to remove post-etch residue or post chemical mechanical polishing residues from the surface of a substrate. Specifically, the present invention relates to a method ...  
WO/2006/034030A1
The present invention relates to methods of processing wafer-like objects (e.g., having an exposed copper feature and/or including low-k dielectric material) with ozone. In certain preferred embodiments, a base is also used to process th...  
WO2005096747A3
Silicon oxide etching solutions containing the product of at least one bifluoride source compound dissolved in a solvent consisting of at least one carboxylic acid, and further comprising from about (0.5) to about (3) percent by solution...  
WO/2006/030475A1
The present invention refers to a process for manufacturing shoes with upper made of decoloured fabric, together with the shoe obtained by said process; process being characterised in that it consists in the sequence of the following ope...  
WO/2006/029676A1
A process for the manufacture of a detergent base powder composition comprising the steps of mixing together an inorganic spray drying filler material, anionic surfactant, sodium silicate and a soluble alkaline earth salt, optionally wit...  
WO/2006/028912A1
Wipes for household use. The present invention relates to wipes which are premoistened. The wipes are also disposable. The wipes may be used to treat house-hold fabric-based materials. The present invention also relates to a method for t...  
WO/2006/028539A2
A method for formulating a cleaning composition, wherein the cleaning composition comprises a water-soluble organic solvent, an ionic surfactant, a nonionic surfactant, a chelating agent, and distilled water.  
WO/2006/029363A1
Described are methods for processing optical materials, by use of cleaning materials that include acid and oxidizer.  
WO/2006/028617A1
Rinse aid compositions and methods for using and methods for making the compositions for warewashing processes. In one aspect, the rinse aid composition includes ingredients listed on the FDA GRAS ('generally recognized as safe') list, i...  
WO2005108644A3
A cleaner-passivator composition and method for treating a fuel cell cooling system are described. The cleaner-passivator comprises a complexing agent, a surfactant, a corrosion inhibitor, and a solvent. The cleaner-passivator reduces th...  
WO/2006/025639A1
Disclosed herein are a method and an apparatus for cleaning a substrate using a mixture of electrolyzed water and ozone water during fabrication of a display device. The apparatus comprises a loading section, a cleaning section and an un...  
WO2004094001A3
Methods and apparatus utilizing supplemental ozone treatment for ensuring sterility of instrument cleaning systems. By flushing ozonated water through the components of a cleaning system, the persistent problem of contamination of cleane...  

Matches 951 - 1,000 out of 7,100