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Patent Searching and Data


Matches 951 - 1,000 out of 6,948

Document Document Title
WO/2005/111190A1
The invention relates to a unit dose detergent for cleaning a coffee machine consisting of a water-soluble sachet filled with a detergent composition comprising: a) 10-40 wt.% of a sequestering agent; b) 15-50 wt.% of a persalt or peraci...  
WO/2005/108644A2
A cleaner-passivator composition and method for treating a fuel cell cooling system are described. The cleaner-passivator comprises a complexing agent, a surfactant, a corrosion inhibitor, and a solvent. The cleaner-passivator reduces th...  
WO/2005/108041A1
A method for cleaning a mold, wherein a main cleaning solution for use in the electrolytic cleaning as a main cleaning comprises a strongly alkaline component containing one or more selected from sodium hydroxide, potassium hydroxide and...  
WO/2005/108539A1
The invention relates to a method for production of solid granulates with improved storage stability and abrasion resistance, based on the addition of hygroscopic polyols. The invention further relates to solid granulates with improved s...  
WO2005090537A3
An oil containing starch granule is provided comprising: (a) a starch to form an effective matrix for said granule; (b) an oil, said oil being capable of providing a benefit-additive to a substrate upon contact therewith, said substrate ...  
WO/2005/108543A1
The invention relates to dry anti-fogging wipes which are obtained by impregnating a textile surface with a liquid surfactant. The invention also relates to a method for the anti-fogging treatment of surfaces, such as transparent or refl...  
WO/2005/104682A3
A method and composition for removing ion-implanted photoresist from semiconductor substrates having such photoresist is described. The removal composition contains supercritical CO2 (SCCO2), a co-solvent and a reducing agent for use in ...  
WO/2005/105967A9
Material, composition, and manufacturing method alternatives for a solidification matrix that may be used, for example, in solid cleaning compositions, or other technologies. In at least some embodiments, the solidification matrix includ...  
WO/2005/105967A1
Material, composition, and manufacturing method alternatives for a solidification matrix that may be used, for example, in solid cleaning compositions, or other technologies. In at least some embodiments, the solidification matrix includ...  
WO/2005/105303A1
The present invention relates to the use of certain manganese complexes having bispyridylpyrimidine or bispyridyltriazine ligands or mixtures of such ligands as catalysts for reactions with peroxy compounds for bleaching coloured stains ...  
WO/2005/104682A2
A method and composition for removing ion-implanted photoresist from semiconductor substrates having such photoresist is described. The removal composition contains supercritical CO2 (SCCO2), a co-solvent and a reducing agent for use in ...  
WO/2005/105973A1
The solubility of granules can be manipulated by granulating solid and liquid components using mixer(s)/granulator(s) and a fluidization granulator and sharing out the liquid component between the mixer/granulator and the fluidized bed. ...  
WO/2005/104214A2
A method and composition for removing a bottom anti-reflection coating (BARC) layer from semiconductor substrates having such BARC layers is described. The removal composition includes a supercritical fluid, a co-solvent, an etchant and ...  
WO/2005/103831A1
The invention provides a novel rinsing fluid which can convert an easily wettable resist pattern surface having a contact angel of 40° or below into one having a contact angle of 70° or above to inhibit pattern collapse effectively and...  
WO/2005/103214A2
A perfume composition effective in reducing or preventing malodours comprises at least 1.0% by weight of one or more materials having a fruity note; and at least 0.5% by weight of at least one material having an amber note and selected f...  
WO/2005/100522A1
A glass and general purpose cleaning composition is described which has zero to low volatility while providing acceptable cleaning and drying rates. The cleaning composition contains at least one low-volatile non-VOC evaporative organic ...  
WO/2005/100524A1
[PROBLEMS] To provide a hydrophilizing agent excellent in hydrophilization performance and antifouling properties. [MEANS FOR SOLVING PROBLEMS] The hydrophilizing agent is characterized by containing an aromatic sulfonic acid compound/fo...  
WO2005014478A3
The present invention generally relates to a formulation created by reacting sodium hydroxide, water, and silicon metal which has unique properties and many uses. The instant invention is further directed to methods of producing and usin...  
WO/2005/100520A1
The present invention describes liquid aqueous acidic cleaning compositions suitable for removing limescale, comprising an acid system, wherein said acid system comprises formic acid and an acid forming slightly water soluble calcium sal...  
WO/2005/100533A1
The invention relates to a method for producing quaternary hydroxyalkylammonium granules, which is characterized by spraying an aqueous solution or suspension comprising a) a quaternary hydroxyalkylammonium compound, b) a support materia...  
WO/2005/100521A1
The present invention describes a method of removing soap scum from a hard-surface comprising the step of applying a liquid aqueous acidic composition onto the hard-surface, wherein the composition comprises phosphoric acid and a nonioni...  
WO2005043250B1
A new cleaning chemistry based on bis-choline and tris-choline compounds, such as their hydroxides, is provided in order to address the removal of photoresist and flux while minimizing any etching of the substrate.  
WO/2005/097961A1
The invention relates to a method of preparing an aqueous detergent dispersion comprising mixing at least one silane compound, colloidal silica particles, and a detergent to form an aqueous detergent dispersion comprising silanized collo...  
WO/2005/097958A1
A detergent blend is prepared by admixing together a fluorinated surfactant and an amphoteric-based sultaine surfactant hydrotrope. This blend can then be formulated into a detergent concentrate which includes a caustic compound, a chela...  
WO/2005/098920A3
The invention relates to a novel solution for removing post-etch-residue, having improved properties, and to the use thereof in the production of semi-conductors. The invention also relates to an aqueous solution having a reduced etching...  
WO/2005/096747A2
Silicon oxide etching solutions containing the product of at least one bifluoride source compound dissolved in a solvent consisting of at least one carboxylic acid, and further comprising from about (0.5) to about (3) percent by solution...  
WO/2005/098920A2
The invention relates to a novel solution for removing post-etch-residue, having improved properties, and to the use thereof in the production of semi-conductors. The invention also relates to an aqueous solution having a reduced etching...  
WO/2005/095567A1
Described are anionic N-substituted fluorinated sulfonamide surfactants, and use thereof in cleaning and in acid etch solutions. The cleaning and etch solutions are used with a wide variety of substrates, for example, in the cleaning and...  
WO/2005/095569A1
Solid laundry detergent comprising polyanionic ammonium surfactant granules, the granules comprising a substantially non-aqueous binder, which in turn comprises a polyanionic ammonium surfactant and a solubilizer for the surfactant. A pr...  
WO/2005/095675A1
Disclosed for use in treating a metal, e.g., an alloy of silver as aforesaid, is a water-based composition comprising a treatment agent selected from an alkanethiol, alkyl thioglycollate, dialkyl sulfide or dialkyl disulfide and at least...  
WO/2005/095570A1
The present invention relates to cleaning compositions comprising polymer bound manganese compounds as reducing agents and the use of such manganese compounds in cleaning compositions, particularly to machine dishwashing compositions com...  
WO/2005/091771A2
Water-soluble solvent compositions, including from about 10% to about 60% by weight of an aromatic ester; from about 30% to about 60% by weight of an aliphatic ester; from 0% to about 15% by weight of a co-solvent; from 0% to about 20% o...  
WO/2005/093032A1
Nanoelectronic and microelectronic cleaning compositions for cleaning nanoelectronic and microelectronic substrates under supercritical fluid state conditions, and particularly cleaning compositions useful with and having improved compat...  
WO/2005/093031A1
This disclosure discusses cleaning of semiconductor wafers after the Chemical-Mechanical Planarization (CMP) of the wafer during the manufacturing of semiconductor devices. Disclosed is an acidic chemistry for the post-CMP cleaning of wa...  
WO2005073296A3
Water dispersible or water soluble porous bodies comprising a three dimensional open-cell lattice containing 10 to 95 % by weight of a polymeric material which is soluble in water, and, less than 5 % by weight of a surfactant, said porou...  
WO/2005/090542A1
The invention relates to a method of cleaning equipment for producing or processing dairy products, said equipment being soiled with said dairy products, wherein said method comprises the step of treating, especially the step(s) of conta...  
WO/2005/090537A2
An oil containing starch granule is provided comprising: (a) a starch to form an effective matrix for said granule; (b) an oil, said oil being capable of providing a benefit-additive to a substrate upon contact therewith, said substrate ...  
WO/2005/090538A2
An oil containing starch granule is provided comprising: (a) a starch to form an effective matrix for said granule; (b) a perfume oil comprising ingredients having a calculated Clog P of at least 3, said Clog P being the calculated octan...  
WO/2005/087909A1
A process for producing surfactant products by reacting, in a jacketed vacuum neutralizing reactor, the acid form of an anionic surfactant with a neutralizing agent, and supplementing heat to the reactor via a heat transfer medium on the...  
WO/2005/087908A1
The aim of the invention is to significantly improve the compatibility of bleach activators with bleach-sensitive dyestuffs. To this end, the invention relates to a method for producing coated bleach activators, characterised by the foll...  
WO/2005/085408A1
This disclosure discusses cleaning of semiconductor wafers after the Chemical-Mechanical Planarization (CMP) of the wafer during the manufacturing of semiconductor devices. Disclosed is an alkaline chemistry for the post-CMP cleaning of ...  
WO/2005/085406A1
Kits, applicators and methods for treatment of a surface involve sequential application to a surface of a hydrogel precursor and a crosslinking component to form a removable hydrogel patch on the surface followed by removal of the patch....  
WO/2005/083170A1
This invention relates to new compositions and methods for cleaning textile substrates, especially carpet and upholstery fabrics. More particularly, this invention relates to liquid compositions that contain absorbent particles in a flow...  
WO/2005/083523A1
Microelectronic cleaning compositions for cleaning microelectronic substrates, and particularly cleaning compositions useful with and having improved compatibility with microelectronic substrates characterized by silicon dioxide, sensiti...  
WO2005068598A9
A method of warewashing for the removal of starch is described herein. The method includes applying an alkaline composition to a dish, then applying an acidic composition to a dish, and then applying a second alkaline composition to the ...  
WO2005051997A3
There is provided a fusion protein comprising a Carbohydrate Binding Domain and a domain having a high binding affinity for a melamine-type polymer. Also provided is a detergent composition comprising one or more surfactants and a fusion...  
WO/2005/081289A2
The present invention generally relates to a system for cleaning substrates. More particularly, the present invention relates to process(es) for effecting chemical removal of residues from semiconductor substrates, including silicon wafe...  
WO/2005/081289A3
The present invention generally relates to a system for cleaning substrates. More particularly, the present invention relates to process(es) for effecting chemical removal of residues from semiconductor substrates, including silicon wafe...  
WO/2005/080538A1
A granular detergent composition comprising (i) 5 to 30% of non-ionic surfactant system and (ii) 20 to 95% builder wherein the non-ionic surfactant system comprises (A) a C8 to C20 primary or secondary alcohol ethoxylates with an average...  
WO2005040320B1
The present invention relates to a stable cleaning composition including a borate salt and spores (bacterial or fungal), vegetative bacteria, or fungi. The composition can also include a polyol.  

Matches 951 - 1,000 out of 6,948