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Matches 951 - 1,000 out of 6,924

Document Document Title
WO/2005/100521A1
The present invention describes a method of removing soap scum from a hard-surface comprising the step of applying a liquid aqueous acidic composition onto the hard-surface, wherein the composition comprises phosphoric acid and a nonioni...  
WO2005043250B1
A new cleaning chemistry based on bis-choline and tris-choline compounds, such as their hydroxides, is provided in order to address the removal of photoresist and flux while minimizing any etching of the substrate.  
WO/2005/097961A1
The invention relates to a method of preparing an aqueous detergent dispersion comprising mixing at least one silane compound, colloidal silica particles, and a detergent to form an aqueous detergent dispersion comprising silanized collo...  
WO/2005/097958A1
A detergent blend is prepared by admixing together a fluorinated surfactant and an amphoteric-based sultaine surfactant hydrotrope. This blend can then be formulated into a detergent concentrate which includes a caustic compound, a chela...  
WO/2005/098920A3
The invention relates to a novel solution for removing post-etch-residue, having improved properties, and to the use thereof in the production of semi-conductors. The invention also relates to an aqueous solution having a reduced etching...  
WO/2005/096747A2
Silicon oxide etching solutions containing the product of at least one bifluoride source compound dissolved in a solvent consisting of at least one carboxylic acid, and further comprising from about (0.5) to about (3) percent by solution...  
WO/2005/098920A2
The invention relates to a novel solution for removing post-etch-residue, having improved properties, and to the use thereof in the production of semi-conductors. The invention also relates to an aqueous solution having a reduced etching...  
WO/2005/095567A1
Described are anionic N-substituted fluorinated sulfonamide surfactants, and use thereof in cleaning and in acid etch solutions. The cleaning and etch solutions are used with a wide variety of substrates, for example, in the cleaning and...  
WO/2005/095569A1
Solid laundry detergent comprising polyanionic ammonium surfactant granules, the granules comprising a substantially non-aqueous binder, which in turn comprises a polyanionic ammonium surfactant and a solubilizer for the surfactant. A pr...  
WO/2005/095675A1
Disclosed for use in treating a metal, e.g., an alloy of silver as aforesaid, is a water-based composition comprising a treatment agent selected from an alkanethiol, alkyl thioglycollate, dialkyl sulfide or dialkyl disulfide and at least...  
WO/2005/095570A1
The present invention relates to cleaning compositions comprising polymer bound manganese compounds as reducing agents and the use of such manganese compounds in cleaning compositions, particularly to machine dishwashing compositions com...  
WO/2005/091771A2
Water-soluble solvent compositions, including from about 10% to about 60% by weight of an aromatic ester; from about 30% to about 60% by weight of an aliphatic ester; from 0% to about 15% by weight of a co-solvent; from 0% to about 20% o...  
WO/2005/093032A1
Nanoelectronic and microelectronic cleaning compositions for cleaning nanoelectronic and microelectronic substrates under supercritical fluid state conditions, and particularly cleaning compositions useful with and having improved compat...  
WO/2005/093031A1
This disclosure discusses cleaning of semiconductor wafers after the Chemical-Mechanical Planarization (CMP) of the wafer during the manufacturing of semiconductor devices. Disclosed is an acidic chemistry for the post-CMP cleaning of wa...  
WO2005073296A3
Water dispersible or water soluble porous bodies comprising a three dimensional open-cell lattice containing 10 to 95 % by weight of a polymeric material which is soluble in water, and, less than 5 % by weight of a surfactant, said porou...  
WO/2005/090542A1
The invention relates to a method of cleaning equipment for producing or processing dairy products, said equipment being soiled with said dairy products, wherein said method comprises the step of treating, especially the step(s) of conta...  
WO/2005/090537A2
An oil containing starch granule is provided comprising: (a) a starch to form an effective matrix for said granule; (b) an oil, said oil being capable of providing a benefit-additive to a substrate upon contact therewith, said substrate ...  
WO/2005/090538A2
An oil containing starch granule is provided comprising: (a) a starch to form an effective matrix for said granule; (b) a perfume oil comprising ingredients having a calculated Clog P of at least 3, said Clog P being the calculated octan...  
WO/2005/087909A1
A process for producing surfactant products by reacting, in a jacketed vacuum neutralizing reactor, the acid form of an anionic surfactant with a neutralizing agent, and supplementing heat to the reactor via a heat transfer medium on the...  
WO/2005/087908A1
The aim of the invention is to significantly improve the compatibility of bleach activators with bleach-sensitive dyestuffs. To this end, the invention relates to a method for producing coated bleach activators, characterised by the foll...  
WO/2005/085408A1
This disclosure discusses cleaning of semiconductor wafers after the Chemical-Mechanical Planarization (CMP) of the wafer during the manufacturing of semiconductor devices. Disclosed is an alkaline chemistry for the post-CMP cleaning of ...  
WO/2005/085406A1
Kits, applicators and methods for treatment of a surface involve sequential application to a surface of a hydrogel precursor and a crosslinking component to form a removable hydrogel patch on the surface followed by removal of the patch....  
WO/2005/083170A1
This invention relates to new compositions and methods for cleaning textile substrates, especially carpet and upholstery fabrics. More particularly, this invention relates to liquid compositions that contain absorbent particles in a flow...  
WO/2005/083523A1
Microelectronic cleaning compositions for cleaning microelectronic substrates, and particularly cleaning compositions useful with and having improved compatibility with microelectronic substrates characterized by silicon dioxide, sensiti...  
WO2005068598A9
A method of warewashing for the removal of starch is described herein. The method includes applying an alkaline composition to a dish, then applying an acidic composition to a dish, and then applying a second alkaline composition to the ...  
WO2005051997A3
There is provided a fusion protein comprising a Carbohydrate Binding Domain and a domain having a high binding affinity for a melamine-type polymer. Also provided is a detergent composition comprising one or more surfactants and a fusion...  
WO/2005/081289A2
The present invention generally relates to a system for cleaning substrates. More particularly, the present invention relates to process(es) for effecting chemical removal of residues from semiconductor substrates, including silicon wafe...  
WO/2005/081289A3
The present invention generally relates to a system for cleaning substrates. More particularly, the present invention relates to process(es) for effecting chemical removal of residues from semiconductor substrates, including silicon wafe...  
WO/2005/080538A1
A granular detergent composition comprising (i) 5 to 30% of non-ionic surfactant system and (ii) 20 to 95% builder wherein the non-ionic surfactant system comprises (A) a C8 to C20 primary or secondary alcohol ethoxylates with an average...  
WO2005040320B1
The present invention relates to a stable cleaning composition including a borate salt and spores (bacterial or fungal), vegetative bacteria, or fungi. The composition can also include a polyol.  
WO2005043245A3
The invention provides alkaline compositions useful in the microelectronics industry for stripping or cleaning semiconductor wafer substrates by removing photoresist residues and other unwanted contaminants. The compositions contain (a) ...  
WO/2005/077064A2
A multiuse laundry cleaning device in a solid state containing a homogeneous quantity of cleaning agent configured to dissolve and release a substantially consistent quantity of cleaning agent over a plurality of laundry wash and rinse c...  
WO/2005/078059A1
A method for improving the slip properties of a washing in a washing liquid, which comprises causing an organic polymer having stringiness to be present in the washing liquid during washing; a method of washing by hand which comprises th...  
WO/2005/074639A2
Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohols, reacting olefins and a saturated compounds, reacting reactants having at least two -CF3 groups with r...  
WO/2005/076332A1
Disclosed is a substrate cleaning liquid for semiconductor devices which is capable of removing particle contamination, organic contamination and metal contamination at the same time without corroding the substrate surface. Furthermore, ...  
WO/2005/075618A1
The present invention provides a solid particulate laundry detergent composition comprising: (a) from 2wt% to 20wt% clay; (b) from 0.5wt% to 10wt% polydimethylsiloxane; (c) from 0.1wt% to 5wt% flocculating component; (d) from 5wt% to 25w...  
WO/2005/075622A1
The present invention relates to an auxiliary composition, for use in the laundering or treatment of fabrics, comprising an admix of (i) clay and (ii) a silicone in an emulsified form.  
WO2005043250A3
A new cleaning chemistry based on bis-choline and tris-choline compounds, such as their hydroxides, is provided in order to address the removal of photoresist and flux while minimizing any etching of the substrate.  
WO/2005/073296A2
Water dispersible or water soluble porous bodies comprising a three dimensional open-cell lattice containing 10 to 95 % by weight of a polymeric material which is soluble in water, and, less than 5 % by weight of a surfactant, said porou...  
WO/2005/073300A1
The invention provides a method for preparing water dispersible or water soluble porous bodies and the bodies themselves The bodies have an intrusion volume as measured by mercury porosimetry of at least about 3 ml/g and comprise a three...  
WO/2005/073359A1
The present invention relates to acidic sanitizing and/or cleaning compositions comprising a specific quaternary antimicrobial system consisting of C1-C4 hydroxyalkyl carboxylic acids, C5-C18 alkyl monocarboxylic acids, unsubstituted or ...  
WO/2005/071042A1
A system and process are provided for recovering and/or cleaning residual or waste petroleum products such as sludge accumulated within a storage tank or upon process equipment surfaces, or from inorganic materials such as sand or clay, ...  
WO/2005/071054A1
A method for treating laundry is provided. The method includes steps of applying a bleaching and antimicrobial composition to laundry in a laundry washing machine at a first Ph that favors bleaching properties and at a second pH that fav...  
WO2005019490A3
A process for cleaning the surface of a semiconductor wafer. The process has the following steps: a) conveying a component selected from the group consisting of a dense gas component, a liquid component and a mixture thereof to a bellows...  
WO/2005/068402A1
The invention relates to a method to remove metaloxides from at least the surface of a substrate comprising a stone-like material that contains at least one earth-alkaline metal, wherein an aqueous alkaline solution comprising thioglycol...  
WO/2005/068598A1
A method of warewashing for the removal of starch is described herein. The method includes applying an alkaline composition to a dish, then applying an acidic composition to a dish, and then applying a second alkaline composition to the ...  
WO/2005/068074A2
The invention accordingly relates to the use as catalysts of at least one metal complex of formula (1) [LnMemXp]2Yq (1), wherein L is a ligand of formula (2) wherein Q1 is N or CR 10, Q2 is N or CR11, and wherein the remaining substituen...  
WO/2005/068708A1
Compositions for dry-cleaning garments containing dipropylene glycol tertiary-butyl ether (DPTB), water, and at least one other solvent selected from cyclic siloxanes and glycol ethers other than DPTB suitable for use as dry-cleaning sol...  
WO/2005/066286A1
The present invention relates to a method for treating surfaces with a composition comprising nanocrystalline titanium dioxide. The composition can be used in powder from or as a thixotropic aqueous solution. After physical removal, such...  
WO/2005/066105A1
Azeotrope-like compositions comprising C2F5CF(OCH3)CF(CF3)2 (1,1,1,2,2,3,4,5,5,5-decafluoro-3-methoxy-4-trifluoromethyl- pentane) and an organic solvent, and uses thereof, are described.  

Matches 951 - 1,000 out of 6,924