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Patent Searching and Data


Matches 951 - 1,000 out of 6,691

Document Document Title
WO/2005/003267A1
A fabric article treating process, to provide improved fabric cleaning, fabric appearance and/or fabric care benefits. More particularly, the present process provides an effective delivery of detergent actives and rinse actives by deposi...  
WO/2005/003437A1
Compositions for treating fabric articles, especially articles of clothing, linens and drapery, wherein the compositions provide improved cleaning of soils from and/or care of and/or treatment of fabric articles, especially while providi...  
WO/2005/003279A1
The present invention relates to method of marketing fabric care material for use in a home dry cleaning system. The fabric care material may be in the form of a kit for a desired consumer benefit, a desired theme or for convenience. The...  
WO/2005/003268A1
A fabric article treating system, including the apparatus and the process, to provide improved fabric cleaning, fabric appearance and/or fabric care benefits. More particularly, the present system provides an effective delivery of deterg...  
WO/2005/004199A2
A composition including supercritical fluid and at least one additive selected from fluoro species, and primary and/or secondary amines, optionally with co-solvent, low k material attack-inhibitor(s) and/or surfactant(s). The composition...  
WO/2005/001162A1
An acidic cleaning composition and a method usable for cleaning aluminium, where the cleaning composition comprising an aqueous acidic liquid with a pH of between 0.6 and 2.5, and the composition including for example; 0.2 grams per litr...  
WO/2005/001013A1
A 'two-in-one' treating system, composition, method, composition of matter, and article of manufacture for treating shoes, especially leather-containing shoes, such as athletic shoes, is provided. More particularly, the present invention...  
WO/2005/001014A1
A cleaning solution for paper making equipment includes a stabilized source of peroxide in combination with a glycol ether solvent system and an alcohol ethoxylate. The peroxide system can be hydrogen peroxide stabilized with a phosphona...  
WO/2005/001016A1
The present invention recites a composition comprising a first compound and a second compound. The first compound has the chemical formula (1a), wherein m, n and o are independently from each other equal to 2 or 3; wherein p is equal to ...  
WO2004101181A3
A supercritical CO2 cleaning system (100) according to the invention can include: a pressure chamber (135) configured to clean a workpiece with supercritical CO2; an expansion chamber (140) configured to receive an output of the pressure...  
WO/2004/113461A1
A concentrate composition for removing coatings from surfaces such as paint application equipment is provided, which comprises: (a) 0 to 99.5 percent by weight of acetone, methyl acetate and/or water; (b) 0.01 to 35 percent by weight of ...  
WO/2004/113483A1
A method of treating shoes, especially leather-containing shoes, such as athletic shoes, prior to and/or during and/or after washing the shoes, is provided. More particularly, a method employing a treating system and/or composition appli...  
WO/2004/113486A1
A cleaning composition comprises at least quaternary ammonium hydroxide, a water-soluble organic solvent, water, an anticorrosive, and potassium hydroxide of 1 mass percent or less of a total amount of the solution. This cleaning composi...  
WO/2004/112975A1
An apparatus and method for cleaning passageways and the like with a two-phase mixture of gas under pressure and an aqueous cleaning solution. The two-phase cleaning mixture is generated in a module and is passed out of the module at a p...  
WO/2004/111176A1
A process for the preparation of a granular detergent component comprising an organic superabsorbing material, which process comprises absorbing an aqueous solution, dispersion or emulsion of detergent ingredient on the organic superabso...  
WO/2004/111177A1
A process for the preparation of a particulate detergent component comprising an organic gelling agent, which process comprises absorbing a liquid detergent ingredient, which is an aqueous solution, dispersion or emulsion of detergent in...  
WO/2004/111166A1
A process for the production of powders, flakes, or pellets containing salts of &agr -sulfofatty acid alkyl esters in high concentrations, characterized by comprising (1) the step of production of a paste containing a salt of an &agr -su...  
WO/2004/111175A1
Detergent Composition The laundry detergent composition of the invention contains a combination of a soap, an anionic surfactant, a nonionic surfactant, optionally a builder system, and optionally other detergent ingredients. The surfact...  
WO2004076605B1
Embodiments of the invention generally provide methods for removing a residue from a substrate surface, comprising mixing an aqueous solution with a hydrogen peroxide solution to produce a cleaning solution. The aqueous solution comprise...  
WO/2004/108170A1
A method of treating the surfaces of medical instruments which are contaminated with prions includes contacting the surface with a composition containing a source of peroxide ions, such as hydrogen peroxide, at a molar concentration of a...  
WO2004094080A8
A cleaning device for cleaning a medical instrument such as an endoscope, which includes a fabric, wipe, or sponge impregnated with a composition which comprises: an enzyme such as a protease, alcalase, cellulase, lipolase: a surfactant ...  
WO/2004/105971A1
A method and apparatus (10) for cleaning a component (14) of an airĀ­ conditioning or refrigeration system which provides for flushing liquid solvent through the component (14) to remove contamination from the component, vaporizing the s...  
WO/2004/106589A1
Disclosed are quaternary ammonium carbonates, bicarbonates, and mixtures thereof as anti-corrosive agents. The invention relates to a method for inhibiting the corrosion of metal surfaces by applying a composition containing one or more ...  
WO/2004/102620A2
A method for processing semiconductor wafers is disclosed. A solution is applied to a semiconductor wafer to prevent dendrites and electrolytic reactions at the surface of metal interconnects. The solution can be applied during a CMP pro...  
WO/2004/101181A2
A supercritical CO2 cleaning system (100) according to the invention can include: a pressure chamber (135) configured to clean a workpiece with supercritical CO2; an expansion chamber (140) configured to receive an output of the pressure...  
WO/2004/102621A2
Compositions and methods employing supercritical fluids, e.g., supercritical carbon dioxide, for removal of unwanted material from microelectronic device structures and process equipment. One composition of such type, having utility for ...  
WO/2004/099359A1
A process for the manufacture of a structured material for use in a detergent composition is disclosed, wherein the structured material is extruded in a screw extruder with a specific mechanical energy input of less than 75 kJ/kg. Prefer...  
WO/2004/099356A1
The present invention relates to heterogeneous cleaning compositions, methods employing them, and methods of making them.  
WO/2004/100245A1
A method of cleaning etching residue from a substrate comprising a low k dielectric material comprising the steps of : contacting the substrate with a composition comprising H2SiF6 or HBF4, organic solvent, an amine, a corrosion inhibito...  
WO/2004/098655A1
Methods of treating soiled items, such as medical instruments, with supplemental ozone treatment, such as combinations of ozone and one or more cleaning agents or sterilants, are provided. The methods involve treating soiled items with o...  
WO/2004/099071A1
The invention concerns coated sodium percarbonate granules comprising a core produced by fluidised bed spray granulation, containing sodium percarbonate as its main component, an inner coating layer containing an organic, hydrate-forming...  
WO/2004/097918A1
An etching liquid and a remover liquid for removing a resist and an organic antireflective film and/or a buried organic material are disclosed which contain at least one organic acid.  
WO2004074419A3
The present invention relates to the replacement of surfactants, builders, polymers and bleaches in detergent compositions with enzymes.  
WO2003078691A3  
WO/2004/094581A1
The present invention relates to dilute fluoride solutions and methods for cleaning plasma etch residue form semiconductor substrates including such dilute solutions. The compositions and methods according to the invention can advantageo...  
WO2004085491A3
A method of post chemical mechanical polishing (CMP) cleaning to remove a CMP residue from a surface of an object is disclosed. The object is placed within a pressure chamber. The pressure chamber is pressurized. A supercritical carbon d...  
WO/2004/094080A1
A cleaning device for cleaning a medical instrument such as an endoscope, which includes a fabric, wipe, or sponge impregnated with a composition which comprises: an enzyme such as a protease, alcalase, cellulase, lipolase: a surfactant ...  
WO/2004/094001A2
Methods and apparatus utilizing supplemental ozone treatment for ensuring sterility of instrument cleaning systems. By flushing ozonated water through the components of a cleaning system, the persistent problem of contamination of cleane...  
WO2004059700A3
Disclosed herein is a composition and method for semiconductor processing. In one embodiment, a wet-cleaning composition for removal of photoresist is provided. The composition comprises a strong base; an oxidant; and a polar solvent. In...  
WO2004069974A3
The aim of the invention is to improve stain-removing power of non-ionic cellulose derivatives. The aim is achieved by a combination formed by a stain removing cellulose derivative which can be produced by cellulose and carboxymethyl cel...  
WO/2004/091749A1
The regeneration of a nonaqueous solvent which has been used in a drying operation in a final step of the cleaning of an object material is carried out. A separating liquid having a low compatibility with a nonaqueous solvent and a high ...  
WO/2004/090219A2
The invention relates to a natural, biodegradable aqueous composition for dry cleaning and/or removing grease from textiles and/or leathers. The inventive dry-cleaning composition comprises essential oils and surfactants, can be etherize...  
WO/2004/088735A1
Disclosed is a means for removing fine foreign particles adhering to a fine pattern or the like without damaging the pattern or the like. After placing an object such as a photomask on a rotatable object-holding means, a highly viscous l...  
WO/2004/085591A1
Disclosed is a cleaning solution containing water and a) water-miscible alkylamines and/or hydroxyalkylamines at such a quantity that the pH value of the cleaning solution ranges between 9 and 13, b) 0.01 to 2 percent by weight of alkyl ...  
WO/2004/085599A1
Disclosed is a method for producing packaged detergents or cleaning agents, comprising the following steps: i) a first enveloping material is processed in a shaping manner so as to form a container that is provided with at least one acco...  
WO/2004/085491A2
A method of post chemical mechanical polishing (CMP) cleaning to remove a CMP residue from a surface of an object is disclosed. The object is placed within a pressure chamber. The pressure chamber is pressurized. A supercritical carbon d...  
WO2002097024A8
A detergent composition for dry cleaning which comprises (a) a nonionic surfactant, (b) a cyclic polysiloxane and (c) a polyether-modified silicone having a HLB value of 6 or less, in amounts satisfying that, relative to the total amount...  
WO/2004/084288A1
A process for the production of etching or cleaning fluids characterized by comprising (1) at least one fluoride salt or hydrogen difluoride salt prepared from both at least one member selected from the group consisting of ammonia, hydro...  
WO/2004/083354A1
A composition for cleaning or rinsing hard surfaces in an aqueous or hydroalcoholic medium, comprising at least one surfactant and at least one polybetain for providing said surfaces with anti-deposition and/or anti-adhesion properties f...  
WO2004037962A3
The present invention relates to dilute aqueous solutions containing phosphoric acid and methods for cleaning plasma etch residue from semiconductor substrates including such dilute aqueous solutions. The solution according to the invent...  

Matches 951 - 1,000 out of 6,691