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Patent Searching and Data


Matches 1,001 - 1,050 out of 6,676

Document Document Title
WO/2004/069973A1
The aim of the invention is to improve the dirt dissolving action of non-ionic cellulose derivatives in detergents. This is achieved by a combination of a cellulose derivative with dirt dissolving properties, obtained by the alkylation a...  
WO/2004/069974A2
The aim of the invention is to improve stain-removing power of non-ionic cellulose derivatives. The aim is achieved by a combination formed by a stain removing cellulose derivative which can be produced by cellulose and carboxymethyl cel...  
WO/2004/067692A1
A cleaning solution for removing post dry etching residues, the cleaning solution comprising sulfuric acid, hydrogen peroxide, a fluorine-containing compound and a surfactant. The percentage of sulfuric acid is from 1 wt% to 30wt%, the c...  
WO/2004/063290A2
A floor coating remover composition with abrasive and reduced slip properties under foot. Solid plastic, natural stone or other inorganic or organic grit is incorporated into a floor coating removing formulation to provide a coefficient ...  
WO/2004/063319A1
Cleaning liquid of the piping in a die and a cleaning method of the piping in a die using the cleaning liquid characterized in that a water soluble fatty acid capable of cleaning the piping in a die in a short time while saving energy wi...  
WO/2004/061069A1
The present application discloses a rinse aid composition comprising: a) from 0.01 to 70 wt% of at least one water-soluble metal salt; b) from 0.01 to 25 wt% of an acid; c) from 0.01 to 60 wt% of a non-ionic surfactant; d) at least a dis...  
WO/2004/060586A1
Disclosed are compositions and methods for cleaning contaminated articles based on the provision of a zeotropic composition comprising (a) at least one flammable solvent having a boiling point at a first pressure; (b) at least one first ...  
WO/2004/061027A1
The present invention provides methods of polishing and/or cleaning copper interconnects using sulfonic acid compositions.  
WO/2004/061028A1
The present invention provides methods of polishing and/or cleaning copper interconnections using bis (perfluoroalkanesulfonyl) imide acids or tris (perfluoroalkanesulfonyl) methide acids compositions.  
WO/2004/061068A1
A rinse aid composition for reducing glassware corrosion characterized by comprising: a) from about 0.01% to about 70% by weight of at least one water-soluble metal salt; b) from about 0.01% to about 25% by weight of an acid; c) from abo...  
WO/2004/058933A1
The present invention provides a mechanically robust, water-soluble or water dispersible, low-dust granule comprising an active ingredient, a polymer coating, and an impregnated plasticizer within the granule, and methods for obtaining t...  
WO/2004/058692A1
The invention relates to methods for producing alkylaryl sulfonates by: a) reacting a C4-olefin mixture on a metathesis catalyst in order to produce a 2-pentene and/or an olefin mixture containing 3-hexene, and optionally separating out ...  
WO/2004/059700A2
Disclosed herein is a composition and method for semiconductor processing. In one embodiment, a wet-cleaning composition for removal of photoresist is provided. The composition comprises a strong base; an oxidant; and a polar solvent. In...  
WO2004041175A3
Disclosed is a composition comprised of n-propyl bromide and 1,1.1,3,3-pentafluorobutane. This invention also relates to cleaning solvent systems comprised of n-propyl bromide and 1,1,1,3,3-pentafluorobutane and methods for cleaning vari...  
WO/2004/059936A1
In an orthogonal frequency division multiplexing (OFDM) system (100), a receiver of an OFDM signal via an air interface defines training symbols (110) to be included in the frame structure of the air interface and a post-FFT receiver alg...  
WO/2004/058674A1
A novel fluorine-containing ether compound which is represented by the following formula (I), stable when in use, and has a short life in the atmosphere is disclosed. The fluorine-containing ether compound is useful as a fluorine-contain...  
WO2002064723A8
Automatic dishwashing detergent compositions comprising bleaching agent or enzyme, and blooming perfume composition containing blooming perfume ingredients having a boiling point of less than about 260 DEG C and a ClogP of at least about...  
WO2004045783A3
A method for cleaning cookware and tableware with film-forming liquid dishwashing compositions. The method includes the steps of applying the composition to soiled cookware/tableware, allowing the composition to form a film and act on th...  
WO/2004/055150A1
The invention relates to a fine particulate agent with a significantly improved solubility and a negligible propensity to create dust of 1 %, having a low maximum apparent density of 450 g/l. The surfactant content of said agent represen...  
WO/2004/055149A1
The aim of the invention is to include fine particulate bleaching agents in liquid washing or cleaning agents in a manner stable to sedimentation. Said aim is essentially achieved by means of milling and dispersing phthalimidoperoxyhexan...  
WO/2004/053037A2
The invention relates to a method for the production of surfactant granulates by neutralising anionic surfactant acids and, optionally, additional acidic components with solid neutralisation agents, wherein the anionic surfactant acid(s)...  
WO/2004/053041A2
Glycol ether solvents and fabric article treating compositions and fabric article treating methods employing such solvents are provided.  
WO/2004/053050A1
An anionic surfactant particle for use in laundry detergent compositions has an anionic surfactant content of at least 95 wt% of anionic surfactant and comprises linear alkylbenzene sulphonate (LAS) and primary alcohol sulphate (PAS) in ...  
WO/2004/053970A1
In a stripping composition for easily removing a photoresist without an adverse effect and a method of manufacturing a TFT substrate for an LCD device using the same, the stripping composition includes acetic acid and ozone gas contained...  
WO/2004/052564A1
The process of continuous machine dishwashing, which can be carried out in single-tank or multi-tank machines, is improved by the machine-operated process disclosed. This is achieved, in particular, by treatment of the tableware at least...  
WO2003085190A3
The invention provides a method of facilitating the removal of stains and/or soil from surfaces, which comprises heating a VI-phase detergent composition above its melting point, applying it in the molten state to the stained and/or soil...  
WO/2004/053045A1
A cleaning agent composition comprising a nonionic surfactant represented by the following formula (I): R1O(EO)x(PO)yH (I)(wherein R1 represents a linear or branched alkyl group having from 6 to 20 carbon atoms or a linear or branched al...  
WO/2004/053046A1
The invention relates to a method for the production of surfactant granulates by neutralising anionic surfactant acids and, optionally, additional acidic components with solid neutralisation agents, wherein the anionic surfactant acid(s)...  
WO/2004/050811A1
A cleaning composition is provided. The cleaning composition includes an anionic surfactant and a water hardness anti-precipitant mixture. The water hardness anti-precipitant mixture includes a dispersant and at least one of a sheeting a...  
WO/2004/051379A1
A rinse liquid for lithography enables highly reproducible formation of especially a resist pattern with a high aspect ratio by preventing separation or collapse of the resist pattern. A method for forming a pattern using such a rinse li...  
WO/2004/050815A1
The invention relates to aqueous compositions, preferably aqueous compositions comprising at least one polymer with a particle size of more than 10µm, formed from the polymerisation of a) at least one monomer of formula (I), wherein R1,...  
WO/2004/048507A1
A process for removing coloured stains from hydrophobic surfaces characterised in that the process involves the use of a formulation which comprises a salt of sulphophenyl alkyl carbonate is described. Also a process of removing colour s...  
WO/2004/049062A2
Gas-expanded liquids, methods of use thereof, and systems of using gasexpanded liquids are provided. One exemplary system, among others, includes: a gasexpanded liquid system comprising a gas and a liquid, wherein the gas-expanded liquid...  
WO/2004/046299A1
An automatic dishwashing detergent composition comprises : (a) an encapsulated glasscare active salt; (b) at least one detergent component; (c) optionally at least one adjunct material; and (d) balance water.  
WO/2004/046302A1
This invention relates to wipes impregnated with a cleaning composition particularly suitable for hand dishwashing. According to the invention, there is provided a wipe comprising a water-insoluble substrate having applied thereto a clea...  
WO/2004/046300A1
A rinse aid composition is disclosed comprising: (a) an encapsulated glasscare active salt; (b) at least one rinse aid component; and (c) optionally an adjunct material.  
WO2004037650A3
The invention relates to a method for producing filled, water-soluble dozes which are also filled with refrigerated gas during a production stage. Said hollow bodies contain an agent, in particular a detergent, a treating agent and/or a ...  
WO/2004/046301A1
A wipe comprising a water-insoluble substrate having applied thereto a cleaning composition comprising: a surfactant and a bleach, which is a peroxy carboxylic acid or a hydrophilic precursor thereof.  
WO/2004/045783A2
A method for cleaning cookware and tableware with film-forming liquid dishwashing compositions. The method includes the steps of applying the composition to soiled cookware/tableware, allowing the composition to form a film and act on th...  
WO/2004/044079A1
Pressurized mixtures of propellent gasses and liquid surface or air treating materials are disclosed. The liquid materials are in the form of a dispersion which is a biliquid foam with a thickener, where the foam is structured as an oil-...  
WO/2004/044077A1
Furniture polishes, and methods for their use, are disclosed. The polishes are liquids in the form of a dispersion which is a biliquid foam with a thickener, where the foam is structured as an oil-in-water complex. The dispersion has an ...  
WO/2004/041965A1
A post-etch residue cleaning composition for cleaning ashed or unashed aluminum/SiN/Si post-etch residue from small dimensions on semiconductor substrates. The cleaning composition contains supercritical CO¿2? (SCCO2), alcohol, fluoride...  
WO/2004/041175A2
Disclosed is a composition comprised of n-propyl bromide and 1,1.1,3,3-pentafluorobutane. This invention also relates to cleaning solvent systems comprised of n-propyl bromide and 1,1,1,3,3-pentafluorobutane and methods for cleaning vari...  
WO2004031334A3
A method is provided for the evaluation of washing or cleaning techniques on a substrate. The method comprises the steps i. applying a selective indicator system (e.g.a ph indicator dye and oily substance) on a substrate, ii. washing or ...  
WO/2004/041989A1
The present invention relates to a surface treatment composition and a method for treating the surface of a substrate using the same. More particularly, the present invention relates to a surface treatment composition comprising a liquid...  
WO/2004/041988A1
The invention concerns a method for eliminating biofilm characterized in that it comprises at least the following steps carried out simultaneously or consecutively: a) providing a solution comprising at least an enzymatic mixture contain...  
WO/2004/042811A1
A cleaning liquid for semiconductor substrates furnished or not furnished with metal wiring, comprising a chelating agent of the general formula: (1) (wherein each of Y1 and Y2 represents a lower alkylene; n is an integer of 0 to 4; and ...  
WO/2004/042812A1
A polishing composition and a rinsing composition which effectively prevent a wafer from being contaminated by metal impurities are disclosed. The polishing composition contains a chelating agent, an alkali compound, a silicon dioxide an...  
WO/2004/037965A1
The invention relates to a high flash point aromatic, aliphatic hydrocarbon petroleum solvents optionally combined with specific ingredients to provide maximum solvency, penetration, saturation, dissipation and dispersion of the solid de...  
WO/2004/038731A2
A method for removing a wide variety of radioactive contaminants from a contamined surface sufficient for the surface to be classified as a low-level waste or as free release. Contaminated surface may be classified as Class C, Class B, C...  

Matches 1,001 - 1,050 out of 6,676