Login| Sign Up| Help| Contact|

Patent Searching and Data


Matches 1,001 - 1,050 out of 3,902

Document Document Title
WO/2003/083920A1
A chemical mechanical planarization solution is useful for removing tantalum barrier materials. The solution includes by weight percent 0 to 25 oxidizer, 0 to 15 inhibitor for a nonferrous metal and 0 to 20 complexing agent for the nonfe...  
WO/2003/080918A1
This invention relates to a method of softening water and&sol or in which the deposition of hard water scale is inhibited. The invention relates in particular to such a method carried out in a domestic environment, in particular in ware...  
WO/2003/080788A2
The invention relates to aqueous compositions containing peroxides and certain organopolysiloxanes, to a method for the production thereof and to the use of the same for cleaning, attending to and disinfecting substrate surfaces.  
WO/2003/081647A1
In a small scaled plant intended for flexible manufacturing, a pure water supply system is provided at a low cost without reducing a production efficiency. A pure water system produces a plurality of grades of pure water which are suppli...  
WO/2003/078691A2
An alkaline sensitive metal cleaning composition is provided. The alkaline sensitive metal cleaning composition contains an alkaline concentrate and a corrosion inhibitor concentrate. The alkaline concentrate includes a source of alkalin...  
WO/2003/076362A2
A method of preparing a powder, for compaction into tablets, comprising an amphoteric surfactant, a liquid non-ionic surfactant and particles comprising an aluminosilicate, wherein at least part of said non-ionic surfactant is premixed w...  
WO/2003/076089A1
Hollow porous fibers (12) containing adhered contaminants are cleaned to remove the contaminants by backflushing a liquid to fill the pores, and adding a flow of gas so as to form a two-phase mixture of gas and bubbles of liquid that can...  
WO/2003/072689A1
The invention provides a process for removing fatty soil from a hard surface, the process comprising the steps, in sequence, of: (a) treating the hard surface with a liquid cleaning composition comprising a radical scavenging antioxidant...  
WO/2003/072215A2
Environmentally friendly solvents used to dissolve or remove residues and/or substances from substrates wherein the residue and/or substance is contacted with a Generally Recognized As Safe solvent to dissolve the residue and/or substanc...  
WO/2003/070867A1
This invention provides an antifouling detergent for hard surfaces, which is excellent in antifouling effect without any problem in corrosion of metallic materials. The antifouling detergent for hard surfaces comprises a polymer comprisi...  
WO/2003/068900A1
The present invention is directed to a stone surface cleaning and maintenance composition including a non-ionic surfactant, a quaternary ammonium surfactant a neutralizer to archive a pH of 7 and water. Optionally, fragrance and other ap...  
WO/2003/067631A2
An edge bead remover composition that includes at least one ketone selected from the group consisting of: (Formula 1 & Formula 2); wherein R1 and R2 are independently selected from the group consisting of: methyl, ethyl, n-propyl, n-buty...  
WO/2003/066795A1
Disclosed is a cleaning agent for heater tubes, which is capable of eliminating deposits such as soot particulates in tubes installed in industrial heaters that typically use oil, coal or gas. The cleaning agent of the present invention ...  
WO/2003/066797A1
A paste, comprising at least one hydrophobic component, is produced by mixing of the components and can be offered as a product with an application device and used as a stain removing agent for contaminated textiles or as a cleaning agen...  
WO/2003/064580A1
The invention relates to the use of a cleaning agent which contains surfactants and has a pH value of at least 11 when diluted in an aqueous solution and ready for use. Said cleaning agent is used to destabilise prions during mechanical ...  
WO/2003/064577A1
To provide an anionic surfactant powder comprising a polyoxyalkylene ether sulfate which powder has high stability in hard water, high low-temperature solubility and is improved in powder characteristics such as caking characteristics, a...  
WO/2003/065433A1
A liquid detergent for semiconductor device substrates which comprises the following ingredients (A), (B), and (C); and a method of cleaning with the detergent. Ingredient (A): an ethylene oxide type surfactant which comprises a hydrocar...  
WO/2003/065434A1
A method of surface treatment in which a surface having a structure formed thereon is treated with a supercritical fluid (4), characterized by adding ammonium hydroxide, an alkanolamine, a fluoroamine, hydrofluoric acid, or the like as a...  
WO/2003/063819A1
Disclosed are improved cleaning compositions comprising soap&com ma; fatty acid, synthetic detersive surfactant, salt and a polyhydridic alcohol, which are suitable for formation into precursor cleansing/laundry bar 'soap noodles,' perso...  
WO/2003/061818A1
A method (10) includes providing a substrate and depositing (12) components of a test contaminant library onto regions of the substrate to form at least two test contaminant members of the library. In another method, a chemical cleaning ...  
WO/2003/062520A1
The present invention provides a method for the removal of stains from articles, especially fabric, using densified carbon dioxide. More particularly the invention is concerned with a method of dry cleaning an article comprising the succ...  
WO/2003/060052A1
Filters used in the food and beverage industry can be cleaned by contacting the filters with a cyclic nitroxyl compound and a reoxidator or with a nitroxonium compound in a bromine−free process. The nitroxyl can be TEMPO or its 4−ace...  
WO/2003/060045A1
The present invention relates to aqueous compositions used to remove post etch organic and inorganic residue as well polymeric residues and contaminants from semiconductor substrates. The compositions are comprised of a water soluble org...  
WO/2003/060054A2
A single-dose detergent formulation having a hydrophobically modified polymer and useful for either laundry or auto dishwashing applications is presented. The polymer consists of a hydrophilic backbone to which a hydrophobic moiety has b...  
WO/2003/057811A1
Chemical formulations and methods for removing unwanted material, such as unexposed photoresist, metal oxides, CMP residue, and the like, from semiconductor wafers or other substrates. The formulations utilize a supercritical fluid-based...  
WO/2003/057642A1
The present invention relates to a cleaning process for removing epoxy resin from ceramic substrates, the process includes: a) contacting the ceramic substrate with heated N-methylpyrrolidone for a sufficient time to swell and mechanical...  
WO/2003/057812A1
The invention relates to the use of a composition for cleaning the outside of means of transportation. Said composition contains a) at least one tertiary amino oxide of formula R1R2R3NO, whereby R1 represents an alkylamidoalkyl, alkenyla...  
WO/2003/058350A1
The present invention relates to a composition for cleaning a photoresist and is to provide a cleaning composition wherein the residue of the photoresist does not remain on the boundary surface between the cleaned area and the not-cleane...  
WO/2003/057377A1
A method for cleaning an article includes the steps of contacting the article with a solvent fluid that includes carbon dioxide, whereby contaminants on the article dissolve in the solvent fluid and displacing the solvent fluid with a di...  
WO/2003/055966A1
A fabric care composition comprises a solid carrier and an anti-wrinkle agent. The composition may be used to provide fabrics with softness and/or anti-wrinkle and/or other fabric benefits in laundering processes.  
WO/2003/055584A2
The invention concerns granules obtainable by drying an emulsion comprising: at least an active hydrophobic material; at least a polyakoxylated non ionic surfactant; at least a water soluble or water dispersible compound selected among p...  
WO/2003/054279A2
Methods and compositions to treat fabrics with lipophilic fluid and a rebuild agent are provided by the present invention.  
WO/2003/054126A1
A method of hard surface treatment and liquid compositions comprising a polymeric material with a very degree of branching in a liquid carrier are described. A polymeric material obtained by polymerising a monomer having at least one ter...  
WO/2003/053602A1
A cleaning solution for removing copper complex residues from the surface of polishing pads and wafer substrates includes an amine pH-adjusting agent, which can be a unidentate or bidentate amine compound or a quartnary ammonium hydroxid...  
WO/2003/054135A1
This invention relates to a method of cleaning using water, in which the water is softened and/or in which the deposition of hard water scale is diminished. The invention relates in particular to such a method carried out in a domestic e...  
WO/2003/054131A1
Easily soluble surfactant granulates containing builders, having a variable bulk weight and an excellent solubility profile, containing the neutralized form of an anionic surfactant acid and sodium carbonate and sodium hydrogencarbonate,...  
WO/2003/052036A1
The invention relates to novel, highly concentrated, free-flowing pearly lustre concentrates containing (a) between 30 and 50 wt. % of pearly lustre waxes, (b) less than 25 wt. % of emulsifiers from the group of non-ionic emulsifiers and...  
WO/2003/052037A1
The invention relates to novel, highly concentrated, free-flowing pearly lustre concentrates containing (a) between 20 and 45 wt. % of pearly lustre waxes, (b) between 0.1 and 6 wt. % of anionic surfactants, and (c) between 0.1 and 8 wt....  
WO/2003/052105A1
Cellulase preparations containing endoglucanase originating in Zygomycetes, proteins lacking the cellulose-binding domain thereof, modified proteins thereof or homologs thereof together with a reducing agent. A method of processing a cel...  
WO/2003/050221A1
A semiconductor wafer cleaning formulation, including 2-98% wt. organic amine, 0-50% wt. water, 0.1-60% wt. 1,3-dicarbonyl compound chelating agent, 0-25% wt. of additional different chelating agent(s), 0.1-40% wt. nitrogen-containing ca...  
WO/2003/050344A1
Compositions and methods for removing and/or reducing incidental soils from fabric articles, especially articles of clothing, linen and drapery, wherein the compositions provide improved cleaning of incidental soils, either with or witho...  
WO/2003/048290A1
The aim of the invention is to improve the stability in storage and pourability of particle-shaped bleach activators of formula (I) in which: R?1¿ represents -H, -CH¿3?, a C¿2-24? alkyl radical or alkenyl radical, a substituted C¿2-2...  
WO/2003/048286A2
The invention relates to highly soluble surfactant granulates with varying bulk densities and excellent solubility profile that comprise the neutralized form of an anionic surfactant acid and sodium carbonate and sodium hydrogen-carbonat...  
WO/2003/048289A1
The aim of the invention is to improve a method for producing bleach activator granules whereby obtaining granules that are more stable in storage and more pourable. This is achieved, in essence, by the following steps: a) preparing an a...  
WO/2003/046119A1
The invention concerns solid shaped detergent compositions comprising 0.5-95% by weight detergent active and 0-90% by weight of inorganic particulates and/or other conventional ingredients and wherein the external surface of said shaped ...  
WO/2003/044149A1
A process of cleaning a substrate, the process comprising the steps of contacting a substrate with a composition comprising at least two liquids mutually presenting a liquid-liquid interface with an interfacial tension of at least 5 mN/m...  
WO/2003/044146A1
An aqueous wheel and&sol or tire cleaning solution for removing the dirt from the surface of aluminum, chrome, stainless steel, painted steel, painted aluminum, clear coated aluminum, rubber, and plastic wheels and tires without scrubbin...  
WO/2003/044257A1
The present invention relates to a washing machine in which a composition is used comprising at least one liquid-liquid interface, with an interfacial tension of at least 5 mN/m. The washing machine comprises a heatable wash drum, means ...  
WO/2003/042762A1
The present invention relates to a thinner composition for removing resist used in TFT−LCD manufacturing processes, and more particularly to a thinner composition for removing resist that comprises : a) 0.1 to 5wt% of an inorganic alka...  
WO/2003/041747A1
A method of sterilising medical instruments is disclosed comprising the steps of soaking the instruments in an alkaline solution containing a repellent; and subsequently rinsing the instruments to remove all traces of the solution theref...  

Matches 1,001 - 1,050 out of 3,902