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Matches 1 - 50 out of 5,562

Document Document Title
WO/2017/218238A1
An antimicrobial article includes a first surface and an opposing second surface. The antimicrobial core is formed from an antimicrobial alloy comprising greater than 60% by volume molybdenum such that the antimicrobial alloy is configur...  
WO/2017/212731A1
A method for manufacturing an electrode material, comprising molding and sintering a powder mixture of a solid solution powder of Cr and a heat-resistant element including Cr and a heat-resistant element (Mo, W, Ta, Nb, V, Zr, or the lik...  
WO/2017/175605A1
The present invention provides: a tungsten-containing metal production method that includes simple steps and that enables lowering of impurities content; and a tungsten-containing metal. A tungsten-containing raw material, silicon and/or...  
WO/2017/168806A1
A Cr-based two-phase alloy product according to the present invention is a product in which a Cr-based two-phase alloy in which two phases including a ferrite phase and an austenite phase are mixed is used, the Cr-based two-phase alloy p...  
WO/2017/168640A1
The purpose of the present invention is to provide a product obtained using a low cost chromium-based two-phase alloy having high corrosion resistance and good mechanical characteristics at levels not lower than the prior art, and to pro...  
WO/2017/168972A1
Provided are: a low cost Cr-based two-phase alloy having corrosion resistance at least as high and mechanical properties at least as good as conventional technology; and a product using said two-phase alloy. This Cr-based two-phase alloy...  
WO/2017/169056A1
The purpose of the present invention is to provide a two-phase alloy having Cr, which is inexpensive, as the main component thereof and having excellent corrosion resistance, strength characteristics including toughness, and abrasion res...  
WO/2017/164301A1
Provided is a sputtering target which comprises 0.1-30 at% of Ta with the remainder being Ti and unavoidable impurities, characterized in that the oxygen content is 400 wtppm or less. Due to low oxygen content and low hardness, the prese...  
WO/2017/140832A1
A process (100) for producing at least one molybdenum-containing unit is disclosed. The process (100) comprises providing (110) at least a molybdenum-containing powder and a carbon-containing powder. An intermediate process product in th...  
WO/2017/132286A1
Disclosed herein, in certain embodiments, are composite materials, methods, tools and abrasive materials comprising a tungsten-based metal composition and an alloy. In some cases, the composite materials or material are resistant to oxid...  
WO/2017/131224A1
The invention according to the present application pertains to a cobalt-free heat-resistant sintering material (A) having superior high-temperature wear resistance and high-temperature strength, and comprising a ferrous alloy base (1) an...  
WO/2017/110813A1
The present invention addresses the problem of providing a high-hardness high-toughness alloy powder that can be used in hard particles for sintering, a hard friction powder, a raw material powder for a high-hardness powder metallurgy ma...  
WO/2017/105488A1
Refractory metal alloy targets for reducing particles in physical vapor deposition processing and refractory metal-based layers for integrated circuit applications (for example, as crystallization barrier layers in non-volatile memory de...  
WO/2017/100257A1
A metal device that is at least partially formed of a novel copper and tungsten alloy.  
WO/2017/093700A1
Method for assembling a first part and a second part by brazing, the face to be assembled of the first part being made from a first metal and the face to be assembled of the second part being made from a second metal or ceramic, the meth...  
WO/2017/086250A1
[Problem] To provide an electrode material for a fuel cell used as a fuel electrode catalyst layer or an air electrode catalyst layer in which a platinum-group element is not used, and a method for manufacturing the electrode material. [...  
WO/2017/084899A1
A thermoelectric generator includes a hot side heat exchanger, a cold side heat exchanger, a plurality of n-type semiconductor legs arranged between the hot side heat exchanger and the cold side heat exchanger, and a plurality of p-type ...  
WO/2017/078945A1
Methods of making Ta, Nb, and Ta/Nb sputter targets and targets produced thereby. The improved targets comprise a mixed {100}/{111} texture wherein the % volume of {100} texture is increased over prior art methods and a % volume {111} te...  
WO/2017/073487A1
This sputtering target comprises a substrate and a target material formed on the surface of the substrate. The target material has a composition comprising a metal element M within a range of 8-66 at.% and a remainder of Si and unavoidab...  
WO/2017/037851A1
The purpose of the present invention is to provide a low-cost Cr-based two-phase alloy which is a metal material suitable for applications in a highly corrosive environment and in a temperature range of oil wells or the like, and which h...  
WO/2017/032825A1
The invention relates to a vanadium alloy having between 2 - 35 At. % silicon and 3 - 50 At.% boron which is also resistant to oxidation even at high temperatures, and in particular is suitable for producing components which are subjecte...  
WO/2017/026509A1
The present invention is an electrode material used as an electrode contact for a vacuum interrupter, the electrode material containing heat-resistant elements at a weight ratio of 1 or more with respect to Cr 1, the remainder being Cu a...  
WO/2017/018402A1
The present invention provides a target material which suppresses contamination of a gate electrode during sputtering and which is used to form a gate electrode capable of achieving stable TFT characteristics. This target material contai...  
WO/2017/002851A1
The purpose of the present invention is to provide a sintered alloy having high mechanical strength (particularly high toughness suitable for a sputtering target material) and a sputtering target material which includes the sintered allo...  
WO/2016/188696A1
Components having a certain fiber matrix structure can be obtained by using a specific molybdenum-silicon-boron alloy and carrying out a certain production method. Said components can be used in high-temperature applications and can be p...  
WO/2016/189612A1
Provided are: a niobium silicide-based composite material which achieves a good balance between toughness and mechanical characteristics in an ultra-high temperature range (at 1,200°C or higher) at high levels; a high-temperature compon...  
WO/2016/190159A1
When backscattered electron diffraction is used to observe the normal direction ND of the rolling surface, i.e. a cross section orthogonal to the sputtering surface of the target, this tantalum sputtering target has an area ratio of crys...  
WO/2016/190160A1
When backscattered electron diffraction is used to observe the normal direction ND of the rolling surface, i.e. a cross section orthogonal to the sputtering surface of the target, this tantalum sputtering target has an area ratio of crys...  
WO/2016/178388A1
The present invention is a method for producing an electrode material containing Cu, Cr, and a heat-resistant element. A heat-resistant element powder and a Cr powder are mixed in a ratio such that the heat-resistant element < Cr in term...  
WO/2016/167304A1
[Problem] To provide a plated steel sheet having excellent heat resistance and productivity, and a method for manufacturing the same. [Solution] According to one aspect of the present invention, there is provided a plated steel sheet, ch...  
WO/2016/164269A1
Methods for making Ta sputter targets and sputter targets made thereby. Ta ingots are compressed along at least two of the x, y, and z dimensions and then cross rolled in at least one of those dimensions. A pair of target blanks is then ...  
WO/2016/152780A1
A starting material powder comprising particles of W, or a starting material powder blended from a powder of W particles and one or more powders of alloy component particles selected from the group consisting of Ti, Zr, Hf, V, Nb, Ta, Cr...  
WO/2016/134000A1
In various embodiments, apparatuses for receiving and supporting one or more components during processing thereof at process temperatures greater than approximately 1000°C feature refractory metal shelves separated by refractory metal s...  
WO/2016/129449A1
Provided are: a Cr-Ti alloy sputtering target material, which is capable of suppressing the generation of fine particles during sputtering; and a method for producing this Cr-Ti alloy sputtering target material. A Cr-Ti alloy sputtering ...  
WO/2016/118879A1
A functionally graded carbide body (400) can include a group 5 metal carbide substrate having a bulk composition region (410) that contains at least 70 wt% of a rhombohedral ζ-phase carbide. A γ-phase-rich region (420) having a γ-phas...  
WO/2016/115026A3
Sputtering targets including molybdenum, niobium and tantalum are found to be useful for sputtering films for electronic devices. Sputtering targets with about 88 to 97 weight percent molybdenum show improved performance, particularly wi...  
WO/2016/115026A2
Sputtering targets including molybdenum, niobium and tantalum are found to be useful for sputtering films for electronic devices. Sputtering targets with about 88 to 97 weight percent molybdenum show improved performance, particularly wi...  
WO/2016/115026A9
Sputtering targets including molybdenum, niobium and tantalum are found to be useful for sputtering films for electronic devices. Sputtering targets with about 88 to 97 weight percent molybdenum show improved performance, particularly wi...  
WO/2016/101156A1
Disclosed is a ceramic steel material, which comprises a ceramic phase and a metallic phase. The ceramic phase is a boride of Fe, Co and Ni and any one or more of metallic elements of the fourth, fifth and sixth periods of Groups IVB, VB...  
WO/2016/093067A1
An electrode structure wherein an electrode layer, a barrier layer, a first metal layer and a second metal layer are sequentially formed on a semiconductor substrate. This electrode structure comprises a wire electrode that is joined to ...  
WO/2016/084738A1
Provided are a highly wear-resistant cBN sintered compact, and a highly wear-resistant cutting tool using the same. A cBN sintered compact 1 containing 50 vol% or more of cBN particles 2, and a bonded phase 4 including Co, bonded-phase i...  
WO/2016/064985A1
BCC metal hydride alloys historically have limited electrochemical capabilities. Provided are a new examples of these alloys useful as electrode active materials. BCC metal hydride alloys provided include a pressure plateau in the desorp...  
WO/2016/061721A1
A method for preparing a rare-earth oxide dispersion strengthened fine-grained tungsten material, comprising: according to a condition that a mass percentage of rare-earth oxide is 0.1-2%, and the remaining composition is W, weighing sol...  
WO/2016/056441A1
 This W-Ti sputtering target has a composition containing Ti in a range of 5% by mass to 20% by mass and Fe in a range of 25 ppm by mass to 100 ppm by mass, the remainder comprising W and unavoidable impurities, and satisfies the relat...  
WO/2016/052371A1
Provided is a master alloy for a sputtering target, such master alloy being characterized in that, if the elements constituting the master alloy are X1, X2, Y1, Y2, and Y3 as defined hereinafter, the master alloy comprises any one combin...  
WO/2016/052445A1
The purpose of the present invention is to provide a two-phase alloy which is a metallic material suitable even for use in highly corrosive environments with a temperature range as in oil wells and which has high corrosive resistance equ...  
WO/2016/052380A1
Provided is a sputtering target, characterized by containing 0.01-0.5 wt% of Ag, with the remainder being W and unavoidable impurities. The purpose of the present invention is to provide a sputtering target with which it is possible to f...  
WO/2016/039154A1
An electrode material comprising a sintered body containing a heat-resistant element and Cr infiltrated with a highly conductive metal. A powder mixture of a heat-resistant element powder and a Cr powder is calcined beforehand to cause s...  
WO/2016/025968A1
The invention relates to a metallization for a thin film component and to a method for producing a metallization. The invention further relates to a sputtering target made of a Mo-based alloy, containing Al and Ti and the usual impuritie...  
WO/2016/024947A1
A method to make capacitor grade powder includes the use of a spray dryer that includes a rotating atomizer disk to form agglomerated powder and the method further includes a heat treatment step. The capacitor grade powder is preferably ...  

Matches 1 - 50 out of 5,562