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WO/2022/239009A9 |
This invention provides a process for the preparation of aluminum scandium nitride films. This invention further provides aluminum scandium nitride films and layers, and devices and systems comprising aluminum scandium nitride films.
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WO/2023/020461A1 |
Provided is a semiconductor process apparatus, comprising a first chamber (100), a second chamber (200), and a third chamber (300), wherein the first chamber (100) is connected to and in communication with the second chamber (200); the t...
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WO/2023/022230A1 |
A coated tool according to the present invention comprises a base material and a hard coating film on the base material. The hard coating film has a face-centered cubic lattice structure and is formed of a nitride or a carbonitride conta...
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WO/2023/020709A1 |
A method of depositing material includes sputtering from a first rotary target having a first magnet assembly having a first plasma confinement and with an aperture plate and sputtering simultaneously from a second rotary target having a...
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WO/2023/020874A1 |
The invention relates to a flat steel product comprising a steel substrate with an anti-corrosion coating of zinc or a zinc alloy provided on at least one side of the steel substrate. The anti-corrosion coating has zinc nanocrystals (19)...
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WO/2023/019549A1 |
Provided are a self-lubricating coated hob cutter for band saw blade milling teeth, a preparation method therefor, and an application thereof. The coated hob cutter comprises a cutter base, and also comprises a nitride bonding layer and ...
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WO/2023/022849A1 |
A method of forming a metal superlattice structure includes depositing, on a substrate, a layer of a first metal with face-centered-cubic (fcc) crystal structure. The method further includes depositing a layer of ruthenium (Ru) metal wit...
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WO/2023/018758A1 |
Sputtering machines and substrate holders for such systems are described which include one or more magnets apart from the magnets typical of sputtering guns. The added magnets produce a magnetic field bias which is a new means for contro...
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WO/2023/018600A1 |
A method and apparatus for thermal evaporation are provided. The thermal evaporator includes a flat crucible design, which provides an increased surface area for evaporation of the material to be deposited relative to conventional design...
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WO/2023/019068A1 |
A substrate preparation chamber is described herein. The substrate preparation chamber comprises an enclosure, a rotatable substrate support disposed within the enclosure, and an atmosphere replacement system coupled to the enclosure. Th...
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WO/2023/017667A1 |
This sputtering target is formed from multiple structural members including a target and a substrate. The multiple structural members include a first structural member and a second structural member that are layered together. The first s...
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WO/2023/018419A1 |
An apparatus includes a wall defining a boundary of an evacuated space and having a first side interior to the evacuated space and a second side exterior to the evacuated space, a first plate positioned on a first side of the wall and in...
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WO/2023/011509A1 |
Disclosed in the present application is a magnetron sputtering apparatus, comprising: a process chamber; a target material arranged at the top in the process chamber; a carrying base for carrying a wafer, the carrying base being arranged...
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WO/2023/010893A1 |
Embodiments of the present application provide a support bar and a web tensioning method. A first aspect of embodiments of the present application provides a support bar, the support bar comprising a support section and a precut section,...
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WO/2023/012345A1 |
Cooling device, layer deposition apparatus and method for cooling a cooling element. Therein, the cooling device comprises a cooling element having a cooling duct with an inlet and an outlet. With the inlet a compressed gas supply is con...
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WO/2023/011733A1 |
The present invention relates to a method of operating an evaporation system (30), in particular a thermal laser evaporation system (30), for a deposition of source material (32) onto a substrate (36), the system (30) comprising a reacti...
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WO/2023/011782A1 |
The invention relates to a coating plant (1) for coating an object (2), for example a steel strip. The coating plant (1) comprises: - a coating chamber (4) and - a device for chemical vapor deposition of material (6), comprising an evapo...
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WO/2023/013816A1 |
The present embodiment comprises: a crucible having a deposition space in which a deposition material is accommodated and elongated in the left-and-right direction; a heater for heating the crucible along the outer periphery of the cruci...
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WO/2023/013703A1 |
A thermoelectric conversion element 1a comprises a substrate 10 and magnetic bodies 21. The magnetic bodies 21 are disposed on the substrate 10 and are ferromagnetic or antiferromagnetic. The ratio of the measured density of the magnetic...
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WO/2023/011732A1 |
The present invention relates to an optical element (10) for use with a reaction chamber (70), in particular a reaction chamber (70) of a thermal laser evaporation system, the reaction chamber (70) having a chamber wall (72), with a flan...
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WO/2023/006198A1 |
The present invention relates to an apparatus (100) for a thermal evaporation system (200) and to a thermal evaporation system (200), respectively, for coating a coating region (58) on a front surface (56) of a substrate (50) with a sour...
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WO/2023/008188A1 |
The coated tool according to the present disclosure has: a base made of a WC-based cemented carbide containing WC particles as a hard phase component and Co as the main component of a binding phase; a coating layer located on the base; a...
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WO/2023/004752A1 |
Provided are a periodic multi-layer structure coating band saw blade, and a preparation method therefor. The periodic multi-layer structure coating band saw blade comprises a band saw blade base body and a CrN bonding layer, a CrN/AlCrN ...
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WO/2023/008301A1 |
Provided are: an optical laminate that is capable of preventing abnormal discharge to a marker layer for displaying a defect location, and of marking the defect location using few steps and at low cost; and a method for producing the opt...
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WO/2023/006197A1 |
The present invention is related to a method of coating a coating region (58) on a front surface (56) of a substrate (50) with a source material (40) thermally evaporated and/or sublimated from a source (30) by electromagnetic radiation ...
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WO/2023/008134A1 |
A coated tool according to the present disclosure includes a substrate and a coating layer located on the substrate. The coating layer includes a second coating layer containing Ti, Si, and N. Of the metallic elements contained in the se...
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WO/2023/008189A1 |
A coated tool according to the present disclosure comprises a base material, and a coating layer that is positioned on the base material. The coating layer comprises a first coating layer that contains Al, Cr, Si and N. The first coating...
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WO/2023/008131A1 |
In a coating tool according to the present disclosure, a coating layer contains a cubic crystal that comprises at least one kind of element selected from elements of groups 4a, 5a, and 6a of the periodic table, Al and Si, and at least on...
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WO/2023/005677A1 |
Disclosed in the present invention is a method for preparing a metal thin film by means of physical vapor deposition. The method comprises: step 1: placing a substrate of a thin film to be deposited on a base of a reaction chamber; step ...
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WO/2023/008559A1 |
Provided are a sputtering target and method for producing the same, whereby the generation of arcing is curbed and product yield is improved. This sputtering target is characterized in that, when observed by a laser microscope at 400x ...
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WO/2023/005755A1 |
The present invention provides a susceptor bias adjustment apparatus and method, and a semiconductor process device. The apparatus comprises a positive bias adjustment unit, a negative bias adjustment unit, and an anti-interference unit....
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WO/2023/008133A1 |
This coated tool is provided with a substrate and at least one coating layer positioned on the substrate. The coating layer contains a cubic crystal comprising at least one element selected from groups 4a, 5a and 6a in the periodic table...
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WO/2023/006060A1 |
The present application discloses a process chamber and a wafer machining method. The process chamber comprises a chamber body, a carrier, an inner liner, a first pressure ring, a second pressure ring, an ejector pin device, and a pressu...
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WO/2023/006846A1 |
The invention relates to a process for fabricating an optoelectronic device (1) comprising a substrate (20) and rod-shaped diodes (10) having a spacing ratio h/d at least equal to (1), the process comprising a step of producing a thin co...
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WO/2023/005136A1 |
The present application relates to the technical field of touch screens, and provides a neutral density filter and a preparation method and preparation device therefor. The method comprises: arranging a first target, a second target and ...
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WO/2023/008113A1 |
The coated tool according to the present disclosure has a base, and a coating layer located on the base. The coating layer contains a crystal having a cubic structure. The coating layer has a stripe structure in cross-sectional observati...
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WO/2023/008130A1 |
The coated tool according to the present disclosure has: a base comprising a WC-based cemented carbide that has WC particles as a hard-phase component and that has Co as the main component of a binder phase; and a first coating layer pos...
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WO/2023/006227A1 |
The present invention refers to a method for determining at least one optical property of at least one deposition material used for a for lithographic mask which comprises the steps: (a) determining a height value of the at least one dep...
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WO/2023/008123A1 |
Provided is a film-equipped base material that can effectively increase infrared transmittance when used in an infrared-transmitting lens. The film-equipped base material 1 has a multilayer film 3 provided on a base material 2. The mul...
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WO/2023/006660A1 |
A layered disinfecting structure comprising a first activated carbon layer and a second layer, wherein the second layer contains a metal coating between 10 nm and 20 micrometer in average thickness. The slow release of metal from the sec...
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WO/2023/005008A1 |
A low-dielectric constant high-entropy film and a preparation method therefor, the low-dielectric constant high-entropy film comprising: a SrTiO3 substrate, a La0.7Sr0.3MnO3 buffer layer disposed on the surface of the SrTiO3 substrate, a...
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WO/2023/007935A1 |
A coated tool according to the present disclosure comprises a base, and a coating layer placed on the base. The coating layer contains a crystal having a cubic structure. The coating layer has a striped structure in cross-sectional obser...
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WO/2023/008435A1 |
This reflective mask blank has a substrate, a multilayer reflection film that reflects EUV light, and a phase shift film that shifts the phase of the EUV light in this order. The phase shift film is a film on which an aperture pattern is...
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WO/2023/000913A1 |
Provided are a high-conductivity corrosion-resistant graphite-like carbon protective multilayer composite coating, a preparation method therefor, and an application thereof. The multilayer composite coating comprises a chromium-iridium t...
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WO/2023/001829A1 |
The invention relates to a component with a part (1) which is made of steel, said part being at least partly coated with a nickel diffusion layer (10), and the layer thickness of the nickel diffusion layer (10) equals 1 – 500 µm. The ...
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WO/2023/001992A1 |
The invention relates to a method for obtaining a nanostructured layer of titanium nitride by deposition by cathode sputtering of a substrate at ambient temperature, characterised in that it comprises: - a first step of reactive cathode ...
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WO/2023/001016A1 |
A semiconductor process chamber, comprising a chamber body (100), a shielding assembly (1), a connecting sleeve (2), a grounding assembly (3), and a bearing apparatus (4). The bearing apparatus (4) comprises a liftable base (41) and a de...
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WO/2023/003285A1 |
The present invention relates to a method for setting the size of a frame used for a frame-integrated mask, a strain reduction method, and a frame. More specifically, provided are a method for setting the size of a frame, a strain reduct...
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WO/2023/003286A1 |
The present invention relates to a method for reducing a deformation amount of a mask cell sheet part, a frame-integrated mask, and a method for manufacturing the frame-integrated mask. More particularly, the present invention relates to...
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WO/2023/001137A1 |
The present invention belongs to the technical field of OLEDs, and particularly relates to a silver-based alloy, a preparation method therefor, a silver alloy composite thin film and the use thereof. The silver-based alloy provided in th...
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