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WO/2024/016182A1 |
A method for surface modification, comprising the following steps: a) providing a first substrate comprising a metal material; b) forming a colored precursor layer on the first substrate by means of vapor deposition, such that the colore...
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WO/2024/017553A1 |
A method for manufacturing an edge emitting semiconductor laser diode comprising the following steps is provided: - providing an edge emitting semiconductor body (2) configured for generating electromagnetic laser radiation during operat...
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WO/2024/017119A1 |
The present invention discloses a target palladium membrane selection method, a hydrogen-related reaction execution method, and an osmosis diffusion rate determination method and system. The selection method comprises: according to a tar...
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WO/2024/018686A1 |
A film according to the preset invention, which protects a ceramic-based composite material from a high-temperature environment that contains sand and dust, is provided with an upper layer on at least one side that is exposed to the envi...
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WO/2024/019169A1 |
Provided are: a base film which has high heat resistance, flexibility, and dimensional stability and is used for providing a vapor deposition layer on at least one surface thereof; and a vapor deposition film comprising said base film an...
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WO/2024/019920A1 |
A spacing guide for use on a dark space shield of a sputtering chamber includes a horizontal body having a first end, a second end opposite the first end and a thickness, the horizontal body configured to rest on an end of the dark space...
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WO/2024/011678A1 |
The present disclosure relates to a magnetic control assembly, a physical vapor deposition apparatus and method, and a control apparatus. The magnetic control assembly (310) is connected to a back plate (321) of a reaction chamber (320),...
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WO/2024/014528A1 |
This method for manufacturing an electronic device comprises: a preparation step for preparing a first laminate, which includes a first surface and a second surface positioned on the side opposite to the first surface, the first laminate...
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WO/2024/012550A1 |
The present invention relates to the technical field of batteries, and in particular to an aluminum composite current collector and a preparation method therefor, a positive electrode plate, a battery, and an electric device. The prepara...
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WO/2024/012225A1 |
The present application provides a silver alloy and a preparation method therefor, a conductive film, and a display device. The silver alloy comprises silver, a first doping substance, and a second doping substance' the first doping subs...
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WO/2024/011538A1 |
The present invention relates to the technical field of batteries, in particular to an aluminum composite current collector, a preparation method therefor, a positive electrode sheet, a battery and an electric apparatus. The preparation ...
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WO/2024/014156A1 |
This Co-Cr-Pt-oxide-based sputtering target comprises 50 at% or more of Co, more than 0 at% and 20 at% or less of Cr, and more than 0 at% and 25 at% or less of Pt, with the remainder made up of one or more oxides and unavoidable impuriti...
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WO/2024/014069A1 |
Provided are a palladium cobalt oxide target, a delafossite-type oxide target, and a method for producing a palladium cobalt oxide target. The palladium cobalt oxide target has a compactness of 60-80%, the compactness being calculated on...
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WO/2024/013620A1 |
The present invention relates to method for manufacturing a paperboard based packaging laminate, said method comprising: a) providing a paperboard base layer, b) providing a vacuum coated film layer, c) applying an adhesive composition t...
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WO/2024/011752A1 |
The present application relates to an evaporation device, an evaporation system, and an evaporation method. The evaporation device comprises: a base having an evaporation cavity, the evaporation cavity comprising a first evaporation area...
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WO/2024/014207A1 |
The present invention addresses the problem of providing a reflection-type mask blank for which machining error is small when machining by charged particle radiation is carried out. A reflection-type mask blank (10a) includes, in the g...
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WO/2024/013227A1 |
The present invention relates to a method of preparing a perovskite structure on a substrate surface wherein the perovskite has a general structure of ABX3 where A is at least partly an organic compound and where the method uses a source...
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WO/2024/014068A1 |
Provided are: a palladium cobalt oxide thin film; a delafossite-type oxide thin film; a schottky electrode having a delafossite-type oxide thin film; a method for producing a palladium cobalt oxide thin film; and a method for producing a...
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WO/2024/012820A1 |
The invention relates to a lens element for a microlithographic projection exposure apparatus designed for operation in the DUV, and a method and an arrangement for forming an antireflection layer. In accordance with one aspect, in the c...
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WO/2024/011536A1 |
The present invention relates to the field of lithium ion batteries, and specifically to a copper composite current collector, a preparation method therefor and an application thereof. The preparation method for a copper composite curren...
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WO/2024/011535A1 |
The present invention relates to the technical field of batteries, and particularly relates to an aluminum composite current collector, a preparation method therefor, and the use thereof. The preparation method for the aluminum composite...
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WO/2024/010939A1 |
Apparatus for processing a semiconductor substrate are described herein. The apparatus include an electrostatic chuck within a physical vapor deposition process chamber. The electrostatic chuck is covered by a cover plate and has an edge...
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WO/2024/009809A1 |
This reflective mask blank has, in the following order, a substrate, a multilayer reflective film that reflects EUV light, a protective film that protects the multilayer reflective film, and a phase shift film that shifts the phase of th...
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WO/2024/010126A1 |
A linear evaporation source may comprise: a plurality of partition walls that are accommodated in a deposition space of a crucible, spaced apart from each other in the left and right directions, and divide the deposition space into a plu...
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WO/2024/008903A1 |
The invention relates to a coated substrate, preferably coated tool for use in manufacturing processes, such as machining processes or forming processes, comprising a coated surface, said coated surface formed by a substrate surface made...
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WO/2024/009125A1 |
A vapor source (50) for depositing an evaporated material on a substrate is provided. The vapor source includes a vapor distribution pipe (60) with a plurality of nozzles, wherein at least one nozzle (100) of the plurality of nozzles inc...
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WO/2024/008038A1 |
The present application relates to an apparatus for lithium supplementation by evaporation deposition. The apparatus for lithium supplementation by evaporation deposition comprises: a vacuum oven provided with a vacuum chamber; a winding...
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WO/2023/206084A9 |
The present disclosure relates to a mask, a display panel and a display device. By means of providing a universal first opening (121) in a mask main body (12) and matching a sheet (13) which is provided with different kinds of second ope...
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WO/2024/009229A1 |
The invention relates to the technique of vacuum deposition of metal and ceramic coatings, in particular to a device for high-rate magnetron sputtering, and can be used in the manufacture of products with coatings of metals, glass, polym...
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WO/2024/008618A1 |
The present invention relates to a moulding comprising: (a.) at least one plastic substrate which has a surface texture having a depth of 0.005 to 0.2 mm; and (b.) a metal coating which is applied to the plastic substrate by means of a t...
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WO/2024/007601A1 |
The present disclosure discloses a solar cell preparation method, comprising the following steps: providing a coating carrier plate; and placing, on the coating carrier plate, a substrate to be used to prepare a solar cell, and depositin...
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WO/2024/010591A1 |
An alignment mechanism for aligning a substrate in a vacuum chamber is provided. The alignment mechanism includes an actuator configured to be coupled to a chamber wall of the vacuum chamber, and a lever pivotably provided on a first piv...
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WO/2024/010982A1 |
Provided is a vacuum seal and seal system including a corresponding isolation ring and a corresponding sputtering target. The seal and seal system may be used in PVD sputter applications. The seal may include a compressible portion and a...
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WO/2024/006828A1 |
Technologies for reducing surface oxidation in molecular beam epitaxy (MBE) systems include an effusion cell having a conical crucible and an endplate. The conical crucible is configured to receive a source material, and the endplate is ...
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WO/2024/004326A1 |
Provided is an alignment device that is characterized by comprising: an image-capturing means that captures an edge image including an edge of a substrate 200 held by a holding means 100; an edge detection means that sets a detection reg...
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WO/2024/003604A1 |
A mask module configured to be coupled to a substrate carrier is described. The mask module includes a body; a mask coupled to the body, the mask having one or more first openings; a movable shutter, the movable shutter having one or mor...
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WO/2024/004226A1 |
A method for producing a transparent electroconductive film (3), in which a transparent electroconductive layer (2) is formed on one thickness-direction surface of a continuous substrate (1). The method for producing a transparent electr...
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WO/2024/005038A1 |
[Problem] The present invention addresses the problem of improving the adhesion between a first layer and a second layer in a substrate with a multilayer reflective film, the substrate having a protective film that comprises the first la...
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WO/2024/000569A1 |
Device for evaporation(100) of a coating material comprising a first material reservoir(10), a first pressure-and temperature-sealing metering device(11), a first transportation section(12), a second material reservoir(13), a second pres...
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WO/2024/004554A1 |
The present invention provides a tungsten target and a method for manufacturing the same that suppresses the occurrence of particle-causing pores, controlling the size and distribution thereof to high precision. The tungsten target is fo...
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WO/2024/000803A1 |
The present invention relates to a preparation method for a composite current collector, and a composite current collector. The preparation method for a composite current collector comprises the following steps: ionizing metal nickel to ...
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WO/2024/000893A1 |
The present application provides a mask, and a mask manufacturing method. The mask comprises a frame body, a plurality of first supporting strips, a plurality of shielding strips, and a plurality of mask strips; the first supporting stri...
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WO/2024/004501A1 |
In an embodiment, this film forming method comprises a first film forming step for forming a first film formed from an organic material on a substrate by using a mask and a second film forming step for forming a second film formed from a...
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WO/2024/004873A1 |
A coated cutting tool according to an embodiment of the present invention comprises a base material and a hard film formed on the base material. The hard film is a nitride in which, with respect to the total amount of metal elements (inc...
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WO/2024/003445A1 |
A method for forming a barrier deposit within a substrate comprising defects is disclosed. The method comprises introducing the substrate into a reaction space, wherein: - the substrate contains water and/or is exposed to water, and simu...
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WO/2024/006298A1 |
A method for reducing a wet etch rate of flowable chemical vapor deposition (FCVD) oxide layers in a semiconductor wafer, the method including performing a plasma doping operation on the semiconductor wafer using a primary dopant gas and...
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WO/2024/004502A1 |
This electronic device manufacturing method comprises: a first mask forming step for forming a first mask that is patterned by means of photolithography; a first film forming step for using the first mask to form a first light-emitting l...
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WO/2024/002713A1 |
The present invention relates to a method for producing a carbon coating on a metal substrate, the metal substrate being chosen from the group consisting of stainless steel, carbon steel, galvanised steel, copper and aluminium, which met...
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WO/2024/004600A1 |
The present invention addresses the problem of providing: a method for producing a laminate having excellent wear resistance; and a method for producing an eyewear lens. The method for producing a laminate according to the present invent...
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WO/2024/003603A1 |
A substrate processing system for processing of a plurality of substrates is described. The substrate processing system includes one or more vacuum chambers; at least a first deposition source and a second deposition source provided in t...
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