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WO/2023/225241A1 |
A razor blade with a substrate having a tip portion. A hard coating layer is deposited on the substrate. A non-fluorinated organic material is deposited in one or more monolayers on an outer bonding surface of the hard coating. The hard ...
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WO/2023/224437A1 |
The apparatus for manufacturing an organic light-emitting display device comprises a first deposition chamber, a second deposition chamber and a third deposition chamber. The first deposition chamber comprises a first evaporation source ...
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WO/2023/221572A1 |
The present invention relates to a coating system, comprising a vacuum chamber and a rotary tool disposed in the vacuum chamber. The rotary tool comprises a rotatably mounted rotary component, a first driving module, a second driving mod...
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WO/2023/221417A1 |
The present invention discloses a high-purity multi-element alloy sputter coating material for an advanced generation high-definition liquid crystal display, consisting of Mo, Ti, Ni, Cu and inevitable trace impurity elements, the conten...
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WO/2023/222198A1 |
A carrier (100) for holding a substrate (10) in a curved state is provided. The carrier (100) comprises a carrier body (110) having a curved substrate support surface (111), a sealing (120) for providing a sealing between an edge of the ...
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WO/2023/224084A1 |
Provided is at least any of a metallic material which includes a metal having a body-centered cubic structure and is suitable for use as a sputtering target, a method for producing the metallic material, a sputtering target including the...
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WO/2023/224026A1 |
Provided are: a rigid-film-coated object having hydrogen embrittlement resistance and wear resistance and having excellent unsusceptibility to separation; and a machine component and a bearing which include the rigid-film-coated object. ...
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WO/2023/216863A1 |
Disclosed in the present application are a sputtering method and a sputtering device for performing magnetron sputtering on a rotary target material. The sputtering method comprises: acquiring, online, morphology information of a target ...
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WO/2023/217406A1 |
According to the present invention a non-hydrogenated amorphous carbon coating such as an a-C and/or ta-C coating on a surface of a sliding part is disclosed, wherein the sliding part is foreseen for use under lubricated conditions and o...
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WO/2023/220455A1 |
A tray assembly comprises a plurality of trays. Each of the plurality of trays comprises a first tray portion and a second tray portion which are couplable together by a retainer and which are engageable with a cam member. Depending on t...
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WO/2023/218840A1 |
Provided is a gallium nitride film formation method comprising disposing a substrate in a vacuum chamber so as to be opposite from a target including nitrogen and gallium, heating the substrate, supplying a sputtering gas to the vacuum c...
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WO/2023/216313A1 |
An evaporation source apparatus, comprising a vacuum chamber (10), and a base (20), at least one vacuum box (30) and at least one control valve (40) located in the vacuum chamber (10). The at least one vacuum box (30) is arranged on the ...
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WO/2023/216407A1 |
A preparation method for a graphene/copper composite material combining physical vapor deposition (PVD) and chemical vapor deposition (CVD). According to the method, a layer of graphene material is deposited on the surface of a copper fo...
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WO/2023/216521A1 |
The embodiments of the present invention disclose a surface modification method for degradable pure magnesium or a degradable magnesium alloy, and a pure magnesium or magnesium alloy material, so as to solve the technical problems whereb...
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WO/2023/216413A1 |
A preparation method for a micromirror using an electrostatic-driven MEMS comb tooth structure. Insulating layers (01) are provided on the surfaces of comb teeth of the electrostatic-driven MEMS comb tooth structure, and the insulating l...
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WO/2023/214513A1 |
This method for producing a crystalline indium oxide semiconductor film has: a step for forming an indium oxide film via sputtering film deposition by sputtering a sputtering target with metal indium being a principal component thereof i...
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WO/2023/214005A1 |
The present disclosure relates to a device for vacuum deposition systems, comprising: a movable main body, at least one deposition source mounted on the movable main body, at least one coating window associated with the at least one depo...
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WO/2023/213189A1 |
Provided in the embodiments of the present application are a semiconductor process device and a method for forming a stacked film structure. The method for forming a stacked film structure comprises: a first sputtering step, involving: t...
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WO/2023/213720A1 |
The present invention relates to a process for obtaining perovskite thin films from powders of inorganic and organic materials by vapour deposition, characterized in that the crucible used to heat the powders is pre-heated above their su...
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WO/2023/215529A1 |
A system and associated method are described. The system includes a controlled power supply for generating electrical pulses for a plasma discharge source. The controlled power supply includes an output pulse rail, a direct current power...
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WO/2023/208249A1 |
A preparation method for a molybdenum alloy tube target material, a molybdenum alloy tube target material, and an application, which belong to the technical field of powder metallurgy. The target material is prepared from raw material po...
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WO/2023/211160A1 |
The present invention relates to an electromagnetic wave shielding material and to a method for manufacturing same, the shielding material comprising: a base material; and a Zn-NiCr shielding layer coated on the surface of the base mater...
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WO/2023/209241A1 |
An arrangement (10) for holding substrates (SS) curved along a main extension direction is adapted to be received in a vacuum chamber (14) of a coating apparatus (12) vis-a-vis to an evaporation source (16), and comprises a hub portion (...
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WO/2023/210436A1 |
An antireflection film (10) has a transparent film base material (11), a hard coat layer (12), and an antireflection layer (13) in this order. The dimension change ratio in a first direction from before to after a heat resistance test of...
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WO/2023/209052A1 |
The invention relates to a transparent substrate provided, on one of the main surfaces thereof, with a stack of thin layers, said stack consisting of the following layers, starting from the substrate: - a first dielectric module of one o...
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WO/2023/208597A1 |
The present invention relates to a coated cutting tool comprising a substrate and a coating comprising a first, a second and a third layer, wherein i) the first layer is a (Ti, Al)N layer adhered to the substrate, said first layer having...
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WO/2023/207950A1 |
The present application discloses a magnetron apparatus and a magnetron sputtering device. The magnetron apparatus is used for acting on a target assembly to sputter particles. The magnetron apparatus comprises a first magnetron, a secon...
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WO/2023/211245A1 |
The present invention relates to silicon-coated antioxidant iron, silicon-coated antioxidant nickel, and manufacturing methods therefor. More specifically, the present invention relates to an antioxidant iron that includes a surface coat...
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WO/2023/210096A1 |
A film deposition device having an alignment means for aligning a substrate and a mask using a substrate mark provided to the substrate a mask mark provided to the mask, a bonding means for bonding the aligned substrate and mask, and a f...
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WO/2023/210606A1 |
The present invention achieves a hard coating, etc., exhibiting stable, high performance under a wide range of processing conditions. A hard coating (12) has a structure obtained by alternately laminating A layers (A1 to An) comprising A...
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WO/2023/208599A1 |
The invention relates to a wear-optimised saw blade (10), more particularly a linearly cutting saw blade (10) for a sabre saw or a compass saw, comprising a main body (12), on which at least one saw tooth (14) is arranged and/or formed. ...
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WO/2023/210464A1 |
A film deposition device according to one embodiment of the present invention deposits a film, through a mask that has one or a plurality of open regions provided in a mask foil joined to a frame-like mask frame, onto one or a plurality ...
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WO/2023/210308A1 |
A film structure (10) has a buffer film (12) formed on a substrate (11) and a metal film (13) formed on the buffer film (12). The substrate (11) is an Si (100) substrate or an SOI substrate containing an SOI layer obtained from an Si (10...
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WO/2023/204912A2 |
The present disclosure provides a method of processing a substrate within an ion beam system. The substrate has a top surface that has a plurality of features, an edge and a bottom surface. The substrate is placed on a wafer stage and an...
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WO/2023/203281A1 |
According to an aspect, there is provided a collimator for tilted c-axis thin-film deposition comprising a collimator body. The collimator body comprises an array of holes for limiting directions of deposition of particles. The collimato...
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WO/2023/204021A1 |
A compound containing at least one selected from the group consisting of polydialkylsiloxane residues and C10 or higher alkylene chains, a polyoxyalkylene chain, and a reactive silyl group; a composition and a surface treatment agent con...
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WO/2023/201766A1 |
An anti-corrosion and anti-fouling composite treatment method for the surface of an additive manufacturing metal part, comprising: 1, preparing a metal part base by using a selective laser melting method; 2, performing shot blasting trea...
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WO/2023/202793A1 |
An apparatus for coating a component. The apparatus includes a chamber. A first magnetron and a second magnetron are disposed within the chamber for supplying a coating material to a surface of the component. A component holder is dispos...
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WO/2023/204020A1 |
Provided are: a compound that contains a monovalent aromatic ring group having a substituted or unsubstituted aromatic ring having 4 to 16 carbon atoms, at least one partial structure selected from the group consisting of (A) a linear al...
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WO/2023/201841A1 |
An individual-film thickness measurement system (10) for a multi-layer film system. The measurement system (10) comprises a measurement box body (1) mounted on a substrate holder (30) inside a vacuum coating chamber (100) and capable of ...
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WO/2023/204762A1 |
An amphiphobic coating is provided. The amphiphobic coating comprises a polymeric substrate having an oxygen plasma-treated surface; a silicon dioxide layer comprising silicon dioxide nanoparticles disposed directly on the oxygen plasma-...
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WO/2023/203147A1 |
The invention relates to a coated cutting tool (1) comprising a substrate (5) and a coating (6), wherein the coating (6) comprises a from 0.5 to 15 µm monolithic layer (7) of (Ti,Al,Si)N with an average composition Ti1-x-yAlxSiyN, 5 0.5...
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WO/2023/204896A1 |
The present disclosure provides a method for increased target utilization within a sputtering system. A plurality of targets are provided wherein each target is operatively connected to a central axis. An ion beam is generated within the...
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WO/2023/204295A1 |
This light exposure method is a method for exposing a first resist layer located on a deposition mask base material to light. In the first resist layer, a region used for the formation of a single deposition mask by etching is a unit mas...
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WO/2023/197130A1 |
Disclosed are a multi-channel high-density ultra-narrow stretchable microelectrode, a method for preparing same, and use thereof. The method comprises the following steps: providing a flexible substrate comprising a stretchable area and ...
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WO/2023/199699A1 |
This substrate conveying device comprises: a series of conveyance rollers that support support surfaces of a conveyance body which holds a substrate, and that convey the conveyance body; and a measurement means for measuring changes in t...
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WO/2023/199722A1 |
An objective of the present invention is to provide an oxide semiconductor film capable of enhancing carrier mobility in a thin film transistor and stability relative to ambient temperature. An oxide semiconductor film according to one a...
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WO/2023/199668A1 |
This phase shift mask blank has: a substrate; and a first layer that is deposited on the substrate. The first layer contains zirconium (Zr), silicon (Si), and nitrogen (N). The transmittance of the first layer at a thickness at which a 1...
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WO/2023/197469A1 |
A high-conductivity corrosion-resistant amorphous/nanocrystalline composite coexisting coating, and a preparation method therefor and a use thereof. The preparation method comprises: using arc ion plating in combination with high-power i...
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WO/2023/199618A1 |
The purpose of the present invention is to provide a heat-resistant and wear-resistant coating, and a coated object coated with the coating as a tool such as a cutting tool or a die tool, etc. This coating is an AlCr oxidation-resistant ...
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