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Matches 301 - 350 out of 103,586

Document Document Title
WO/2018/180545A1
The production method for a cylindrical sputtering target according to the present invention comprises: a solder material applying step for forming a solder underlying layer on the inner peripheral surface of a sputtering target material...  
WO/2018/179556A1
[Problem] To provide an IGZO sputtering target that suppresses arcing. [Solution] Provided is an IGZO sputtering target containing In, Ga, Zn and O, wherein, in terms of atomic ratio, 0.30≤In/(In+Ga+Zn)≤0.36, 0.30≤Ga/(In+Ga+Zn)≤0...  
WO/2018/180182A1
This cylindrical sputtering target is provided with: a metallic cylindrical base material; and a ceramic cylindrical target material, which is bonded to the outer circumferential side of the cylindrical base material, and which is integr...  
WO/2018/178036A2
The invention relates to a method for determining the partial pressure or concentration of a vapour in a volume (2), a sensor surface (6) of a sensor body (5) oscillating with an oscillation frequency being kept at a temperature at which...  
WO/2018/176848A1
Disclosed are a mask plate and a manufacturing method therefor. The mask plate comprises a mask substrate (100). The mask substrate (100) comprises a mask area (110) thereon. The mask area (110) comprises an active area (120) and a dummy...  
WO/2018/175753A1
Provided herein are centrifugal evaporation sources. These sources include a manifold body, a crucible, an expansion chamber, a centrifugal separator chamber, and an effusion nozzle.  
WO/2018/174019A1
Provided is a sintered In-Cu sputtering target characterized by having a composition containing In in the range of 10-90 at.%, with the remainder being Cu and unavoidable impurities, and by having a theoretical density ratio of at least ...  
WO/2018/172211A1
The invention relates to an apparatus for separating layers from an organic material on a substrate (13), comprising a gas inlet member (7) having a heating device (31) arranged in a reactor housing (1), a steam generator (30), by means ...  
WO/2018/174049A1
Provided are: a lens with a water repellent anti-reflection film, wherein a water repellent film has improved adhesion and durability; and a method for producing this lens with a water repellent anti-reflection film. A lens with a water ...  
WO/2018/173450A1
Provided is a tungsten silicide target that allows particle generation during sputtering to be suppressed via a different method than in the prior art. The tungsten silicide target has no more than five low-density partially sintered sec...  
WO/2018/175689A1
A magnetron sputtering source for sputtering a target includes a magnetically permeable material yoke member and a first magnet positioned on said yoke member and having a north-south magnetic orientation that is perpendicular to the yok...  
WO/2018/175381A1
A fully-dense, fluid tight, low friction coating system is described that is characterized by fluid impermeability and a reduced coefficient of friction. The coating system includes a fully dense, fluid tight underlying layer; and a low ...  
WO/2018/171977A1
Disclosed is an antiabrasion-coated metal part (I; II), the tribologically affected surface of which is provided at least in part with an antiabrasive coating (1; 1', 1") that is applied using a plasma process and is in the form of a mul...  
WO/2018/173517A1
This sputtering target has a molybdenum content of 3 mol% to 25 mol% and a silicon content of 75 mol% to 97 mol%. The sputtering target comprises a silicon phase in which the average particle diameter of the silicon particles is 2.0 µm ...  
WO/2018/175182A1
A method of performing deposition of diamond-like carbon on a workpiece in a chamber includes supporting the workpiece in the chamber facing an upper electrode suspended from a ceiling of the chamber, introducing a hydrocarbon gas into t...  
WO/2018/172277A1
The invention relates to a process chamber guide, designed for linearly guiding a substrate carrier that can be displaced in the process chamber guide in a direction of guidance such that by means of displacement of the substrate carrier...  
WO/2018/166954A3
The invention relates to a device for depositing a layer, which has been structured by the application of a mask (4), on a substrate (13), comprising an adjusting device (100, 200) for adjusting the position of a mask support (6) with re...  
WO/2018/166620A1
The present disclosure provides an apparatus (100) for vacuum processing of a substrate (10). The apparatus (100) includes a first vacuum region (110), a second vacuum region (120), an opening (130) between the first vacuum region (100) ...  
WO/2018/166621A1
The present disclosure provides a deposition apparatus (100) for a vacuum deposition process. The deposition apparatus includes a vacuum chamber (130), a movable deposition source (110) arranged in the vacuum chamber, and a supply arrang...  
WO/2018/167895A1
This sputtering device is configured to form an insulating film on a substrate and is provided with: a vacuum container; an electrode which is disposed in the vacuum container, and to which an insulator target is attached; a substrate ho...  
WO/2018/168973A1
The present invention provides a surface treatment agent comprising a silane compound which contains a perfluoro(poly)ether group and a compound which includes an atom with an unshared electron pair in the molecular structure.  
WO/2018/169998A1
Disclosed herein are aluminum alloys with scandium as the alloying element. The alloys have a high scandium content, as measured by atomic percentage, and are highly uniform, as described herein. Methods of forming articles from these al...  
WO/2018/169062A1
The purpose of the present invention is to provide a metal coating for electromagnetic wave penetration having a sufficient metallic luster for appearance, and a method for forming a metal coating for electromagnetic wave penetration sui...  
WO/2018/166619A1
A material deposition arrangement (100) for depositing a material on a substrate in a vacuum deposition chamber is described. The material deposition arrangement (1 00) includes at least one material deposition source (105) having a cruc...  
WO/2018/166831A1
Known cylindrical sputtering targets comprise a substrate and a target material that forms a layer on the substrate, said layer has a thickness d, wherein the target material comprises TiOx as the main component, and x is within a range ...  
WO/2018/166616A1
A carrier (20) for use in a vacuum system is described. The carrier (20) includes: a magnet arrangement (30) including one or more first permanent magnets (32); one or more second permanent magnets (34); and a magnet device (36) configur...  
WO/2018/167170A1
A technique comprising: depositing a first layer comprising a precursor to a cross-linked polymer on a substrate comprising at least a semiconductor material that provides one or more semiconductor channels for one or more transistors, w...  
WO/2018/169250A1
A metal plate for use in manufacture of a deposition mask according to an embodiment is a multilayer metal plate having a thickness of 30µm or less and containing an alloy of nickel (Ni) and iron (Fe), and comprises: a first outer porti...  
WO/2018/168963A1
A hydrophilic vapor deposition film which is able to be formed even on a substrate having high water resistance and large curvature, a substrate having a complicated shape or a substrate that is difficult to be heated to high temperature...  
WO/2018/166637A1
A deposition system (100) for depositing evaporated material on a substrate is described. The deposition system (100) includes a vapor source (120) having one or more vapor outlets (125); a shield (110); and a cooling device (112) for co...  
WO/2018/166622A1
A method of operating a vacuum processing system (100, 200, 300) with a main transportation path (50) along which substrates can be transported in a main transportation direction (Z) is described. The method includes: (1a) routing a subs...  
WO/2018/169247A2
The present invention relates to an anode, a production method therefor, and a lithium secondary battery comprising the same, the anode comprising a lithium metal layer, a lithium nitride thin film layer formed on at least one surface of...  
WO/2018/166953A1
The invention relates to a device for separating a layer on a substrate (13), said layer being structured by placing a mask (4), having an adjustment device (100, 200) for adjusting the position of a mask carrier (6) with respect to a ca...  
WO/2018/168111A1
An Al2O3 sputtering target which is characterized by having a purity of 99.99 wt% or more, a relative density of from 85% to 95% (inclusive), a volume resistivity of 10 × 1014 Ω·cm or less and a dielectric loss tangent of 15 × 10-4 o...  
WO/2018/168972A1
The present invention provides a surface treatment agent comprising a silane compound which contains a perfluoro(poly)ether group and a compound which includes an atom with an unshared electron pair in the molecular structure.  
WO/2018/166618A1
The present disclosure provides an apparatus (100) for vacuum processing of a substrate. The apparatus (100) includes a processing vacuum chamber (110), a maintenance vacuum chamber (120), an opening (130) for transferring at least a por...  
WO/2018/167534A1
The present invention provides for an ion implanted cold sprayed hardmetal cemented carbide coating and a method to prepare the coating. The coating comprises hardmetal carbide and a binder metal M selected from nickel, cobalt, copper, i...  
WO/2018/168942A1
The purpose of the present invention is to improve uniformity of film deposition by a plasma-based sputtering device. Provided is a sputtering device 100 for depositing a film on a substrate W through sputtering of targets T by using pla...  
WO/2018/166955A1
The invention relates to a device and a method for the thermal treatment of at least one substrate (2) in a process chamber (1) of a treatment device at a regulated temperature with a heat flow from a heating element (5) heating a suscep...  
WO/2018/166954A2
The invention relates to a device for depositing a layer, which has been structured by the application of a mask (4), on a substrate (13), comprising an adjusting device (100, 200) for adjusting the position of a mask support (6) with re...  
WO/2018/169331A1
The present invention relates to a method for producing an antibacterial food packaging material containing a metal nanoparticle, and an antibacterial food packaging material produced thereby and, particularly, to a method for producing ...  
WO/2018/168244A1
Provided are: a method for producing a transparent optical film, by which a transparent optical film that comprises an extremely thin transparent silver alloy layer is efficiently produced; and a method for producing a transparent multil...  
WO/2018/164216A1
A laminate exhibiting structural color, characterized by comprising: a base layer that has a plurality of convex parts or a plurality of concave parts disposed in a substantially regular manner on the surface thereof; a first layer that ...  
WO/2018/164693A1
Processes are described herein which 3D print a ceramic fiber composite (24, 48) in a printed pattern (308) on a ceramic matrix composite (CMC) component (300) in order to define a plurality of channels (312) between adjacently deposited...  
WO/2018/163861A1
This Cu-Ni alloy sputtering target has a composition such that: Ni is contained in the range of 16 mass% to 55 mass%; the hydrogen content is less than 5 mass ppm, the oxygen content is 500 mass ppm or less, and the carbon content is 500...  
WO/2018/162231A1
The invention relates to a mirror (10) having an optically active surface (12) for reflecting electromagnetic radiation and having at least one piezoelectrically active layer (13) for the deformation of the optically active surface (12),...  
WO/2018/162385A1
The invention relates to a method for producing at least one opening (1) in a transparent or transmissive glass substrate (2), the glass substrate (2) being selectively modified along a beam axis (s) by means of electromagnetic radiation...  
WO/2018/165055A1
A method of depositing germanium on one or more substrates is disclosed. The method includes placing a source of germanium and the substrate(s) in a vapor deposition system, and heating the source of germanium in the vapor deposition sys...  
WO/2018/164155A1
The purpose of the present invention is to provide a high-purity tin product not containing undesirable carbon impurities by producing a high-purity metal vacuum-packaged product (high-purity tin vacuum-packaged product) by means of vacu...  
WO/2018/164139A1
Provided is a rolling bearing which has excellent durability. This rolling bearing (1) is provided with an inner ring (2), an outer ring (3), a plurality of rolling bodies (4) and a hard film (8). The hard film (8) is formed on the surfa...  

Matches 301 - 350 out of 103,586