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Patent Searching and Data


Matches 301 - 350 out of 103,952

Document Document Title
WO/2018/214483A1
Disclosed is an evaporation device. The evaporation device comprises a workbench (900), an evaporation source (110) on the workbench, an inner layer plate (120) located on at least one side of the evaporation source (110) and fixedly con...  
WO/2018/214515A1
A support plate (10) for a vapor deposition device comprises: a substrate (1) comprising a groove (2) on one side of a surface of the substrate (1) for supporting a component to undergo vapor-deposition (20); and a cooling component (3) ...  
WO/2018/215413A1
The method relates to a process for preparing a nanomesh metal membrane (5) transferable onto a very wide variety of supports of different types and shapes, comprising at least one step of de-alloying (1) a thin layer (6) of a metal allo...  
WO/2018/214514A1
A metal mask strip fixing device and a metal mask preparation device comprising the metal mask strip fixing device are provided. The metal mask strip fixing device comprises a fixing device body (22), the fixing device body (22) comprise...  
WO/2018/215274A1
A feedback system (210) for controlling properties of a single layer or multiple layer stack being applied on a substrate (10) by means of a vacuum coating process controlled by a plurality of process controlling means, comprises - at le...  
WO/2018/210408A1
An apparatus (100) for processing a substrate is described. The apparatus includes a first vacuum processing arrangement (101), a second vacuum processing arrangement (102), and a support structure (103) arranged in an atmospheric space ...  
WO/2018/212481A1
The present invention relates to a method for manufacturing an anode for a lithium secondary battery comprising a patterned lithium metal. An anode for a lithium secondary battery manufactured according to the present invention can preve...  
WO/2018/209374A1
The invention relates to a method for improving the wear resistance of a highly loaded component provided with a corrosion protection layer, according to which a chemical nickel layer is deposited on the component as a corrosion protecti...  
WO/2018/211703A1
Provided is a vapor deposition method including: a fixing step for fixing a vapor deposition mask (3) on a mask frame (2); a raising step for placing a substrate (4) on the vapor deposition mask (3) and raising the mask frame (2) such th...  
WO/2018/211792A1
This sputtering target for transparent conductive film comprises an oxide sintered compact having, as constituent elements, In, Sn, Si and O, the content ratio of In being greater than 25.0% by mass but not more than 82.0% by mass in ter...  
WO/2018/209612A1
Disclosed in the present invention are a contact plate, an alignment system, and a vapor deposition device. The alignment system comprises a contact plate and a vapor deposition magnetic plate, for use in the alignment between a mask and...  
WO/2018/210042A1
A method for vacuum drying of a film. The method comprises: placing a substrate (1) on which a film material (2) is formed in a vacuum drying environment, the film material (2) comprising a solvent and solute used for forming a film; in ...  
WO/2018/210120A1
A magnetron driving mechanism comprises a driving assembly, a transmission assembly, a rotating assembly, and a limiting assembly. The driving assembly is used to drive both the rotating assembly and the transmission assembly to rotate c...  
WO/2018/211793A1
This sputtering target for transparent conductive film comprises an oxide sintered compact having, as constituent elements, In, Sn, Si and O, or In, Si and O, the content ratio of In being 70.0% by mass to less than 85.0% by mass in term...  
WO/2018/211900A1
The present invention is related to an oxide sintered body which is formed from the metal elements In, Ga, Zn, and Sn, and includes a hexagonal layered compound represented by InGaO3(ZnO)m (m being an integer in the range of 1-6), wherei...  
WO/2018/210866A1
A metal cutting tool comprising a main body made of cemented carbide, cermet, ceramic, steel or high-speed steel, and a multi-layer wear protection coating, wherein the wear protection coating comprises - an lower layer (LL) having the o...  
WO/2018/211899A1
The present invention is related to an oxide sintered body which is formed from the metal elements In, Ga, Zn, and Sn, and includes Ga2In6Sn2O16, ZnGa2O4, and InGaZnO4, wherein, when [In], [Ga], [Zn], and [Sn] represent the ratios (atom%...  
WO/2018/211977A1
Provided are: an oxide sintered body which includes In, W, and Zn, includes an In2O3 crystal phase and an In2(ZnO)mO3 crystal phase (m being a natural number), and in which the average coordination number of oxygen coordinated to indium ...  
WO/2018/211348A1
A body component of a vehicle can comprise a first substrate formed of at least one non-conductive material and defining a back surface that defines a retroreflector geometry and a front surface that defines a different geometry than the...  
WO/2018/211724A1
Provided are: an oxide sintered body which includes In, W, and Zn, includes an In2O3 crystal phase and an In2(ZnO)mO3 crystal phase (m being a natural number), and in which the average coordination number of oxygen coordinated to indium ...  
WO/2018/211081A1
An apparatus for patterned processing comprises a source of input gas (2), a source of energy suitable for generating a plasma from the input gas (2) in a plasma region and a grounded sample holder (12) configured for receiving a solid s...  
WO/2018/209940A1
Film manufacturing equipment and method. The apparatus comprises: a chamber (200); a substrate carrying member disposed in the chamber (200) for carrying a substrate (101) upon which film is to be formed; a mask fixing member (202) for f...  
WO/2018/207727A1
This superconducting wire is provided with: a superconducting laminate in which a superconducting layer is formed on a tape-like substrate, with an intermediate layer being interposed therebetween; and a stabilization layer which covers ...  
WO/2018/204944A1
The invention relates to the use of an additive for preserving the electrical conductivity of an Mo-based layer within a layer plane, wherein the Mo-based layer is applied (directly or via one or more intermediate layers) onto a flexible...  
WO/2018/209098A1
A self-cleaning transparent conductive surface includes a hydrophobic film and a metal nano-web coupled to the hydrophobic film. The metal nano-web imparts conductive properties to the surface of the film and texturing formed by either t...  
WO/2018/204943A2
The invention relates to a high-temperature component (1) made of a refractory metal or a refractory metal alloy, said component having a coating (2) for increasing emissivity and the coating substantially consisting of: tantalum nitride...  
WO/2018/207803A1
The present invention relates to manufacturing technology for a hard carbon film that can exhibit not only excellent wear resistance but also sufficiently low abrasiveness by smoothing of a sliding surface while suppressing occurrences o...  
WO/2018/205664A1
Disclosed is a fine mask plate support framework (1), comprising: a plurality of frames (11), and the plurality of frames (11) surrounding a mask region (12), wherein at least one pair of two frames (11) which are arranged oppositely are...  
WO/2018/205432A1
Provided is an evaporation device, comprising: a housing (202), and a plurality of evaporation sources (101, 203), which are located inside said housing (202) and used for evaporating a material to produce a gas material; the evaporation...  
WO/2018/208504A1
A cylindrical target assembly for use in a physical vapor deposition (PVD) processing chamber for magnetically enhanced sputtering applications. In embodiments disclosed herein, a cylindrical target, disposed around a rotatable backing t...  
WO/2018/207652A1
The present invention aims to provide: a dustproof lens that improves dustproofing performance without losing transparency; and a production method therefor. This dustproof lens is characterized by: at least a conductive film being forme...  
WO/2018/207618A1
The present invention relates to a read-only optical information recording medium in which at least one reflection film and at least one optically transparent layer are stacked sequentially on a substrate and with which information is pl...  
WO/2018/207414A1
Provided are an Sn-Zn-O-based oxide sintered body of high density and low resistance that can be used in such applications as barrier films and protective films, and a production method therefor. This Sn-Zn-O-based oxide sintered body ha...  
WO/2018/204963A1
The invention relates to a method for producing noble metal-modified silicon nanowires, comprising the following steps: creating the silicon nanowires in a silicon wafer by means of silver-catalysed chemical wet etching; and applying one...  
WO/2018/205531A1
Disclosed are a mask plate and mask pieces. The mask plate comprises a first mask piece (100) and a second mask piece (200), wherein the first mask piece (100) comprises a first mask region (110) located in the middle in a first directio...  
WO/2018/207577A1
Provided is a film-forming device for sputtering a target T and forming a thin film on a substrate, wherein the film-forming device is provided with an anti-deposition mechanism within a film-forming chamber, the anti-deposition mechanis...  
WO/2018/207616A1
[Problem] To reduce the size of a vacuum processing device and improve substrate throughput. [Solution] A vacuum processing device in which load lock chambers 3A, 3B are connected to a normal-pressure transfer chamber 2 in such a manner ...  
WO/2018/205361A1
Provided is a vapour deposition apparatus, comprising a main chamber (11) and at least one secondary chamber (10) in communication with the main chamber (11) by means of a valve; the secondary chamber (10) comprises a suction platform (2...  
WO/2018/207770A1
The present invention is characterized by having a composition which contains from 16% by mass to 55% by mass (inclusive) of Ni, with the balance made up of Cu and unavoidable impurities, and wherein the contents of Si, Al, Mg and Zr amo...  
WO/2018/205667A1
An evaporation device for substrate evaporation. A mask (400) is provided on one side of a substrate (300). The evaporation device comprises: a magnetic adsorption layer (100); and a heat-sensitive layer (200) located on one side of the ...  
WO/2018/205430A1
A magnetron sputtering cavity for through-silicon-via filling and a semiconductor processing device. The magnetron sputtering cavity comprises a cavity, a target (2) provided at the top of the cavity, a magnetron (1) provided above the t...  
WO/2018/207105A1
Described embodiments include an apparatus (20, 21), which includes a support (22), including an outer surface (24) and configured for insertion into a body of a subject. The apparatus further includes multiple atoms (26) of a radionucli...  
WO/2018/202964A1
The invention relates to a turbine part, such as a turbine blade or a distributor fin, for example, comprising a substrate made of a monocrystalline nickel superalloy, a metal sublayer covering the substrate, and a protective layer of me...  
WO/2018/204570A1
The invention provides a sputter deposition assembly that includes a sputtering chamber, a sputtering target, and a magnet assembly. The magnet assembly includes a magnetic backing plate comprising an elongated flexible magnetic control ...  
WO/2018/203526A1
The present invention pertains to an aluminum vapor-deposited film in which a polyethylene terephthalate film, an active treatment layer, and a vapor-deposited layer in which the composition changes continuously from an aluminum oxide va...  
WO/2018/203972A1
A substrate having a coating is disclosed. The coating is formed of a plurality of layers. A base layer of the plurality of layers includes an alloy, and at least two additional layers include silver. A coating for a substrate is also di...  
WO/2018/204320A1
The present invention is directed to the synthesis of metallic nickel-molybdenum-tungsten films and coatings with direct current sputter deposition, which results in fully-dense crystallographically textured films that are filled with na...  
WO/2018/202656A1
A process for depositing a lithium cobalt oxide-based thin film on a substrate in which the Li-stoichiometry (LixCoO2) can be tuned within the limits 0.5≤ x≤1.1 using a standard stoichiometric LiCoO2 target material combined with a s...  
WO/2018/202542A1
The invention relates to a method for processing an inner wall of a cylinder, in particular a cylinder of an internal combustion engine, comprising the following steps: providing a cylinder, which extends along a cylinder axis; processin...  
WO/2018/199184A1
The evaporation source is provided with an evaporation source container, a heating device, a first heat-shielding plate, and second heat-shielding plates. The evaporation source container is provided with: a container body having a top f...  

Matches 301 - 350 out of 103,952