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WO/2018/180545A1 |
The production method for a cylindrical sputtering target according to the present invention comprises: a solder material applying step for forming a solder underlying layer on the inner peripheral surface of a sputtering target material...
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WO/2018/179556A1 |
[Problem] To provide an IGZO sputtering target that suppresses arcing. [Solution] Provided is an IGZO sputtering target containing In, Ga, Zn and O, wherein, in terms of atomic ratio, 0.30≤In/(In+Ga+Zn)≤0.36, 0.30≤Ga/(In+Ga+Zn)≤0...
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WO/2018/180182A1 |
This cylindrical sputtering target is provided with: a metallic cylindrical base material; and a ceramic cylindrical target material, which is bonded to the outer circumferential side of the cylindrical base material, and which is integr...
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WO/2018/178036A2 |
The invention relates to a method for determining the partial pressure or concentration of a vapour in a volume (2), a sensor surface (6) of a sensor body (5) oscillating with an oscillation frequency being kept at a temperature at which...
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WO/2018/176848A1 |
Disclosed are a mask plate and a manufacturing method therefor. The mask plate comprises a mask substrate (100). The mask substrate (100) comprises a mask area (110) thereon. The mask area (110) comprises an active area (120) and a dummy...
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WO/2018/175753A1 |
Provided herein are centrifugal evaporation sources. These sources include a manifold body, a crucible, an expansion chamber, a centrifugal separator chamber, and an effusion nozzle.
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WO/2018/174019A1 |
Provided is a sintered In-Cu sputtering target characterized by having a composition containing In in the range of 10-90 at.%, with the remainder being Cu and unavoidable impurities, and by having a theoretical density ratio of at least ...
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WO/2018/172211A1 |
The invention relates to an apparatus for separating layers from an organic material on a substrate (13), comprising a gas inlet member (7) having a heating device (31) arranged in a reactor housing (1), a steam generator (30), by means ...
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WO/2018/174049A1 |
Provided are: a lens with a water repellent anti-reflection film, wherein a water repellent film has improved adhesion and durability; and a method for producing this lens with a water repellent anti-reflection film. A lens with a water ...
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WO/2018/173450A1 |
Provided is a tungsten silicide target that allows particle generation during sputtering to be suppressed via a different method than in the prior art. The tungsten silicide target has no more than five low-density partially sintered sec...
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WO/2018/175689A1 |
A magnetron sputtering source for sputtering a target includes a magnetically permeable material yoke member and a first magnet positioned on said yoke member and having a north-south magnetic orientation that is perpendicular to the yok...
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WO/2018/175381A1 |
A fully-dense, fluid tight, low friction coating system is described that is characterized by fluid impermeability and a reduced coefficient of friction. The coating system includes a fully dense, fluid tight underlying layer; and a low ...
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WO/2018/171977A1 |
Disclosed is an antiabrasion-coated metal part (I; II), the tribologically affected surface of which is provided at least in part with an antiabrasive coating (1; 1', 1") that is applied using a plasma process and is in the form of a mul...
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WO/2018/173517A1 |
This sputtering target has a molybdenum content of 3 mol% to 25 mol% and a silicon content of 75 mol% to 97 mol%. The sputtering target comprises a silicon phase in which the average particle diameter of the silicon particles is 2.0 µm ...
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WO/2018/175182A1 |
A method of performing deposition of diamond-like carbon on a workpiece in a chamber includes supporting the workpiece in the chamber facing an upper electrode suspended from a ceiling of the chamber, introducing a hydrocarbon gas into t...
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WO/2018/172277A1 |
The invention relates to a process chamber guide, designed for linearly guiding a substrate carrier that can be displaced in the process chamber guide in a direction of guidance such that by means of displacement of the substrate carrier...
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WO/2018/166954A3 |
The invention relates to a device for depositing a layer, which has been structured by the application of a mask (4), on a substrate (13), comprising an adjusting device (100, 200) for adjusting the position of a mask support (6) with re...
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WO/2018/166620A1 |
The present disclosure provides an apparatus (100) for vacuum processing of a substrate (10). The apparatus (100) includes a first vacuum region (110), a second vacuum region (120), an opening (130) between the first vacuum region (100) ...
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WO/2018/166621A1 |
The present disclosure provides a deposition apparatus (100) for a vacuum deposition process. The deposition apparatus includes a vacuum chamber (130), a movable deposition source (110) arranged in the vacuum chamber, and a supply arrang...
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WO/2018/167895A1 |
This sputtering device is configured to form an insulating film on a substrate and is provided with: a vacuum container; an electrode which is disposed in the vacuum container, and to which an insulator target is attached; a substrate ho...
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WO/2018/168973A1 |
The present invention provides a surface treatment agent comprising a silane compound which contains a perfluoro(poly)ether group and a compound which includes an atom with an unshared electron pair in the molecular structure.
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WO/2018/169998A1 |
Disclosed herein are aluminum alloys with scandium as the alloying element. The alloys have a high scandium content, as measured by atomic percentage, and are highly uniform, as described herein. Methods of forming articles from these al...
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WO/2018/169062A1 |
The purpose of the present invention is to provide a metal coating for electromagnetic wave penetration having a sufficient metallic luster for appearance, and a method for forming a metal coating for electromagnetic wave penetration sui...
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WO/2018/166619A1 |
A material deposition arrangement (100) for depositing a material on a substrate in a vacuum deposition chamber is described. The material deposition arrangement (1 00) includes at least one material deposition source (105) having a cruc...
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WO/2018/166831A1 |
Known cylindrical sputtering targets comprise a substrate and a target material that forms a layer on the substrate, said layer has a thickness d, wherein the target material comprises TiOx as the main component, and x is within a range ...
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WO/2018/166616A1 |
A carrier (20) for use in a vacuum system is described. The carrier (20) includes: a magnet arrangement (30) including one or more first permanent magnets (32); one or more second permanent magnets (34); and a magnet device (36) configur...
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WO/2018/167170A1 |
A technique comprising: depositing a first layer comprising a precursor to a cross-linked polymer on a substrate comprising at least a semiconductor material that provides one or more semiconductor channels for one or more transistors, w...
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WO/2018/169250A1 |
A metal plate for use in manufacture of a deposition mask according to an embodiment is a multilayer metal plate having a thickness of 30µm or less and containing an alloy of nickel (Ni) and iron (Fe), and comprises: a first outer porti...
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WO/2018/168963A1 |
A hydrophilic vapor deposition film which is able to be formed even on a substrate having high water resistance and large curvature, a substrate having a complicated shape or a substrate that is difficult to be heated to high temperature...
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WO/2018/166637A1 |
A deposition system (100) for depositing evaporated material on a substrate is described. The deposition system (100) includes a vapor source (120) having one or more vapor outlets (125); a shield (110); and a cooling device (112) for co...
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WO/2018/166622A1 |
A method of operating a vacuum processing system (100, 200, 300) with a main transportation path (50) along which substrates can be transported in a main transportation direction (Z) is described. The method includes: (1a) routing a subs...
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WO/2018/169247A2 |
The present invention relates to an anode, a production method therefor, and a lithium secondary battery comprising the same, the anode comprising a lithium metal layer, a lithium nitride thin film layer formed on at least one surface of...
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WO/2018/166953A1 |
The invention relates to a device for separating a layer on a substrate (13), said layer being structured by placing a mask (4), having an adjustment device (100, 200) for adjusting the position of a mask carrier (6) with respect to a ca...
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WO/2018/168111A1 |
An Al2O3 sputtering target which is characterized by having a purity of 99.99 wt% or more, a relative density of from 85% to 95% (inclusive), a volume resistivity of 10 × 1014 Ω·cm or less and a dielectric loss tangent of 15 × 10-4 o...
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WO/2018/168972A1 |
The present invention provides a surface treatment agent comprising a silane compound which contains a perfluoro(poly)ether group and a compound which includes an atom with an unshared electron pair in the molecular structure.
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WO/2018/166618A1 |
The present disclosure provides an apparatus (100) for vacuum processing of a substrate. The apparatus (100) includes a processing vacuum chamber (110), a maintenance vacuum chamber (120), an opening (130) for transferring at least a por...
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WO/2018/167534A1 |
The present invention provides for an ion implanted cold sprayed hardmetal cemented carbide coating and a method to prepare the coating. The coating comprises hardmetal carbide and a binder metal M selected from nickel, cobalt, copper, i...
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WO/2018/168942A1 |
The purpose of the present invention is to improve uniformity of film deposition by a plasma-based sputtering device. Provided is a sputtering device 100 for depositing a film on a substrate W through sputtering of targets T by using pla...
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WO/2018/166955A1 |
The invention relates to a device and a method for the thermal treatment of at least one substrate (2) in a process chamber (1) of a treatment device at a regulated temperature with a heat flow from a heating element (5) heating a suscep...
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WO/2018/166954A2 |
The invention relates to a device for depositing a layer, which has been structured by the application of a mask (4), on a substrate (13), comprising an adjusting device (100, 200) for adjusting the position of a mask support (6) with re...
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WO/2018/169331A1 |
The present invention relates to a method for producing an antibacterial food packaging material containing a metal nanoparticle, and an antibacterial food packaging material produced thereby and, particularly, to a method for producing ...
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WO/2018/168244A1 |
Provided are: a method for producing a transparent optical film, by which a transparent optical film that comprises an extremely thin transparent silver alloy layer is efficiently produced; and a method for producing a transparent multil...
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WO/2018/164216A1 |
A laminate exhibiting structural color, characterized by comprising: a base layer that has a plurality of convex parts or a plurality of concave parts disposed in a substantially regular manner on the surface thereof; a first layer that ...
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WO/2018/164693A1 |
Processes are described herein which 3D print a ceramic fiber composite (24, 48) in a printed pattern (308) on a ceramic matrix composite (CMC) component (300) in order to define a plurality of channels (312) between adjacently deposited...
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WO/2018/163861A1 |
This Cu-Ni alloy sputtering target has a composition such that: Ni is contained in the range of 16 mass% to 55 mass%; the hydrogen content is less than 5 mass ppm, the oxygen content is 500 mass ppm or less, and the carbon content is 500...
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WO/2018/162231A1 |
The invention relates to a mirror (10) having an optically active surface (12) for reflecting electromagnetic radiation and having at least one piezoelectrically active layer (13) for the deformation of the optically active surface (12),...
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WO/2018/162385A1 |
The invention relates to a method for producing at least one opening (1) in a transparent or transmissive glass substrate (2), the glass substrate (2) being selectively modified along a beam axis (s) by means of electromagnetic radiation...
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WO/2018/165055A1 |
A method of depositing germanium on one or more substrates is disclosed. The method includes placing a source of germanium and the substrate(s) in a vapor deposition system, and heating the source of germanium in the vapor deposition sys...
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WO/2018/164155A1 |
The purpose of the present invention is to provide a high-purity tin product not containing undesirable carbon impurities by producing a high-purity metal vacuum-packaged product (high-purity tin vacuum-packaged product) by means of vacu...
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WO/2018/164139A1 |
Provided is a rolling bearing which has excellent durability. This rolling bearing (1) is provided with an inner ring (2), an outer ring (3), a plurality of rolling bodies (4) and a hard film (8). The hard film (8) is formed on the surfa...
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