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Matches 351 - 400 out of 104,008

Document Document Title
WO/2018/207577A1
Provided is a film-forming device for sputtering a target T and forming a thin film on a substrate, wherein the film-forming device is provided with an anti-deposition mechanism within a film-forming chamber, the anti-deposition mechanis...  
WO/2018/207616A1
[Problem] To reduce the size of a vacuum processing device and improve substrate throughput. [Solution] A vacuum processing device in which load lock chambers 3A, 3B are connected to a normal-pressure transfer chamber 2 in such a manner ...  
WO/2018/205361A1
Provided is a vapour deposition apparatus, comprising a main chamber (11) and at least one secondary chamber (10) in communication with the main chamber (11) by means of a valve; the secondary chamber (10) comprises a suction platform (2...  
WO/2018/207770A1
The present invention is characterized by having a composition which contains from 16% by mass to 55% by mass (inclusive) of Ni, with the balance made up of Cu and unavoidable impurities, and wherein the contents of Si, Al, Mg and Zr amo...  
WO/2018/205667A1
An evaporation device for substrate evaporation. A mask (400) is provided on one side of a substrate (300). The evaporation device comprises: a magnetic adsorption layer (100); and a heat-sensitive layer (200) located on one side of the ...  
WO/2018/205430A1
A magnetron sputtering cavity for through-silicon-via filling and a semiconductor processing device. The magnetron sputtering cavity comprises a cavity, a target (2) provided at the top of the cavity, a magnetron (1) provided above the t...  
WO/2018/207105A1
Described embodiments include an apparatus (20, 21), which includes a support (22), including an outer surface (24) and configured for insertion into a body of a subject. The apparatus further includes multiple atoms (26) of a radionucli...  
WO/2018/202964A1
The invention relates to a turbine part, such as a turbine blade or a distributor fin, for example, comprising a substrate made of a monocrystalline nickel superalloy, a metal sublayer covering the substrate, and a protective layer of me...  
WO/2018/204570A1
The invention provides a sputter deposition assembly that includes a sputtering chamber, a sputtering target, and a magnet assembly. The magnet assembly includes a magnetic backing plate comprising an elongated flexible magnetic control ...  
WO/2018/203526A1
The present invention pertains to an aluminum vapor-deposited film in which a polyethylene terephthalate film, an active treatment layer, and a vapor-deposited layer in which the composition changes continuously from an aluminum oxide va...  
WO/2018/203972A1
A substrate having a coating is disclosed. The coating is formed of a plurality of layers. A base layer of the plurality of layers includes an alloy, and at least two additional layers include silver. A coating for a substrate is also di...  
WO/2018/204320A1
The present invention is directed to the synthesis of metallic nickel-molybdenum-tungsten films and coatings with direct current sputter deposition, which results in fully-dense crystallographically textured films that are filled with na...  
WO/2018/202656A1
A process for depositing a lithium cobalt oxide-based thin film on a substrate in which the Li-stoichiometry (LixCoO2) can be tuned within the limits 0.5≤ x≤1.1 using a standard stoichiometric LiCoO2 target material combined with a s...  
WO/2018/202542A1
The invention relates to a method for processing an inner wall of a cylinder, in particular a cylinder of an internal combustion engine, comprising the following steps: providing a cylinder, which extends along a cylinder axis; processin...  
WO/2018/199184A1
The evaporation source is provided with an evaporation source container, a heating device, a first heat-shielding plate, and second heat-shielding plates. The evaporation source container is provided with: a container body having a top f...  
WO/2018/196365A1
A mask sheet (10, 200, 300), comprising: a mask region (110, 210, 310) and a peripheral region (120, 220, 320) which surrounds the mask region (110, 210, 310); the mask sheet is located at at least one edge portion of the peripheral regi...  
WO/2018/196752A1
A vacuum coating cavity with a cooling device. The cooling device (2) is mounted inside a vacuum cavity (1) and comprises an upper water cooling means (201), a middle water cooling means (202), and a lower water cooling means (203); the ...  
WO/2018/197702A1
Power converter unit (1, 1') capable to convert an electrical input power into a bipolar output power and to deliver this output power to at least two independent plasma processing chambers (9a, 9b.. 9n), the unit (1, 1') comprising : on...  
WO/2018/197699A1
Power converter unit (1, 1') capable to convert an electrical input power into a bipolar output power and to deliver this output power to at least two independent plasma processing chambers (9a, 9b.. 9n), the unit (1, 1') comprising : on...  
WO/2018/197305A3
The soft magnetic material multilayer deposition apparatus comprises a circular arrangement of a multitude of substrate carriers (11) in a circular inner space of a vacuum transport chamber (3). In operation the substrate carriers (11) p...  
WO/2018/197696A1
Power converter unit (1, 1') capable to convert an electrical input power into a bipolar output power and to deliver this output power to at least two independent plasma processing chambers (9a, 9b,.. 9n), the unit (1, 1') comprising: - ...  
WO/2018/197008A1
The present disclosure provides a method (100) for cleaning a vacuum system used in the manufacture of OLED devices. The method (100) includes performing pre-cleaning for cleaning at least a portion of the vacuum system, and performing p...  
WO/2018/196071A1
Disclosed is a device for forming a film by means of physical sputtering, said device comprising a vacuum cavity (1); a substrate table (2) arranged in the vacuum cavity (1), wherein a substrate (21) with a film to be formed is arranged ...  
WO/2018/196113A1
Disclosed is a vapour deposition device, comprising an evaporation part (10), a transmission pipe (20) and a vapour deposition part (30), wherein the evaporation part (10) is used for heating and evaporating a vapour deposition material ...  
WO/2018/197305A2
The soft magnetic material multilayer deposition apparatus comprises a circular arrangement of a multitude of substrate carriers (11) in a circular inner space of a vacuum transport chamber (3). In operation the substrate carriers (11) p...  
WO/2018/198661A1
This glass roll production method comprises a glass film supply step of dispensing a band-shaped first glass film 2A in a predetermined direction, a film-forming step of heat-forming a transparent electric conductive film 3 on one surfac...  
WO/2018/197010A1
A vacuum system (100) for depositing a plurality of materials on a substrate is described. The vacuum system includes a plurality of deposition modules (110) arranged along a main transport direction (P) and including deposition sources ...  
WO/2018/199507A1
The present invention provides an electronic component carrier sheet, and an adhesion device and a thin film forming apparatus using the same, the electronic component carrier sheet allowing electronic components to be attached thereto s...  
WO/2018/197823A1
Sputtering cathode target consisting on the one hand of an oxide of at least one element selected from the group consisting of titanium, silicon, zirconium and, on the other hand, particles of a metal selected from the group consisting o...  
WO/2018/200394A1
A reconfigurable wafer spin chuck for supporting a wafer includes a rotatable chuck base having a first opening formed therein and including one or more support members extending upwardly therefrom. The spin chuck is reconfigurable betwe...  
WO/2018/199394A1
The present invention relates to a gold-deposited copper film. The gold-deposited copper film comprises: a metal layer composed of copper; a metal barrier layer positioned on the metal layer and including brass, manganese brass, phosphor...  
WO/2018/197009A1
A vacuum system (100) for depositing one or more materials on a substrate is described. The vacuum system (100) comprises a first transport system (110) configured to transport a substrate (10) along a main transport path (101) in a main...  
WO/2018/199169A1
A film forming device according to an aspect of the present invention has an unwinding roller, a winding roller, a heating roller, a film forming unit, and a control unit. The unwinding roller unwinds a base material which is a long film...  
WO/2018/197821A1
Glazing comprising a glass substrate on which a coating comprising at least one layer is deposited, said layer being made of a material comprising metal nanoparticles dispersed in an inorganic matrix of an oxide in which said metal nanop...  
WO/2018/197867A1
Apparatus for depositing germanium and carbon onto one or more substrates comprises a vacuum chamber, at least first and second magnetron sputtering devices and at least one movable mount for supporting the one or more substrates within ...  
WO/2018/197560A1
The invention relates to various embodiments of a solid particle-source (100a, 100a) that can comprise: a container (104) which comprises an area for receiving solid particles; at least one electron source (106) for introducing electrons...  
WO/2018/198302A1
Provided is a stretching device (1) that imparts tension to a vapor deposition mask (5), wherein the stretching device (1) is provided with: tension drive devices (31 – 34) for stretching tension end parts (51 – 54) provided in at le...  
WO/2018/192886A1
Method for manufacturing a ceramic component, in particular containing zirconia and/or alumina, for a timepiece or jewelry piece, characterised in that it comprises a step (E3) of depositing at least one additional element or compound on...  
WO/2018/192070A1
An evaporation source device (100) comprises a body (11) and a heating member (12). The heating member (12) is used to heat an evaporation material to form an evaporation gas, and the body is provided with a first cavity (111) for accomm...  
WO/2018/192668A1
A material deposition arrangement chamber (1000) for depositing a material on a substrate is described. The material deposition arrangement chamber comprises a vacuum generation device (1060) and a material deposition arrangement (100) h...  
WO/2018/193036A1
The invention comprises a superalloy target wherein the superalloy target has a polycrystalline structure of random grain orientation, the average grain size in the structure is smaller than 20 μm, and the porosity in the structure is s...  
WO/2018/193759A1
[Problem] To produce a variable resistance element having excellent electrical characteristics at low cost. [Solution] A method for producing a variable resistance element according to the present invention comprises the formation of a f...  
WO/2018/193742A1
Provided is an antireflective material that has a water- and oil-repellant layer on a multi-layered antireflective layer and is capable of exhibiting excellent surface lubricity, water- and oil-repellant properties, and durability. The s...  
WO/2018/192885A1
A method for manufacturing a bound ceramic powder comprising at least one additional element or compound, said bound ceramic powder being in particular based on zirconia and/or alumina and/or strontium aluminate, characterized in that it...  
WO/2018/195054A1
A sputtering target comprising a sputtering material and having a non-planar sputtering surface prior to erosion by use in a sputtering system, the non-planar sputtering surface having a circular shape and comprising a central axis regio...  
WO/2018/192196A1
Disclosed is a protective plate (10) comprising: a substrate (101); and a bearing layer (102) located on the substrate (101) and used for bearing a plating material, wherein the bearing layer (102) can be stripped from the substrate (101...  
WO/2018/193993A1
A film forming apparatus according to one embodiment of the present invention comprises a film formation unit, a first treatment unit, a second treatment unit and a vacuum chamber. The film formation unit comprises an evaporation source ...  
WO/2018/194348A1
The present invention provides a lamination system comprising a substrate and a highly reflective layer, which is formed on the substrate and has a reflective index of 2.0 or greater and a thickness of 70 nm or less.  
WO/2018/193035A1
Superalloy workpiece comprising: - a superalloy substrate - an interface layer (IF-1) of essentially the same superalloy composition directly on a surface of the superalloy substrate, followed by - a transition layer (TL) of essentially ...  
WO/2018/193991A1
A container which comprises: a base material that has one or more containing parts, in each of which a sample is to be contained; a conductive film that is formed on at least a part of the base material; and an amorphous carbon film that...  

Matches 351 - 400 out of 104,008