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Matches 351 - 400 out of 103,586

Document Document Title
WO/2018/163883A1
The present invention addresses the problem of providing a polyethylene film for vapor deposition substrates, which enables the achievement of a vapor deposition film having excellent barrier properties even if the vapor deposition film ...  
WO/2018/162920A1
Disclosed is a titanium alloy comprising: 70 at.% to 85 at.% titanium; 3.0 at.% to 23 at.% of vanadium; 1.8 at.% to 5 at.% iron; and 0.5 at.% to 3 at.% aluminium. The alloy has superelastic properties with high elastic recovery and a lar...  
WO/2018/164494A1
The present invention relates to a negative electrode with a carbon-based thin film formed on at least one surface of a lithium metal layer and to a lithium secondary battery comprising the same. According to the present invention, the c...  
WO/2018/162386A1
The invention relates to a method for producing a technical mask (1) from a flat substrate (2), for example glass, sapphire or silicon. At least one opening of the mask (1) is produced by means of laser-induced deep etching, wherein the ...  
WO/2018/162919A1
Disclosed is a titanium alloy comprising: 76 at.% to 89 at.% titanium; 3.0 at.% to 18 at.% of niobium; 0.5 at.% to 4.8 at.% hafnium; and 0.05 at.% to 3 at.% chromium. The alloy has superelastic properties with high elastic recovery and a...  
WO/2018/162745A1
The present invention relates to a material comprising a base substrate and a thin layer of an alloy with atomic formula Ti1-xAux, 1-x and x being atomic fractions, x being comprised between 0.22 and 0.28. The present invention also rela...  
WO/2018/158348A1
This invention relates to a substrate carrier structure wherein the substrate may be a wafer and its use in nanoscale processes, such as deposition and/or growth processes. The carrier structure (1) comprises grooves (2, 3) on its fronts...  
WO/2018/159492A1
[Problem] To provide a dielectric composition having a high relative dielectric constant and high Q value even at high frequencies, and an electronic component comprising a dielectric film configured from said dielectric composition. [So...  
WO/2018/159392A1
Provided are: a reflective mask blank provided with a phase shift film having a phase difference and a reflectance which have little dependence on film thickness; and a reflective mask. The reflective mask blank is characterized in that:...  
WO/2018/158101A1
The invention relates to a target for using in a physical vapour deposition process, with a matrix consisting of a composite material selected from the group consisting of an aluminium-based material, a titanium-based material and a chro...  
WO/2018/160501A1
A high throughput deposition apparatus includes a process chamber, a plurality of targets that form a first closed loop in the process chamber, wherein the first closed loop includes a long dimension defined by at least a first pair of t...  
WO/2018/160195A1
There are provided processes and materials which extend the lifetime of a thermal barrier coating (14), and which reduce or eliminate the effects of molten contaminant attack (e.g., CMAS infiltration) to the thermal barrier coating (14)....  
WO/2018/159888A1
The present invention relates to a tin/magnesium thin film formed on a zinc plated layer and a method for manufacturing the same. The method comprises the steps of: preparing a substrate on which a zinc plated layer is formed; physically...  
WO/2018/159753A1
This sputtering target is characterized by having a metal copper phase and a copper oxide phase, wherein the volume fraction of the copper oxide phase is in a range exceeding 80 vol% and less than or equal to 90 vol%, the ratio IP1/IP2 b...  
WO/2018/155421A1
This resin film formation method uses a mask with the mask main body formed from a metal material and having prescribed openings and forms a resin film on a substrate in a reduced pressure atmosphere, and involves: a first step in which ...  
WO/2018/153480A1
A positioning arrangement (100) for positioning a substrate carrier (150) and a mask carrier (160) in a vacuum chamber is described. The positioning arrangement (100) comprising a first track (110) extending in a first direction and conf...  
WO/2018/153853A1
A modular demountable low-temperature high-output linear evaporation source (100) for depositing a semi-metal source material (75), in particular Se, on a substrate (50), the evaporation source comprising: a crucible (201) comprising: a ...  
WO/2018/155478A1
A substrate processing device (10) and a processing system (100) according to an embodiment process substrates (W) having a magnetic layer individually and are provided with: a support unit (PP) for supporting the substrates; a heating u...  
WO/2018/155301A1
An oxide semiconductor film which contains In, Ga and Sn at atomic ratios expressed by formula (1) 0.01 ≤ Ga/(In + Ga + Sn) ≤ 0.30, formula (2) 0.01 ≤ Sn/(In + Ga + Sn) ≤ 0.40 and formula (3) 0.55 ≤ In/(In + Ga + Sn) ≤ 0.98, ...  
WO/2018/153859A1
A modular demountable low-temperature high-output linear evaporation source (100) for depositing a semi-metal source material (75), in particular Se, on a substrate (50), the evaporation source comprising: a crucible (201) comprising: a ...  
WO/2018/153851A1
A modular demountable low-temperature high-output linear evaporation source (100) for depositing a semi-metal source material (75), in particular Se, on a substrate (50), the evaporation source comprising: a crucible (201) comprising: a ...  
WO/2018/155385A1
The purpose of the present invention is to provide technology for manufacturing a hard carbon film that effectively inhibits occurrences of abrasive wear and has greatly reduced coefficient of friction while maintaining abrasion resistan...  
WO/2018/153850A1
A modular demountable low-temperature high-output linear evaporation source (100) for depositing a source material (75) on a substrate (50), the evaporation source comprising: a crucible (201) comprising: a base (203); a first plurality ...  
WO/2018/153847A1
A modular demountable low-temperature high-output linear evaporation source (100) for depositing a semi-metal source material (75), in particular Se, on a substrate (50), the evaporation source comprising: a crucible (201) comprising: a ...  
WO/2018/154054A1
According to various embodiments, an electron beam evaporator (100) can comprise the following: a tube target (102); an electron beam gun (104) for producing at least one vapour source (102q) on a removal surface (102f) of the tube targe...  
WO/2018/155415A1
This film forming method sprays a liquid resin material on to a heating unit and vaporizes same, supplies the vaporized steam on to a substrate, and forms a resin material film. The film forming method controls film forming conditions so...  
WO/2018/153857A1
A modular demountable low-temperature high-output linear evaporation source (100) for depositing a semi-metal source material (75), in particular Se, on a substrate (50), the evaporation source comprising: a crucible (201) comprising: a ...  
WO/2018/155440A1
This method for forming a patterned resin film on a substrate involves, in order, at least: a first step in which a mask is used having a mask main body structured such that a flexible support part and an adhesive part overlap, and the m...  
WO/2018/155419A1
This vaporizer is for supplying a vaporized resin material to a production device for an element structure. The vaporizer comprises: a vaporization tank that comprises an inner space that is for vaporizing a liquid resin material; a disc...  
WO/2018/153482A1
A deposition source (100) for depositing evaporated material on a substrate (10) is described. The deposition source includes a distribution pipe assembly (120) with a plurality of nozzles (130) configured for directing the evaporated ma...  
WO/2018/153481A1
The present disclosure provides an apparatus (200) for vacuum processing of a substrate (10). The apparatus (200) includes a vacuum chamber, a first track arrangement (110) configured for transportation of a substrate carrier (120), a se...  
WO/2018/156452A1
Methods and apparatus for processing substrates with a multi-cathode chamber. The multi-cathode chamber includes a shield with a plurality of holes and a plurality of shunts. The shield is rotatable to orient the holes and shunts with a ...  
WO/2018/149840A2
The invention relates to a device and a method for treating, especially coating, a substrate (4), comprising: a gas inlet unit (2), which is mounted in a housing (1) and can be brought to a gas inlet temperature by means of a first tempe...  
WO/2018/150173A2
Apparatus for depositing one or more variable interference filters onto one or more substrates comprises a vacuum chamber, at least one magnetron sputtering device and at least one movable mount for supporting the one or more substrates ...  
WO/2018/151485A1
The present invention provides a reflective coating substrate comprising a transparent substrate, an underlayer formed on the transparent substrate and a reflective metal layer formed on the underlayer, wherein the underlayer includes zi...  
WO/2018/150621A1
Provided is an oxide sintered body containing In, W and Zn, which: contains a first crystal phase containing a bixbyite type phase and a second crystal phase having a first diffraction peak, in x-ray diffraction, in a position greater th...  
WO/2018/150173A3
Apparatus for depositing one or more variable interference filters onto one or more substrates comprises a vacuum chamber, at least one magnetron sputtering device and at least one movable mount for supporting the one or more substrates ...  
WO/2018/150622A1
Provided is an oxide sintered body containing In, W and Zn, further containing a first crystal phase which contains a bixbyite-type phase and a second crystal phase which has a higher Zn content ratio than the first crystal phase. The pa...  
WO/2018/152397A1
An optical mount includes a support substrate defining an aperture configured to receive an optical element. A support assembly is positioned proximate a perimeter of the aperture. The support assembly includes a resilient member configu...  
WO/2018/150130A1
Process for treating a sapphire part with a beam of a mixture of singly- and multiply-charged ions of a gas which are produced by an electron cyclotron resonance (ECR) source, where: the acceleration voltage of the ions is between 10 kV ...  
WO/2018/149840A3
The invention relates to a device and a method for treating, especially coating, a substrate (4), comprising: a gas inlet unit (2), which is mounted in a housing (1) and can be brought to a gas inlet temperature by means of a first tempe...  
WO/2018/148992A1
Provided are a shadow mask assembly and a method for reusing same. The shadow mask assembly comprises a shadow mask membrane (10) and a frame body (20), wherein the frame body (20) comprises an outer wall (204) and an inner wall (202) ar...  
WO/2018/150159A1
An apparatus for protecting an interior surface of a fusion reactor vessel. The apparatus comprises a power supply operably connected to an electrode for insertion into the vessel. The apparatus supports a solid material within the vesse...  
WO/2018/151035A1
A cutting tool for a sputtering target, said cutting tool being for chamfering the corners that constitute a sputtering surface and a side surface of a sputtering target, said cutting tool comprising: a shaft part and a blade part provid...  
WO/2018/149219A1
Disclosed is an evaporation source device (200), comprising: a support frame (207), and a nozzle set (202) and a shell (204) both located on the support frame (207), wherein the shell (204) comprises an evaporation opening (206) such tha...  
WO/2018/149548A1
The present invention discloses a tool holding device for shank type tools, comprising at least one tool holder, a base part and a top part, whereby at least the top part comprises uptake holes for the at least one tool holder characteri...  
WO/2018/149097A1
The present disclosure provides a crucible. The crucible includes a crucible body having an opening formed at the top thereof. The crucible further includes a sealing cover and an elastic element. The sealing cover is configured to seal ...  
WO/2018/151037A1
A method for machining a sputtering target including a sputtering surface, a facing surface on the opposite side from the sputtering surface, and an outer peripheral surface between the sputtering surface and the facing surface, the meth...  
WO/2018/149510A1
A deposition apparatus (100) for coating a flexible substrate (10) with at least one layer is described. The deposition apparatus comprises: a first spool chamber (110) configured for housing a storage spool for providing the flexible su...  
WO/2018/149894A1
The present invention relates to a method for the evaporation of a cathode by means of cathodic arc evaporation, wherein the focal spot of the arc is forced to a predetermined track on the cathode surface by means of temporally and spati...  

Matches 351 - 400 out of 103,586